Россия, г. Королев.

eburdiyg@gmail.com

8 (903) 781-84-63

  • Главная
  • Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound

Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound

Номер патента: US09703195B2
Опубликовано: 11-07-2017
Автор(ы): Hayato Namai, Kota Nishino
Принадлежит: JSR Corp
Получить PDF файл: Открыть в новом окне

Вам могут быть интересны следующие патенты

Рисунок 1. Взаимосвязь патентов (ближайшие 20).

Radiation-sensitive resin composition, resist pattern forming method, polymer and method for producing compound

Номер патента: KR102164849B1. Автор: 하야토 나마이,고타 니시노. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2020-10-13.

Radiation-sensitive resin composition, resist pattern forming method, polymer and compound production method

Номер патента: JPWO2014148241A1. Автор: 準人 生井,晃太 西野. Владелец: JSR Corp. Дата публикации: 2017-02-16.

Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound

Номер патента: US20150355539A1. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2015-12-10.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound

Номер патента: US20240061331A1. Автор: Akiyoshi Goto,Masafumi KOJIMA,Yosuke BEKKI,Nishiki FUJIMAKI. Владелец: Fujifilm Corp. Дата публикации: 2024-02-22.

Active light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for producing electronic device, and compound

Номер патента: EP4324822A1. Автор: Akiyoshi Goto,Masafumi KOJIMA,Yosuke BEKKI,Nishiki FUJIMAKI. Владелец: Fujifilm Corp. Дата публикации: 2024-02-21.

Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent

Номер патента: US20180321585A1. Автор: Natsuko Kinoshita. Владелец: JSR Corp. Дата публикации: 2018-11-08.

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

Номер патента: EP2776889A1. Автор: Junichi Ito,Shinichi Sugiyama,Kaoru Iwato,Toshiaki Fukuhara,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Masahiro Yoshidome,Naohiro Tango,Yoko TOKUGAWA. Владелец: Fujifilm Corp. Дата публикации: 2014-09-17.

Radiation-sensitive resin composition, method for forming resist pattern, polymer, and compound

Номер патента: US20230393469A1. Автор: Ryuichi Nemoto,Nozomi SAKANO. Владелец: JSR Corp. Дата публикации: 2023-12-07.

Radiation-sensitive resin composition and pattern formation method

Номер патента: US20240152048A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2024-05-09.

Chemically amplified resist material, pattern-forming method, compound, and production method of compound

Номер патента: US20170052449A1. Автор: Tomoki Nagai,Akihiro Oshima,Hisashi Nakagawa,Takehiko Naruoka,Seiji Nagahara,Seiichi Tagawa. Владелец: Osaka University NUC. Дата публикации: 2017-02-23.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Номер патента: US20240053679A1. Автор: Takamitsu Tomiga,Hideaki Tsubaki,Sou Kamimura,Yoichi Nishida. Владелец: Fujifilm Corp. Дата публикации: 2024-02-15.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240272553A1. Автор: Michihiro Shirakawa,Hideyuki Ishihara,Yuma Kurumisawa,Ahiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-08-15.

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Номер патента: US9829796B2. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2017-11-28.

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Номер патента: US09829796B2. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2017-11-28.

Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device

Номер патента: US09915870B2. Автор: Kaoru Iwato,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2018-03-13.

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US09791777B2. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2017-10-17.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230133710A1. Автор: Keita Kato,Akira Takada,Michihiro Shirakawa,Masafumi KOJIMA,Aina USHIYAMA,Akiyoshi GOYO. Владелец: Fujifilm Corp. Дата публикации: 2023-05-04.

Pattern forming method, method for producing electronic device, actinic ray-sensitive or radiation-sensitive resin composition, and resist film

Номер патента: US20240176242A1. Автор: Satomi Takahashi,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-05-30.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230236502A1. Автор: Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA,Yosuke BEKKI. Владелец: Fujifilm Corp. Дата публикации: 2023-07-27.

Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

Номер патента: US20220229367A1. Автор: Ryuichi Nemoto,Satoshi Okazaki,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2022-07-21.

Pattern forming method, electronic device manufacturing method, actinic ray-sensitive or radiation-sensitive resin composition, and resist film

Номер патента: EP4372466A1. Автор: Satomi Takahashi,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-05-22.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240152049A1. Автор: Masafumi KOJIMA,Yosuke BEKKI,Nobuhiro HIURA. Владелец: Fujifilm Corp. Дата публикации: 2024-05-09.

Radiation-sensitive resin composition, method of forming resist pattern, and compound

Номер патента: US20220091508A1. Автор: Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2022-03-24.

Radiation-sensitive resin composition, method for forming resist pattern and compound

Номер патента: US12092957B2. Автор: Kazuya KIRIYAMA,Ryuichi Nemoto,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2024-09-17.

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Номер патента: US20160147155A1. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2016-05-26.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device

Номер патента: WO2014017665A1. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2014-01-30.

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20160347897A1. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2016-12-01.

Radiation-sensitive resin composition and pattern formation method

Номер патента: US20230273519A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2023-08-31.

