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Integrated circuit, system and method of forming the same

Номер патента: US20240276696A1
Опубликовано: 15-08-2024
Автор(ы): Kao-Cheng LIN, Wei Min Chan, Yen Lin CHUNG CHUNG, Yen-Huei Chen
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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