Method for forming metal oxide film and method for forming secondary electron emission film in gas discharge tube

11-02-2006 дата публикации

Номер:

TWI248914B

Автор: Hitoshi Yamada, Akira Tokai, Manabu Ishimoto, Akira Nakazawa, Kenji Awamoto

Принадлежит: Fujitsu Ltd

Контакты:

Номер заявки: 84-09-9212

Дата заявки: 31-07-2003

According to the present invention, there is provided a method for forming a metal oxide film comprising, when a metal oxide film is formed by conducting a thermal treatment on a coating film containing an organic metal compound formed on an inner wall of a tube, performing an ultraviolet irradiation treatment or an ozone treatment on the coating film prior to or simultaneously with the thermal treatment.

CPC - классификация

B B0 B05 B05D B05D3 B05D3/B05D3/0 B05D3/06 C C0 C03 C03C C03C1 C03C17 C03C17/C03C17/2 C03C17/25 C03C2 C03C22 C03C221 C03C2217 C03C2217/C03C2217/2 C03C2217/21 C03C2217/22 C03C2217/228 C03C2218 C03C2218/C03C2218/1 C03C2218/11 C03C2218/113 C03C2218/3 C03C2218/32 C2 C23 C23C C23C1 C23C18 C23C18/C23C18/0 C23C18/06 C23C18/1 C23C18/12 C23C18/121 C23C18/1216 C23C18/127 C23C18/1279 C23C18/14 C23C18/143 H H0 H01 H01J H01J1 H01J1/H01J1/7 H01J1/70 H01J11 H01J11/H01J11/1 H01J11/18 H01J2 H01J22 H01J220 H01J2209 H01J2209/H01J2209/0 H01J2209/01 H01J2209/012 H01J6 H01J61 H01J61/H01J61/3 H01J61/35 H01J9 H01J9/H01J9/2 H01J9/20

IPC - классификация

B B0 B05 B05D B05D3 B05D3/B05D3/0 B05D3/06 C C0 C01 C01B C01B1 C01B13 C01B13/C01B13/1 C01B13/14 C03 C03C C03C1 C03C17 C03C17/C03C17/2 C03C17/25 C03C17/27 C2 C23 C23C C23C1 C23C18 C23C18/C23C18/0 C23C18/06 C23C18/1 C23C18/12 C23C18/14 H H0 H01 H01J H01J1 H01J1/H01J1/7 H01J1/70 H01J11 H01J11/H01J11/1 H01J11/18 H01J11/2 H01J11/22 H01J11/3 H01J11/34 H01J11/4 H01J11/40 H01J9 H01J9/H01J9/0 H01J9/02 H01J9/2 H01J9/20

Получить PDF