Radiation-sensitive resin composition and method for forming pattern

Номер патента: US20240004288A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2024-01-04.

Radiation-sensitive resin composition, method of forming pattern, polymer, and compound

Номер патента: US20230384676A1. Автор: Kazuya KIRIYAMA,Yuushi Matsumura,Natsuko Kinoshita,Katsuaki NISHIKORI,Takuya Omiya. Владелец: JSR Corp. Дата публикации: 2023-11-30.

Pattern-forming method

Номер патента: US20140255854A1. Автор: Koji Ito,Hirokazu Sakakibara,Hiromu Miyata,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2014-09-11.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, positive tone pattern forming method, and method for manufacturing electronic device

Номер патента: US20230393472A1. Автор: Shuhei Yamaguchi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-07.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, resist film, and electronic device production method

Номер патента: EP4023636A1. Автор: Keita Kato,Hironori Oka,Kazuhiro Marumo,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA. Владелец: Fujifilm Corp. Дата публикации: 2022-07-06.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic device

Номер патента: US20220334476A1. Автор: Keita Kato,Hironori Oka,Kazuhiro Marumo,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA. Владелец: Fujifilm Corp. Дата публикации: 2022-10-20.

Resist composition and pattern forming method using the same

Номер патента: EP4394508A1. Автор: Yoonhyun Kwak,Kyuhyun IM,Youngmin Nam,Haengdeog Koh,Chanjae Ahn,Sungwon Choi,Sunghyun HAN,Changheon Lee,Mijeong Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

Organometallic compound, resist composition including the same and pattern forming method using the same

Номер патента: US20240239820A1. Автор: Yoonhyun Kwak,Hasup LEE,Kyuhyun IM,Haengdeog Koh,Jaejun Lee,Sunghyun HAN,Sukkoo Hong,Mijeong Kim,Kyungoh KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-18.

Resist composition and pattern forming method using the same

Номер патента: US20240231225A1. Автор: Yoonhyun Kwak,Kyuhyun IM,Youngmin Nam,Haengdeog Koh,Chanjae Ahn,Sungwon Choi,Sunghyun HAN,Changheon Lee,Mijeong Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-11.

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion

Номер патента: US20200393755A1. Автор: Tsuyoshi Furukawa,Ryuichi Nemoto. Владелец: JSR Corp. Дата публикации: 2020-12-17.

Method for producing active light sensitive or radiation sensitive resin composition, pattern forming method, and method for producing electronic device

Номер патента: EP3992179A1. Автор: Kei Yamamoto,Kazuhiro Marumo,Naohiro Tango,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2022-05-04.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20210124263A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2021-04-29.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20210389667A9. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2021-12-16.

Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

Номер патента: US20230400767A1. Автор: Kazuya KIRIYAMA,Natsuko Kinoshita,Katsuaki NISHIKORI,Takuya Omiya,Tetsurou KANEKO. Владелец: JSR Corp. Дата публикации: 2023-12-14.

Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound

Номер патента: US20150323866A1. Автор: Hayato Namai,Kota Nishino. Владелец: JSR Corp. Дата публикации: 2015-11-12.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND ACID DIFFUSION CONTROL AGENT

Номер патента: US20180321585A1. Автор: KINOSHITA Natsuko. Владелец: JSR Corporation. Дата публикации: 2018-11-08.

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

Номер патента: EP2776889B1. Автор: Junichi Ito,Shinichi Sugiyama,Kaoru Iwato,Toshiaki Fukuhara,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Masahiro Yoshidome,Naohiro Tango,Yoko TOKUGAWA. Владелец: Fujifilm Corp. Дата публикации: 2019-04-03.

Radiation-sensitive resin composition and resist pattern forming method

Номер патента: JP6304246B2. Автор: 準人 生井. Владелец: JSR Corp. Дата публикации: 2018-04-04.

Radiation-sensitive resin composition, pattern-forming method, polymer, and compound

Номер патента: US20130260315A1. Автор: Mitsuo Sato,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2013-10-03.

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device

Номер патента: US12044967B2. Автор: Hironori Oka,Michihiro Shirakawa,Akiyoshi Goto,Daisuke Asakawa,Kyohei Sakita. Владелец: Fujifilm Corp. Дата публикации: 2024-07-23.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US12038689B2. Автор: Kazunari Yagi,Takashi Kawashima,Akihiro Kaneko,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-07-16.

Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and method for producing onium salt

Номер патента: US20230123203A1. Автор: Shuhei Yamaguchi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-04-20.

Actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, resin, and method for manufacturing resin

Номер патента: US20240248398A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-07-25.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US09874816B2. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2018-01-23.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Номер патента: US20240241443A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2024-07-18.

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Номер патента: EP2761373A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa,Naoki Inoue. Владелец: Fujifilm Corp. Дата публикации: 2014-08-06.

Radiation-sensitive resin composition, polymer, and method for forming resist pattern

Номер патента: US20120070783A1. Автор: Hirokazu Sakakibara,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2012-03-22.

Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound

Номер патента: US11709428B2. Автор: Natsuko Kinoshita. Владелец: JSR Corp. Дата публикации: 2023-07-25.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device, and compound

Номер патента: WO2014034533A1. Автор: Keita Kato,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Akiyoshi Goto. Владелец: FUJIFILM Corporation. Дата публикации: 2014-03-06.

Active light-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: EP4317217A1. Автор: Kotaro Takahashi,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2024-02-07.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for producing electronic devices

Номер патента: EP4293011A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-20.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20170168395A1. Автор: Shuhei Yamaguchi. Владелец: Fujifilm Corp. Дата публикации: 2017-06-15.

Active light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: EP4372018A1. Автор: Satomi Takahashi,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-05-22.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: US20240192598A1. Автор: Satomi Takahashi,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-06-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230168581A1. Автор: Michihiro Shirakawa,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2023-06-01.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230185192A1. Автор: Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2023-06-15.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound

Номер патента: US20230139891A1. Автор: Akira Takada,Takeshi Kawabata,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA. Владелец: Fujifilm Corp. Дата публикации: 2023-05-04.

Active-ray-sensitive or radiation-sensitive resin composition, resist film, method for forming positive-working pattern, and method for manufacturing electronic device

Номер патента: EP4293055A1. Автор: Shuhei Yamaguchi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-20.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240027908A1. Автор: Kotaro Takahashi,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2024-01-25.

Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: EP4293054A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-20.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230384674A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-11-30.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic devices

Номер патента: US20230393473A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-07.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US11835849B2. Автор: Tsutomu Yoshimura,Yoichi Nishida,Yasunori Yonekuta,Kohei Higashi,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2023-12-05.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230408920A1. Автор: Shuhei Yamaguchi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-12-21.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing method of semiconductor device, and semiconductor device

Номер патента: WO2013180314A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Takeshi Kawabata,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-12-05.

Method for producing radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Номер патента: US20220244629A1. Автор: Kenichi Harada,Takumi Tanaka,Takashi Bannai,Hiroyuki Ezoe,Shoichiro IWAGAYA,Hiroki Motoyama. Владелец: Fujifilm Corp. Дата публикации: 2022-08-04.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230221640A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Kyohei Sakita,Kazuhiro Karumo. Владелец: Fujifilm Corp. Дата публикации: 2023-07-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and production method for electronic device

Номер патента: EP3885378A1. Автор: Hidenori Takahashi,Tsutomu Yoshimura,Takeshi Kawabata,Naohiro Tango,Akiyoshi Goto,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2021-09-29.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US12001140B2. Автор: Kazunari Yagi,Takashi Kawashima,Akihiro Kaneko,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-06-04.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210216012A1. Автор: Kazunari Yagi,Takashi Kawashima,Akihiro Kaneko,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2021-07-15.

Method for producing resin, method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and resin

Номер патента: US20220382151A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2022-12-01.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US12032290B2. Автор: Kei Yamamoto,Takashi Kawashima,Michihiro Shirakawa,Akiyoshi Goto,Daisuke Asakawa. Владелец: Fujifilm Corp. Дата публикации: 2024-07-09.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20180329298A1. Автор: Hayato Namai,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2018-11-15.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device

Номер патента: WO2013047911A1. Автор: Junichi Ito,Shinichi Sugiyama,Kaoru Iwato,Toshiaki Fukuhara,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Masahiro Yoshidome,Naohiro Tango,Yoko TOKUGAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, method for producing electronic device, compound, and resin

Номер патента: EP4282886A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-29.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20170363961A9. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2017-12-21.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Номер патента: WO2014104400A1. Автор: Hiroo Takizawa,Keita Kato,Takeshi Kawabata,Akinori Shibuya,Akiyoshi Goto,Masafumi KOJIMA. Владелец: FUJIFILM Corporation. Дата публикации: 2014-07-03.

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

Номер патента: WO2013047899A1. Автор: Junichi Ito,Shinichi Sugiyama,Kaoru Iwato,Toshiaki Fukuhara,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Masahiro Yoshidome,Naohiro Tango,Yoko TOKUGAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: EP4282885A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-29.

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Номер патента: WO2013047092A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa,Naoki Inoue. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20190146340A1. Автор: Hiromu Miyata,Takehiko Naruoka,Motohiro SHIRATANI. Владелец: JSR Corp. Дата публикации: 2019-05-16.

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230161253A1. Автор: Takamitsu Tomiga,Takumi Tanaka,Fumihiro Yoshino,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-05-25.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method

Номер патента: EP2529276A1. Автор: Tomotaka Tsuchimura,Takayuki Ito,Tadateru Yatsuo,Takeshi Inasaki,Koutarou Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2012-12-05.

Radiation-sensitive resin composition, polymer and resist pattern formation method

Номер патента: EP2503392A1. Автор: Hiromitsu Nakashima,Yukio Nishimura,Takanori Kawakami,Yusuke Asano,Takehiko Naruoka,Yuko KIRIDOSHI. Владелец: JSR Corp. Дата публикации: 2012-09-26.

