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IMPRINT APPARATUS, CONTROL METHOD, IMPRINT METHOD AND MANUFACTURING METHOD

Номер патента: US20200033720A1
Опубликовано: 30-01-2020
Автор(ы): Khusnatdinov Niyaz, Meissl Mario Johannes
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Номер патента: JP4325479B2. Автор: 壮一 守谷. Владелец: Seiko Epson Corp. Дата публикации: 2009-09-02.

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Номер патента: US11146042B2. Автор: Atsutoshi Hidaka. Владелец: NGK Spark Plug Co Ltd. Дата публикации: 2021-10-12.

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Номер патента: US20200244049A1. Автор: Atsutoshi Hidaka. Владелец: NGK Spark Plug Co Ltd. Дата публикации: 2020-07-30.

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Номер патента: TW201346789A. Автор: Takahiro Ito,Taku Mizutani,Shigenori Todate,Toshihiko Iijima,Ichiro NAMIOKA. Владелец: Tokyo Electron Ltd. Дата публикации: 2013-11-16.

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Номер патента: MY202139A. Автор: Haruka TAI,Atsumasa Kambayashi. Владелец: Canon Machinery Inc. Дата публикации: 2024-04-05.

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Номер патента: US11901223B2. Автор: Sachiyo Ito,Hiroshi Yoshimura,Jiro Higuchi,Kazuyuki Hino,Ken FURUBAYASHI. Владелец: Kioxia Corp. Дата публикации: 2024-02-13.

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Номер патента: US20180197974A1. Автор: Kanzaki Yohsuke,SAITOH TAKAO,Takamaru Yutaka. Владелец: . Дата публикации: 2018-07-12.

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Номер патента: US20150338276A1. Автор: NAKAGAWA Satoko,KASHIMA Kazuhiko. Владелец: . Дата публикации: 2015-11-26.

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Номер патента: JP3886953B2. Автор: 隆行 酒井,正信 岐部,徳久 大岩. Владелец: Toshiba Corp. Дата публикации: 2007-02-28.

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Номер патента: JP6971383B2. Автор: 基哉 竹脇,智志 谷山. Владелец: Kokusai Electric Corp. Дата публикации: 2021-11-24.

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Номер патента: CN1669148A. Автор: 小椋厚志. Владелец: NEC Corp. Дата публикации: 2005-09-14.

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Номер патента: WO2003096426A1. Автор: Atsushi Ogura. Владелец: NEC Corporation. Дата публикации: 2003-11-20.

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Номер патента: US20160276445A1. Автор: LEE Choong-Hyun,Toriumi Akira,NISHIMURA Tomonori. Владелец: JAPAN SCIENCE AND TECHNOLOGY AGENCY. Дата публикации: 2016-09-22.

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Номер патента: US7785994B2. Автор: Hideki Okai. Владелец: Panasonic Corp. Дата публикации: 2010-08-31.

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Номер патента: US20130109156A1. Автор: Kyoko Okita. Владелец: Sumitomo Electric Industries Ltd. Дата публикации: 2013-05-02.

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Номер патента: US20220184734A1. Автор: Kenichi Ohmori,Suk-Hwan Chung. Владелец: Japan Steel Works Ltd. Дата публикации: 2022-06-16.

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Номер патента: US11992896B2. Автор: Kenichi Ohmori,Suk-Hwan Chung. Владелец: JSW Aktina System Co Ltd. Дата публикации: 2024-05-28.

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Номер патента: US20200133120A1. Автор: Niyaz Khusnatdinov,Mario Johannes Meissl. Владелец: Canon Inc. Дата публикации: 2020-04-30.

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Номер патента: US20200133120A1. Автор: Khusnatdinov Niyaz,Meissl Mario Johannes. Владелец: . Дата публикации: 2020-04-30.

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Номер патента: JP6444276B2. Автор: イェ ドゥ,孝夫 古林,泰祐 佐々木,裕弥 桜庭,有紀子 高橋,和博 宝野. Владелец: NATIONAL INSTITUTE FOR MATERIALS SCIENCE. Дата публикации: 2018-12-26.

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Номер патента: US12038424B2. Автор: Takanori Murakami,Hidenori Mochizuki,Daiki HIRASHIMA. Владелец: Asahi Kasei Corp. Дата публикации: 2024-07-16.

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Номер патента: US20240272444A1. Автор: Akiyoshi Suzuki,Osamu Wakabayashi,Yasufumi Kawasuji. Владелец: GIGAPHOTON INC. Дата публикации: 2024-08-15.

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Номер патента: NL2028111B1. Автор: HORI Tsukasa,Shiraishi Yutaka. Владелец: GIGAPHOTON INC. Дата публикации: 2022-09-14.

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Номер патента: US20210410261A1. Автор: Yutaka Shiraishi,Tsukasa Hori. Владелец: GIGAPHOTON INC. Дата публикации: 2021-12-30.

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Номер патента: NL2028111A. Автор: HORI Tsukasa,Shiraishi Yutaka. Владелец: GIGAPHOTON INC. Дата публикации: 2022-02-04.

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Номер патента: US20210193344A1. Автор: Masahiko Ando. Владелец: GIGAPHOTON INC. Дата публикации: 2021-06-24.

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Номер патента: NL2026727A. Автор: ANDO Masahiko. Владелец: GIGAPHOTON INC. Дата публикации: 2021-08-11.

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Номер патента: US7365830B2. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Kodama,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Shin Etsu Handotai Co Ltd. Дата публикации: 2008-04-29.

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Номер патента: US20070177126A1. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Kodama,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Toshiba Corp. Дата публикации: 2007-08-02.

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Номер патента: US20180267183A1. Автор: Kazuto Nishizawa. Владелец: Canon Medical Systems Corp. Дата публикации: 2018-09-20.

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Номер патента: US11890791B2. Автор: Shingo Ishida. Владелец: Canon Inc. Дата публикации: 2024-02-06.

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Номер патента: US20200303266A1. Автор: KANG SEUNGMO,JEONG Seongrak. Владелец: . Дата публикации: 2020-09-24.

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Номер патента: US20230004310A1. Автор: Atsushi Kondo,Ryo YONEZAWA. Владелец: Kioxia Corp. Дата публикации: 2023-01-05.

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Номер патента: US20210349400A1. Автор: Toru Abe. Владелец: GIGAPHOTON INC. Дата публикации: 2021-11-11.

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Номер патента: NL2027803A. Автор: Abe Toru. Владелец: GIGAPHOTON INC. Дата публикации: 2021-11-23.

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Номер патента: NL2027803B1. Автор: Abe Toru. Владелец: GIGAPHOTON INC. Дата публикации: 2022-06-15.

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Номер патента: JPWO2020165942A1. Автор: 徹 阿部. Владелец: GIGAPHOTON INC. Дата публикации: 2021-12-09.

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Номер патента: TW200929207A. Автор: Yoshihisa Usami. Владелец: Fujifilm Corp. Дата публикации: 2009-07-01.

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Номер патента: TW541579B. Автор: Kenji Kawai,Atsunori Nishiura,Ryoichi Yoshifuku. Владелец: Mitsubishi Electric Corp. Дата публикации: 2003-07-11.

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Номер патента: EP4050381A1. Автор: Jun Sakurai,Keisuke Goto,Kazuhiro Shirakawa,Masashi Hatanaka,Haruki Yamaji. Владелец: Hamamatsu Photonics KK. Дата публикации: 2022-08-31.

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Номер патента: US9780095B2. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-10-03.

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Номер патента: EP4318425A1. Автор: Kiyotaka Teshima. Владелец: Hochiki Corp. Дата публикации: 2024-02-07.

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Номер патента: US20240103189A1. Автор: Jun Sakurai,Keisuke Goto,Kazuhiro Shirakawa,Masashi Hatanaka,Haruki Yamaji. Владелец: Hamamatsu Photonics KK. Дата публикации: 2024-03-28.

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Номер патента: US20210149185A1. Автор: Takashi Suganuma,Takahiro Tatsumi. Владелец: GIGAPHOTON INC. Дата публикации: 2021-05-20.

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Номер патента: US20170352667A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-12-07.

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Номер патента: US20170243871A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-08-24.

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Номер патента: US20190363027A1. Автор: Toshihiro Arai,Yasushi Niimura,Hideki Shishido,Takayuki SHIMATOU. Владелец: Fuji Electric Co Ltd. Дата публикации: 2019-11-28.

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Номер патента: US20220080725A1. Автор: Byung Chul Lee,Min Soo Kim,Myung Soo Huh,Heung Cheol JEONG,Jae Ha Lim. Владелец: Samsung Display Co Ltd. Дата публикации: 2022-03-17.

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Номер патента: NL2026637A. Автор: SUGANUMA Takashi,TATSUMI Takahiro. Владелец: GIGAPHOTON INC. Дата публикации: 2021-07-20.

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Номер патента: NL2026637B1. Автор: SUGANUMA Takashi,TATSUMI Takahiro. Владелец: GIGAPHOTON INC. Дата публикации: 2021-09-23.

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Номер патента: US20240103336A1. Автор: Yasufumi Kawasuji. Владелец: GIGAPHOTON INC. Дата публикации: 2024-03-28.

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Номер патента: US11955390B2. Автор: Hirotaka Kato,Yasuyuki Hashimoto,Takahiro Nagasawa. Владелец: Sumco Corp. Дата публикации: 2024-04-09.

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Номер патента: US20160306005A1. Автор: Teruyuki Ohashi,Ryosuke llJIMA. Владелец: Toshiba Corp. Дата публикации: 2016-10-20.

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Номер патента: NL2026727B1. Автор: ANDO Masahiko. Владелец: GIGAPHOTON INC. Дата публикации: 2021-09-29.

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Номер патента: US20230418155A1. Автор: Hirotaka Tsuda. Владелец: Kioxia Corp. Дата публикации: 2023-12-28.

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Номер патента: US20070259458A1. Автор: Hideki Yuzawa,Kazuhiro Kijima. Владелец: Seiko Epson Corp. Дата публикации: 2007-11-08.

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Номер патента: KR100873181B1. Автор: 히로키마사아키. Владелец: 가부시키가이샤 한도오따이 에네루기 켄큐쇼. Дата публикации: 2008-12-10.

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Номер патента: US20210072646A1. Автор: Kengo Hayashi. Владелец: GIGAPHOTON INC. Дата публикации: 2021-03-11.

