Gate processing method with reduced gate oxide corner and edge thinning

02-12-2003 дата публикации

Номер:

US6656798B2

Автор: Helmut Tews, Mary Weybright, Oleg Gluschenkov

Принадлежит: INFINEON TECHNOLOGIES AG

Контакты:

Номер заявки:

Дата заявки:

CPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/2 H01L21/28 H01L21/282 H01L21/2823 H01L21/28238 H01L21/7 H01L21/76 H01L21/762 H01L21/7622 H01L21/76224 H01L21/8 H01L21/82 H01L21/823 H01L21/8234 H01L21/82348 H01L21/823481 H01L29 H01L29/H01L29/4 H01L29/42 H01L29/423 H01L29/4236 H01L29/42368 H01L29/5 H01L29/51 H01L29/517

IPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/7 H01L21/76 H01L21/762 H01L21/7622 H01L21/76224 H01L21/763 H01L29 H01L29/H01L29/5 H01L29/51 H01L29/513

Получить PDF