Method for forming negative tone pattern, method for manufacturing electronic device, and active-light-sensitive or radiation-sensitive resin composition

Номер патента: US20170199455A1. Автор: Keita Kato,Akinori Shibuya,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2017-07-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

Номер патента: US20210072642A1. Автор: Keita Kato,Takashi Kawashima,Akiyoshi Goto,Masafumi KOJIMA,Daisuke Asakawa,Yasufumi OISHI. Владелец: Fujifilm Corp. Дата публикации: 2021-03-11.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, compound, and resin

Номер патента: US20230375925A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-23.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

Номер патента: US12007688B2. Автор: Keita Kato,Takashi Kawashima,Akiyoshi Goto,Masafumi KOJIMA,Daisuke Asakawa,Yasufumi OISHI. Владелец: Fujifilm Corp. Дата публикации: 2024-06-11.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20200159117A1. Автор: Akira Takada,Kazuhiro Marumo,Naohiro Tango,Akiyoshi Goto,Ryo Nishio,Keiyu O. Владелец: Fujifilm Corp. Дата публикации: 2020-05-21.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

Номер патента: US20240192592A1. Автор: Tomotaka Tsuchimura,Takeshi Kawabata,Minoru Uemura. Владелец: Fujifilm Corp. Дата публикации: 2024-06-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20200201177A1. Автор: Kazunari Yagi,Tomotaka Tsuchimura,Takashi Kawashima. Владелец: Fujifilm Corp. Дата публикации: 2020-06-25.

Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same

Номер патента: WO2011034213A1. Автор: Yusuke IIZUKA,Shuji Hirano,Hidenori Takahashi,Masahiro Yoshidome,Michihiro Shirakawa. Владелец: FUJIFILM Corporation. Дата публикации: 2011-03-24.

Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound

Номер патента: US20230280652A1. Автор: Natsuko Kinoshita. Владелец: JSR Corp. Дата публикации: 2023-09-07.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US12032288B2. Автор: Kei Yamamoto,Akihiro Kaneko,Minoru Uemura,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2024-07-09.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230400769A1. Автор: Michihiro Shirakawa,Hideyuki Ishihara,Akiyoshi Goto,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2023-12-14.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device, and compound

Номер патента: US20150168830A1. Автор: Keita Kato,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2015-06-18.

Radiation-sensitive resin composition, cured film, pattern forming method, solid-state imaging device, and image display device

Номер патента: US20210132496A1. Автор: Kaoru Aoyagi,Yuki Nara. Владелец: Fujifilm Corp. Дата публикации: 2021-05-06.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230120139A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-04-20.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

Номер патента: US20240210826A1. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI,Yuka KAMINO. Владелец: Fujifilm Corp. Дата публикации: 2024-06-27.

Radiation-sensitive resin composition, and method for forming pattern

Номер патента: US20220299875A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2022-09-22.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230367210A1. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-16.

Radiation-sensitive resin composition, polymer and method for forming a resist pattern

Номер патента: US9598520B2. Автор: Hiromitsu Nakashima,Yukio Nishimura,Takanori Kawakami,Yusuke Asano,Takehiko Naruoka,Yuko KIRIDOSHI. Владелец: JSR Corp. Дата публикации: 2017-03-21.

Radiation-sensitive resin composition and method for forming resist pattern

Номер патента: US20220342307A1. Автор: Ryuichi Nemoto,Hajime Inami,Kota FURUICH. Владелец: JSR Corp. Дата публикации: 2022-10-27.

Radiation-sensitive resin composition and compound

Номер патента: US8697335B2. Автор: Mitsuo Sato,Kazuo Nakahara. Владелец: JSR Corp. Дата публикации: 2014-04-15.

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

Номер патента: US20160179003A1. Автор: Mitsuo Sato,Hiromitsu Nakashima,Yasuhiko Matsuda,Masafumi Hori,Kazuo Nakahara,Takanori Kawakami,Yoshifumi Oizumi,Kazuki Kasahara,Yuusuke Asano. Владелец: JSR Corp. Дата публикации: 2016-06-23.

Radiation-sensitive resin composition and method of forming resist pattern

Номер патента: US20230236506A2. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2023-07-27.

Radiation-sensitive resin composition and method of forming resist pattern

Номер патента: US20220382152A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2022-12-01.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Номер патента: WO2013047902A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Номер патента: US20150338736A1. Автор: Hiroo Takizawa,Keita Kato,Takeshi Kawabata,Akinori Shibuya,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2015-11-26.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Номер патента: US10234759B2. Автор: Hiroo Takizawa,Keita Kato,Takeshi Kawabata,Akinori Shibuya,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2019-03-19.

Pattern forming method and method for producing electronic device

Номер патента: US20240219831A1. Автор: Satomi Takahashi,Kazuhiro Marumo,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-07-04.

Pattern forming method and method for manufacturing electronic device

Номер патента: US20230367212A1. Автор: Keita Kato,Tetsuya Shimizu,Satomi Takahashi,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-16.