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Номер патента: US11307501B2. Автор: Kengo Hayashi. Владелец: GIGAPHOTON INC. Дата публикации: 2022-04-19.

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Номер патента: TW200425370A. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Komada,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Shinetsu Handotai Kk. Дата публикации: 2004-11-16.

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Номер патента: US20130244143A1. Автор: TERASAWA Tsuneo,YAMANE Takeshi. Владелец: Kabushiki Kaihsa Toshiba. Дата публикации: 2013-09-19.

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Номер патента: US20210072646A1. Автор: Kengo Hayashi. Владелец: GIGAPHOTON INC. Дата публикации: 2021-03-11.

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Номер патента: US20200075315A1. Автор: Yanai Naomi,Yoshimizu Yasuhito,ITO Fuyuma. Владелец: Toshiba Memory Corporation. Дата публикации: 2020-03-05.

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Номер патента: US20180136279A1. Автор: Takanashi Keiichi,NAGASAWA Takahiro. Владелец: SUMCO CORPORATION. Дата публикации: 2018-05-17.

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Номер патента: US20210193344A1. Автор: ANDO Masahiko. Владелец: Gigaphoton Inc.. Дата публикации: 2021-06-24.

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Номер патента: US20170229356A1. Автор: NIIMURA Yasushi,Shishido Hideki,ARAI Toshihiro,SHIMATOU Takayuki. Владелец: . Дата публикации: 2017-08-10.

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Номер патента: JP3843871B2. Автор: 毅 野上,尚紀 駒井. Владелец: Sony Corp. Дата публикации: 2006-11-08.

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Номер патента: US20150249034A1. Автор: Daiyu Kondo,Haruhisa Nakano. Владелец: Fujitsu Ltd. Дата публикации: 2015-09-03.

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Номер патента: US20040043596A1. Автор: Nobuo Hayasaka,Manabu Kimura,Keiichi Sasaki,Yoshimi Hisatsune. Владелец: Toshiba Corp. Дата публикации: 2004-03-04.

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Номер патента: US20190295901A1. Автор: Ikuo Motonaga. Владелец: Toshiba Electronic Devices and Storage Corp. Дата публикации: 2019-09-26.

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Номер патента: JP3876167B2. Автор: 克典 鈴木. Владелец: Kawasaki Microelectronics Inc. Дата публикации: 2007-01-31.

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Номер патента: JP4554908B2. Автор: 健二郎 高柳,昌司 山本. Владелец: Nitto Denko Corp. Дата публикации: 2010-09-29.

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Номер патента: JP4112343B2. Автор: 克也 小崎,勝 衣川,武夫 中本. Владелец: Mitsubishi Electric Corp. Дата публикации: 2008-07-02.

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Номер патента: JP4575205B2. Автор: 良実 江川. Владелец: Oki Semiconductor Co Ltd. Дата публикации: 2010-11-04.

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Номер патента: JPWO2014126051A1. Автор: 久典 丹所,公亮 土屋,真希 浅田,裕介 須賀. Владелец: Fujimi Inc. Дата публикации: 2017-02-02.

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Номер патента: CN102439696A. Автор: 山中贞则,秦雅彦,福原升. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2012-05-02.

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Номер патента: JP5586199B2. Автор: 英之 小形,智彦 岡山,幹英 甲斐,修司 大園. Владелец: Ulvac Inc. Дата публикации: 2014-09-10.

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Номер патента: JP4840832B2. Автор: 英和 坂上,雄介 足立. Владелец: Sharp Corp. Дата публикации: 2011-12-21.

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Номер патента: JP3946427B2. Автор: 譲司 西尾,正行 石川. Владелец: Toshiba Corp. Дата публикации: 2007-07-18.

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Номер патента: JP4581031B2. Автор: 建久 松永,秀宏 柳川,考宜 中島. Владелец: HITACHI KOKUSAI ELECTRIC INC. Дата публикации: 2010-11-17.

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Номер патента: JP7127765B2. Автор: 一史 柏倉,博 石井,秀和 元矢. Владелец: Canon Tokki Corp. Дата публикации: 2022-08-30.

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Номер патента: JP6636377B2. Автор: ▲听▼ 陸,秀輝 小清水,侑里香 荒谷. Владелец: Disco Corp. Дата публикации: 2020-01-29.

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Номер патента: JP6387032B2. Автор: 久典 丹所,公亮 土屋,真希 浅田,裕介 須賀. Владелец: Fujimi Inc. Дата публикации: 2018-09-05.

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Номер патента: US10043719B2. Автор: Yuichi Shimizu. Владелец: Shin Etsu Handotai Co Ltd. Дата публикации: 2018-08-07.

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Номер патента: JP4256115B2. Автор: 欣一 熊谷,晃 高島,光久 渡部. Владелец: Fujitsu Semiconductor Ltd. Дата публикации: 2009-04-22.

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Номер патента: JP5075819B2. Автор: 一洋 木村,和宏 湯浅,靖浩 女川. Владелец: HITACHI KOKUSAI ELECTRIC INC. Дата публикации: 2012-11-21.

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Номер патента: JP4355785B2. Автор: 光 小林. Владелец: 光 小林. Дата публикации: 2009-11-04.

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Номер патента: JPWO2017065155A1. Автор: 康章 渡邉,泰則 伊藤,浩二 中村,洋 宇津木,翼 近藤,雄貴 堀. Владелец: Asahi Glass Co Ltd. Дата публикации: 2018-08-02.

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Номер патента: EP1642171A1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2006-04-05.

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Номер патента: EP1642171B1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2011-06-15.

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Номер патента: US10488761B2. Автор: Yoshimitsu Kato. Владелец: Toshiba Memory Corp. Дата публикации: 2019-11-26.

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Номер патента: US20080231840A1. Автор: Ulrich Wegmann,Wolfgang Emer,Helmut Haidner. Владелец: CARL ZEISS SMT GMBH. Дата публикации: 2008-09-25.

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Номер патента: US20240349285A1. Автор: Salvatore Costanzo,Joe SAAD,Mohamad YASSIN. Владелец: ORANGE SA. Дата публикации: 2024-10-17.

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Номер патента: US8142960B2. Автор: Satoshi Nagai,Kazuya Fukuhara. Владелец: Toshiba Corp. Дата публикации: 2012-03-27.

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Номер патента: US20120054695A1. Автор: SATOSHI Tanaka,Kyoko Izuha,Toshiya Kotani,Shigeki Nojima. Владелец: Toshiba Corp. Дата публикации: 2012-03-01.

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Номер патента: US20090269685A1. Автор: Yoshiaki Yanagawa,Yuki Okada. Владелец: NEC Electronics Corp. Дата публикации: 2009-10-29.

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Номер патента: US20240175479A1. Автор: Hans Butler,Michael Erath,Petrus Martinus Bernardus Vermeulen Johannes,Maarten Hartger Kimman,Philipp Gaida,Stefan TROGER. Владелец: ASML Netherlands BV. Дата публикации: 2024-05-30.

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Номер патента: US20040253553A1. Автор: Takashi Sato,Shoji Mimotogi,Shigeru Hasebe. Владелец: Individual. Дата публикации: 2004-12-16.

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Номер патента: US7118834B2. Автор: Takashi Sato,Shoji Mimotogi,Shigeru Hasebe. Владелец: Toshiba Corp. Дата публикации: 2006-10-10.

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Номер патента: TW200921289A. Автор: Yuichi Shibazaki,Yuho Kanaya. Владелец: Nikon Corp. Дата публикации: 2009-05-16.

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Номер патента: US20240310720A1. Автор: Jaeil LEE,Kyoungcho Na. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-09-19.

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Номер патента: US20110027701A1. Автор: Masaru Tanabe. Владелец: Hoya Corp. Дата публикации: 2011-02-03.

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Номер патента: US20200089103A1. Автор: Keiko Morishita. Владелец: Kioxia Corp. Дата публикации: 2020-03-19.

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Номер патента: TW200707901A. Автор: Nobuaki Hashimoto. Владелец: Seiko Epson Corp. Дата публикации: 2007-02-16.

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Номер патента: US20110237087A1. Автор: Ryoji Yoshikawa. Владелец: Individual. Дата публикации: 2011-09-29.

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Номер патента: US20190079402A1. Автор: Yoshimitsu Kato. Владелец: Toshiba Memory Corp. Дата публикации: 2019-03-14.

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Номер патента: US20190079402A1. Автор: Kato Yoshimitsu. Владелец: Toshiba Memory Corporation. Дата публикации: 2019-03-14.

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Номер патента: TW200737319A. Автор: Takayoshi Minami. Владелец: Fujitsu Ltd. Дата публикации: 2007-10-01.

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Номер патента: US20230330802A1. Автор: Koji Yamashita,Taku Watanabe,Kyohei Ishida. Владелец: JFE Steel Corp. Дата публикации: 2023-10-19.

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Номер патента: RU2726168C1. Автор: Сатоси ИГИ,Хисакадзу ТАДЗИКА. Владелец: ДжФЕ СТИЛ КОРПОРЕЙШН. Дата публикации: 2020-07-09.

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Номер патента: US20230386983A1. Автор: Kenji Fujii,Hiroaki Matsubara,Taro Nishioka,Tomohira Kikuchi,Yoshizo OSUMI. Владелец: ROHM CO LTD. Дата публикации: 2023-11-30.

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Номер патента: US20040157169A1. Автор: Hiroshi Morioka. Владелец: Fujitsu Ltd. Дата публикации: 2004-08-12.

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Номер патента: US20180067405A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2018-03-08.

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Номер патента: US20170160649A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2017-06-08.

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Номер патента: US20180224758A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2018-08-09.

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Номер патента: US20150293464A1. Автор: Shibazaki Yuichi. Владелец: . Дата публикации: 2015-10-15.

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Номер патента: US20170315457A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2017-11-02.

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Номер патента: US20160327872A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2016-11-10.

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Номер патента: JP4147574B2. Автор: 浩二 貝瀬. Владелец: Nikon Corp. Дата публикации: 2008-09-10.

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Номер патента: US6649484B2. Автор: Yoshinori Ohsaki. Владелец: Canon Inc. Дата публикации: 2003-11-18.

