Photosensitive composition and pattern forming method using same.

Photosensitive composition and pattern forming method using same

Номер патента: JPS6413540A
Опубликовано: 18-01-1989
Автор(ы): Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Seiji Miura, Yoshiyuki Odaka
Принадлежит: HITACHI LTD

Рисунок 1. Взаимосвязь патентов (ближайшие 20).

Photosensitive compositions and pattern formation method

Номер патента: US20010003633A1. Автор: Masaharu Watanabe,Noriaki Tochizawa,Hirotaka Tagoshi,Tetsuhiko Yamaguchi. Владелец: Individual. Дата публикации: 2001-06-14.

Photosensitive composition

Номер патента: US4229514A. Автор: Yoshio Kurita,Akio Iwaki. Владелец: KONICA MINOLTA INC. Дата публикации: 1980-10-21.

High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition

Номер патента: US4741986A. Автор: Andre Collet,Serge Gourrier,Olivier Maurin. Владелец: US Philips Corp. Дата публикации: 1988-05-03.

Photosensitive composition

Номер патента: US4442196A. Автор: Noriyasu Kita,Akio Iwaki,Hiroyoshi Yamaguchi,Tatsuya Sasazawa. Владелец: KONICA MINOLTA INC. Дата публикации: 1984-04-10.

Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition

Номер патента: US20140287363A1. Автор: Kaoru Iwato,Akinori Shibuya. Владелец: Fujifilm Corp. Дата публикации: 2014-09-25.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same

Номер патента: US20130078426A1. Автор: Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi,Kosuke KOSHIJIMA. Владелец: Fujifilm Corp. Дата публикации: 2013-03-28.

Photosensitive compositions container polyvinyl alchool and their use in printing processes

Номер патента: EP2185976A1. Автор: Maurizio Stefano Galimberti,Franco Fattorini,Angela Lostritto,Vittorio Beretti. Владелец: KIIAN SpA. Дата публикации: 2010-05-19.

Photosensitive composition

Номер патента: US4123276A. Автор: Nobuyuki Kita,Yasuhisa Narutomi. Владелец: National Patent Development Corp. Дата публикации: 1978-10-31.

Onium salt, chemically amplified positive resist composition, and resist pattern forming process

Номер патента: US20240280900A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-08-22.

Resist composition, and resist film, pattern forming method, and electronic device manufacturing method using the same

Номер патента: JPWO2017056928A1. Автор: 修史平野,年哉高橋,英宏望月,直也下重,暁 ▲高▼田. Владелец: Fujifilm Corp. Дата публикации: 2018-01-18.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION

Номер патента: US20130136900A1. Автор: Shibuya Akinori,IWATO Kaoru. Владелец: FUJIFILM Corporation. Дата публикации: 2013-05-30.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION

Номер патента: US20140287363A1. Автор: Shibuya Akinori,IWATO Kaoru. Владелец: . Дата публикации: 2014-09-25.

Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition

Номер патента: US20180210339A1. Автор: Shuji Hirano,Akira Takada,Hidehiro Mochizuki,Toshiya Takahashi,Naoya SHIMOJU. Владелец: Fujifilm Corp. Дата публикации: 2018-07-26.

Radiation curable resin composition and rapid three-dimensional image forming method using the same

Номер патента: JP5167496B2. Автор: パウルス、アントニウス、マリア、ステーマン,ベールト、ヤコブス、ケーストラ,マルコ、マルクス、マテウス、ドリーッセン,デブラ、リン、フィッシュ、レプコ,メルビン、ズスマン. Владелец: DSM IP ASSETS BV. Дата публикации: 2013-03-21.

Negative-type photosensitive resin composition and method for producing polyimide and cured relief pattern using same

Номер патента: TW202100570A. Автор: 平田竜也,村上航平,藤岡孝亘. Владелец: 日商旭化成股份有限公司. Дата публикации: 2021-01-01.

Photosensitive resin composition and method for pattern forming

Номер патента: US20080311512A1. Автор: Takahiro Senzaki,Atsushi Yamanouchi,Junzo Yonekura,Koji Saito. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2008-12-18.

Radiation sensitive resin composition, and interlayer insulating film and forming method thereof

Номер патента: KR101669085B1. Автор: 마사아키 하나무라,히로유키 마루야마,카츠야 나가야. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2016-10-25.

Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Номер патента: US11573491B2. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2023-02-07.

