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Illumination System, Inspection Apparatus Including Such an Illumination System, Inspection Method and Manufacturing Method

Номер патента: US20180088347A1
Опубликовано: 29-03-2018
Автор(ы): EBERT Martin, Jak Martin Jacobus Johan, Van Der Zouw Gerbrand
Принадлежит: ASML Netherlands B.V.
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Номер патента: JP6824802B2. Автор: 信和 生駒,健二 井阪,浩二 江川. Владелец: NGK Insulators Ltd. Дата публикации: 2021-02-03.

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Номер патента: KR20210003917A. Автор: 유키오 다카하시,신지 도미야마,히로토 가세,쇼타 아마노,도시후미 고다마. Владелец: 제이에프이 스틸 가부시키가이샤. Дата публикации: 2021-01-12.

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Номер патента: NL2017123A. Автор: Staals Frank,Christiaan Hinnen Paul,Cornelis Maria Luijten Carlo,Bernhard Van Oosten Anton. Владелец: ASML Netherlands BV. Дата публикации: 2017-01-24.

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Номер патента: US20170023867A1. Автор: Staals Frank,Van Oosten Anton Bernhard,HINNEN Paul Christiaan,LUIJTEN Carlo Cornelis Maria. Владелец: ASML Netherlands B.V.. Дата публикации: 2017-01-26.

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Номер патента: WO2017016839A1. Автор: Paul Christiaan Hinnen,Frank Staals,Anton Bernhard Van Oosten,Carlo Cornelis Maria LUIJTEN. Владелец: ASML Netherlands B.V.. Дата публикации: 2017-02-02.

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Номер патента: US20080231840A1. Автор: Ulrich Wegmann,Wolfgang Emer,Helmut Haidner. Владелец: CARL ZEISS SMT GMBH. Дата публикации: 2008-09-25.

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Номер патента: US09429854B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2016-08-30.

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Номер патента: TWI435048B. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2014-04-21.

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Номер патента: US20190107787A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2019-04-11.

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Номер патента: US20140354966A1. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2014-12-04.

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Номер патента: US20150293464A1. Автор: Shibazaki Yuichi. Владелец: . Дата публикации: 2015-10-15.

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Номер патента: US9740114B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2017-08-22.

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Номер патента: US9760021B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2017-09-12.

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Номер патента: US9846374B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2017-12-19.

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Номер патента: US10197924B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2019-02-05.

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Номер патента: US9971253B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2018-05-15.

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Номер патента: KR101881716B1. Автор: 유이치 시바자키. Владелец: 가부시키가이샤 니콘. Дата публикации: 2018-07-24.

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Номер патента: KR101444632B1. Автор: 유이치 시바자키. Владелец: 가부시키가이샤 니콘. Дата публикации: 2014-09-26.

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Номер патента: KR20130105916A. Автор: 유이치 시바자키. Владелец: 가부시키가이샤 니콘. Дата публикации: 2013-09-26.

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Номер патента: KR101521193B1. Автор: 히로시 오오키,아야코 나카무라. Владелец: 가부시키가이샤 니콘. Дата публикации: 2015-05-18.

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Номер патента: TW201824351A. Автор: 柴崎祐一. Владелец: 日商尼康股份有限公司. Дата публикации: 2018-07-01.

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Номер патента: KR101511929B1. Автор: 유이치 시바자키. Владелец: 가부시키가이샤 니콘. Дата публикации: 2015-04-13.

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Номер патента: TWI553704B. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2016-10-11.

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Номер патента: TW201415537A. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2014-04-16.

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Номер патента: US8134688B2. Автор: Yuichi Shibazaki. Владелец: Nikon Corp. Дата публикации: 2012-03-13.

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Номер патента: TWI479275B. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2015-04-01.

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Номер патента: US20190271922A1. Автор: Manabu Takakuwa. Владелец: Toshiba Memory Corp. Дата публикации: 2019-09-05.

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Номер патента: US10921722B2. Автор: Manabu Takakuwa. Владелец: Toshiba Memory Corp. Дата публикации: 2021-02-16.

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Номер патента: US20190079402A1. Автор: Yoshimitsu Kato. Владелец: Toshiba Memory Corp. Дата публикации: 2019-03-14.

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Номер патента: US20120163699A1. Автор: Kazuya Fukuhara. Владелец: Individual. Дата публикации: 2012-06-28.

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Номер патента: US20210349400A1. Автор: Toru Abe. Владелец: GIGAPHOTON INC. Дата публикации: 2021-11-11.

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Номер патента: NL2027803A. Автор: Abe Toru. Владелец: GIGAPHOTON INC. Дата публикации: 2021-11-23.

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Номер патента: NL2027803B1. Автор: Abe Toru. Владелец: GIGAPHOTON INC. Дата публикации: 2022-06-15.

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Номер патента: JP3699960B2. Автор: 由行 佐藤. Владелец: Toshiba Corp. Дата публикации: 2005-09-28.

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Номер патента: US20240291220A1. Автор: Seiji Nogiwa,Takayuki OSANAI. Владелец: GIGAPHOTON INC. Дата публикации: 2024-08-29.

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Номер патента: KR101964371B1. Автор: 박용호,이진주,진창성. Владелец: 한화디펜스 주식회사. Дата публикации: 2019-04-01.

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Номер патента: JP3776902B2. Автор: 崎 裕一郎 山,宏 幸 林. Владелец: Toshiba Corp. Дата публикации: 2006-05-24.

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Номер патента: US20210123680A1. Автор: Jun Eto,Masami Kamiya,Akihisa Okuda,Kazuki NOMA. Владелец: Mitsubishi Heavy Industries Ltd. Дата публикации: 2021-04-29.

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Номер патента: US7365830B2. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Kodama,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Shin Etsu Handotai Co Ltd. Дата публикации: 2008-04-29.

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Номер патента: US20070177126A1. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Kodama,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Toshiba Corp. Дата публикации: 2007-08-02.

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Номер патента: US20180267183A1. Автор: Kazuto Nishizawa. Владелец: Canon Medical Systems Corp. Дата публикации: 2018-09-20.

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Номер патента: US20140117991A1. Автор: KUMADA Chiaki,Gotoh Shunsuke. Владелец: NGK SPARK PLUG CO., LTD.. Дата публикации: 2014-05-01.

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Номер патента: US20200244049A1. Автор: HIDAKA Atsutoshi. Владелец: NGK SPARK PLUG CO., LTD.. Дата публикации: 2020-07-30.

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Номер патента: EP2728257A2. Автор: Chiaki Kumada,Shunsuke Gotoh. Владелец: NGK Spark Plug Co Ltd. Дата публикации: 2014-05-07.

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Номер патента: JP6947072B2. Автор: 洋平 白川,芳丈 揚石. Владелец: Hitachi Metals Ltd. Дата публикации: 2021-10-13.

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Номер патента: JP6947042B2. Автор: 洋平 白川,芳丈 揚石. Владелец: Hitachi Metals Ltd. Дата публикации: 2021-10-13.

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Номер патента: TWI276189B. Автор: Junji Hirase,Tatsuo Sugiyama,Satoshi Shibata,Fumitoshi Kawase,Emi Kanazaki. Владелец: Matsushita Electric Ind Co Ltd. Дата публикации: 2007-03-11.

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Номер патента: EP4050381A1. Автор: Jun Sakurai,Keisuke Goto,Kazuhiro Shirakawa,Masashi Hatanaka,Haruki Yamaji. Владелец: Hamamatsu Photonics KK. Дата публикации: 2022-08-31.

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Номер патента: US20240103189A1. Автор: Jun Sakurai,Keisuke Goto,Kazuhiro Shirakawa,Masashi Hatanaka,Haruki Yamaji. Владелец: Hamamatsu Photonics KK. Дата публикации: 2024-03-28.

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Номер патента: US20190363027A1. Автор: Toshihiro Arai,Yasushi Niimura,Hideki Shishido,Takayuki SHIMATOU. Владелец: Fuji Electric Co Ltd. Дата публикации: 2019-11-28.

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Номер патента: US20230004310A1. Автор: Atsushi Kondo,Ryo YONEZAWA. Владелец: Kioxia Corp. Дата публикации: 2023-01-05.

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Номер патента: US20070259458A1. Автор: Hideki Yuzawa,Kazuhiro Kijima. Владелец: Seiko Epson Corp. Дата публикации: 2007-11-08.

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Номер патента: KR100873181B1. Автор: 히로키마사아키. Владелец: 가부시키가이샤 한도오따이 에네루기 켄큐쇼. Дата публикации: 2008-12-10.

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Номер патента: EP3731322A1. Автор: Woo Yong Lee,Hyun Tae Kim,Shin Hwa Lee. Владелец: LG Chem Ltd. Дата публикации: 2020-10-28.

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Номер патента: US20060219900A1. Автор: Masahiro Watanabe,Toshihiko Nakata. Владелец: HITACHI LTD. Дата публикации: 2006-10-05.

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Номер патента: EP4339553A1. Автор: Tomohiro Sugimoto. Владелец: Canon Inc. Дата публикации: 2024-03-20.

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Номер патента: US20160306005A1. Автор: Teruyuki Ohashi,Ryosuke llJIMA. Владелец: Toshiba Corp. Дата публикации: 2016-10-20.

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Номер патента: TW200425370A. Автор: Makoto Kobayashi,Masashi Ichikawa,Kenichi Komada,Soichi Inoue,Tadahito Fujisawa,Tsuneyuki Hagiwara. Владелец: Shinetsu Handotai Kk. Дата публикации: 2004-11-16.

