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Positive type resist composition and resist pattern formation method using same

Номер патента: US20060134552A1
Опубликовано: 22-06-2006
Автор(ы): Hideo Hada, Miwa Miyairi, Naotaka Kubota, Satoshi Fujimura, Takeshi Iwai
Принадлежит: Tokyo Ohka Kogyo Co Ltd
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Wash resistant compositions containing aminosilicone

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Positive-type non-return valve

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Underwater antifouling agent composition, and hull, fishing net and underwater structure antifouling treatment method using the same

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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

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Ultrasonic diagnostics technique for position type of acromial process with respect to head of humerus

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Novel composition and methods for the treatment of psoriasis

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Taxane Compounds, Compositions And Methods

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Method of stabilisation of electroplated chrome coating of barrels of automatic small arms, and shaft-type resistance furnace for its implementation

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