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

Номер патента: US20070196766A1. Автор: Kenji Wada. Владелец: Fujifilm Corp. Дата публикации: 2007-08-23.

Composition for resist underlayer, and pattern forming method using same

Номер патента: US12130552B2. Автор: Minsoo Kim,Jaeyeol Baek,Soonhyung Kwon,Hyeon Park,Shinhyo Bae,Yoojeong Choi. Владелец: Samsung SDI Co Ltd. Дата публикации: 2024-10-29.

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

Номер патента: EP1736824A2. Автор: Kenji Wada. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-12-27.

Composition for forming fine resist pattern and pattern forming method using same

Номер патента: US09448485B2. Автор: Masahiro Ishii,Takashi Sekito,Tetsuo Okayasu. Владелец: Merck Patent GmBH. Дата публикации: 2016-09-20.

Positive resist composition and pattern forming method

Номер патента: EP2140306A1. Автор: Hiromi Kanda,Shinichi Kanna,Toshiaki Fukuhara. Владелец: Fujifilm Corp. Дата публикации: 2010-01-06.

Photosensitive composition for euv light, pattern formation method, and method for manufacturing electronic device

Номер патента: EP3783434A1. Автор: Hironori Oka,Michihiro Shirakawa,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2021-02-24.

Photosensitive composition for euv light, pattern formation method, and method for manufacturing electronic device

Номер патента: EP3783434A8. Автор: Hironori Oka,Michihiro Shirakawa,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2021-04-14.

Positive resist composition and pattern forming method using the same

Номер патента: US7338744B2. Автор: Hideaki Tsubaki,Shinji Tarutani. Владелец: Fujifilm Corp. Дата публикации: 2008-03-04.

Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device

Номер патента: US09488911B2. Автор: Tomotaka Tsuchimura,Kyouhei SAKITA. Владелец: Fujifilm Corp. Дата публикации: 2016-11-08.

Gap filling composition and pattern forming method using composition containing polymer

Номер патента: US20200319556A1. Автор: Tatsuro Nagahara,Xiaowei Wang. Владелец: AZ Electronic Materials SARL. Дата публикации: 2020-10-08.

Negative-type photosensitive composition for euv light, pattern forming method, and manufacturing method of electronic device

Номер патента: EP3779596A1. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2021-02-17.

Negative tone photosensitive composition for euv light, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210011380A1. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2021-01-14.

Photosensitive composition for euv light, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210011377A1. Автор: Hironori Oka,Michihiro Shirakawa,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2021-01-14.

Method for testing photosensitive composition and method for producing photosensitive composition

Номер патента: US20240280362A1. Автор: Kei Yamamoto,Satomi Takahashi,Michihiro Shirakawa,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2024-08-22.

Chain transfer agent, photosensitive composition, cured product of photosensitive composition, and method for curing photosensitive composition

Номер патента: US09611337B2. Автор: Makoto Mizoguchi,Tatsuya Hase. Владелец: Kyushu University NUC. Дата публикации: 2017-04-04.

Method for testing photosensitive composition and method for producing photosensitive composition

Номер патента: US20240231235A1. Автор: Kei Yamamoto,Michihiro Shirakawa,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2024-07-11.

Resist composition and pattern forming method using the same

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Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Номер патента: US20120301831A1. Автор: Toru Fujimori,Kana Fujii,Takamitsu Tomica. Владелец: Fujifilm Corp. Дата публикации: 2012-11-29.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Номер патента: EP2545412A1. Автор: Takamitsu Tomiga,Toru Fujimori,Kana Fujii. Владелец: Fujifilm Corp. Дата публикации: 2013-01-16.

Analysis method of photosensitive composition, production method of photosensitive composition, and manufacturing method of electronic device

Номер патента: US20240280518A1. Автор: Tetsuya Kamimura,Hideo Nagasaki. Владелец: Fujifilm Corp. Дата публикации: 2024-08-22.

Positive photosensitive composition, pattern using same, and method of manufacturing pattern

Номер патента: US20190294044A1. Автор: Taiki Mihara,Naomi Sato,Junya MIYAKE. Владелец: Adeka Corp. Дата публикации: 2019-09-26.

Positive type photosensitive siloxane composition and cured film formed by using the same

Номер патента: SG11201909268PA. Автор: Megumi Takahashi,Naofumi Yoshida,Katsuto Taniguchi. Владелец: Merck Patent GmBH. Дата публикации: 2019-11-28.