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Номер патента: US20160056085A1. Автор: llJIMA Ryosuke,OHASHI Teruyuki. Владелец: KABUSHIKI KAISHA TOSHIBA. Дата публикации: 2016-02-25.

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Номер патента: US20160085010A1. Автор: CHOI Kyung Ho,Shin Gyo Jic,Lee Sang Kug. Владелец: . Дата публикации: 2016-03-24.

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Номер патента: US20210123680A1. Автор: OKUDA Akihisa,ETO Jun,NOMA Kazuki,Kamiya Masami. Владелец: . Дата публикации: 2021-04-29.

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Номер патента: US20180136279A1. Автор: Takanashi Keiichi,NAGASAWA Takahiro. Владелец: SUMCO CORPORATION. Дата публикации: 2018-05-17.

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Номер патента: US20170229356A1. Автор: NIIMURA Yasushi,Shishido Hideki,ARAI Toshihiro,SHIMATOU Takayuki. Владелец: . Дата публикации: 2017-08-10.

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Номер патента: US20180267183A1. Автор: NISHIZAWA Kazuto. Владелец: Canon Medical Systems Corporation. Дата публикации: 2018-09-20.

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Номер патента: US20160297704A1. Автор: OHTO Kimiaki,Sugahara Akira,ARITA Yusuke,IKENOTA Minoru. Владелец: Asahi Glass Company, Limited. Дата публикации: 2016-10-13.

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Номер патента: US20160306005A1. Автор: llJIMA Ryosuke,OHASHI Teruyuki. Владелец: KABUSHIKI KAISHA TOSHIBA. Дата публикации: 2016-10-20.

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Номер патента: US20150338276A1. Автор: NAKAGAWA Satoko,KASHIMA Kazuhiko. Владелец: . Дата публикации: 2015-11-26.

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Номер патента: US20190363027A1. Автор: NIIMURA Yasushi,Shishido Hideki,ARAI Toshihiro,SHIMATOU Takayuki. Владелец: . Дата публикации: 2019-11-28.

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Номер патента: JP6488572B2. Автор: 公夫 長坂,長坂　公夫,藤井　永一,永一 藤井. Владелец: Seiko Epson Corp. Дата публикации: 2019-03-27.

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Номер патента: US20040085645A1. Автор: Hideki Komatsuda. Владелец: Nikon Corp. Дата публикации: 2004-05-06.

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Номер патента: US8184266B2. Автор: Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN,Jeroen Pieter STARREVELD. Владелец: ASML Netherlands BV. Дата публикации: 2012-05-22.

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Номер патента: EP1642171A1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2006-04-05.

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Номер патента: EP1642171B1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2011-06-15.

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Номер патента: CN104423141A. Автор: 山口昇,坪井诚治,吉川裕. Владелец: Hoya Corp. Дата публикации: 2015-03-18.

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Номер патента: US20180017865A1. Автор: Shuji Hirano,Akira Takada,Hidehiro Mochizuki. Владелец: Fujifilm Corp. Дата публикации: 2018-01-18.

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Номер патента: NL2028111B1. Автор: HORI Tsukasa,Shiraishi Yutaka. Владелец: GIGAPHOTON INC. Дата публикации: 2022-09-14.

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Номер патента: US8142960B2. Автор: Satoshi Nagai,Kazuya Fukuhara. Владелец: Toshiba Corp. Дата публикации: 2012-03-27.

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Номер патента: US20180305868A1. Автор: Masanao Kunugi,Satomi Yoshioka. Владелец: Seiko Epson Corp. Дата публикации: 2018-10-25.

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Номер патента: US20240175479A1. Автор: Hans Butler,Michael Erath,Petrus Martinus Bernardus Vermeulen Johannes,Maarten Hartger Kimman,Philipp Gaida,Stefan TROGER. Владелец: ASML Netherlands BV. Дата публикации: 2024-05-30.

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Номер патента: US20040253553A1. Автор: Takashi Sato,Shoji Mimotogi,Shigeru Hasebe. Владелец: Individual. Дата публикации: 2004-12-16.

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Номер патента: TW200921289A. Автор: Yuichi Shibazaki,Yuho Kanaya. Владелец: Nikon Corp. Дата публикации: 2009-05-16.

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Номер патента: US7118834B2. Автор: Takashi Sato,Shoji Mimotogi,Shigeru Hasebe. Владелец: Toshiba Corp. Дата публикации: 2006-10-10.

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Номер патента: US20110027701A1. Автор: Masaru Tanabe. Владелец: Hoya Corp. Дата публикации: 2011-02-03.

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Номер патента: US20200089103A1. Автор: Keiko Morishita. Владелец: Kioxia Corp. Дата публикации: 2020-03-19.

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Номер патента: US20230420291A1. Автор: Masatoshi Terayama. Владелец: Kioxia Corp. Дата публикации: 2023-12-28.

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Номер патента: US20050250022A1. Автор: Koji Hashimoto,SATOSHI Tanaka,Soichi Inoue,Toshiya Kotani,Shigeki Nojima. Владелец: Individual. Дата публикации: 2005-11-10.

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Номер патента: TWI443469B. Автор: 山本�一. Владелец: 尼康股份有限公司. Дата публикации: 2014-07-01.

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Номер патента: IL281957A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2021-05-31.

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Номер патента: TW200737319A. Автор: Takayoshi Minami. Владелец: Fujitsu Ltd. Дата публикации: 2007-10-01.

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Номер патента: TW201245890A. Автор: Teruyuki Hayashi,Yuji Ono,Takaaki Matsuoka,Hiraku Ishikawa. Владелец: Tokyo Electron Ltd. Дата публикации: 2012-11-16.

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Номер патента: IL281957B1. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2024-10-01.

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Номер патента: US11320740B2. Автор: Yukio Watanabe,Yutaka Shiraishi,Hiroshi Someya,Toshihiro Nishisaka,Tsukasa Hori. Владелец: GIGAPHOTON INC. Дата публикации: 2022-05-03.

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Номер патента: US11806901B2. Автор: Hideki Kanai,Toshiaki Komukai,Kazuhiro Takahata. Владелец: Kioxia Corp. Дата публикации: 2023-11-07.

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Номер патента: US20200089106A1. Автор: Sachiko Kobayashi. Владелец: Toshiba Memory Corp. Дата публикации: 2020-03-19.

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Номер патента: US20040157169A1. Автор: Hiroshi Morioka. Владелец: Fujitsu Ltd. Дата публикации: 2004-08-12.

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Номер патента: US20170017738A1. Автор: PISARENCO Maxim,VAN KRAAIJ Markus Gerardus Martinus Maria,DIRKS Remco. Владелец: ASML Netherlands B.V.. Дата публикации: 2017-01-19.

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Номер патента: US20180067405A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2018-03-08.

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Номер патента: US20170160649A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2017-06-08.

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Номер патента: US20200202054A1. Автор: Remco Dirks,Markus Gerardus Martinus Maria Van Kraaij,Maxim PISARENCO. Владелец: ASML Netherlands BV. Дата публикации: 2020-06-25.

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Номер патента: US20180224758A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2018-08-09.

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Номер патента: US20150309423A1. Автор: Shibazaki Yuichi. Владелец: . Дата публикации: 2015-10-29.

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Номер патента: US20170315457A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2017-11-02.

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Номер патента: US20160327872A1. Автор: Shibazaki Yuichi. Владелец: NIKON CORPORATION. Дата публикации: 2016-11-10.

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Номер патента: JP4147574B2. Автор: 浩二 貝瀬. Владелец: Nikon Corp. Дата публикации: 2008-09-10.

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Номер патента: KR100552559B1. Автор: 타케나카츠토무,미우라세이야. Владелец: 캐논 가부시끼가이샤. Дата публикации: 2006-02-14.

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Номер патента: US6649484B2. Автор: Yoshinori Ohsaki. Владелец: Canon Inc. Дата публикации: 2003-11-18.

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Номер патента: JPWO2017056928A1. Автор: 修史 平野,年哉 高橋,英宏 望月,直也 下重,暁 ▲高▼田. Владелец: Fujifilm Corp. Дата публикации: 2018-01-18.

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Номер патента: US20050042525A1. Автор: Tsutomu Takenaka,Seiya Miura. Владелец: Canon Inc. Дата публикации: 2005-02-24.

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Номер патента: TWI606312B. Автор: 可拉吉 馬可斯 傑拉度 馬堤司 瑪麗亞 凡,馬克辛 帕薩瑞可,萊姆克 德爾克斯. Владелец: Ａｓｍｌ荷蘭公司. Дата публикации: 2017-11-21.

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Номер патента: TWI422982B. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2014-01-11.

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Номер патента: TWI497220B. Автор: 柴崎祐一. Владелец: 尼康股份有限公司. Дата публикации: 2015-08-21.

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Номер патента: CA2336569A1. Автор: Koji Kikuchi. Владелец: Sony Corp. Дата публикации: 2001-08-24.

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Номер патента: IL280148A. Автор: . Владелец: ASML Netherlands BV. Дата публикации: 2021-03-01.

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Номер патента: TW201629632A. Автор: Tomotaka Tsuchimura. Владелец: Fujifilm Corp. Дата публикации: 2016-08-16.

