Vacuum reaction chamber with x-lamp heater
Опубликовано: 11-10-2007
Автор(ы): Alexandros T Demos, Amir Al-Bayati, Ashish Shah, Cruz Lester A D, Dale R Dubois, Juan Carlos Rocha-Alvarez, Khaled A Elsheref, Naoyuki Iwasaki, Saad Hichem M, Takashi Shimizu
Принадлежит: Alexandros T Demos, Amir Al-Bayati, Applied Materials Inc, Ashish Shah, Cruz Lester A D, Dale R Dubois, Juan Carlos Rocha-Alvarez, Khaled A Elsheref, Naoyuki Iwasaki, Saad Hichem M, Takashi Shimizu
Реферат: Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum chamber, and combinations thereof are provided. In one embodiment, the vacuum chamber comprises an electron source wherein the electron source comprises a cathode connected to a high voltage source, an anode connected to a low voltage source, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.
Vacuum reaction chamber with x-lamp heater
Номер патента: WO2007035389A2. Автор: Alexandros T. Demos,Takashi Shimizu,Hichem M'Saad,Amir Al-Bayati,Ashish Shah,Dale R. DuBois,Juan Carlos Rocha-Alvarez,Naoyuki Iwasaki,Lester A. D'Cruz,Khaled A. Elsheref. Владелец: Applied Materials, Inc.. Дата публикации: 2007-03-29.