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Номер патента: KR102284344B1. Автор: 자오송 리우,위엔쥔 쉬. Владелец: 선전 차이나 스타 옵토일렉트로닉스 세미컨덕터 디스플레이 테크놀로지 컴퍼니 리미티드. Дата публикации: 2021-08-04.

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Номер патента: US20050042525A1. Автор: Tsutomu Takenaka,Seiya Miura. Владелец: Canon Inc. Дата публикации: 2005-02-24.

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Номер патента: JP6888401B2. Автор: 雅史 蔵本,蔵本　雅史,哲平 国宗. Владелец: Nichia Corp. Дата публикации: 2021-06-16.

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Номер патента: JP3458549B2. Автор: 透 小川,政也 植松. Владелец: Sony Corp. Дата публикации: 2003-10-20.

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Номер патента: JP3514401B2. Автор: 和彦 三島. Владелец: Canon Inc. Дата публикации: 2004-03-31.

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Номер патента: US20090134204A1. Автор: Masahiko Kimbara. Владелец: Toyota Industries Corp. Дата публикации: 2009-05-28.

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Номер патента: US20120163699A1. Автор: Kazuya Fukuhara. Владелец: Individual. Дата публикации: 2012-06-28.

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Номер патента: US20140038318A1. Автор: SATO Hironobu. Владелец: KABUSHIKI KAISHA TOSHIBA. Дата публикации: 2014-02-06.

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Номер патента: US20220077373A1. Автор: Sachiko Matsushita,Biao MEI. Владелец: Sanoh Industrial Co Ltd. Дата публикации: 2022-03-10.

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Номер патента: US20190078194A1. Автор: SHINNO Mikio,NISHITSUJI Kiyoaki,TERADA Reiji. Владелец: . Дата публикации: 2019-03-14.

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Номер патента: US20160085010A1. Автор: CHOI Kyung Ho,Shin Gyo Jic,Lee Sang Kug. Владелец: . Дата публикации: 2016-03-24.

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Номер патента: US20200089103A1. Автор: MORISHITA Keiko. Владелец: . Дата публикации: 2020-03-19.

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Номер патента: US20220149093A1. Автор: Kudoh Yoshiharu,Kataoka Toyotaka,KIMIZUKA Naohiko. Владелец: SONY SEMICONDUCTOR SOLUTIONS CORPORATION. Дата публикации: 2022-05-12.

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Номер патента: US20170115556A1. Автор: Shim Woo-seok,Liang Wenqing. Владелец: . Дата публикации: 2017-04-27.

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Номер патента: US20190112699A1. Автор: SHINNO Mikio. Владелец: . Дата публикации: 2019-04-18.

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Номер патента: US20140217156A1. Автор: Shinkai Masayoshi,MUTO Aya. Владелец: Mitsubishi Electric Corporation. Дата публикации: 2014-08-07.

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Номер патента: US20210223698A1. Автор: KAMIMURA Tetsuya. Владелец: FUJIFILM Corporation. Дата публикации: 2021-07-22.

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Номер патента: US20170243871A1. Автор: CHUN Jae-Houb,LIM Jeong-Sub. Владелец: . Дата публикации: 2017-08-24.

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Номер патента: US20170352667A1. Автор: CHUN Jae-Houb,LIM Jeong-Sub. Владелец: . Дата публикации: 2017-12-07.

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Номер патента: US20190355906A1. Автор: FUJIWARA Seiji,NAKAJIMA Shinsaku. Владелец: . Дата публикации: 2019-11-21.

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Номер патента: KR102440758B1. Автор: 홍성훈,이현철,장현진,우영제. Владелец: (주)오로스 테크놀로지. Дата публикации: 2022-09-06.

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Номер патента: JP4607705B2. Автор: 正光 伊藤. Владелец: Toshiba Corp. Дата публикации: 2011-01-05.

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Номер патента: JP7206483B2. Автор: 聖人 田邉. Владелец: Nichia Corp. Дата публикации: 2023-01-18.

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Номер патента: JP4832369B2. Автор: 信幸 林,佳彦 今中. Владелец: Fujitsu Ltd. Дата публикации: 2011-12-07.

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Номер патента: JP3833066B2. Автор: 舜平 山崎,健司 福永. Владелец: Semiconductor Energy Laboratory Co Ltd. Дата публикации: 2006-10-11.

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Номер патента: KR102460132B1. Автор: 이현철. Владелец: (주)오로스 테크놀로지. Дата публикации: 2022-10-31.

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Номер патента: KR20210057104A. Автор: 켄타 야마자키,케이 후쿠하라. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2021-05-20.

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Номер патента: JP4950037B2. Автор: 靖 笠. Владелец: スパンション エルエルシー. Дата публикации: 2012-06-13.

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Номер патента: JP4799122B2. Автор: 学 南幅,大 福島,進 山本,博之 矢野. Владелец: Toshiba Corp. Дата публикации: 2011-10-26.

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Номер патента: JP5800778B2. Автор: 亜弥 武藤,雅芳 新飼. Владелец: Mitsubishi Electric Corp. Дата публикации: 2015-10-28.

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Номер патента: TWI397945B. Автор: 長坂博之. Владелец: 尼康股份有限公司. Дата публикации: 2013-06-01.

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Номер патента: JP4543341B2. Автор: 直正 白石. Владелец: Nikon Corp. Дата публикации: 2010-09-15.

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Номер патента: JP5100032B2. Автор: 康雄 田中. Владелец: Lapis Semiconductor Co Ltd. Дата публикации: 2012-12-19.

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Номер патента: JP3912318B2. Автор: 雅邦 塩澤. Владелец: Seiko Epson Corp. Дата публикации: 2007-05-09.

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Номер патента: JP3415283B2. Автор: 彰 牛島,睦 末松. Владелец: Toshiba Corp. Дата публикации: 2003-06-09.

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Номер патента: JP5350594B2. Автор: 正光 伊藤. Владелец: Toshiba Corp. Дата публикации: 2013-11-27.

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Номер патента: JP4737502B2. Автор: 正人 土居,秋彦 渡辺. Владелец: Sony Corp. Дата публикации: 2011-08-03.

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Номер патента: JP4256408B2. Автор: 帥現 姜. Владелец: Toshiba Corp. Дата публикации: 2009-04-22.

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Номер патента: JP3968554B2. Автор: 文明 松島,勉 太田,和徳 桜井,明 間ヶ部. Владелец: Seiko Epson Corp. Дата публикации: 2007-08-29.

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Номер патента: JP4174262B2. Автор: 隆一 海老沼. Владелец: Canon Inc. Дата публикации: 2008-10-29.

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Номер патента: US20070081139A1. Автор: Takashi Sato,Kazuya Fukuhara. Владелец: Toshiba Corp. Дата публикации: 2007-04-12.

Bump forming method and flip chip manufacturing method

Номер патента: JP3940891B2. Автор: 剛 依田,健 湯沢,武志 岩垂. Владелец: Seiko Epson Corp. Дата публикации: 2007-07-04.

Wiring formation method and semiconductor device manufacturing method

Номер патента: JP6297789B2. Автор: 貴洋 佐藤,直哉 坂本,佐藤　貴洋,隆之 長,俊介 越岡,哲也 大嶋. Владелец: Semiconductor Energy Laboratory Co Ltd. Дата публикации: 2018-03-20.

Circuit board manufacturing method and lead frame manufacturing method

Номер патента: JP4295395B2. Автор: 洋一 松岡. Владелец: Fuji Machinery Manufacturing and Electronics Co Ltd. Дата публикации: 2009-07-15.

Liquid film forming method and semiconductor device manufacturing method

Номер патента: JP3655576B2. Автор: 信一 伊藤. Владелец: Toshiba Corp. Дата публикации: 2005-06-02.

Exposure apparatus, exposure method, and semiconductor device manufacturing method

Номер патента: US6573976B2. Автор: Hiroaki Takeishi. Владелец: Canon Inc. Дата публикации: 2003-06-03.

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Номер патента: JP6385449B2. Автор: 賢一 梅田,文彦 望月,梅田　賢一. Владелец: Fujifilm Corp. Дата публикации: 2018-09-05.

Soldering method and semiconductor module manufacturing method

Номер патента: CN101351874A. Автор: 金原雅彦. Владелец: Toyoda Automatic Loom Works Ltd. Дата публикации: 2009-01-21.

Backlight framework manufacturing method and display device manufacturing method

Номер патента: CN112908976A. Автор: 李鹏飞,陈细俊,季洪雷,许怀书. Владелец: Huizhou Shiwei New Technology Co Ltd. Дата публикации: 2021-06-04.

Mask blank substrate processing apparatus, mask blank substrate processing method, mask blank substrate manufacturing method, mask blank manufacturing method, and transfer mask manufacturing method

Номер патента: JP5980957B2. Автор: 敏彦 折原,山田　剛之,剛之 山田,貴仁 西村. Владелец: Hoya Corp. Дата публикации: 2016-08-31.

Insulation sampling circuit and control method therefor, voltage withstand test method, and electrical device

Номер патента: EP4325228A1. Автор: WEI Tian,Hang Ma,Xingchang WANG,Zhiwei Yan,Fangyou LU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-02-21.

Control method for medical probe, imaging method, and ultrasound system

Номер патента: US20240215952A1. Автор: TONG Li,CHENG He. Владелец: Wuhan United Imaging Healthcare Co Ltd. Дата публикации: 2024-07-04.

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Номер патента: US12004412B2. Автор: Byung Chul Lee,Jin Oh KWAG,Myung Soo Huh,Heung Cheol JEONG,Do Hun LEE. Владелец: Samsung Display Co Ltd. Дата публикации: 2024-06-04.

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Номер патента: EP4254411A1. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2023-10-04.

Glass bottle inspection method and glass bottle manufacturing method

Номер патента: PH12020552062A1. Автор: Takashi Harada,Takashi Suzuki. Владелец: Toyo Glass Co Ltd. Дата публикации: 2021-05-31.

Mirror device manufacturing method and mirror unit manufacturing method

Номер патента: US20220363535A1. Автор: Daiki Suzuki,Tomoyuki Ide,Mikito TAKAHASHI. Владелец: Hamamatsu Photonics KK. Дата публикации: 2022-11-17.

Mirror device manufacturing method and mirror unit manufacturing method

Номер патента: EP4043942A1. Автор: Daiki Suzuki,Tomoyuki Ide,Mikito TAKAHASHI. Владелец: Hamamatsu Photonics KK. Дата публикации: 2022-08-17.