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Номер патента: US20230082514A1. Автор: Kentaro Matsunaga,Satomi Abe,Issui Aiba. Владелец: Kioxia Corp. Дата публикации: 2023-03-16.

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Номер патента: JP3458549B2. Автор: 透 小川,政也 植松. Владелец: Sony Corp. Дата публикации: 2003-10-20.

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Номер патента: JP3514401B2. Автор: 和彦 三島. Владелец: Canon Inc. Дата публикации: 2004-03-31.

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Номер патента: JP4068531B2. Автор: 谷 敏 也 小,嶋 茂 樹 野. Владелец: Toshiba Corp. Дата публикации: 2008-03-26.

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Номер патента: US20240079844A1. Автор: Takashi Shiga. Владелец: GIGAPHOTON INC. Дата публикации: 2024-03-07.

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Номер патента: US20240072510A1. Автор: Takashi Shiga. Владелец: GIGAPHOTON INC. Дата публикации: 2024-02-29.

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Номер патента: US20230314928A1. Автор: Masanori Nakagawa. Владелец: Hoya Corp. Дата публикации: 2023-10-05.

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Номер патента: US11835854B2. Автор: Hirokazu Kato,Kei Kobayashi,Daizo Muto,Kasumi Okabe. Владелец: Kioxia Corp. Дата публикации: 2023-12-05.

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Номер патента: US20140038318A1. Автор: Hironobu Sato. Владелец: Toshiba Corp. Дата публикации: 2014-02-06.

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Номер патента: US20230324881A1. Автор: Sooyong Lee,Jeeyong Lee. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2023-10-12.

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Номер патента: US20210072646A1. Автор: Kengo Hayashi. Владелец: GIGAPHOTON INC. Дата публикации: 2021-03-11.

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Номер патента: US11307501B2. Автор: Kengo Hayashi. Владелец: GIGAPHOTON INC. Дата публикации: 2022-04-19.

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Номер патента: EP1089128A3. Автор: Mizunori c/o Intell. Prop. Div. Ezaki. Владелец: Toshiba Corp. Дата публикации: 2001-05-02.

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Номер патента: US20240069428A1. Автор: Yohei IKEBE. Владелец: Hoya Corp. Дата публикации: 2024-02-29.

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Номер патента: US7629092B2. Автор: Keiji Yamada. Владелец: Fujitsu Semiconductor Ltd. Дата публикации: 2009-12-08.

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Номер патента: US20060093926A1. Автор: Takeshi Ito,Tadahito Fujisawa,Toshiya Kotani. Владелец: Toshiba Corp. Дата публикации: 2006-05-04.

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Номер патента: US20160079076A1. Автор: Hiroshi Yamamoto,Mitsuhiro Omura,Tsubasa IMAMURA. Владелец: Toshiba Corp. Дата публикации: 2016-03-17.

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Номер патента: US20230418155A1. Автор: Hirotaka Tsuda. Владелец: Kioxia Corp. Дата публикации: 2023-12-28.

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Номер патента: US20120163699A1. Автор: Kazuya Fukuhara. Владелец: Individual. Дата публикации: 2012-06-28.

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Номер патента: US20130244143A1. Автор: TERASAWA Tsuneo,YAMANE Takeshi. Владелец: Kabushiki Kaihsa Toshiba. Дата публикации: 2013-09-19.

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Номер патента: US20200012187A1. Автор: KOMUKAI Toshiaki. Владелец: Toshiba Memory Corporation. Дата публикации: 2020-01-09.

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Номер патента: US20220055254A1. Автор: Hirokazu Kato,Seiji Morita,Kei Kobayashi,Anupam Mitra. Владелец: Toshiba Memory Corp. Дата публикации: 2022-02-24.

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Номер патента: US20190079402A1. Автор: Kato Yoshimitsu. Владелец: Toshiba Memory Corporation. Дата публикации: 2019-03-14.

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Номер патента: US20200089106A1. Автор: Kobayashi Sachiko. Владелец: Toshiba Memory Corporation. Дата публикации: 2020-03-19.

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Номер патента: US20170115556A1. Автор: Shim Woo-seok,Liang Wenqing. Владелец: . Дата публикации: 2017-04-27.

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Номер патента: US20160246238A1. Автор: SUZUKI Hiroaki,Kitagawa Hiroo. Владелец: . Дата публикации: 2016-08-25.

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Номер патента: US20190271922A1. Автор: Manabu Takakuwa. Владелец: Toshiba Memory Corp. Дата публикации: 2019-09-05.

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Номер патента: US20200303190A1. Автор: Kobayashi Kei,Nakamura Takayuki,KATO Hirokazu. Владелец: . Дата публикации: 2020-09-24.

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Номер патента: US20190384169A1. Автор: SUZUKI Katsutoshi,NAGAI Takaharu,ICHIMURA Koji,INAZUKI Yuichi,HIKICHI Ryugo,HARADA Saburou. Владелец: Dai Nippon Printing Co., Ltd.. Дата публикации: 2019-12-19.

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Номер патента: US20220373893A1. Автор: Wakabayashi Osamu,FUJII Koichi. Владелец: Gigaphoton Inc.. Дата публикации: 2022-11-24.

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Номер патента: JP3822101B2. Автор: 義之 横山,孝司 服部. Владелец: Renesas Technology Corp. Дата публикации: 2006-09-13.

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Номер патента: KR101906098B1. Автор: 이길수,하호철. Владелец: (주)오로스 테크놀로지. Дата публикации: 2018-10-10.

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Номер патента: JP5350594B2. Автор: 正光 伊藤. Владелец: Toshiba Corp. Дата публикации: 2013-11-27.

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Номер патента: JP6379292B2. Автор: 英明 椿,亘 二橋,徹 土橋. Владелец: Fujifilm Corp. Дата публикации: 2018-08-22.

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Номер патента: JP4256408B2. Автор: 帥現 姜. Владелец: Toshiba Corp. Дата публикации: 2009-04-22.

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Номер патента: JP5879229B2. Автор: 敏明 福原,明規 渋谷,祥平 片岡,知樹 松田,研由 後藤,渋谷　明規. Владелец: Fujifilm Corp. Дата публикации: 2016-03-08.

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Номер патента: JP4714930B2. Автор: 哲也 樋口,栄一 高橋,哲明 松縄,博和 野里,英徳 坂無. Владелец: National Institute of Advanced Industrial Science and Technology AIST. Дата публикации: 2011-07-06.

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Номер патента: TW202128839A. Автор: 嶋田和人,井上和臣,榎本雄一郎,佐藤直樹. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2021-08-01.

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Номер патента: JPH11224853A. Автор: Osamu Tanitsu,修 谷津,香葉 杉山,Kayo Sugiyama. Владелец: Nikon Corp. Дата публикации: 1999-08-17.

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Номер патента: JP7244401B2. Автор: 康信 小林,洋紀 菅原. Владелец: Canon Tokki Corp. Дата публикации: 2023-03-22.

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Номер патента: JP3633506B2. Автор: 晃司 菊地. Владелец: Sony Corp. Дата публикации: 2005-03-30.

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Номер патента: KR102126215B1. Автор: 테츠야 카미무라. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2020-06-24.

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Номер патента: US20070081139A1. Автор: Takashi Sato,Kazuya Fukuhara. Владелец: Toshiba Corp. Дата публикации: 2007-04-12.

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Номер патента: JPWO2017169587A1. Автор: 淳志 小湊,寿幸 鈴木,鈴木　寿幸. Владелец: Hoya Corp. Дата публикации: 2018-04-05.

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Номер патента: TW201734635A. Автор: Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2017-10-01.

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Номер патента: US20050058914A1. Автор: Shoji Mimotogi,Maki Miyazaki. Владелец: Toshiba Corp. Дата публикации: 2005-03-17.

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Номер патента: KR102206776B1. Автор: 히데아키 츠바키,와타루 니하시,토모타카 츠치무라,슈지 히라노,아키히로 카네코. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2021-01-25.

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Номер патента: JP3655576B2. Автор: 信一 伊藤. Владелец: Toshiba Corp. Дата публикации: 2005-06-02.

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Номер патента: US6573976B2. Автор: Hiroaki Takeishi. Владелец: Canon Inc. Дата публикации: 2003-06-03.

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Номер патента: EP1130467A2. Автор: Kikuchi Koji. Владелец: Sony Corp. Дата публикации: 2001-09-05.

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Номер патента: JP2019532488A. Автор: ボ・ユン・チェ,ミン・ス・チョン,ユ・ジン・キョン,クワン・ジュ・イ,ウ・ジェ・チョン,ビョン・ジュ・チェ. Владелец: エルジー・ケム・リミテッド. Дата публикации: 2019-11-07.

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Номер патента: TWI241628B. Автор: Shoji Mimotogi,Maki Miyazaki. Владелец: Toshiba Corp. Дата публикации: 2005-10-11.

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Номер патента: JP3673263B2. Автор: 正光 伊藤. Владелец: Toshiba Corp. Дата публикации: 2005-07-20.

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Номер патента: JP6720139B2. Автор: 野澤　順,順 野澤,淳志 小湊. Владелец: Hoya Corp. Дата публикации: 2020-07-08.

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Номер патента: JP5980957B2. Автор: 敏彦 折原,山田　剛之,剛之 山田,貴仁 西村. Владелец: Hoya Corp. Дата публикации: 2016-08-31.

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Номер патента: TWI534550B. Автор: 木內徹,水谷英夫. Владелец: 尼康股份有限公司. Дата публикации: 2016-05-21.