Photosensitive composition

Номер патента: EP4401983A1. Автор: William Wolf,Kangtai Ren,Jeffrey Klang,Richard PLENDERLEITH,Jonathan Andersson,Ali AHMARI. Владелец: Arkema France SA. Дата публикации: 2024-07-24.

Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same

Номер патента: US20170115562A1. Автор: Shin Ae Jun,Shang Hyeun Park,JongGi Kim,Hojeong PAEK. Владелец: Samsung SDI Co Ltd. Дата публикации: 2017-04-27.

Negative-working photosensitive composition and negative-working photosensitive planographic printing plate

Номер патента: EP1535114A2. Автор: Eiji Hayakawa,Y. c/o Kodak Polychrome Graphics Japan MIYAMOTO. Владелец: Kodak Graphic Communications Japan Ltd. Дата публикации: 2005-06-01.

Binder composition and photosensitive composition including the same

Номер патента: US20100148134A1. Автор: Mikyong Yoo. Владелец: Individual. Дата публикации: 2010-06-17.

Photosensitive composition, and cured film

Номер патента: US20240160104A1. Автор: Naoki Watanabe,Hiroaki Imoto,Kensuke Naka,Kimihiro Matsukawa. Владелец: JNC Corp. Дата публикации: 2024-05-16.

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

Номер патента: US09709891B2. Автор: Hiromi Kanda,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2017-07-18.

Organometallic compound, resist composition including the same and pattern forming method using the same

Номер патента: EP4393925A1. Автор: Yoonhyun Kwak,Hasup LEE,Kyuhyun IM,Haengdeog Koh,Jaejun Lee,Sunghyun HAN,Sukkoo Hong,Mijeong Kim,Kyungoh KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

Organometallic compound, resist composition including the same and pattern forming method using the same

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Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

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Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

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Photosensitive compositions and applications thereof

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Composition for resist underlayer, and pattern forming method using same

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Display element, photosensitive composition and electrowetting display

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Display element, photosensitive composition and electrowetting display

Номер патента: US09625706B2. Автор: Yoshinori Kinoshita,Toshiharu Araki,Kazunari Kudou. Владелец: JSR Corp. Дата публикации: 2017-04-18.

Photosensitive composition, transfer film, pattern forming method, method for manufacturing circuit wiring, and method for manufacturing touch panel

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Actinic ray-sensitive or radiation-sensitive resing composition, actinic ray-sensitive or radiation-sensitive film using the composition, and pattern forming method

Номер патента: US20140170564A1. Автор: Akinori Shibuya,Tomoki Matsuda,Yoko TOKUGAWA. Владелец: Fujifilm Corp. Дата публикации: 2014-06-19.

Organic anti-reflective coating composition and pattern forming method using the same

Номер патента: US20050014094A1. Автор: Sam Kim,Geun Lee. Владелец: Hynix Semiconductor Inc. Дата публикации: 2005-01-20.

Negative type photosensitive composition curable at low temperature

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Actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, resin, and method for manufacturing resin

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Photosensitive composition, cured product, display device, electronic component, and method for producing cured product

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Resist composition and pattern forming process

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Photosensitive composition, film, color filter, solid-state imaging element, and image display device

Номер патента: US20240310728A1. Автор: Takashi Kawashima,Kazuya Oota. Владелец: Fujifilm Corp. Дата публикации: 2024-09-19.

Positive resist composition and pattern forming method using the resist composition

Номер патента: EP1693705B1. Автор: Yasutomo Kawanishi. Владелец: Fujifilm Corp. Дата публикации: 2014-01-22.

Photosensitive composition, cured film, pattern forming method, color filter, solid-state imaging element, and image display device

Номер патента: US20190212644A1. Автор: Yoshinori Taguchi,Hiroyuki Morishita,Kazuya Oota,Akiko YOSHII. Владелец: Fujifilm Corp. Дата публикации: 2019-07-11.

Photosensitive composition, cured film, optical filter, solid image pickup element, image display device, and infrared sensor

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Positive resist composition and pattern forming method using the same

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Treatment liquid and pattern forming method

Номер патента: US20180217503A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

Treatment liquid and pattern forming method

Номер патента: US20210200097A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2021-07-01.

Treatment liquid and pattern forming method

Номер патента: US20180217499A1. Автор: Shuji Hirano,Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

Pattern forming method and pattern forming apparatus

Номер патента: US20140300018A1. Автор: Ikuo Yoneda. Владелец: Toshiba Corp. Дата публикации: 2014-10-09.