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Номер патента: US20230315934A1. Автор: Takahiro SAKIMOTO,Tsunehisa Handa. Владелец: JFE Steel Corp. Дата публикации: 2023-10-05.

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Номер патента: EP4160182A1. Автор: Hisakazu TAJIKA,Takahiro SAKIMOTO,Tsunehisa Handa. Владелец: JFE Steel Corp. Дата публикации: 2023-04-05.

Control device, apparatus control device, control method, report reception method, reporting method, and recording medium

Номер патента: EP3197011A4. Автор: Hitoshi Yano,Koji Kudo,Hisato Sakuma. Владелец: NEC Corp. Дата публикации: 2017-12-13.

Recording medium, authoring method, and optical disc manufacturing method

Номер патента: EP1912220B1. Автор: Kouichi Uchimura,So Fujii. Владелец: Sony Corp. Дата публикации: 2011-02-23.

Data processing device, control method of data processing device, control program and manufacturing method of data processing device

Номер патента: CN100449526C. Автор: 山下直人,藤井阳子,林田健,神尾宗久,我妻纯市,大科统和. Владелец: Fujitsu Ltd. Дата публикации: 2009-01-07.

Data processing device, control method of data processing device, control program and manufacturing method of data processing device

Номер патента: US20060122718A1. Автор: Yoko Fujii,Naoto Yamashita,Ken Hayashida,Munehisa Kamio,Junichi Wagatsuma,Norikazu Oshina. Владелец: Fujitsu Ltd. Дата публикации: 2006-06-08.

Thin film forming method and color filter manufacturing method

Номер патента: US8187665B2. Автор: Satoru Katagami,Hirotaka ISHIZUKA. Владелец: Seiko Epson Corp. Дата публикации: 2012-05-29.

Image processing apparatus and its control method, imaging apparatus, image processing method, and storage medium

Номер патента: US20190325609A1. Автор: Masahiro Kawarada. Владелец: Canon Inc. Дата публикации: 2019-10-24.

Image processing apparatus and its control method, imaging apparatus, image processing method, and storage medium

Номер патента: US20210304440A1. Автор: Masahiro Kawarada. Владелец: Canon Inc. Дата публикации: 2021-09-30.

Image processing apparatus and its control method, imaging apparatus, image processing method, and storage medium

Номер патента: US11710257B2. Автор: Masahiro Kawarada. Владелец: Canon Inc. Дата публикации: 2023-07-25.

Image processing apparatus and its control method, imaging apparatus, image processing method, and storage medium

Номер патента: US20210304440A1. Автор: Masahiro Kawarada. Владелец: Canon Inc. Дата публикации: 2021-09-30.

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Номер патента: US20190325609A1. Автор: Kawarada Masahiro. Владелец: . Дата публикации: 2019-10-24.

Data transmission control method, content transmission control method, content processing information acquisition method, and content transmission system

Номер патента: JP5065305B2. Автор: ジョン，マン−スー,パク，イル−ゴン,パク，クー−ヨン,チュン，ミン−ギュ,チョ，スン−ヒュン,キム，スー−ジュン,クマール ケー，キラン. Владелец: LG ELECTRONICS INC. Дата публикации: 2012-10-31.

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Номер патента: US20090144580A1. Автор: Sung-hyun Cho,Man-soo Jeong,Il-Gon Park,Koo-yong Pak,Min-gyu Chung,Kiran Kumar K. Владелец: LG ELECTRONICS INC. Дата публикации: 2009-06-04.

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Номер патента: WO2018103253A1. Автор: 陈敏. Владелец: 华为技术有限公司. Дата публикации: 2018-06-14.

Data transfer controlling method, content transfer controlling method, content processing information acquisition method and content transfer system

Номер патента: US20090063629A1. Автор: Sung-hyun Cho,Man-soo Jeong,Il-Gon Park,Koo-yong Pak,Min-gyu Chung,Soo-jung Kim,Kiran Kumar K.. Владелец: LG ELECTRONICS INC. Дата публикации: 2009-03-05.

Data transfer controlling method, content transfer controlling method, content processing information acquisition method and content transfer system

Номер патента: KR101038124B1. Автор: 조성현,김수정,정민규,박구용,정만수,박일곤,키란 쿠마 케이. Владелец: 엘지전자 주식회사. Дата публикации: 2011-05-31.

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Номер патента: EP4174665A1. Автор: Tomotaka Ogawa. Владелец: Mitsubishi Electric Corp. Дата публикации: 2023-05-03.

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Номер патента: JP6833348B2. Автор: 厚 伊達,克昌 田中,賢一 藤井,道雄 相澤,松下　明弘,明弘 松下,智裕 矢埜,半田　雅大,雅大 半田,相澤　道雄,祥吾 水野,田中　克昌,圭輔 森澤,麻衣 小宮山,藤井　賢一,伊達　厚. Владелец: Canon Inc. Дата публикации: 2021-02-24.

Communication system, device, device control method, and portable device manufacturing method

Номер патента: WO2021192448A1. Автор: 洋介 大橋,信吾 望月,啓太 祖父江,紀博 清水. Владелец: 株式会社東海理化電機製作所. Дата публикации: 2021-09-30.

Slave device, relay device, master-slave system, slave control method, slave control program, relay method, and relay program

Номер патента: EP4174665A4. Автор: Tomotaka Ogawa. Владелец: Mitsubishi Electric Corp. Дата публикации: 2023-07-26.

Thin film forming method and color filter manufacturing method

Номер патента: TW200950890A. Автор: Satoru Katagami,Hirotaka ISHIZUKA. Владелец: Seiko Epson Corp. Дата публикации: 2009-12-16.

Neutron ray irradiation target apparatus, mutation induction method, and irradiation target manufacturing method

Номер патента: US11980148B2. Автор: Norio Kikuchi,Kohei Yamaguchi,Hiroya ISOZAKI. Владелец: Quantum Flowers & Foods Co Ltd. Дата публикации: 2024-05-14.

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Номер патента: US20130098109A1. Автор: OHTO Kimiaki. Владелец: Asahi Glass Company, Limited. Дата публикации: 2013-04-25.

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Номер патента: US20200153636A1. Автор: Ueda Hiroshi,TAKADA Hiroaki,KURACHI Ryo. Владелец: . Дата публикации: 2020-05-14.

Film forming apparatus, film forming method, and electronic device manufacturing method

Номер патента: JP2022173248A. Автор: Yukio Matsumoto,達哉 岩崎,行生 松本,Tatsuya Iwasaki. Владелец: Canon Tokki Corp. Дата публикации: 2022-11-18.

Lens barrel, image pickup device, lens barrel inspecting method, and lens barrel manufacturing method

Номер патента: CN101384939B. Автор: 林谦一,林孝行,伊藤大介,长冈英一,阪本圭司,安达右二. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 2010-06-02.

Inkjet printing method and display device manufacturing method using the inkjet printing method

Номер патента: KR102487276B1. Автор: 이동준,김종원,김민수,이현진,이승돈. Владелец: 삼성디스플레이 주식회사. Дата публикации: 2023-01-12.

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Номер патента: KR100302991B1. Автор: 요시노리 하라다,요시히로 이주미. Владелец: 샤프 가부시키가이샤. Дата публикации: 2002-10-09.

Laminated structure, semiconductor device, laminated structure manufacturing method, and semiconductor device manufacturing method

Номер патента: JP2009272437A. Автор: 幸栄 鈴木,隆徳 田野,敦 小野寺,Yukie Suzuki,Atsushi Onodera,Takanori Tano. Владелец: Ricoh Co Ltd. Дата публикации: 2009-11-19.

Optical film, polarizing plate, image display device, optical film manufacturing method and polarizing plate manufacturing method

Номер патента: JP6622385B2. Автор: 克文 大室,雅明 鈴木,達也 岩▲崎▼,大室　克文,晃治 飯島. Владелец: Fujifilm Corp. Дата публикации: 2019-12-18.

Display, its inspecting method, its manufacturing method, display panel inspecting method, and display panel manufacturing method

Номер патента: KR100941406B1. Автор: 신야 다나카. Владелец: 후지쓰 텐 가부시키가이샤. Дата публикации: 2010-02-10.

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Номер патента: EP2728257A2. Автор: Chiaki Kumada,Shunsuke Gotoh. Владелец: NGK Spark Plug Co Ltd. Дата публикации: 2014-05-07.

Display panel substrate, display panel including the substrate, display panel substrate manufacturing method, and display panel manufacturing method

Номер патента: JP4667505B2. Автор: 俊英 津幡,義朗 平形,成裕 松田. Владелец: Sharp Corp. Дата публикации: 2011-04-13.

Print control apparatus, image forming system, print control method, and printed-matter manufacturing method

Номер патента: US09977391B2. Автор: Hiroaki Suzuki,Hiroo Kitagawa. Владелец: Ricoh Co Ltd. Дата публикации: 2018-05-22.

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Номер патента: US20240364070A1. Автор: Toru Suzuki,Atsushi Fuchimukai. Владелец: GIGAPHOTON INC. Дата публикации: 2024-10-31.

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Номер патента: US20240154381A1. Автор: Junichi Fujimoto,Akira SUWA. Владелец: GIGAPHOTON INC. Дата публикации: 2024-05-09.

Processing device, sheet manufacturing apparatus, processing method, and sheet manufacturing method

Номер патента: US20180305868A1. Автор: Masanao Kunugi,Satomi Yoshioka. Владелец: Seiko Epson Corp. Дата публикации: 2018-10-25.

Plasma treatment apparatus, plasma treatment method, and original plate manufacturing method

Номер патента: US20230290619A1. Автор: Hideaki Sakurai,Noriko Sakurai,Takeharu Motokawa. Владелец: Kioxia Corp. Дата публикации: 2023-09-14.

Plasma process simulation method and semiconductor device manufacturing method including the same

Номер патента: US20240274416A1. Автор: Seungmin Lee,Inkook Jang,Suntaek LIM,Dongig OH,Jaesik An,Joohyun JEON,Thanh Cuong Nguyen. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-08-15.

Fuel cell cathode manufacturing method and fuel cell manufacturing method

Номер патента: US20070167313A1. Автор: Atsushi Sano,Satoshi Maruyama. Владелец: TDK Corp. Дата публикации: 2007-07-19.