System, method and computer program for a scientific or surgical imaging system, scientific or surgical imaging system

Номер патента: EP4431005A1. Автор: GAO Yang,Charles Zhang,Alvin KOK,Zhen YE,Jiahao PAN,Qingsong Zou,Zheng-Dong ZENG,Gim Tong TEO. Владелец: Leica Instruments Singapore Pte Ltd. Дата публикации: 2024-09-18.

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Номер патента: US20240306904A1. Автор: GAO Yang,Charles Zhang,Alvin KOK,Zhen YE,Jiahao PAN,Qingsong Zou,Zheng-Dong ZENG,Gim Tong TEO. Владелец: Leica Instruments Singapore Pte Ltd. Дата публикации: 2024-09-19.

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Номер патента: US20040047117A1. Автор: Jing-Chang Jeng. Владелец: L A Sky Hawk Computers Inc. Дата публикации: 2004-03-11.

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Номер патента: US20210090243A1. Автор: ABE Yoichiro,KAWANISHI Norio. Владелец: . Дата публикации: 2021-03-25.

Inspection information management system, inspection information management method, and program for causing computer to execute the method

Номер патента: JP5604233B2. Автор: 航 松井,秀人 櫻井,真二 小助川,邦政 清水,貴吉 記内,悟朗 三浦,幸一朗 宮▲崎▼,保宏 浅井. Владелец: Fujifilm Corp. Дата публикации: 2014-10-08.

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Номер патента: US09485379B2. Автор: Masahiro Suzuki. Владелец: Kyocera Document Solutions Inc. Дата публикации: 2016-11-01.

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Номер патента: JP6444276B2. Автор: イェ ドゥ,孝夫 古林,泰祐 佐々木,裕弥 桜庭,有紀子 高橋,和博 宝野. Владелец: NATIONAL INSTITUTE FOR MATERIALS SCIENCE. Дата публикации: 2018-12-26.

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Номер патента: JP6718326B2. Автор: 亘 西,フィデル カストロ. Владелец: Mitsubishi Heavy Industries Ltd. Дата публикации: 2020-07-08.

Data-driven method and apparatus for handling user inquiries using collected data

Номер патента: US11928617B2. Автор: Hengbin CUI,Shaofei XUE,Jiaxing Zhang. Владелец: Alibaba Group Holding Ltd. Дата публикации: 2024-03-12.

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Номер патента: US20240202399A1. Автор: Hui ZENG,Ruijing Han. Владелец: Cansemi Technology Inc. Дата публикации: 2024-06-20.

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Номер патента: EP1912220B1. Автор: Kouichi Uchimura,So Fujii. Владелец: Sony Corp. Дата публикации: 2011-02-23.

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Номер патента: US12057148B2. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2024-08-06.

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Номер патента: US20240363143A1. Автор: Tetsuya Kaneko,Toru Nakao,Yoichi AKANO. Владелец: Fujifilm Corp. Дата публикации: 2024-10-31.

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Номер патента: US20150036169A1. Автор: Suzuki Masahiro. Владелец: KYOCERA Document Solutions Inc.. Дата публикации: 2015-02-05.

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Номер патента: TW200929207A. Автор: Yoshihisa Usami. Владелец: Fujifilm Corp. Дата публикации: 2009-07-01.

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Номер патента: EP4194144A4. Автор: Koji Yamashita,Taku Watanabe,Kyohei Ishida. Владелец: JFE Steel Corp. Дата публикации: 2024-01-10.

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Номер патента: EP2405431A1. Автор: Mohamed Karroumi. Владелец: Thomson Licensing SAS. Дата публикации: 2012-01-11.

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Номер патента: US8355560B2. Автор: Tadashi Mitsui. Владелец: Toshiba Corp. Дата публикации: 2013-01-15.

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Номер патента: JP6286227B2. Автор: 修平 山口,夏海 横川,孝太郎 高橋. Владелец: Fujifilm Corp. Дата публикации: 2018-02-28.

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Номер патента: KR102388701B1. Автор: 순페이 야마자키,세이지 야스모토,마사타카 사토,마사카츠 오노,히로키 아다치. Владелец: 가부시키가이샤 한도오따이 에네루기 켄큐쇼. Дата публикации: 2022-04-19.

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Номер патента: JP3926565B2. Автор: 浩二 須藤,芳明 柳田,和雄 横井,友一 杉山,照秋 西岡,俊介 曽根. Владелец: Fujitsu Ltd. Дата публикации: 2007-06-06.

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Номер патента: JP4405201B2. Автор: 明子 中村,慎一 五十嵐,正弘 北島. Владелец: National Institute of Japan Science and Technology Agency. Дата публикации: 2010-01-27.

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Номер патента: US20220184734A1. Автор: Kenichi Ohmori,Suk-Hwan Chung. Владелец: Japan Steel Works Ltd. Дата публикации: 2022-06-16.

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Номер патента: US11992896B2. Автор: Kenichi Ohmori,Suk-Hwan Chung. Владелец: JSW Aktina System Co Ltd. Дата публикации: 2024-05-28.

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Номер патента: US20240087853A1. Автор: Kazuhiko Nakamura. Владелец: Kioxia Corp. Дата публикации: 2024-03-14.

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Номер патента: US7785994B2. Автор: Hideki Okai. Владелец: Panasonic Corp. Дата публикации: 2010-08-31.

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Номер патента: US20200039317A1. Автор: Shigeru Kuroda. Владелец: NHK Spring Co Ltd. Дата публикации: 2020-02-06.

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Номер патента: US09892986B2. Автор: Xin Lu,Hideki Koshimizu,Yurika Araya. Владелец: Disco Corp. Дата публикации: 2018-02-13.

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Номер патента: US20130109156A1. Автор: Kyoko Okita. Владелец: Sumitomo Electric Industries Ltd. Дата публикации: 2013-05-02.

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Номер патента: US20190295901A1. Автор: Ikuo Motonaga. Владелец: Toshiba Electronic Devices and Storage Corp. Дата публикации: 2019-09-26.

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Номер патента: US20160052045A1. Автор: Atsushi Tomizawa,Hidehiro Arita,Masaaki Mizumura. Владелец: Nippon Steel and Sumitomo Metal Corp. Дата публикации: 2016-02-25.

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Номер патента: EP4032622A1. Автор: Yuko Takebayashi. Владелец: Dexerials Corp. Дата публикации: 2022-07-27.

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Номер патента: US20240165525A1. Автор: Koichi Nishino. Владелец: Epoch Co Ltd. Дата публикации: 2024-05-23.

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Номер патента: RU2528947C2. Автор: Эрвин М. А. МАТТИС. Владелец: ТП Вижн Холдинг Б.В.. Дата публикации: 2014-09-20.

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Номер патента: US20030146382A1. Автор: Hiroyuki Suzuki,YASUTSUGU Usami,Hiroyuki Shinada,Shuji Sugiyama,Atsuko Takafuji. Владелец: HITACHI LTD. Дата публикации: 2003-08-07.

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Номер патента: US11889198B2. Автор: Omar Ben Abdelaziz,Amine BEN MHAMED. Владелец: Faurecia Interieur Industrie SAS. Дата публикации: 2024-01-30.

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Номер патента: WO2023232887A1. Автор: Bengt Lindoff,Tord Wingren,Olof Hultin. Владелец: BrainLit AB. Дата публикации: 2023-12-07.

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Номер патента: EP4287776A1. Автор: Bengt Lindoff,Tord Wingren,Olof Hultin. Владелец: BrainLit AB. Дата публикации: 2023-12-06.

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Номер патента: US7184456B2. Автор: Chih-Sung Chang,Shu-Wei Chiu. Владелец: Epistar Corp. Дата публикации: 2007-02-27.

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Номер патента: US20050243880A1. Автор: Chih-Sung Chang,Shu-Wei Chiu. Владелец: Individual. Дата публикации: 2005-11-03.

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Номер патента: WO2008032866A1. Автор: Tadahiko Sakai,Kouji Motomura,Hideki Eifuku. Владелец: Panasonic Corporation. Дата публикации: 2008-03-20.

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Номер патента: US20090161328A1. Автор: Tadahiko Sakai,Kouji Motomura,Hideki Eifuku. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 2009-06-25.

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Номер патента: US20030155508A1. Автор: Hiroyuki Suzuki,YASUTSUGU Usami,Hiroyuki Shinada,Shuji Sugiyama,Atsuko Takafuji. Владелец: HITACHI LTD. Дата публикации: 2003-08-21.

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Номер патента: JP3929237B2. Автор: 啓介 吉國,洋司 當麻,章吾 塚田,敦司 上崎. Владелец: Hoya Corp. Дата публикации: 2007-06-13.

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Номер патента: JP5463536B2. Автор: 忠弘 大見,哲也 後藤,清隆 石橋,正広 桶作. Владелец: Hokuriku Seikei Industrial Co Ltd. Дата публикации: 2014-04-09.

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Номер патента: JP6594376B2. Автор: 翔吾 武藤. Владелец: Fujikura Ltd. Дата публикации: 2019-10-23.

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Номер патента: US20110229618A1. Автор: Tadahiro Ohmi,Hisayoshi Kobayashi. Владелец: Individual. Дата публикации: 2011-09-22.

