Methods and apparatus for post exposure processing
Номер патента: EP3999912A1
Опубликовано: 25-05-2022
Автор(ы): Alan Tso, Gautam PISHARODY, Lancelot HUANG, Qiwei Liang
Принадлежит: Applied Materials Inc
Опубликовано: 25-05-2022
Автор(ы): Alan Tso, Gautam PISHARODY, Lancelot HUANG, Qiwei Liang
Принадлежит: Applied Materials Inc
Реферат: Embodiments described herein relate to methods and apparatus for post exposure processing. More specifically, embodiments described herein relate to field-guided post exposure bake (iFGPEB) chambers and processes, In one embodiment, a substrate is transferred into a post exposure process chamber and then raised to a pre-processing position by a plurality of lift pins. A substrate support is then raised to engage with the substrate and vacuum chuck the substrate thereon prior to iFGPEB processing.
Conveyance system, conveyance method and vacuum holding apparatus for object to be processed, and centering method for water
Номер патента: US20040046545A1. Автор: Shuji Akiyama,Toshihiko Iijima,Hiroki Hosaka. Владелец: Tokyo Electron Ltd. Дата публикации: 2004-03-11.