PRINT CONTROL APPARATUS, IMAGE FORMING SYSTEM, PRINT CONTROL METHOD, AND PRINTED-MATTER MANUFACTURING METHOD

Номер патента: US20160246238A1. Автор: SUZUKI Hiroaki,Kitagawa Hiroo. Владелец: . Дата публикации: 2016-08-25.

Battery cell activation method and battery cell manufacturing method comprising same

Номер патента: EP4064400A4. Автор: Gyu Ok HWANG. Владелец: LG Energy Solution Ltd. Дата публикации: 2023-11-29.

Antenna manufacturing method and communication equipment manufacturing method

Номер патента: EP1786062A4. Автор: M Ito,Y Sasaki,H Shimizu,K Hiraide. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 2007-08-01.

Fuel cell cathode manufacturing method and fuel cell manufacturing method

Номер патента: TW200618384A. Автор: Atsushi Sano,Satoshi Maruyama. Владелец: TDK Corp. Дата публикации: 2006-06-01.

Fine-particles synthesis method and electronic-component manufacturing method

Номер патента: EP2168919A1. Автор: Isao Nakahata,Tomoya Imura,Kiyoyuki Masuzawa,Jintao Huang. Владелец: TDK Corp. Дата публикации: 2010-03-31.

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Номер патента: US20230329114A1. Автор: Sachiko Matsushita,Biao MEI. Владелец: Sanoh Industrial Co Ltd. Дата публикации: 2023-10-12.

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Номер патента: US11737363B2. Автор: Sachiko Matsushita,Biao MEI. Владелец: Sanoh Industrial Co Ltd. Дата публикации: 2023-08-22.

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Номер патента: US20200058930A1. Автор: Noboru Yoshida,Makihiro Otohata. Владелец: NEC Corp. Дата публикации: 2020-02-20.

Plasma processing apparatus, plasma processing method, and semiconductor device manufacturing method

Номер патента: US20240087853A1. Автор: Kazuhiko Nakamura. Владелец: Kioxia Corp. Дата публикации: 2024-03-14.

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Номер патента: JP4184057B2. Автор: 雅人 栗原,鈴木　　忠,篤史 佐野,哲 丸山. Владелец: TDK Corp. Дата публикации: 2008-11-19.

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Номер патента: US11787966B2. Автор: Phillip Lee,Seungjun Chung,Heesuk KIM,Hyunjoo CHO,Byeongmoon LEE,JeongGon SON,Jaikyeong KIM,Youngpyo Ko. Владелец: Korea Advanced Institute of Science and Technology KAIST. Дата публикации: 2023-10-17.

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Номер патента: US20230010066A1. Автор: Phillip Lee,Seungjun Chung,Heesuk KIM,Hyunjoo CHO,Byeongmoon LEE,JeongGon SON,Jaikyeong KIM,Youngpyo Ko. Владелец: Korea Advanced Institute of Science and Technology KAIST. Дата публикации: 2023-01-12.

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Номер патента: CN106960930A. Автор: 金容庆,徐东完,李璟姝. Владелец: Samsung SDI Co Ltd. Дата публикации: 2017-07-18.

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Номер патента: EP3995901A1. Автор: Kosuke Nakamura,Shinichi Hamaguchi,Toshio Tsukamoto. Владелец: KONICA MINOLTA INC. Дата публикации: 2022-05-11.

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Номер патента: EP3748721A1. Автор: Hidenori Ando,Makoto Kikuta. Владелец: Micronics Japan Co Ltd. Дата публикации: 2020-12-09.

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Номер патента: US20130234813A1. Автор: Takaya Kouetsu,Yamamoto Yuichi,Okamoto Kouichi,IMAMURA Seiji,OGAWA Taku. Владелец: . Дата публикации: 2013-09-12.

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Номер патента: US20200058930A1. Автор: YOSHIDA Noboru,OTOHATA Makihiro. Владелец: NEC Corporation. Дата публикации: 2020-02-20.

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Номер патента: US20220137529A1. Автор: Hamaguchi Shinichi,NAKAMURA Kosuke,Tsukamoto Toshio. Владелец: . Дата публикации: 2022-05-05.

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Номер патента: US20170207026A1. Автор: GOTO Seiji,IWAKOSHI Kunio. Владелец: MURATA MANUFACTURING CO., LTD.. Дата публикации: 2017-07-20.

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Номер патента: US20180315552A1. Автор: TANAKA Atsushi,Ono Shoji,NAGAHARA Kazuhiro,NARITA Yoshiyuki. Владелец: . Дата публикации: 2018-11-01.

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Номер патента: US20200385240A1. Автор: Kobayashi Masaki,Yotsuji Junichi,TAKAKI Yuki. Владелец: JFE STEEL CORPORATION. Дата публикации: 2020-12-10.

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Номер патента: US20200388443A1. Автор: TANAKA Atsushi,Ono Shoji,NAGAHARA Kazuhiro,NARITA Yoshiyuki. Владелец: . Дата публикации: 2020-12-10.

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Номер патента: US20220367112A1. Автор: Hirai Yoshiki. Владелец: . Дата публикации: 2022-11-17.

Electrode assembly manufacturing method and rechargeable battery manufacturing method

Номер патента: KR102446279B1. Автор: 이병규,정태진,구자훈,표정관,김원년,구상현. Владелец: 주식회사 엘지에너지솔루션. Дата публикации: 2022-09-22.

Protective film compound manufacturing method and transparent electrode manufacturing method with improved visibility

Номер патента: KR102027954B1. Автор: 김창수,송명관,민정호,정용찬. Владелец: 한국기계연구원. Дата публикации: 2019-10-04.

Plating treatment method and conductive film manufacturing method

Номер патента: JP4905803B2. Автор: 佳弘 藤田. Владелец: Fujifilm Corp. Дата публикации: 2012-03-28.

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Номер патента: JP4336869B2. Автор: 満博 森,裕 坂内,博規 山本,麻里子 宮地,伊紀子 山崎,功二 宇津木,環 三浦. Владелец: NEC Corp. Дата публикации: 2009-09-30.

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Номер патента: JPWO2004087613A1. Автор: 佐藤　　茂樹,暁太朗 阿部,佐藤　茂樹,央始 小林. Владелец: TDK Corp. Дата публикации: 2006-06-29.

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Номер патента: KR20220157958A. Автор: 데츠야 스즈키,마사노리 니시야마,야스히코 아카누마,아키라 시라쿠라,다쿠미 다나카,고토노 미카모토. Владелец: 산토리 홀딩스 가부시키가이샤. Дата публикации: 2022-11-29.

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Номер патента: KR101488464B1. Автор: 유키히로 카와무라,타카시 토노이케,사부로 야기. Владелец: 후루카와 에이에스 가부시키가이샤. Дата публикации: 2015-01-30.

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Номер патента: JPWO2018025941A1. Автор: 卓也 松本,裕義 屋鋪,竹田　和年,和年 竹田,松本　卓也,克 高橋,高橋　克,屋鋪　裕義,義顕 名取. Владелец: Nippon Steel and Sumitomo Metal Corp. Дата публикации: 2019-04-11.

Laser device, laser irradiation method, and semiconductor device manufacturing method

Номер патента: JP4531323B2. Автор: 将樹 古山,秀和 宮入,明久 下村,幸一郎 田中,圭恵 高野. Владелец: Semiconductor Energy Laboratory Co Ltd. Дата публикации: 2010-08-25.

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Номер патента: EP4446272A1. Автор: Atsushi Kurimoto,Yuki TAKAKI,Yusaku Takemura,Kento Uematsu,Ayaka USUI. Владелец: JFE Steel Corp. Дата публикации: 2024-10-16.

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Номер патента: US20200039317A1. Автор: Shigeru Kuroda. Владелец: NHK Spring Co Ltd. Дата публикации: 2020-02-06.

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Номер патента: US20160052045A1. Автор: Atsushi Tomizawa,Hidehiro Arita,Masaaki Mizumura. Владелец: Nippon Steel and Sumitomo Metal Corp. Дата публикации: 2016-02-25.

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Номер патента: EP4032622A1. Автор: Yuko Takebayashi. Владелец: Dexerials Corp. Дата публикации: 2022-07-27.

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Номер патента: US20240165525A1. Автор: Koichi Nishino. Владелец: Epoch Co Ltd. Дата публикации: 2024-05-23.

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Номер патента: EP3926916A1. Автор: Jian Wang,Haibo Xu,Chuting YAO,Liwei Cui,Chaoling Ye. Владелец: Huawei Technologies Co Ltd. Дата публикации: 2021-12-22.

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Номер патента: US20230294739A1. Автор: Kosuke Nakanishi,Nanami TSUKAMOTO. Владелец: Honda Motor Co Ltd. Дата публикации: 2023-09-21.

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Номер патента: EP4325228A4. Автор: WEI Tian,Hang Ma,Xingchang WANG,Zhiwei Yan,Fangyou LU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-09-18.

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Номер патента: RU2019142098A. Автор: Хисао ТАНАКА. Владелец: Эвертрон Холдингз Пте. Лтд.. Дата публикации: 2021-06-21.

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Номер патента: US20140257546A1. Автор: Ito Takahiro,MIZUTANI Taku,Iijima Toshihiko,NAMIOKA Ichiro,TODATE Shigenori. Владелец: TOKYO ELECTRON LIMITED. Дата публикации: 2014-09-11.

Lens position control method, lens position controller, cutting method, and cutting device

Номер патента: TW200723269A. Автор: Gakuji Hashimoto. Владелец: Sony Corp. Дата публикации: 2007-06-16.

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Номер патента: US20170220013A1. Автор: Kudo Koji,Sakuma Hisato,Yano Hitoshi. Владелец: . Дата публикации: 2017-08-03.

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Номер патента: US20230023651A1. Автор: Hitoshi Fukamachi. Владелец: Canon Inc. Дата публикации: 2023-01-26.

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Номер патента: US20210251025A1. Автор: Koji Yukimasa. Владелец: Canon Inc. Дата публикации: 2021-08-12.

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Номер патента: US20210251025A1. Автор: Yukimasa Koji. Владелец: . Дата публикации: 2021-08-12.

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Номер патента: US20240117280A1. Автор: Mai Sugawara,Yugeng Wu,Ivan Ryzhii. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2024-04-11.