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Номер патента: EP4431829A1. Автор: Kenichi Fujii,Takashi Kuroki,Sho Tamura,Yusuke YASUFUKU,Zongtao Cheng,Akinobu KUROKAWA. Владелец: JFE Steel Corp. Дата публикации: 2024-09-18.

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Номер патента: US20070194232A1. Автор: Atsushi Onishi,Yuichiro Yamazaki,Ichirota Nagahama. Владелец: Individual. Дата публикации: 2007-08-23.

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Номер патента: EP4400607A1. Автор: Yuki Kimura,Ryo Kawabata,Tomohiro Sugino,Hiroto Kase. Владелец: JFE Steel Corp. Дата публикации: 2024-07-17.

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Номер патента: US20240173796A1. Автор: Yasuhiro Adachi,Yasufumi Kawasuji,Akira SUWA. Владелец: GIGAPHOTON INC. Дата публикации: 2024-05-30.

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Номер патента: EP4414409A1. Автор: Noriyuki Kato,Kentaro Ishihara,Atsushi MOTEGI,Katsushi NISHIMORI,Shoko MURATA SUZUKI,Kazutaka Takamatsu. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2024-08-14.

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Номер патента: CA2421932C. Автор: Yasunori Matsufuji. Владелец: JAPAN SCIENCE AND TECHNOLOGY AGENCY. Дата публикации: 2008-08-05.

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Номер патента: US20240308127A1. Автор: Kazuhiro Horiuchi,Atsushi Nagasaki,Manabu OGIHARA. Владелец: Nissei ASB Machine Co Ltd. Дата публикации: 2024-09-19.

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Номер патента: NZ524640A. Автор: Yasunori Matsufuji. Владелец: Japan Science & Tech Agency. Дата публикации: 2006-04-28.

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Номер патента: US20240313094A1. Автор: Ayanori Gatto. Владелец: Mitsubishi Electric Corp. Дата публикации: 2024-09-19.

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Номер патента: US09941285B2. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2018-04-10.

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Номер патента: US20210057227A1. Автор: Akihiro Itou,Shogo Okita,Atsushi Harikai,Toshiyuki TAKASAKI. Владелец: Panasonic Intellectual Property Management Co Ltd. Дата публикации: 2021-02-25.

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Номер патента: CA3103195A1. Автор: Akito Yoshida,Yoichi Shimbo,Yuta Ozawa. Владелец: Mitsubishi Power Ltd. Дата публикации: 2019-12-19.

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Номер патента: EP4181176A1. Автор: Kazuma Matsui. Владелец: Resonac Corp. Дата публикации: 2023-05-17.

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Номер патента: US20180030561A1. Автор: Yuji Masuda,Yusuke Ishibashi,Shugo Iwasaki,Kosei KAWAHARA,Shinichiro Tokuyama. Владелец: Mitsubishi Heavy Industries Compressor Corp. Дата публикации: 2018-02-01.

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Номер патента: US10837071B2. Автор: Yuji Masuda,Yusuke Ishibashi,Shugo Iwasaki,Kosei KAWAHARA,Shinichiro Tokuyama. Владелец: Mitsubishi Heavy Industries Compressor Corp. Дата публикации: 2020-11-17.

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Номер патента: AU2021355246A9. Автор: Mitsuyoshi Tamura,Mitsuteru Yamada,Kisei Matsumoto,Yoshiya Maegawa,Koujun Utaka,Keishiro Yoshimori,Yuka ORIKASA,Ryouhei OKA. Владелец: DNP FINE CHEMICALS CO LTD. Дата публикации: 2024-07-25.

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Номер патента: US20240117280A1. Автор: Mai Sugawara,Yugeng Wu,Ivan Ryzhii. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2024-04-11.

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Номер патента: US11735431B2. Автор: Yusuke KASAHARA. Владелец: Kioxia Corp. Дата публикации: 2023-08-22.

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Номер патента: US09833854B2. Автор: Takashi Yuzawa,Tatsushi Sato,Hidetaka Miyake,Atsushi Itokazu. Владелец: Mitsubishi Electric Corp. Дата публикации: 2017-12-05.

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Номер патента: US09806566B2. Автор: Satoru Suzuki,Toshihiro Matsuura,Yoshinobu Nagao,Yukihide Ishino,Yoshihiro Adachi,Masaru Irie,Takashi Nagaya,Yoshitsugu Nakagawa. Владелец: Asmo Co Ltd. Дата публикации: 2017-10-31.

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Номер патента: US09707638B2. Автор: Hidetaka Miyake,Atsushi Itokazu. Владелец: Mitsubishi Electric Corp. Дата публикации: 2017-07-18.

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Номер патента: US09646868B2. Автор: Hiroyuki Yasuda,Michihiro Sugo,Masahito Tanabe,Shohei Tagami. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-05-09.

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Номер патента: US20200043835A1. Автор: Wataru Kobayashi,Takumi Nomura,Kazuki KODA. Владелец: Denso Corp. Дата публикации: 2020-02-06.

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Номер патента: EP4261039A1. Автор: Katsutoshi Aoki,Keito SATO,Shunsuke FUKUI,Gota KATAYANAGI. Владелец: Kao Corp. Дата публикации: 2023-10-18.

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Номер патента: US20240042746A1. Автор: Katsutoshi Aoki,Keito SATO,Shunsuke FUKUI,Gota KATAYANAGI. Владелец: Kao Corp. Дата публикации: 2024-02-08.

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Номер патента: EP3674034A1. Автор: Takashi Yoshimura,Takeshi Ebina,Koji YOKOE. Владелец: NSK LTD. Дата публикации: 2020-07-01.

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Номер патента: US20240282581A1. Автор: Masahiro Sakashita,Yousuke Hoshi,Yasuhiro Ichige,Shogo ARATA. Владелец: Resonac Corp. Дата публикации: 2024-08-22.

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Номер патента: US20240274416A1. Автор: Seungmin Lee,Inkook Jang,Suntaek LIM,Dongig OH,Jaesik An,Joohyun JEON,Thanh Cuong Nguyen. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-08-15.

Workpiece processing method and device chip manufacturing method

Номер патента: US20200185277A1. Автор: Yuki Ikeda,Toshiyuki Yoshikawa,Hideyuki Kawaguchi,Kenta Nakano,Senichi Ryo. Владелец: Disco Corp. Дата публикации: 2020-06-11.

Polishing solution, polishing method, component manufacturing method, and semiconductor component manufacturing method

Номер патента: EP4379779A1. Автор: Masahiro Sakashita,Yousuke Hoshi,Yasuhiro Ichige,Shogo ARATA. Владелец: Resonac Corp. Дата публикации: 2024-06-05.

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Номер патента: EP4379780A1. Автор: Yasuhiro Ichige,Shogo ARATA. Владелец: Resonac Corp. Дата публикации: 2024-06-05.

Substrate processing apparatus, substrate processing method, and semiconductor device manufacturing method

Номер патента: US20240087918A1. Автор: Katsuhiro Sato,Hiroshi Fujita,Tomohiko Sugita,Tatsuhiko Koide. Владелец: Kioxia Corp. Дата публикации: 2024-03-14.

Electronic substrate and its manufacturing method, electro-optical device manufacturing method, and electronic apparatus manufacturing method

Номер патента: TW200707901A. Автор: Nobuaki Hashimoto. Владелец: Seiko Epson Corp. Дата публикации: 2007-02-16.

Fin-Assembled Tube Manufacturing Method and Double Tube Manufacturing Method

Номер патента: US20200049427A1. Автор: Hiroyuki Oono. Владелец: Marelli Corp. Дата публикации: 2020-02-13.

Fuel cell cathode manufacturing method and fuel cell manufacturing method

Номер патента: US20070167313A1. Автор: Atsushi Sano,Satoshi Maruyama. Владелец: TDK Corp. Дата публикации: 2007-07-19.

Lens manufacturing method and coating liquid manufacturing method

Номер патента: US20100255193A1. Автор: Takamitsu Hirose,Takeshi Imizu. Владелец: Hoya Corp. Дата публикации: 2010-10-07.

Film-forming surface reforming method and semiconductor device manufacturing method

Номер патента: US20010029109A1. Автор: Takayoshi Azumi,Kazuo Maeda,Kiyotaka Sasaki,Setsu Suzuki. Владелец: CANON SALES Co AND SEMICONDUCTOR PROCESS LABORATORY Co Ltd. Дата публикации: 2001-10-11.

Conductor pattern forming method, and semiconductor device manufacturing method

Номер патента: US09466485B2. Автор: Keita Torii. Владелец: Canon Inc. Дата публикации: 2016-10-11.

SEMICONDUCTOR DEVICE INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Номер патента: US20190295901A1. Автор: Motonaga Ikuo. Владелец: . Дата публикации: 2019-09-26.

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Номер патента: JP7099939B2. Автор: 和浩 小林,博喜 井上. Владелец: Toyo Tire Corp. Дата публикации: 2022-07-12.

Glass plate cutting device, glass plate cutting method, and glass plate manufacturing method

Номер патента: TWI624438B. Автор: Akihiro Sasaki,Yoshihiro Shimizu,Hiroyuki Hattori,Kohei Yamasaki,Hidehito Iwasaki,Shigeyoshi Takuwa. Владелец: Asahi Glass Co Ltd. Дата публикации: 2018-05-21.

Battery cell activation method and battery cell manufacturing method comprising same

Номер патента: EP4064400A4. Автор: Gyu Ok HWANG. Владелец: LG Energy Solution Ltd. Дата публикации: 2023-11-29.