Pattern forming method and pattern forming apparatus

Номер патента: US20160318234A1. Автор: Ikuo Yoneda. Владелец: Toshiba Corp. Дата публикации: 2016-11-03.

Method of forming plated product using negative photoresist composition and photosensitive composition used therein

Номер патента: EP1761823A1. Автор: Yasuo Tokyo Ohka Kogyo Co. Ltd. MASUDA,Yasushi Tokyo Ohka Kogyo Co. Ltd. WASHIO,Koji Tokyo Ohka Kogyo Co. Ltd. SAITO. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2007-03-14.

Photosensitive composition comprising inorganic particle

Номер патента: US20240280904A1. Автор: Changmin Lee,Soung Yun MUN,Jun Bae,Jin Hyun Kim,Jun Ki Kim,Yun Jong KO,Younghoon KANG. Владелец: DukSan Neolux Co Ltd. Дата публикации: 2024-08-22.

Negative type photosensitive composition curable at low temperature

Номер патента: US20210208503A1. Автор: Daishi Yokoyama,Katsuto Taniguchi,Masahiro Kuzawa,Motoki Misumi. Владелец: AZ Electronic Materials SARL. Дата публикации: 2021-07-08.

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

Номер патента: EP1975718A2. Автор: Hideaki Tsubaki,Wataru HOSHINO,Masahiro Yoshidome. Владелец: Fujifilm Corp. Дата публикации: 2008-10-01.

Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric

Номер патента: US20050287469A1. Автор: Hideki Matsuo,Tatsuro Nagahara. Владелец: Individual. Дата публикации: 2005-12-29.

Photosensitive composition and calcined pattern obtained by use thereof

Номер патента: US6103452A. Автор: Masahisa Kakinuma,Kouichi Takagi,Ooki Tomobe. Владелец: Taiyo Ink Mfg Co Ltd. Дата публикации: 2000-08-15.

Photosensitive composition and photosensitive lithographic printing plate material

Номер патента: US20130022927A1. Автор: Akira Furukawa,Takahiro Hagihara. Владелец: Mitsubishi Paper Mills Ltd. Дата публикации: 2013-01-24.

Negative photosensitive composition and pattern formation method

Номер патента: US20240045330A1. Автор: Takahiro Kondo,Hirofumi Imai,Shota Katayama,Kenichi Yamagata. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2024-02-08.

Method of preserving photosensitive composition

Номер патента: US6531521B2. Автор: Koji Baba,Toshiya Inoue,Shigeo Hozumi. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2003-03-11.

Negative type photosensitive composition comprising black colorant

Номер патента: US20220260913A1. Автор: Seishi SHIBAYAMA,Atsuko Noya,Daishi YOKOHAMA. Владелец: Individual. Дата публикации: 2022-08-18.

Resist composition and pattern forming process

Номер патента: US20240310727A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-09-19.

Onium salt, resist composition, and pattern forming process

Номер патента: US20240361688A1. Автор: Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-31.

Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same composition

Номер патента: US20120207978A1. Автор: Kunihiko Kodama,Kenji Wada,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda. Владелец: Fujifilm Corp. Дата публикации: 2012-08-16.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing method of semiconductor device, and semiconductor device

Номер патента: WO2013180314A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Takeshi Kawabata,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-12-05.

Photosensitive resin, photosensitive composition and photo-crosslinked structure

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Chemical liquid, chemical liquid storage body, and pattern forming method

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Pattern forming method using contrast enhanced material

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High heat resistance resist composition and pattern forming method using the same

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Phosphine activated photosensitive compositions and photopolymer printing plates made therefrom

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Positive working photosensitive composition

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Photosensitive compositions

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Acetal polymers useful in photosensitive compositions

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Photosensitive compositions and lithographic printing plates with reduced propensity to blinding

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Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye

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Polyvinyl acetals having imido groups and use thereof in photosensitive compositions

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Positive photosensitive composition of cocondensed β-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide

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Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer

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Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device

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Unsaturated cyclic anhydride end capped polyimides and polyamic acids and photosensitive compositions thereof

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Photoacid generator, and photosensitive composition using same

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Positive tone photosensitive compositions containing amic acid as latent base catalyst

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Low-temperature curable photosensitive compositions

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Photosensitive composition for forming light blocking layer of organic light emitting device

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Conductor pattern forming method, and semiconductor device manufacturing method

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Hair treatment systems and methods using peptides and other compositions

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