Temperature monitoring device, temperature monitoring method, and composite material manufacturing method

Номер патента: US20210123680A1. Автор: Jun Eto,Masami Kamiya,Akihisa Okuda,Kazuki NOMA. Владелец: Mitsubishi Heavy Industries Ltd. Дата публикации: 2021-04-29.

Master plate, master plate manufacturing method, and transfer body manufacturing method

Номер патента: EP3858572A1. Автор: Shunichi Kajiya. Владелец: Dexerials Corp. Дата публикации: 2021-08-04.

Camera system, control method thereof, device manufacturing apparatus, exposure apparatus, and device manufacturing method

Номер патента: US20030128277A1. Автор: Hiroshi Tanaka. Владелец: Canon Inc. Дата публикации: 2003-07-10.

Camera system, control method thereof, device manufacturing apparatus, exposure apparatus, and device manufacturing method

Номер патента: US7154537B2. Автор: Hiroshi Tanaka. Владелец: Canon Inc. Дата публикации: 2006-12-26.

Signal processing device, magnetic tape drive, magnetic tape, magnetic tape cartridge, program, signal processing method, and magnetic tape manufacturing method

Номер патента: US12057148B2. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2024-08-06.

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Номер патента: US20240363143A1. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2024-10-31.

Recording medium, recording medium recording method, output control method, reproducing apparatus, recording/reproducing control method, recording method, recording/reproducing method, and recording and/or reproducing method

Номер патента: EP1288948A1. Автор: Yoichiro Sony Corporation Sako,Tatsuya Sony Corporation INOKUCHI,Shunsuke Sony Corporation FURUKAWA. Владелец: Sony Corp. Дата публикации: 2003-03-05.

Insulation sampling circuit and control method therefor, voltage withstand test method, and power consuming device

Номер патента: US20240110965A1. Автор: WEI Tian,Hang Ma,Xingchang WANG,Zhiwei Yan,Fangyou LU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-04-04.

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Номер патента: US20170102383A1. Автор: Masaru Kato,Kenji Miyamoto. Владелец: Nikon Corp. Дата публикации: 2017-04-13.

Cleaning machine, cleaning device, control method therefor, information display method, and storage medium

Номер патента: AU2020343339B2. Автор: Hong Zhang,Jian Huang,Zhen Chen,Jian Sun,Dehua Zhou,Chunfeng Zhou,Yonghai Liu,Hongbin Jiang,Chencheng LI,Anbo LI. Владелец: Tineco Intelligent Technology Co Ltd. Дата публикации: 2024-05-16.

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Номер патента: US20170102383A1. Автор: MIYAMOTO Kenji,KATO Masaru. Владелец: . Дата публикации: 2017-04-13.

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Номер патента: US20190332952A1. Автор: NONAKA Osamu,Ogata Yoshihisa,Fujimoto Masahiro,SAKAI Koji,OKADA Keiji,Iwaki Hidekazu,YOSHIDA Yoichi,OSA Kazuhiko,NOZAKI Hirokazu. Владелец: OLYMPUS CORPORATION. Дата публикации: 2019-10-31.

Uplink power control method, power control parameter configuration method and equipment of methods

Номер патента: CN102045827A. Автор: 潘学明,沈祖康,高雪娟. Владелец: Datang Mobile Communications Equipment Co Ltd. Дата публикации: 2011-05-04.

A media session data transmission control method, a control relation negotiation method and a control device and a system

Номер патента: WO2007109948A1. Автор: LEI Zhu,Liming Zhang,Long Luo,Aiqin Zhang,Qiongyan Liu. Владелец: Huawei Technologies Co., Ltd.. Дата публикации: 2007-10-04.

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Номер патента: CN102045827B. Автор: 潘学明,沈祖康,高雪娟. Владелец: Datang Mobile Communications Equipment Co Ltd. Дата публикации: 2013-07-31.

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Номер патента: CN109392065B. Автор: 潘学明,吴昱民. Владелец: Vivo Mobile Communication Co Ltd. Дата публикации: 2020-06-05.

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Номер патента: EP2320207B1. Автор: Masaru Iguchi,Yusuke Katayama,Shunzo Hirakawa,Fumio Tojo,Toshiyasu Toyoda. Владелец: Yamabun Electronics Co Ltd. Дата публикации: 2015-02-25.

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Номер патента: US20130179961A1. Автор: Abe Koichi. Владелец: CANON KABUSHIKI KAISHA. Дата публикации: 2013-07-11.

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Номер патента: US20130204996A1. Автор: Takazawa Satoshi. Владелец: CANON KABUSHIKI KAISHA. Дата публикации: 2013-08-08.

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Номер патента: US20130286948A1. Автор: Pan Xueming,Shen Zukang,Gao Xuejuan. Владелец: DATANG MOBILE COMMUNICATIONS EQUIPMENT CO., LTD. Дата публикации: 2013-10-31.

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Номер патента: CN110599646A. Автор: 张平,陈浩然,冯新文,许才. Владелец: Electric Power Research Institute of State Grid Eastern Inner Mongolia Power Co Ltd. Дата публикации: 2019-12-20.

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Номер патента: CN110798811B. Автор: 李扬,王建,吴冲,杨广龙,杨继成,刘阁旭. Владелец: Efy Intelligent Control Tianjin Tech Co ltd. Дата публикации: 2021-12-21.

Maximum power point tracking control method based on conductance incremental method and particle swarm optimization

Номер патента: CN112162589B. Автор: 刘正新,孟凡英,雷茂杰,许坦奇. Владелец: Shanghai Institute of Microsystem and Information Technology of CAS. Дата публикации: 2021-10-12.

Valve device, flow control method using the valve device, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing device

Номер патента: TWI727633B. Автор: 篠原努,中田知宏,近藤研太,土口大飛,吉田俊英,丹野竜太郎,鈴木裕也,滝本昌彥. Владелец: 日商富士金股份有限公司. Дата публикации: 2021-05-11.

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Номер патента: JP5388234B2. Автор: 美波 石井,幹生 岩村,睦 石本. Владелец: NTT DOCOMO INC. Дата публикации: 2014-01-15.

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Номер патента: JPWO2020158459A1. Автор: 努 篠原,知宏 中田,俊英 吉田,研太 近藤,裕也 鈴木,竜太郎 丹野,大飛 土口,昌彦 滝本. Владелец: Fujikin Inc. Дата публикации: 2021-12-02.

Head flying height control method, write current value determining method, and storage device

Номер патента: KR101004652B1. Автор: 츠요시 다카하시. Владелец: 도시바 스토리지 디바이스 가부시키가이샤. Дата публикации: 2011-01-04.

Uplink power control method, power control parameter cofiguration method and apparatus thereof

Номер патента: KR101618333B1. Автор: 수에밍 판,수에주안 가오,주캉 센. Владелец: 다 탕 모바일 커뮤니케이션즈 이큅먼트 코포레이션 리미티드. Дата публикации: 2016-05-04.

Vehicle control method, apparatus, vehicle key generation method and system

Номер патента: CN106603470A. Автор: 赵亮,郝飞,刘旺. Владелец: SAIC Motor Corp Ltd. Дата публикации: 2017-04-26.

Performance control system, performance control apparatus, performance control method, program for implementing the method, and storage medium storing the program

Номер патента: US20060027079A1. Автор: Haruki Uehara. Владелец: Yamaha Corp. Дата публикации: 2006-02-09.

Access control method, access control token issuing method and device

Номер патента: CN106656937A. Автор: 周巍. Владелец: China Academy of Telecommunications Technology CATT. Дата публикации: 2017-05-10.

Information processing system control method, intermediate service device, authentication method, and storage medium

Номер патента: CN103218187A. Автор: 安部孝一. Владелец: Canon Inc. Дата публикации: 2013-07-24.

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Номер патента: EP4194144A4. Автор: Koji Yamashita,Taku Watanabe,Kyohei Ishida. Владелец: JFE Steel Corp. Дата публикации: 2024-01-10.

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Номер патента: EP4212846A4. Автор: Takahiro SAKIMOTO,Tsunehisa Handa. Владелец: JFE Steel Corp. Дата публикации: 2024-03-13.

Setup condition determining method for manufacturing facilities, mill setup value determining method for rolling mill, mill setup value determining device for rolling mill, product manufacturing method, and rolled material manufacturing method

Номер патента: EP3926425B1. Автор: Tatsuya Yamazaki. Владелец: JFE Steel Corp. Дата публикации: 2024-07-24.

Temperature measuring method, heat treating method, and semiconductor device manufacturing method

Номер патента: TWI276189B. Автор: Junji Hirase,Tatsuo Sugiyama,Satoshi Shibata,Fumitoshi Kawase,Emi Kanazaki. Владелец: Matsushita Electric Ind Co Ltd. Дата публикации: 2007-03-11.

Package, package manufacturing method and piezoelectric vibrator manufacturing method

Номер патента: TW201041196A. Автор: Takeshi Sugiyama. Владелец: Seiko Instr Inc. Дата публикации: 2010-11-16.

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Номер патента: EP4212846B1. Автор: Takahiro SAKIMOTO,Tsunehisa Handa. Владелец: JFE Steel Corp. Дата публикации: 2024-10-23.

Capping unit and control method for same, liquid droplet ejection apparatus and device manufacturing method

Номер патента: US7341327B2. Автор: Hidenori Usuda. Владелец: Seiko Epson Corp. Дата публикации: 2008-03-11.

Capping unit and control method for same, liquid droplet ejection apparatus and device manufacturing method

Номер патента: CN100400293C. Автор: 臼田秀范. Владелец: Seiko Epson Corp. Дата публикации: 2008-07-09.

Moving apparatus, and member inspection method and member manufacturing method using same

Номер патента: EP4220148A1. Автор: Kyohei Ishida,Yuta TOKUMOTO. Владелец: JFE Steel Corp. Дата публикации: 2023-08-02.

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Номер патента: EP2405431A1. Автор: Mohamed Karroumi. Владелец: Thomson Licensing SAS. Дата публикации: 2012-01-11.

Crystal display processing method and crystal wafer manufacturing method

Номер патента: US6063301A. Автор: Katsumi Suzuki,Itaru Nagai,Kazushige Umetsu,Kazunori Kiwada. Владелец: Seiko Epson Corp. Дата публикации: 2000-05-16.