Absorption rotor, rotor element, absorption rotor manufacturing method, and rotor element manufacturing method

Номер патента: EP3501621A4. Автор: Katsuhiro Yamashita,Tomohiro Deguchi,Teruzi Yamazaki,Yusuke Chigira,Masahiro TSUZAKI. Владелец: Nichias Corp. Дата публикации: 2020-05-27.

Film forming method and semiconductor device manufacturing method

Номер патента: TW201003786A. Автор: Shintaro Aoyama,Kouji Shimomura,Genji Nakamura,Tetsuji Ueno. Владелец: Tokyo Electron Ltd. Дата публикации: 2010-01-16.

Ion implantation method and semiconductor device manufacturing method

Номер патента: TW200913021A. Автор: Hideki Okai. Владелец: Matsushita Electric Ind Co Ltd. Дата публикации: 2009-03-16.

Wiring layer dry etching method and semiconductor device manufacturing method

Номер патента: TW541579B. Автор: Kenji Kawai,Atsunori Nishiura,Ryoichi Yoshifuku. Владелец: Mitsubishi Electric Corp. Дата публикации: 2003-07-11.

Plasma etching method and semiconductor device manufacturing method

Номер патента: US20150187588A1. Автор: Takayuki Katsunuma,Kazuhiro Kubota,Masanobu Honda. Владелец: Tokyo Electron Ltd. Дата публикации: 2015-07-02.

Antenna manufacturing method and communication equipment manufacturing method

Номер патента: EP1786062A4. Автор: M Ito,Y Sasaki,H Shimizu,K Hiraide. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 2007-08-01.

Joining method, and joined structure manufacturing method

Номер патента: TW200906526A. Автор: Kazuo Aoki,Hayato Sato,Hisashi Hori,Nobushiro Seo,Tomohiro Komoto. Владелец: Nippon Light Metal Co. Дата публикации: 2009-02-16.

Fuel cell cathode manufacturing method and fuel cell manufacturing method

Номер патента: TW200618384A. Автор: Atsushi Sano,Satoshi Maruyama. Владелец: TDK Corp. Дата публикации: 2006-06-01.

Ball joint manufacturing method and stabilizer link manufacturing method

Номер патента: EP3604838A4. Автор: Shigeru Kuroda. Владелец: NHK Spring Co Ltd. Дата публикации: 2021-03-10.

Ball joint manufacturing method and stabilizer link manufacturing method

Номер патента: EP3604838B1. Автор: Shigeru Kuroda. Владелец: NHK Spring Co Ltd. Дата публикации: 2022-12-21.

Package, package manufacturing method and piezoelectric vibrator manufacturing method

Номер патента: TW201041196A. Автор: Takeshi Sugiyama. Владелец: Seiko Instr Inc. Дата публикации: 2010-11-16.

Rubber composition manufacturing method, and related tire manufacturing method

Номер патента: EP4201627B1. Автор: Sho Taniguchi. Владелец: Toyo Tire Corp. Дата публикации: 2024-07-17.

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Номер патента: TW200807492A. Автор: Tetsuro Takahashi,Jiro Katsuki,Shuuichi Ishizuka. Владелец: Tokyo Electron Ltd. Дата публикации: 2008-02-01.

Semiconductor-substrate manufacturing method and semiconductor-device manufacturing method in which germanium layer is heat-treated

Номер патента: US09647074B2. Автор: Tomonori Nishimura,Akira Toriumi,Choong-Hyun Lee. Владелец: JAPAN SCIENCE AND TECHNOLOGY AGENCY. Дата публикации: 2017-05-09.

Fine-particles synthesis method and electronic-component manufacturing method

Номер патента: EP2168919A1. Автор: Isao Nakahata,Tomoya Imura,Kiyoyuki Masuzawa,Jintao Huang. Владелец: TDK Corp. Дата публикации: 2010-03-31.

Polishing method, substrate manufacturing method, and electronic apparatus manufacturing method

Номер патента: EP2025468A2. Автор: Mitsuo Takeuchi,Fumihiko Tokura. Владелец: Fujitsu Ltd. Дата публикации: 2009-02-18.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US9780095B2. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-10-03.

Boron nitride film forming method and semiconductor device manufacturing method

Номер патента: US20170117145A1. Автор: Takahiro Miyahara. Владелец: Tokyo Electron Ltd. Дата публикации: 2017-04-27.

Etching method and element chip manufacturing method

Номер патента: US11817323B2. Автор: Akihiro Itou,Shogo Okita,Atsushi Harikai. Владелец: Panasonic Intellectual Property Management Co Ltd. Дата публикации: 2023-11-14.

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Номер патента: US20200063684A1. Автор: Akira Sato,Koichi Hatakeyama. Владелец: Teipi Industry Co Ltd. Дата публикации: 2020-02-27.

Thermoelectric cell, thermoelectric cell manufacturing method, and thermoelectric body manufacturing method

Номер патента: US20230329114A1. Автор: Sachiko Matsushita,Biao MEI. Владелец: Sanoh Industrial Co Ltd. Дата публикации: 2023-10-12.

Thermoelectric cell, thermoelectric cell manufacturing method, and thermoelectric body manufacturing method

Номер патента: US11737363B2. Автор: Sachiko Matsushita,Biao MEI. Владелец: Sanoh Industrial Co Ltd. Дата публикации: 2023-08-22.

Brazing sheet, brazing method, and heat exchanger manufacturing method

Номер патента: US20230080566A1. Автор: Hiroshi Kumagai,Masahiro ARIYAMA,Yohei Hatano. Владелец: Mahle Filter Systems Japan Corp. Дата публикации: 2023-03-16.

Semiconductor device, semiconductor device design method, and semiconductor device manufacturing method

Номер патента: US20230386983A1. Автор: Kenji Fujii,Hiroaki Matsubara,Taro Nishioka,Tomohira Kikuchi,Yoshizo OSUMI. Владелец: ROHM CO LTD. Дата публикации: 2023-11-30.

Heat exchanger, fin tube manufacturing method, and heat exchanger manufacturing method

Номер патента: US20240011722A1. Автор: JaeYoung Kim,Seungmo Jung,Hongseong Kim,Hanchoon Lee. Владелец: LG ELECTRONICS INC. Дата публикации: 2024-01-11.

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Номер патента: US20180305869A1. Автор: Hiroshi Tanaka,Shunichi Seki,Kaneo Yoda,Hiroki Kurata,Seiichi Taniguchi. Владелец: Seiko Epson Corp. Дата публикации: 2018-10-25.

Wafer processing method and device chip manufacturing method

Номер патента: US20240105513A1. Автор: Kazuma Sekiya. Владелец: Disco Corp. Дата публикации: 2024-03-28.

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Номер патента: EP4100202A1. Автор: Hiroshi Kumagai,Masahiro ARIYAMA,Yohei Hatano. Владелец: Mahle Filter Systems Japan Corp. Дата публикации: 2022-12-14.

Inert gas substituting method and ceramic structure manufacturing method using inert gas substituting method

Номер патента: US20180244584A1. Автор: Yoshiyuki Kamei,Takashi Goshima,Chikashi Ihara. Владелец: NGK Insulators Ltd. Дата публикации: 2018-08-30.

Inert gas substituting method and ceramic structure manufacturing method using inert gas substituting method

Номер патента: US10774009B2. Автор: Yoshiyuki Kamei,Takashi Goshima,Chikashi Ihara. Владелец: NGK Insulators Ltd. Дата публикации: 2020-09-15.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US20170352667A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-12-07.

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Номер патента: US20170243871A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-08-24.

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Номер патента: US20200058930A1. Автор: Noboru Yoshida,Makihiro Otohata. Владелец: NEC Corp. Дата публикации: 2020-02-20.

Temperature adjusting device, temperature adjusting method, and resin container manufacturing method

Номер патента: US12017399B2. Автор: Kazuhiro Horiuchi,Atsushi Nagasaki,Manabu OGIHARA. Владелец: Nissei ASB Machine Co Ltd. Дата публикации: 2024-06-25.

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Номер патента: US20130125517A1. Автор: GOMI Kazuya. Владелец: KABUSHIKI KAISHA YASKAWA DENKI. Дата публикации: 2013-05-23.

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Номер патента: US20210001638A1. Автор: Shibata Hiroyuki. Владелец: FUJIFILM Corporation. Дата публикации: 2021-01-07.

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Номер патента: US20170140974A1. Автор: TAKAMOTO Naohide,KIMURA Ryuichi. Владелец: NITTO DENKO CORPORATION. Дата публикации: 2017-05-18.

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Номер патента: JP6756423B1. Автор: 直子 住谷,智裕 京谷,栄治 出島,住谷　直子,友寛 加藤,毅 沢井. Владелец: Mitsubishi Chemical Corp. Дата публикации: 2020-09-16.

CMP abrasive, substrate polishing method and semiconductor device manufacturing method using the same, and additive for CMP abrasive

Номер патента: JP4729834B2. Автор: 誠人 吉田,寅之助 芦沢,直之 小山,浩二 芳賀,圭三 平井,洋一 町井. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2011-07-20.

CMP polishing liquid, and polishing method and semiconductor substrate manufacturing method using the same

Номер патента: JPWO2011058816A1. Автор: 深沢　正人,利明 阿久津,正人 深沢,茂 吉川,吉川　茂. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2013-03-28.

