GATE SPACER STRUCTURES AND METHODS FOR FORMING THE SAME.

GATE SPACER STRUCTURES AND METHODS FOR FORMING THE SAME

Номер патента: US20200251571A1
Опубликовано: 06-08-2020
Автор(ы): Lin Yu-Ming, MORE Shahaji B., TSAI Chun Hsiung, Wann Clement Hsingjen, Yeh Ming-Hsi, Yu Kuo-Feng
Принадлежит: Taiwan Semiconductor Manufacturing Co., Ltd.
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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