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

Номер патента: US20140030640A1. Автор: Tomotaka Tsuchimura,Tadateru Yatsuo,Toru Tsuchihashi,Koutarou Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2014-01-30.

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

Номер патента: EP2689292A1. Автор: Tomotaka Tsuchimura,Tadateru Yatsuo,Toru Tsuchihashi,Koutarou Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2014-01-29.

Resist pattern-forming method

Номер патента: US09939729B2. Автор: Tomoki Nagai,Hisashi Nakagawa,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2018-04-10.

Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device

Номер патента: US20150370170A1. Автор: Shuji Hirano,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2015-12-24.

Onium salt, chemically amplified positive resist composition, and resist pattern forming process

Номер патента: US20240280900A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-08-22.

Resist composition and resist pattern forming method

Номер патента: US10534264B2. Автор: Tsuyoshi Nakamura,Kazuishi Tanno,Junyeob Lee. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2020-01-14.

Resist composition and resist pattern forming method

Номер патента: US20180224742A1. Автор: Tsuyoshi Nakamura,Kazuishi Tanno,Junyeob Lee. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2018-08-09.

Photosensitive resin composition, photosensitive element, resist pattern forming method and method for manufacturing printed circuit board

Номер патента: CN101971097B. Автор: 村松有纪子,宫坂昌宏,南川华子. Владелец: Hitachi Chemical Co Ltd. Дата публикации: 2013-04-17.

Photosensitive resin composition, photosensitive element, resist pattern forming method and method for manufacturing printed circuit board

Номер патента: CN101971097A. Автор: 村松有纪子,宫坂昌宏,南川华子. Владелец: Hitachi Chemical Co Ltd. Дата публикации: 2011-02-09.

Pattern forming method, method for selecting heating temperature in pattern forming method, extreme ultraviolet-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device

Номер патента: US20150017576A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Naoki Inoue. Владелец: Fujifilm Corp. Дата публикации: 2015-01-15.

Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same

Номер патента: WO2014030723A1. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2014-02-27.

Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device

Номер патента: US9612535B2. Автор: Shuji Hirano,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2017-04-04.

Pattern forming method, laminate, and resist composition for organic solvent development

Номер патента: US20180120706A1. Автор: Keita Kato,Takashi Yakushiji,Tadashi Omatsu,Michihiro Shirakawa,Akiyoshi Goto,Naoya HATAKEYAMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2018-05-03.

Pattern forming method and resist laminate for organic solvent development

Номер патента: US20210200098A1. Автор: Michihiro Shirakawa,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2021-07-01.

Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method

Номер патента: US20070212642A1. Автор: Takekatsu Sugiyama. Владелец: Fujifilm Corp. Дата публикации: 2007-09-13.

Polymer, resist composition, and pattern forming method

Номер патента: US20230244142A1. Автор: Koji Hasegawa,Masahiro Fukushima,Tomohiro Kobayashi,Masayoshi Sagehashi,Yutaro OTOMO. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-08-03.

Radiation sensitive resin composition, resist pattern forming method, polymer and compound

Номер патента: JP6421757B2. Автор: 準人 生井,仁視 大▲崎▼. Владелец: JSR Corp. Дата публикации: 2018-11-14.

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, MONOMER FOR PRODUCING RESIN FOR SEMICONDUCTOR DEVICE MANUFACTURING PROCESS, RESIN, METHOD FOR PRODUCING RESIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM

Номер патента: US20180299776A1. Автор: GOTO Akiyoshi,Yonekuta Yasunori,Hatakeyama Naoya. Владелец: FUJIFILM Corporation. Дата публикации: 2018-10-18.

Radiation sensitive resin composition, resist pattern forming method and photoresist film

Номер патента: JPWO2009142182A1. Автор: 岳彦 成岡,西村　幸生,幸生 西村,下川　努,努 下川,誠 杉浦,大樹 中川,信司 松村,裕介 浅野,誠 志水,宏和 榊原,一樹 笠原. Владелец: JSR Corp. Дата публикации: 2011-09-29.

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

Номер патента: TW201040666A. Автор: Shuhei Yamaguchi,Akinori Shibuya,Shohei Kataoka,Michihiro Shirakawa,Mitsuhiro Fujita,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2010-11-16.

Method for forming pattern, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for producing electronic device and electronic device

Номер патента: TWI564662B. Автор: 加藤啓太,上村聡,高橋秀知. Владелец: 富士軟片股份有限公司. Дата публикации: 2017-01-01.

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND

Номер патента: US20160209746A1. Автор: Yamaguchi Shuhei,Tsuchimura Tomotaka,Takahashi Koutarou,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-07-21.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND

Номер патента: US20160280675A1. Автор: Yamaguchi Shuhei,MOCHIZUKI Hidehiro,Tsuchimura Tomotaka,Takahashi Koutarou,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-09-29.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20190146340A1. Автор: Naruoka Takehiko,MIYATA Hiromu,SHIRATANI Motohiro. Владелец: JSR Corporation. Дата публикации: 2019-05-16.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200393756A1. Автор: Shirakawa Michihiro,Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,KAWASHIMA Takashi. Владелец: FUJIFILM Corporation. Дата публикации: 2020-12-17.

