See-through metrology systems, apparatus, and methods for optical devices
Номер патента: EP4229385A1
Опубликовано: 23-08-2023
Автор(ы): Jinxin FU, Kazuya DAITO, Ludovic Godet, Yangyang Sun
Принадлежит: Applied Materials Inc
Опубликовано: 23-08-2023
Автор(ы): Jinxin FU, Kazuya DAITO, Ludovic Godet, Yangyang Sun
Принадлежит: Applied Materials Inc
Реферат: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.
See-through metrology systems, apparatus, and methods for optical devices
Номер патента: WO2022081365A1. Автор: Ludovic Godet,Yangyang Sun,Jinxin FU,Kazuya DAITO. Владелец: Applied Materials, Inc.. Дата публикации: 2022-04-21.