A cleaning method and associated illumination source metrology apparatus
Номер патента: EP4330768A1
Опубликовано: 06-03-2024
Автор(ы): Adrianus Johannes Hendrikus SCHELLEKENS, Andrey Nikipelov, David O'DWYER, Gosse Charles De Vries, Petrus Wilhelmus SMORENBURG, Sjoerd Nicolaas Lambertus Donders, Stephen Edward
Принадлежит: ASML Netherlands BV
Опубликовано: 06-03-2024
Автор(ы): Adrianus Johannes Hendrikus SCHELLEKENS, Andrey Nikipelov, David O'DWYER, Gosse Charles De Vries, Petrus Wilhelmus SMORENBURG, Sjoerd Nicolaas Lambertus Donders, Stephen Edward
Принадлежит: ASML Netherlands BV
Реферат: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.
Illumination source and associated metrology apparatus
Номер патента: US12044951B2. Автор: Petrus Wilhelmus SMORENBURG,Nan Lin,Wenjie JIN,Christina Lynn PORTER. Владелец: ASML Netherlands BV. Дата публикации: 2024-07-23.