Pattern formation method, electronic device manufacturing method, semiconductor device manufacturing process resin manufacturing monomer, resin, resin manufacturing method, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film

Номер патента: KR102226442B1. Автор: 나오야 하타케야마,아키요시 고토,야스노리 요네쿠타. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2021-03-11.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device, and electronic device

Номер патента: US20150111154A1. Автор: Hidenori Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2015-04-23.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: EP4166582A4. Автор: Keita Kato,Akira Takada,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA. Владелец: Fujifilm Corp. Дата публикации: 2024-01-03.

Active light ray-sensitive or radiation-sensitive resin composition, active light ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: EP4023635A1. Автор: Takamitsu Tomiga,Yasunori Yonekuta,Kohei Higashi,Fumihiro Yoshino,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2022-07-06.

Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic device

Номер патента: US20230028463A1. Автор: Takamitsu Tomiga,Takumi Tanaka,Kohei Higashi,Fumihiro Yoshino,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-01-26.

Radiation-sensitive resin composition and electronic device

Номер патента: US09880468B2. Автор: Takashi Tsutsumi. Владелец: Zeon Corp. Дата публикации: 2018-01-30.

Radiation-sensitive resin composition and method for forming resist pattern

Номер патента: US20230341772A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2023-10-26.

Radiation-sensitive resin composition, compound and producing method of compound

Номер патента: US9120726B2. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2015-09-01.

Radiation-sensitive resin composition, compound and producing method of compound

Номер патента: US20120258399A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2012-10-11.

Radiation sensitive composition and resist pattern forming method

Номер патента: EP3667419A1. Автор: Hisashi Nakagawa,Yusuke Asano,Shinya Minegishi. Владелец: JSR Corp. Дата публикации: 2020-06-17.

Photosensitive resin composition, cured film, display device, and pattern forming method

Номер патента: US20190094692A1. Автор: Tatsuro Ishikawa,Dai Shiota,Naozumi MATSUMOTO. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2019-03-28.

Organometallic compound, resist composition including the same and pattern forming method using the same

Номер патента: EP4393925A1. Автор: Yoonhyun Kwak,Hasup LEE,Kyuhyun IM,Haengdeog Koh,Jaejun Lee,Sunghyun HAN,Sukkoo Hong,Mijeong Kim,Kyungoh KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

Номер патента: US09709891B2. Автор: Hiromi Kanda,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2017-07-18.

Pattern-forming method and radiation-sensitive composition

Номер патента: US20210181627A1. Автор: Christopher K. Ober,Emmanuel P. Giannelis,Kazunori Sakai,Vasiliki Kosma. Владелец: JSR Corp. Дата публикации: 2021-06-17.

Method for producing composition for forming non-photosensitive upper layer film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230221644A1. Автор: Kei Yamamoto,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2023-07-13.

Resin composition and pattern forming method using the same

Номер патента: US09718901B2. Автор: Kaoru Iwato,Tomotaka Tsuchimura,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2017-08-01.

Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof

Номер патента: US20190310552A1. Автор: Hisashi Nakagawa,Yusuke Asano,Shinya Minegishi. Владелец: JSR Corp. Дата публикации: 2019-10-10.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240241444A1. Автор: Shuhei Yamaguchi. Владелец: Fujifilm Corp. Дата публикации: 2024-07-18.

Radiation-sensitive resin composition and electronic component

Номер патента: US20200004145A1. Автор: Makoto Fujimura. Владелец: Zeon Corp. Дата публикации: 2020-01-02.

Radiation-sensitive resin composition, method of forming resist pattern, and compound

Номер патента: US20230236501A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Natsuko Kinoshita,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2023-07-27.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND

Номер патента: US20160280621A1. Автор: Yamaguchi Shuhei,MOCHIZUKI Hidehiro,Takahashi Koutarou,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-09-29.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210088905A1. Автор: Yamamoto Kei,GOTO Akiyoshi,KOJIMA Masafumi,UEMURA Minoru,KAWASHIMA Takashi,Marumo Kazuhiro,OU Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2021-03-25.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN

Номер патента: US20190171104A1. Автор: Shirakawa Michihiro,GOTO Akiyoshi,TAKADA Akira,SAKITA Kyohei,Nishio Ryo,Tango Naohiro,Marumo Kazuhiro. Владелец: FUJIFILM Corporation. Дата публикации: 2019-06-06.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND

Номер патента: US20160070167A1. Автор: Shibuya Akinori,Shirakawa Michihiro,KATAOKA Shohei,FUKUHARA Toshiaki,FURUTANI Hajime. Владелец: FUJIFILM Corporation. Дата публикации: 2016-03-10.

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Номер патента: US20140295332A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2014-10-02.

Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid

Номер патента: US20210263413A9. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2021-08-26.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US11886113B2. Автор: Keita Kato,Takashi Kawashima,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2024-01-30.

Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

Номер патента: US20220299873A1. Автор: Hiromitsu Nakashima,Ryuichi Nemoto,Taiichi Furukawa,Ryotaro Tanaka,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2022-09-22.

Radiation-sensitive resin composition, method for forming pattern, and onium salt compound

Номер патента: US20230400765A1. Автор: Ryuichi Nemoto,Nozomi SAKANO. Владелец: JSR Corp. Дата публикации: 2023-12-14.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240004293A1. Автор: Michihiro Shirakawa,Hideyuki Ishihara,Akiyoshi Goto,Naoya HATAKEYAMA,Yosuke BEKKI. Владелец: Fujifilm Corp. Дата публикации: 2024-01-04.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210373438A1. Автор: Yasunori Yonekuta,Kotaro Takahashi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2021-12-02.

Radiation-sensitive resin composition, method of forming resist pattern, and compound

Номер патента: US20230244143A9. Автор: Kazuya KIRIYAMA,Hayato Namai,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2023-08-03.

Radiation-sensitive resin composition, method of forming resist pattern, and compound

Номер патента: US11966161B2. Автор: Kazuya KIRIYAMA,Hayato Namai,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2024-04-23.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: US9128376B2. Автор: Sou Kamimura,Keita Kato,Hidenori Takahashi,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2015-09-08.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: WO2013081168A1. Автор: Sou Kamimura,Keita Kato,Hidenori Takahashi,Michihiro Shirakawa. Владелец: FUJIFILM Corporation. Дата публикации: 2013-06-06.

Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask

Номер патента: US09798234B2. Автор: Tomotaka Tsuchimura,Shuhei Yamaguchi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2017-10-24.

Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: US09651863B2. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2017-05-16.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

Номер патента: EP2411873A1. Автор: Shuji Hirano,Toru Fujimori,Shinki Yamada,Kana Fuji. Владелец: Fujifilm Corp. Дата публикации: 2012-02-01.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Номер патента: US20240329531A1. Автор: Takamitsu Tomiga,Hideaki Tsubaki,Asahi Takaki. Владелец: Fujifilm Corp. Дата публикации: 2024-10-03.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

Номер патента: WO2010110472A1. Автор: Shuji Hirano,Toru Fujimori,Kana Fujii,Shinki Yamada. Владелец: FUJIFILM Corporation. Дата публикации: 2010-09-30.

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Номер патента: US09996003B2. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2018-06-12.

Method for producing radiation-sensitive resin composition

Номер патента: US12122883B2. Автор: Kenichi Harada,Takumi Tanaka,Hiroyuki Ezoe. Владелец: Fujifilm Corp. Дата публикации: 2024-10-22.

Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US09904167B2. Автор: Tomotaka Tsuchimura. Владелец: Fujifilm Corp. Дата публикации: 2018-02-27.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

Номер патента: US20190219921A1. Автор: Shuji Hirano,Hideaki Tsubaki,Akihiro Kaneko,Wataru Nihashi,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2019-07-18.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

Номер патента: US11640113B2. Автор: Shuji Hirano,Hideaki Tsubaki,Akihiro Kaneko,Wataru Nihashi,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2023-05-02.

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

Номер патента: US09500950B2. Автор: Hiroki Nakagawa,Hiromitsu Nakashima,Yukio Nishimura,Gouji Wakamatsu,Kentarou Gotou,Takeo Shioya. Владелец: JSR Corp. Дата публикации: 2016-11-22.

Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method

Номер патента: US20200407476A1. Автор: Takuo Sone,Ken Maruyama,Motohiro SHIRATANI,Yoshiki Nonoyama. Владелец: JSR Corp. Дата публикации: 2020-12-31.

Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: US20160041465A1. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2016-02-11.

Production method for radiation-sensitive resin composition

Номер патента: EP3992713A1. Автор: Kenichi Harada,Takumi Tanaka,Hiroyuki Ezoe. Владелец: Fujifilm Corp. Дата публикации: 2022-05-04.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of semiconductor device, semiconductor device and production method of resin

Номер патента: WO2013047895A1. Автор: Hideaki Tsubaki,Takeshi Kawabata. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern

Номер патента: US20190285983A1. Автор: Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2019-09-19.

Method for producing radiation-sensitive resin composition

Номер патента: US20220081518A1. Автор: Kenichi Harada,Takumi Tanaka,Hiroyuki Ezoe. Владелец: Fujifilm Corp. Дата публикации: 2022-03-17.

Pattern forming method, method for producing electronic device, and kit

Номер патента: US20230333478A1. Автор: Tetsuya Kamimura. Владелец: Fujifilm Corp. Дата публикации: 2023-10-19.

Radiation-sensitive resin composition and radiation-sensitive acid generating agent

Номер патента: US20130260316A1. Автор: Ken Maruyama. Владелец: JSR Corp. Дата публикации: 2013-10-03.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US11953829B2. Автор: Kazunari Yagi,Tomotaka Tsuchimura,Takashi Kawashima,Michihiro Shirakawa,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2024-04-09.