Electronic commerce method for semiconductor products, electronic commerce thereof, production system, production method, production equipment design system, production equipment design method, and production equipment manufacturing method

Номер патента: EP1164522A3. Автор: Kunihiro Toshiba Kabushiki Kaisha Mitsutake,Katsuya Toshiba Kabushiki Kaisha Okumura. Владелец: Toshiba Corp. Дата публикации: 2004-01-07.

Acquiring apparatus, acquiring method, and optical system manufacturing method

Номер патента: EP4339553A1. Автор: Tomohiro Sugimoto. Владелец: Canon Inc. Дата публикации: 2024-03-20.

Acquiring apparatus, acquiring method, and optical system manufacturing method

Номер патента: US20240085269A1. Автор: Tomohiro Sugimoto. Владелец: Canon Inc. Дата публикации: 2024-03-14.

Holding jig, optical element coating method, and optical lens manufacturing method

Номер патента: EP4310554A1. Автор: Satoshi Annaka. Владелец: Hoya Lens Thailand Ltd. Дата публикации: 2024-01-24.

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Номер патента: US11971390B2. Автор: Toyohisa Shinmiya,Yuji Yamasaki,Kento FUJII. Владелец: JFE Steel Corp. Дата публикации: 2024-04-30.

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Номер патента: US20230317108A1. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2023-10-05.

Pattern evaluation system, pattern evaluation method and semiconductor device manufacturing method

Номер патента: US8355560B2. Автор: Tadashi Mitsui. Владелец: Toshiba Corp. Дата публикации: 2013-01-15.

Optical fiber eccentric measurement method and optical fiber manufacturing method

Номер патента: US20230174408A1. Автор: Takahiro Nomura,Kazuyuki Sohma. Владелец: Sumitomo Electric Industries Ltd. Дата публикации: 2023-06-08.

Laser processing method and circuit board manufacturing method

Номер патента: US20230071592A1. Автор: Masakazu Kobayashi,Junichi Fujimoto,Kouji Kakizaki,Yasufumi Kawasuji,Akira SUWA. Владелец: GIGAPHOTON INC. Дата публикации: 2023-03-09.

EUV MASK INSPECTION APPARATUS AND METHOD, AND EUV MASK MANUFACTURING METHOD INCLUDING EUV MASK INSPECTION METHOD

Номер патента: US20200003685A1. Автор: JEON Byeong-Hwan. Владелец: SAMSUNG ELECTRONICS CO., LTD.. Дата публикации: 2020-01-02.

Through-hole forming method, and piezoelectric device manufacturing method and piezoelectric device manufactured thereby

Номер патента: CN1933325A. Автор: 青木信也. Владелец: Seiko Epson Corp. Дата публикации: 2007-03-21.

Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope

Номер патента: US20060219900A1. Автор: Masahiro Watanabe,Toshihiko Nakata. Владелец: HITACHI LTD. Дата публикации: 2006-10-05.

Glare contrast correction method, comparison method and comparison device, electronic display manufacturing method and antiglare layer manufacturing method

Номер патента: JP2023041667A. Автор: Hiroko Suzuki,裕子 鈴木,Norinaga Nakamura,典永 中村,Makio KURASHIGE,Shumpei NISHIO,雅行 恒川,玄 古井,牧夫 倉重,Yukimitsu Iwata,行光 岩田,Gen Furui,Kazutoshi Ishida,一敏 石田,俊平 西尾,Masayuki Tsunekawa. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2023-03-24.

Optical apparatus, measurement method, and semiconductor device manufacturing method

Номер патента: US20040156052A1. Автор: Takeshi Yamamoto,Akira Miyake. Владелец: Canon Inc. Дата публикации: 2004-08-12.

Lens dyeing method, and lens assembly manufacturing method

Номер патента: US20220001418A1. Автор: Choon Keun Lee,Seong Chan Park,Ae Rim Kim,Sang Hyun KWON,Sang Hyeon HONG. Владелец: Samsung Electro Mechanics Co Ltd. Дата публикации: 2022-01-06.

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Номер патента: US20140295065A1. Автор: Tomomi Sato,Tsutomu Komuro. Владелец: Fujitsu Ltd. Дата публикации: 2014-10-02.

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Номер патента: US20150247959A1. Автор: Sannokyou Takashi. Владелец: . Дата публикации: 2015-09-03.

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Номер патента: US20170266754A1. Автор: Kato Yoshinori,Yamasu Kazushige. Владелец: . Дата публикации: 2017-09-21.

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Номер патента: CN1791306A. Автор: 丰田直之,平井利充. Владелец: Seiko Epson Corp. Дата публикации: 2006-06-21.

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Номер патента: JP4968784B2. Автор: 純司 宮下. Владелец: Citizen Electronics Co Ltd. Дата публикации: 2012-07-04.

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Номер патента: JP3823870B2. Автор: 貴志 橋本. Владелец: Seiko Epson Corp. Дата публикации: 2006-09-20.

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Номер патента: JP5159679B2. Автор: 学 勝村. Владелец: Fujifilm Corp. Дата публикации: 2013-03-06.

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Номер патента: JP4224863B2. Автор: 治彦 楠瀬. Владелец: Lasertec Corp. Дата публикации: 2009-02-18.

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Номер патента: JP6167400B2. Автор: 圭介 関,武志 鴨井,大輔 山原. Владелец: Panasonic Intellectual Property Management Co Ltd. Дата публикации: 2017-07-26.

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Номер патента: JP7071813B2. Автор: 啓介 緒方,泰佑 塩谷,塁 井上. Владелец: Toppan Tomoegawa Optical Films Co Ltd. Дата публикации: 2022-05-19.

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Номер патента: JP4345278B2. Автор: 貴士 宮澤. Владелец: Seiko Epson Corp. Дата публикации: 2009-10-14.

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Номер патента: JP4059260B2. Автор: 山田　　純,和昭 桜田,剛 新舘. Владелец: Seiko Epson Corp. Дата публикации: 2008-03-12.

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Номер патента: JP5028402B2. Автор: 貴志 木津. Владелец: Casio Computer Co Ltd. Дата публикации: 2012-09-19.

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Номер патента: JP6447637B2. Автор: 幸理 飯塚,腰原　敬弘,敬弘 腰原,貴彦 大重,俊文 児玉,紘明 大野,真沙美 楯,児玉　俊文,晃弘 小川,飯塚　幸理. Владелец: JFE Steel Corp. Дата публикации: 2019-01-09.

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Номер патента: KR101021550B1. Автор: 겐지 사카모토. Владелец: 세이코 엡슨 가부시키가이샤. Дата публикации: 2011-03-16.

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Номер патента: JP4973783B2. Автор: 芳明 柳田,徹 原田,和久 三島,宏和 山西. Владелец: Fujitsu Ltd. Дата публикации: 2012-07-11.

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Номер патента: JP6470706B2. Автор: 隆志 畑中,倫裕 大平. Владелец: Hoya Lens Thailand Ltd. Дата публикации: 2019-02-13.

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Номер патента: JP4065476B2. Автор: 裕充 山口,誠 赤平,聡 和田,義朋 丸本,弘 藤池,賢 菊池. Владелец: Canon Inc. Дата публикации: 2008-03-26.

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Номер патента: JP6898071B2. Автор: 勉 古谷,康弘 羽場. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2021-07-07.

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Номер патента: TW202118637A. Автор: 田坂公志,西村浩,藤枝奈奈恵,南條崇. Владелец: 日商柯尼卡美能達股份有限公司. Дата публикации: 2021-05-16.

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Номер патента: JP3951445B2. Автор: 一夫 湯田坂. Владелец: Seiko Epson Corp. Дата публикации: 2007-08-01.

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Номер патента: CN104991380A. Автор: 徐先华,熊燕军. Владелец: Wuhan China Star Optoelectronics Technology Co Ltd. Дата публикации: 2015-10-21.

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Номер патента: JP4707658B2. Автор: 恵美 山本. Владелец: Sharp Corp. Дата публикации: 2011-06-22.

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Номер патента: JP6091951B2. Автор: 洋八 山下,紀子 山本,和弘 逸見,細野　靖晴,靖晴 細野,山本　紀子,山下　洋八,逸見　和弘. Владелец: Toshiba Medical Systems Corp. Дата публикации: 2017-03-08.

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Номер патента: JP7199889B2. Автор: 一史 柏倉,博 石井. Владелец: Canon Tokki Corp. Дата публикации: 2023-01-06.

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Номер патента: JP6824802B2. Автор: 信和 生駒,健二 井阪,浩二 江川. Владелец: NGK Insulators Ltd. Дата публикации: 2021-02-03.

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Номер патента: TWI744612B. Автор: 新納幹大. Владелец: 日商凸版印刷股份有限公司. Дата публикации: 2021-11-01.

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Номер патента: JP3926565B2. Автор: 浩二 須藤,芳明 柳田,和雄 横井,友一 杉山,照秋 西岡,俊介 曽根. Владелец: Fujitsu Ltd. Дата публикации: 2007-06-06.

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Номер патента: WO2020253590A1. Автор: 王海生,刘英明,韩艳玲,赵利军,张晨阳,郭玉珍,李秀锋,李佩笑. Владелец: 京东方科技集团股份有限公司. Дата публикации: 2020-12-24.

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Номер патента: CN108885182B. Автор: 橘久美子,藤井隆志,耕田浩. Владелец: Sumitomo Electric Industries Ltd. Дата публикации: 2021-11-30.

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Номер патента: JP4405201B2. Автор: 明子 中村,慎一 五十嵐,正弘 北島. Владелец: National Institute of Japan Science and Technology Agency. Дата публикации: 2010-01-27.

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Номер патента: JP6190133B2. Автор: ツンデウオ ラウ. Владелец: Hoya Corp. Дата публикации: 2017-08-30.

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Номер патента: CN100437162C. Автор: 网谷圭二,松元浩二,藤本清二,山根尚德. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2008-11-26.

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Номер патента: CN101515082B. Автор: 坂本贤治. Владелец: Seiko Epson Corp. Дата публикации: 2012-02-08.

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Номер патента: TWI749157B. Автор: 堀内正子,大月敏敬,大橋幸恵,長屋勝也. Владелец: 日商Ｊｓｒ股份有限公司. Дата публикации: 2021-12-11.

Molten metal component estimation device, molten metal component estimation method, and molten metal manufacturing method

Номер патента: KR20210003917A. Автор: 유키오 다카하시,신지 도미야마,히로토 가세,쇼타 아마노,도시후미 고다마. Владелец: 제이에프이 스틸 가부시키가이샤. Дата публикации: 2021-01-12.

