CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF.

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF

Номер патента: US20140110626A1
Опубликовано: 24-04-2014
Автор(ы): Castillo, Choo Jae Ouk, Hughes John Edward Quincy, II Daniel Hernandez, Ledenbach Laura, Marsella John Anthony, Schlueter James Allen, Schwartz Jo-Ann Teresa, Shi Xiaobo, Usmani Saifi, Winchester Steven Charles, Zhou Hongjun
Принадлежит: AIR PRODUCTS AND CHEMICALS INC.
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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Composition for chemical-mechanical polishing (cmp) containing non-ion surfactant and carbonate salt

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Methods and compositions for carrier fluids comprising water-absorbent fibers

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Composition for fabricating organic film, organic light-emitting display apparatus manufactured using the same, and method of manufacturing the organic light-emitting display apparatus

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Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates

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Compositions for reducing or preventing the degradation of articles used in a subterranean environment and methods of use thereof

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Water-based alkaline composition for forming an insulating layer of an annealing separator, coated soft magnetic alloy and method of manufacturing a coated soft magnetic ribbon

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COMPOSITION FOR REMOVING ORGANIC DEPOSITS FROM OIL AND GAS WELLS AND OTHER SUBSURFACE SYSTEMS AND METHOD FOR REMOVING ORGANIC DEPOSITS USING THE REMOVER COMPOSITION

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COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

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Binder composition for color asphalt having improved mechanical property, anti-aging property, and crack resistance, and method for preparing the same

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Compositions for glass fiber reinforced polyolefin resin materials, glass fiber reinforced polyolefin resin materials and methods for producing them, and composites.

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Composition for liquid crystal alignment composed of compounds of photosensitive polymers and non-photosensitive polymers, preparation method of the film for photoinduced liquid crystal thereby and the liguid crystal cell comprising the film

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Coating composition for optical articles, spectacle lens, eyeglasses, method for manufacturing spectacle lens, optical article, and method for manufacturing optical article

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A method of joining surfaces

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Resin composition for flexible devices, film adhesive for flexible devices, adhesive sheet for flexible devices, and manufacturing method of flexible devices

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Resin composition for thermally expandable fire resistant sheet, thermally expandable fire resistant sheet using same, and method for manufacturing same

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Adhesive composition for electrical storage device, functional layer for electrical storage device, electrical storage device, and method for producing electrical storage device

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Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device

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Non-flammable paint composition for coating ceiling-type warmer with excellent deodorization, antibacterial, anti-condensation and adhesion properties, ans method of manufacturing the same

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Polyurethane adhesive composition for film lamination

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Two-component polyurethane adhesive composition for film lamination

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Chemical mechanical planarization for shallow trench isolation

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High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanical Planarization Compositions

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PROCESS FOR MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-x Gex MATERIAL IN PRESENCE OF CMP (CHEMICAL MECHANICAL POLISHING) COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND

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Chemical mechanical planarization polishing for shallow trench isolation

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Chemical-mechanical polishing (cmp) composition comprising benzotriazole derivatives as corrosion inhibitors

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Polishing composition, method for fabricating thereof and method of chemical mechanical polishing using the same

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Chemical mechanical polishing slurry composition for polishing boron silicon compound, chemical mechanical polishing method and method of fabricating semiconductor device using the same

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High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing

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Ceramic composite for light conversion and method for manufacture thereof

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Composition for chemical-mechanical polishing containing polyvinyl phosphon acid and derivatives thereof

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Fabrication of a Polishing Pad for Chemical Mechanical Polishing

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Composition for chemical-mechanical polishing and chemical-mechanical polishing method

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High surface quality gan wafer and method of fabricating same

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Chemical mechanical polishing composition containing composite silica particles, method of making the silica composite particles and method of polishing a substrate

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Cmp slurry compositions and methods of fabricating a semiconductor device using the same

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Chemical mechanical polishing composition and polishing method

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Cmp composition comprising abrasive particles containing cerium dioxide

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Chemical mechanical polishing composition for polishing sapphire surface and methods of using same

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Composition for chemical mechanical polishing

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Polishing liquid and chemical mechanical polishing method

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Membrane coating compound for chemical mechanical polishing process, membrane including the same, and polishing apparatus including the same

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Chemical mechanical polishing apparatus and method for performing cerium oxide-based chemical mechanical polishing

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CMP composition for polishing hard materials

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Chemical mechanical polishing slurry

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Slurry composition for chemical mechanical polishing

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Polishing composition for edge roll-off improvement

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Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten

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Chemical-mechanical polishing composition and chemical-mechanical polishing method using the same

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Slurry compositions for polishing metal layers, chemical mechanical polishing apparatuses using the same, and methods for fabricating semiconductor devices using the same

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Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

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Composition for increasing saccharification efficiency of biomass, method for increasing saccharification efficiency of biomass and method for preparing bioethanol derived from biomass on a large scale using chaperone protein

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Compositions for differentiating latent autoimmune diabetes in adults from childhood-onset type 1 diabetes and methods for diagnosing and treating disease

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Compositions for differentiating latent autoimmune diabetes in adults from childhood-onset type 1 diabetes and methods for diagnosing and treating disease

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There is peptide and application and the preparation method of the activity of suppression respiratory virus infection

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Test composition for peroxidatively active substances, test device containing the composition, process for preparing same and method for the determination of peroxidatively active substances.

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Medium composition for in vitro culture of the herbal plant of Polygoni Multiflori Radix and mass production method of seedling using the same

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Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate

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METHOD FOR PREPARING COMPOSITIONS FOR HUMAN CONSUMPTION OR COSMETIC USE ON THE BASIS OF A MENTHOL EESTER, AND METHOD FOR PREPARING THESE MENTHOL ESTERS.

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The extracting method of dencichine and its application and the extracting method of pseudo-ginseng amino acid

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Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element

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Lubricant composition for metal material plasticity processing, lubricating film and coated metal material provided therewith, and method for manufacturing coated metal material

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Inspection apparatus and methods, methods of manufacturing devices

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Номер патента: RU2305621C1. Автор: Владимир Николаевич Хмелёв,Андрей Викторович Шалунов,Роман Владиславович Барсуков,Сергей Николаевич Цыганок,Алексей Николаевич Сливин. Владелец: Государственное образовательное учреждение высшего профессионального образования "Алтайский государственный технический университет им. И.И. Ползунова" (АлтГТУ). Дата публикации: 2007-09-10.

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