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Radiation-sensitive resin composition, resist pattern forming method, radiation-sensitive acid generator and compound

Номер патента: WO2014141979A1
Опубликовано: 18-09-2014
Автор(ы): 啓之 仁井, 憲彦 池田, 永井　智樹, 準人 生井
Принадлежит: Jsr株式会社
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Radiation-sensitive resin composition

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