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Charged Particle Beam Device, Autofocus Processing Method of Charged Particle Beam Device, and Detector

Номер патента: US20220044906A1
Опубликовано: 10-02-2022
Автор(ы): Michio Hatano, Mitsuhiro Nakamura
Принадлежит: Hitachi High Tech Corp
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Apparatus of charged-particle beam such as electron microscope comprising co-condensers for continuous image resolution tuning

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Scanning charged particle microscope

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System and method for resolution improvement of charged particles microscopy

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Charged particle beam system with optical microscope

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Method for inspecting a specimen with an array of primary charged particle beamlets, charged particle beam device for inspection of a specimen with an array of primary charged particle beamlets, and multi-column microscope for inspection of a specimen

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Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method

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CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD

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Charged particle radiation apparatus

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Defective pixel management in charged particle microscopy

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Scanning charged-particle-beam microscopy with energy-dispersive x-ray spectroscopy

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