Electrode forming coating liquid, electrode and electrochemical element, and electrode forming coating liquid manufacturing method, electrode manufacturing method and electrochemical element manufacturing method

Номер патента: JP4184057B2. Автор: 雅人 栗原,鈴木　　忠,篤史 佐野,哲 丸山. Владелец: TDK Corp. Дата публикации: 2008-11-19.

Silica particles and their manufacturing method, silica sol, polishing composition, polishing method, semiconductor wafer manufacturing method and semiconductor device manufacturing method

Номер патента: JP6756422B1. Автор: 直子 住谷,智裕 京谷,栄治 出島,住谷　直子,友寛 加藤,毅 沢井. Владелец: Mitsubishi Chemical Corp. Дата публикации: 2020-09-16.

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Номер патента: KR100305415B1. Автор: 사토시 무라카미,다케시 니시,도시미쯔 고누마,아키라 수가와라,유키코 우에하라,미사코 나카자와. Владелец: 야마자끼 순페이. Дата публикации: 2001-11-22.

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Номер патента: JP6413978B2. Автор: 秀信 大屋,直人 新妻,大屋　秀信,正好 山内,小俣　猛憲,猛憲 小俣,圭一郎 鈴木. Владелец: KONICA MINOLTA INC. Дата публикации: 2018-10-31.

Semiconductor base and its manufacturing method, and semiconductor crystal manufacturing method

Номер патента: KR100677683B1. Автор: 다다토모가주유키,오카가와히로아키,오우치요이치로,고토마사히로. Владелец: 미츠비시 덴센 고교 가부시키가이샤. Дата публикации: 2007-02-05.

Substrate processing apparatus and method, and semiconductor device manufacturing method using the processing method

Номер патента: KR20210037318A. Автор: 박민섭,강성길,안상진,이영광,정찬영. Владелец: 삼성전자주식회사. Дата публикации: 2021-04-06.

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Номер патента: KR101453629B1. Автор: 료스께 아까기,아쯔시 이찌까와,하지메 이또,히로시 도도리끼. Владелец: 아사히 가라스 가부시키가이샤. Дата публикации: 2014-10-22.

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Номер патента: US11247483B2. Автор: Hiroyuki Shibata. Владелец: Fujifilm Corp. Дата публикации: 2022-02-15.

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Номер патента: US7504324B2. Автор: Hiroaki Okagawa,Kazuyuki Tadatomo,Yoichiro Ouchi,Masahiro Koto. Владелец: Mitsubishi Chemical Corp. Дата публикации: 2009-03-17.

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Номер патента: KR102284344B1. Автор: 자오송 리우,위엔쥔 쉬. Владелец: 선전 차이나 스타 옵토일렉트로닉스 세미컨덕터 디스플레이 테크놀로지 컴퍼니 리미티드. Дата публикации: 2021-08-04.

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Номер патента: CN1669148A. Автор: 小椋厚志. Владелец: NEC Corp. Дата публикации: 2005-09-14.

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Номер патента: US6127281A. Автор: Kiyofumi Sakaguchi,Kazutaka Yanagita. Владелец: Canon Inc. Дата публикации: 2000-10-03.

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Номер патента: JP6473889B2. Автор: 智洋 奥村,智志 末益,奥村　智洋. Владелец: Panasonic Intellectual Property Management Co Ltd. Дата публикации: 2019-02-27.

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Номер патента: US8845938B2. Автор: Takashi Shibata,Yasutaka Kato,Takashi Ochi,Akira Kishiro,Tomoko Ichikawa,Masafumi Ise. Владелец: TORAY INDUSTRIES INC. Дата публикации: 2014-09-30.

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Номер патента: JP6888401B2. Автор: 雅史 蔵本,蔵本　雅史,哲平 国宗. Владелец: Nichia Corp. Дата публикации: 2021-06-16.

Image forming device and method, abnormality nozzle detection method, and printed matter manufacturing method

Номер патента: JP6945060B2. Автор: 浩行 柴田. Владелец: Fujifilm Corp. Дата публикации: 2021-10-06.

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Номер патента: JPH073813B2. Автор: ポール・シー・エフ・トング. Владелец: サムスング・セミコンダクター・インコーポレイテッド. Дата публикации: 1995-01-18.

Supply and demand adjustment method and system, product manufacturing method

Номер патента: JP4559698B2. Автор: 周 山田,マイケル・オー・ボール,シェンィエン・ツァオ. Владелец: Toshiba Corp. Дата публикации: 2010-10-13.

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Номер патента: JP7024632B2. Автор: 範幸 長瀬,典久 土岐,達也 秋山. Владелец: SUMITOMO METAL MINING CO LTD. Дата публикации: 2022-02-24.

Nonaqueous ink composition, and recording method and recorded matter manufacturing method using same

Номер патента: WO2022071477A1. Автор: 貴生 松本,充功 田村,喜哉 前川,公淳 宇高,圭士郎 吉森,満輝 山田,由佳 折笠,良平 岡. Владелец: 株式会社Ｄｎｐファインケミカル. Дата публикации: 2022-04-07.

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Номер патента: US6063301A. Автор: Katsumi Suzuki,Itaru Nagai,Kazushige Umetsu,Kazunori Kiwada. Владелец: Seiko Epson Corp. Дата публикации: 2000-05-16.

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Номер патента: CN1933325A. Автор: 青木信也. Владелец: Seiko Epson Corp. Дата публикации: 2007-03-21.

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Номер патента: CN106960930A. Автор: 金容庆,徐东完,李璟姝. Владелец: Samsung SDI Co Ltd. Дата публикации: 2017-07-18.

Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising same

Номер патента: US6433346B1. Автор: Noriyuki Hirayanagi. Владелец: Nikon Corp. Дата публикации: 2002-08-13.

Image forming device and method, abnormality nozzle detection method, and printed matter manufacturing method

Номер патента: JPWO2019188911A1. Автор: 浩行 柴田. Владелец: Fujifilm Corp. Дата публикации: 2021-03-18.

Molten glass manufacturing device, molten glass manufacturing method, and sheet glass manufacturing method using the device and the method

Номер патента: CN102574719B. Автор: 市川敦,伊藤肇,赤木亮介,等等力宏. Владелец: Asahi Glass Co Ltd. Дата публикации: 2014-07-09.

Semiconductor substrate manufacturing method and semiconductor device manufacturing method, and semiconductor substrate and semiconductor device manufactured by the methods

Номер патента: WO2003096426A1. Автор: Atsushi Ogura. Владелец: NEC Corporation. Дата публикации: 2003-11-20.

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Номер патента: US10697069B2. Автор: Mikio SHINNO. Владелец: Toppan Printing Co Ltd. Дата публикации: 2020-06-30.

Pressure reducing and defoaming device for molten glass, molten glass manufacturing method, and glass product manufacturing method

Номер патента: WO2011145526A1. Автор: 和雄 浜島,健一 増田,渉 三好,道人 佐々木. Владелец: 旭硝子株式会社. Дата публикации: 2011-11-24.

Soldering Method and Semiconductor Module Manufacturing Method

Номер патента: US20090134204A1. Автор: Masahiko Kimbara. Владелец: Toyota Industries Corp. Дата публикации: 2009-05-28.

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Номер патента: US20200063685A1. Автор: Akira Sato,Koichi Hatakeyama. Владелец: Teipi Industry Co Ltd. Дата публикации: 2020-02-27.

Paste manufacturing method and flexible electrode manufacturing method using the same

Номер патента: US11787966B2. Автор: Phillip Lee,Seungjun Chung,Heesuk KIM,Hyunjoo CHO,Byeongmoon LEE,JeongGon SON,Jaikyeong KIM,Youngpyo Ko. Владелец: Korea Advanced Institute of Science and Technology KAIST. Дата публикации: 2023-10-17.

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Номер патента: US20190237323A1. Автор: Takehiro Nishimura,Chiaki DOUMOTO. Владелец: Kyocera Corp. Дата публикации: 2019-08-01.

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Номер патента: US20210202207A1. Автор: Shogo Okita,Atsushi Harikai. Владелец: Panasonic Intellectual Property Management Co Ltd. Дата публикации: 2021-07-01.

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Номер патента: US20090093120A1. Автор: Toshiyuki Hirota. Владелец: Elpida Memory Inc. Дата публикации: 2009-04-09.

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Номер патента: US10079209B2. Автор: Daiyu Kondo,Haruhisa Nakano. Владелец: Fujitsu Ltd. Дата публикации: 2018-09-18.

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Номер патента: US20150249034A1. Автор: Daiyu Kondo,Haruhisa Nakano. Владелец: Fujitsu Ltd. Дата публикации: 2015-09-03.

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Номер патента: US20230129351A1. Автор: Kouichi SEKIDO. Владелец: Tokyo Electron Ltd. Дата публикации: 2023-04-27.

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Номер патента: US7049223B2. Автор: Nobuo Hayasaka,Manabu Kimura,Keiichi Sasaki,Yoshimi Hisatsune. Владелец: Toshiba Corp. Дата публикации: 2006-05-23.

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Номер патента: US20010005632A1. Автор: Hideo Ichinose,Shoji Seta. Владелец: Toshiba Corp. Дата публикации: 2001-06-28.

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Номер патента: US20240032205A1. Автор: Hiroshi Komatsu. Владелец: Connectec Japan Corp. Дата публикации: 2024-01-25.

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Номер патента: US20140332503A1. Автор: Hidetaka Miyake,Atsushi Itokazu. Владелец: Mitsubishi Electric Corp. Дата публикации: 2014-11-13.