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Номер патента: US20240294185A1. Автор: Makoto Yamakado,Masato Abe,Yusuke Tanaka,Yu Sato,Yoshio Kano. Владелец: Ikutoku Gakuen School Corp. Дата публикации: 2024-09-05.

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Номер патента: JP3929237B2. Автор: 啓介 吉國,洋司 當麻,章吾 塚田,敦司 上崎. Владелец: Hoya Corp. Дата публикации: 2007-06-13.

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Номер патента: JP4345840B2. Автор: 司 安部,大吾 安藤,英一 日岡,正敬 服部. Владелец: Toyota Motor Corp. Дата публикации: 2009-10-14.

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Номер патента: JP6091487B2. Автор: 裕之 三井,三井　裕之,進 西浦,かおり 猪島,裕 越湖. Владелец: HITACHI KOKUSAI ELECTRIC INC. Дата публикации: 2017-03-08.

Automatic transmission control apparatus, control method, program for realizing that method, and recording medium on which that program is recorded

Номер патента: US20100305823A1. Автор: Yoshio Hasegawa,Hiroyuki Sawada,Ichiro Kitaori,Seiji Kuwahara,Kazuyuki Shiiba,Nobufusa Kobayashi,Toshihiro Fukumasu. Владелец: Toyota Motor Corp. Дата публикации: 2010-12-02.

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Номер патента: US20110229618A1. Автор: Tadahiro Ohmi,Hisayoshi Kobayashi. Владелец: Individual. Дата публикации: 2011-09-22.

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Номер патента: CA2421932C. Автор: Yasunori Matsufuji. Владелец: JAPAN SCIENCE AND TECHNOLOGY AGENCY. Дата публикации: 2008-08-05.

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Номер патента: NZ524640A. Автор: Yasunori Matsufuji. Владелец: Japan Science & Tech Agency. Дата публикации: 2006-04-28.

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Номер патента: EP4431829A1. Автор: Kenichi Fujii,Takashi Kuroki,Sho Tamura,Yusuke YASUFUKU,Zongtao Cheng,Akinobu KUROKAWA. Владелец: JFE Steel Corp. Дата публикации: 2024-09-18.

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Номер патента: EP4414409A1. Автор: Noriyuki Kato,Kentaro Ishihara,Atsushi MOTEGI,Katsushi NISHIMORI,Shoko MURATA SUZUKI,Kazutaka Takamatsu. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2024-08-14.

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Номер патента: US20240308127A1. Автор: Kazuhiro Horiuchi,Atsushi Nagasaki,Manabu OGIHARA. Владелец: Nissei ASB Machine Co Ltd. Дата публикации: 2024-09-19.

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Номер патента: US20170259312A1. Автор: Yamada Kenji,Ogawa Shigeru,Akashi Tooru. Владелец: NIPPON STEEL & SUMITOMO METAL CORPORATION. Дата публикации: 2017-09-14.

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Номер патента: JPWO2016042948A1. Автор: 健二 山田,山田　健二,茂 小川,透 明石,小川　茂. Владелец: Nippon Steel and Sumitomo Metal Corp. Дата публикации: 2017-04-27.

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Номер патента: AU2021355246B2. Автор: Mitsuyoshi Tamura,Mitsuteru Yamada,Kisei Matsumoto,Yoshiya Maegawa,Koujun Utaka,Keishiro Yoshimori,Yuka ORIKASA,Ryouhei OKA. Владелец: DNP FINE CHEMICALS CO LTD. Дата публикации: 2024-07-11.

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Номер патента: CA3103195A1. Автор: Akito Yoshida,Yoichi Shimbo,Yuta Ozawa. Владелец: Mitsubishi Power Ltd. Дата публикации: 2019-12-19.

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Номер патента: AU2021355246A9. Автор: Mitsuyoshi Tamura,Mitsuteru Yamada,Kisei Matsumoto,Yoshiya Maegawa,Koujun Utaka,Keishiro Yoshimori,Yuka ORIKASA,Ryouhei OKA. Владелец: DNP FINE CHEMICALS CO LTD. Дата публикации: 2024-07-25.

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Номер патента: US20180030561A1. Автор: Yuji Masuda,Yusuke Ishibashi,Shugo Iwasaki,Kosei KAWAHARA,Shinichiro Tokuyama. Владелец: Mitsubishi Heavy Industries Compressor Corp. Дата публикации: 2018-02-01.

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Номер патента: US10837071B2. Автор: Yuji Masuda,Yusuke Ishibashi,Shugo Iwasaki,Kosei KAWAHARA,Shinichiro Tokuyama. Владелец: Mitsubishi Heavy Industries Compressor Corp. Дата публикации: 2020-11-17.

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Номер патента: EP4434649A1. Автор: Yukio Takashima,Masayuki Horie,Kosuke Hinata. Владелец: JFE Steel Corp. Дата публикации: 2024-09-25.

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Номер патента: EP4261039A1. Автор: Katsutoshi Aoki,Keito SATO,Shunsuke FUKUI,Gota KATAYANAGI. Владелец: Kao Corp. Дата публикации: 2023-10-18.

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Номер патента: US20240042746A1. Автор: Katsutoshi Aoki,Keito SATO,Shunsuke FUKUI,Gota KATAYANAGI. Владелец: Kao Corp. Дата публикации: 2024-02-08.

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Номер патента: EP3674034A1. Автор: Takashi Yoshimura,Takeshi Ebina,Koji YOKOE. Владелец: NSK LTD. Дата публикации: 2020-07-01.

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Номер патента: US20230119128A1. Автор: Yun Tang,Hua Liu,Xueqiang TANG,Qingqing Zeng. Владелец: Hefei Hualing Co Ltd. Дата публикации: 2023-04-20.

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Номер патента: US20100255193A1. Автор: Takamitsu Hirose,Takeshi Imizu. Владелец: Hoya Corp. Дата публикации: 2010-10-07.

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Номер патента: JP4224098B2. Автор: 浩一郎 牟田,誠和 野村. Владелец: Aisin AW Co Ltd. Дата публикации: 2009-02-12.

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Номер патента: JP4559698B2. Автор: 周 山田,マイケル・オー・ボール,シェンィエン・ツァオ. Владелец: Toshiba Corp. Дата публикации: 2010-10-13.

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Номер патента: US20180037971A1. Автор: Nakai Osamu,Higuchi Hirotaka,Ohara Go,Imamura Masaki. Владелец: . Дата публикации: 2018-02-08.

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Номер патента: JPWO2013099971A1. Автор: 卓巳 加藤. Владелец: Teijin Ltd. Дата публикации: 2015-05-11.

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Номер патента: WO2008056540A1. Автор: Kenichi Sasaki. Владелец: Sumitomo Metal Industries, Ltd.. Дата публикации: 2008-05-15.

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Номер патента: KR101158209B1. Автор: 시게루 오가와,다께아끼 와끼사까,도시유끼 시라이시. Владелец: 신닛뽄세이테쯔 카부시키카이샤. Дата публикации: 2012-06-19.

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Номер патента: JP4540351B2. Автор: 力 大木,康平 藤田. Владелец: NTN Corp. Дата публикации: 2010-09-08.

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Номер патента: JP4309858B2. Автор: 昌弘 吉田. Владелец: Hoya Corp. Дата публикации: 2009-08-05.

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Номер патента: JP4893405B2. Автор: 歩 佐川,康嗣 大島,英司 福代. Владелец: Toyota Motor Corp. Дата публикации: 2012-03-07.

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Номер патента: NL2025293A. Автор: JANSEN Bas,Petrus Martinus Bernardus Vermeulen Johannes,Jeroen Hermanussen Sander. Владелец: ASML Netherlands BV. Дата публикации: 2020-05-07.

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Номер патента: JP6536777B2. Автор: 晃一 坂田. Владелец: Nikon Corp. Дата публикации: 2019-07-03.

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Номер патента: US20120244461A1. Автор: . Владелец: TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.. Дата публикации: 2012-09-27.

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Номер патента: JP2009194416A. Автор: Satoyuki Nakano,智行 中野. Владелец: Sony Corp. Дата публикации: 2009-08-27.

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Номер патента: JP3669539B2. Автор: 秀一 千原. Владелец: Sony Corp. Дата публикации: 2005-07-06.

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Номер патента: US20120063802A1. Автор: . Владелец: . Дата публикации: 2012-03-15.

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Номер патента: CN104105127B. Автор: 杨宁,高有军,金巴. Владелец: China Mobile Communications Group Co Ltd. Дата публикации: 2017-09-15.

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Номер патента: JP5163038B2. Автор: 正人 甲斐川,清二 桑原. Владелец: Toyota Motor Corp. Дата публикации: 2013-03-13.

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Номер патента: JPS53131232A. Автор: Yoshio Takada,Kiyoshi Hirose,Makoto Tsukuda,Kazuhiko Oku,Hisashi Ootake. Владелец: Kobe Steel Ltd. Дата публикации: 1978-11-15.

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Номер патента: JP2005094639A. Автор: Tsuyoshi Sugita,剛志 杉田. Владелец: Konica Minolta Medical and Graphic Inc. Дата публикации: 2005-04-07.

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Номер патента: US20120214317A1. Автор: . Владелец: HITACHI KOKUSAI ELECTRIC INC.. Дата публикации: 2012-08-23.

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Pattern forming method, uneven structure manufacturing method and replica mold manufacturing method

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Diaphragm manufacturing method and pressure sensor manufacturing method

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Ashing method and semiconductor device manufacturing method using the same

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Steel length measuring device, steel material manufacturing device, steel length measuring method, and steel material manufacturing method

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Substrate manufacturing method, mask blank manufacturing method, and transfer mask manufacturing method

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Pattern forming method and integrated circuit manufacturing method

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Wafer, wafer manufacturing method, and device chip manufacturing method

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Silicon surface passivation method, surface passivated silicon manufacturing method, and solar cell manufacturing method

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Coating equipment, sanitary goods manufacturing equipment, coating methods, and sanitary goods manufacturing methods

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Probe manufacturing method and probe array manufacturing method

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Projection exposure apparatus, projection exposure method, and semiconductor device manufacturing method

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Semiconductor thin film manufacturing method and semiconductor device manufacturing method

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