Polishing pad, conditioner and method for polishing the same
Номер патента: MY135978A
Опубликовано: 31-07-2008
Автор(ы): KIM Geon, Kim Jae Seok, KIM Sung Min, Lee Hyun Woo, LEE Jong Myung, Lee Ju Yeol, Park In Ha, Song Eu Gene
Принадлежит: SKC Co Ltd
Опубликовано: 31-07-2008
Автор(ы): KIM Geon, Kim Jae Seok, KIM Sung Min, Lee Hyun Woo, LEE Jong Myung, Lee Ju Yeol, Park In Ha, Song Eu Gene
Принадлежит: SKC Co Ltd
Реферат: THE PRESENT INVENTION RELATES TO A POLISHING PAD FOR PERFORMING EFFECTIVE POLISHING AND CONDITIONING IN A CHEMICAL MECHANICAL POLISHING (HEREINAFTER REFERRED TO AS 'CMP'), A CONDITIONER SUITABLE FOR THE POLISHING PAD, AND A CMP PROCESS USING THE POLISHING PAD AND THE CONDITIONER.(FIG 2)
Polishing pad, polishing unit, polishing device, and method for manufacturing polishing pad
Номер патента: US20230173637A1. Автор: Hiroshi Kurihara,Teppei Tateno,Ryuma Matsuoka,Yamato TAKAMIZAWA,Satsuki Narushima. Владелец: Fujibo Holdins Inc. Дата публикации: 2023-06-08.