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Номер патента: US20230071592A1. Автор: Masakazu Kobayashi,Junichi Fujimoto,Kouji Kakizaki,Yasufumi Kawasuji,Akira SUWA. Владелец: GIGAPHOTON INC. Дата публикации: 2023-03-09.

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Номер патента: US20210230494A1. Автор: Akito Yoshida,Yoichi Shimbo,Yuta Ozawa. Владелец: Mitsubishi Power Ltd. Дата публикации: 2021-07-29.

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Номер патента: US20240096593A1. Автор: Toshiyuki Sasaki. Владелец: Kioxia Corp. Дата публикации: 2024-03-21.

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Номер патента: US20130109156A1. Автор: Okita Kyoko. Владелец: Sumitomo Electric Industries, Ltd.. Дата публикации: 2013-05-02.

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Номер патента: US20200002799A1. Автор: Hamaya Noriaki,UEHARA Ichiro. Владелец: SHIN-ETSU CHEMICAL CO., LTD.. Дата публикации: 2020-01-02.

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Номер патента: US20220032404A1. Автор: SEKIYA Kazuma. Владелец: . Дата публикации: 2022-02-03.

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Номер патента: US20170016334A1. Автор: MATSUNAMI Yasuo,Okuda Takehisa,MACHIDA Motonari. Владелец: . Дата публикации: 2017-01-19.

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Номер патента: US20180037971A1. Автор: Nakai Osamu,Higuchi Hirotaka,Ohara Go,Imamura Masaki. Владелец: . Дата публикации: 2018-02-08.

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Номер патента: US20190112699A1. Автор: SHINNO Mikio. Владелец: . Дата публикации: 2019-04-18.

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Номер патента: US20170117145A1. Автор: MIYAHARA Takahiro. Владелец: . Дата публикации: 2017-04-27.

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Номер патента: US20170120384A1. Автор: MATSUNAMI Yasuo,Okuda Takehisa,MACHIDA Motonari. Владелец: . Дата публикации: 2017-05-04.

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Номер патента: US20140217156A1. Автор: Shinkai Masayoshi,MUTO Aya. Владелец: Mitsubishi Electric Corporation. Дата публикации: 2014-08-07.

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Номер патента: US20140295065A1. Автор: Tomomi Sato,Tsutomu Komuro. Владелец: Fujitsu Ltd. Дата публикации: 2014-10-02.

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Номер патента: US20150214123A1. Автор: Shimizu Yuichi. Владелец: . Дата публикации: 2015-07-30.

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Номер патента: US20170207026A1. Автор: GOTO Seiji,IWAKOSHI Kunio. Владелец: MURATA MANUFACTURING CO., LTD.. Дата публикации: 2017-07-20.

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Номер патента: US20150249034A1. Автор: Kondo Daiyu,NAKANO Haruhisa. Владелец: FUJITSU LIMITED. Дата публикации: 2015-09-03.

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Номер патента: US20190237323A1. Автор: Takehiro Nishimura,Chiaki DOUMOTO. Владелец: Kyocera Corp. Дата публикации: 2019-08-01.

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Номер патента: US20180265651A1. Автор: KUNISHIMA Takeshi. Владелец: JTEKT CORPORATION. Дата публикации: 2018-09-20.

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Номер патента: US20170352667A1. Автор: CHUN Jae-Houb,LIM Jeong-Sub. Владелец: . Дата публикации: 2017-12-07.

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Номер патента: JP3892846B2. Автор: 学 南幅,大 福島,進 山本,博之 矢野. Владелец: Toshiba Corp. Дата публикации: 2007-03-14.

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Номер патента: JP4372173B2. Автор: 学 南幅,博之 矢野,之輝 松井,岳 西岡. Владелец: Toshiba Corp. Дата публикации: 2009-11-25.

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Номер патента: JP4012180B2. Автор: 学 南幅,博之 矢野,之輝 松井. Владелец: Toshiba Corp. Дата публикации: 2007-11-21.

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Номер патента: JPWO2008117573A1. Автор: 裕貴 仕田,彰浩 竹村,池田　正俊,正俊 池田. Владелец: JSR Corp. Дата публикации: 2010-07-15.

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Номер патента: JP3748410B2. Автор: 学 南幅,延行 倉嶋,博之 矢野. Владелец: Toshiba Corp. Дата публикации: 2006-02-22.

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Номер патента: JP5897200B2. Автор: 久典 丹所,公亮 土屋,真希 浅田,裕介 須賀. Владелец: Fujimi Inc. Дата публикации: 2016-03-30.

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Номер патента: JP3660511B2. Автор: 学 南幅,賢朗 中村,壮男 窪田. Владелец: Toshiba Corp. Дата публикации: 2005-06-15.

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Номер патента: JP6198384B2. Автор: 上村　　哲也,正 稲葉,篤史 水谷,上村　哲也,良典 西脇,稲葉　正. Владелец: Fujifilm Corp. Дата публикации: 2017-09-20.

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Номер патента: AU2792797A. Автор: Seiichi Kondo,Yoshio Homma,Noriyuki Sakuma. Владелец: HITACHI LTD. Дата публикации: 1998-12-30.

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Номер патента: WO2022045866A1. Автор: 한덕수,권장국,박한터,홍승철. Владелец: 에스케이씨솔믹스 주식회사. Дата публикации: 2022-03-03.

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Номер патента: US20220367112A1. Автор: Hirai Yoshiki. Владелец: . Дата публикации: 2022-11-17.

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Номер патента: JP4323577B2. Автор: 清文 坂口,隆夫 米原,和明 近江,一隆 柳田. Владелец: Canon Inc. Дата публикации: 2009-09-02.

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Номер патента: JP5446126B2. Автор: 元伸 佐藤. Владелец: Fujitsu Semiconductor Ltd. Дата публикации: 2014-03-19.

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Номер патента: JP4204419B2. Автор: 雅人 栗原,鈴木　　忠,哲 丸山. Владелец: TDK Corp. Дата публикации: 2009-01-07.

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Номер патента: KR101966674B1. Автор: 토모노리 타카하시,나오츠구 무로,테츠야 시미즈,아키코 요시이,사토미 타카하시. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-04-09.

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Номер патента: JP4558413B2. Автор: 茂次 村松,正宏 経塚,幹幸 小松. Владелец: Shinko Electric Industries Co Ltd. Дата публикации: 2010-10-06.

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Номер патента: KR100372980B1. Автор: 겐조 하나와,나오요시 모치즈키,나루오 우에다,가즈히코 가토. Владелец: 미츠이 긴조쿠 고교 가부시키가이샤. Дата публикации: 2003-05-09.

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Номер патента: JP3876167B2. Автор: 克典 鈴木. Владелец: Kawasaki Microelectronics Inc. Дата публикации: 2007-01-31.

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Номер патента: JP4745038B2. Автор: 厚 重田,壮男 窪田,かおり 艾原,亮 本多,弘和 江澤. Владелец: Toshiba Corp. Дата публикации: 2011-08-10.

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Номер патента: KR101321621B1. Автор: 도모코 이치카와,다카시 오치,아키라 기시로,야스타카 가토,다카시 시바타,마사후미 이세. Владелец: 도레이 카부시키가이샤. Дата публикации: 2013-10-29.

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Номер патента: JP3787410B2. Автор: 篤志 塩崎. Владелец: Canon Inc. Дата публикации: 2006-06-21.

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Номер патента: JP5100032B2. Автор: 康雄 田中. Владелец: Lapis Semiconductor Co Ltd. Дата публикации: 2012-12-19.

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Номер патента: US20030040198A1. Автор: Masaaki Ueno,Minoru Nakano. Владелец: HITACHI KOKUSAI ELECTRIC INC. Дата публикации: 2003-02-27.

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Номер патента: JPH10189527A. Автор: Tomokazu Kawamoto,智一 川本,慎二 ▲葛▼谷,Shinji Kuzutani. Владелец: Fujitsu Ltd. Дата публикации: 1998-07-21.

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Номер патента: JP2009277772A. Автор: 元伸 佐藤,Motonobu Sato. Владелец: Fujitsu Semiconductor Ltd. Дата публикации: 2009-11-26.

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Номер патента: JP4867216B2. Автор: 照夫 瀧澤,啓 金本. Владелец: Seiko Epson Corp. Дата публикации: 2012-02-01.

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Номер патента: JP3912318B2. Автор: 雅邦 塩澤. Владелец: Seiko Epson Corp. Дата публикации: 2007-05-09.

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Номер патента: JP4737502B2. Автор: 正人 土居,秋彦 渡辺. Владелец: Sony Corp. Дата публикации: 2011-08-03.

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Номер патента: JPWO2014054611A1. Автор: 一誠 玉井,均 森永,舞子 浅井,玉井　一誠,裕 庭野. Владелец: Fujimi Inc. Дата публикации: 2016-08-25.

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Номер патента: JP4355785B2. Автор: 光 小林. Владелец: 光 小林. Дата публикации: 2009-11-04.

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Номер патента: JP4822103B2. Автор: 正典 小林,治彦 楠瀬,克宜 中嶋,博基 宮井,弘修 鈴木. Владелец: Lasertec Corp. Дата публикации: 2011-11-24.

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Номер патента: US20120214317A1. Автор: . Владелец: HITACHI KOKUSAI ELECTRIC INC.. Дата публикации: 2012-08-23.

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