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same

Номер патента: US20130001751A1. Автор: Naoki Inoue. Владелец: Fujifilm Corp. Дата публикации: 2013-01-03.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20240201589A1. Автор: Tomotaka Tsuchimura,Takeshi Kawabata,Minoru Uemura. Владелец: Fujifilm Corp. Дата публикации: 2024-06-20.

Radiation-sensitive resin composition, method of forming resist pattern, and polymer

Номер патента: US20220269172A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2022-08-25.

Positive tone resist composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20220382153A1. Автор: Kazunari Yagi,Akira Takada,Kazuhiro Marumo,Michihiro Shirakawa,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2022-12-01.

Onium salt, chemically amplified positive resist composition, and resist pattern forming process

Номер патента: US20240337927A1. Автор: Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-10.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP5277679B2. Автор: 有紀子 村松,昌宏 宮坂,華子 南川. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2013-08-28.

Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin

Номер патента: WO2013081184A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-06-06.

Pattern forming method using resist underlayer film

Номер патента: US09793131B2. Автор: Shigeo Kimura,Hiroto Ogata,Yuki Usui,Tomoya Ohashi. Владелец: Nissan Chemical Corp. Дата публикации: 2017-10-17.

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

Номер патента: EP1736824A2. Автор: Kenji Wada. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-12-27.

Positive resist composition and pattern forming method using the resist composition

Номер патента: EP1693705B1. Автор: Yasutomo Kawanishi. Владелец: Fujifilm Corp. Дата публикации: 2014-01-22.

Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method

Номер патента: US5272036A. Автор: Kazufumi Ogawa,Masayuki Endo,Yoshiyuki Tani,Fumiyoshi Urano,Masaaki Nakahata. Владелец: Wako Pure Chemical Industries Ltd. Дата публикации: 1993-12-21.

Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method

Номер патента: US20030235779A1. Автор: Jun Hatakeyama,Tomohiro Kobayashi,Youichi Ohsawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2003-12-25.

Pattern forming method and substance adherence pattern

Номер патента: EP1431821B1. Автор: Koichi Kawamura,Takeyoshi Kano. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2007-02-14.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND METHOD OF CONTROLLING ACID DIFFUSION

Номер патента: US20200393755A1. Автор: Nemoto Ryuichi,FURUKAWA Tsuyoshi. Владелец: JSR Corporation. Дата публикации: 2020-12-17.

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion

Номер патента: US11429024B2. Автор: Tsuyoshi Furukawa,Ryuichi Nemoto. Владелец: JSR Corp. Дата публикации: 2022-08-30.

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

Номер патента: US20140186771A1. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2014-07-03.

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

Номер патента: WO2013099998A1. Автор: 準人 生井. Владелец: Jsr株式会社. Дата публикации: 2013-07-04.

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

Номер патента: KR102047863B1. Автор: 하야토 나마이. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2019-11-22.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20210124263A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Ken Maruyama,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2021-04-29.

Pattern forming method and method for manufacturing electronic device

Номер патента: US20240295822A1. Автор: Tetsuya Kamimura,Satoru Murayama,Tetsuya Shimizu. Владелец: Fujifilm Corp. Дата публикации: 2024-09-05.

Treatment liquid and pattern forming method

Номер патента: US20180217503A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

Treatment liquid and pattern forming method

Номер патента: US20210200097A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2021-07-01.

Treatment liquid and pattern forming method

Номер патента: US20180217499A1. Автор: Shuji Hirano,Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

Radiation-sensitive resin composition and method for forming pattern

Номер патента: US11966160B2. Автор: Ryuichi Nemoto. Владелец: JSR Corp. Дата публикации: 2024-04-23.

Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent

Номер патента: US5925492A. Автор: Yoshiyuki Harita,Yoshihiro Hosaka,Ikuo Nozue,Masashige Takatori. Владелец: JSR Corp. Дата публикации: 1999-07-20.

Pattern-forming method and composition

Номер патента: US09921474B2. Автор: Kanako FUKAMI. Владелец: JSR Corp. Дата публикации: 2018-03-20.

Photocurable / thermosetting resin composition, photosensitive dry film thereof and pattern forming method using the same

Номер патента: JP4606684B2. Автор: 征智 日馬,正樹 佐々木,敦 亀山,忠臣 西久保,誠也 小野寺. Владелец: Taiyo Holdings Co Ltd. Дата публикации: 2011-01-05.

Treatment liquid and pattern forming method

Номер патента: US20180101100A1. Автор: Hideaki Tsubaki,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-04-12.

Pattern forming method

Номер патента: US09891526B2. Автор: Toru Kimura,Yoshio Takimoto,Kazunori Takanashi,Shunsuke Kurita. Владелец: JSR Corp. Дата публикации: 2018-02-13.

Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the same

Номер патента: US20240103374A1. Автор: Tetsuya Kamimura,Tetsuya Shimizu. Владелец: Fujifilm Corp. Дата публикации: 2024-03-28.

Chemically amplified positive type photoresist composition and pattern forming method using the same

Номер патента: US20190339614A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2019-11-07.

Chemically amplified positive type photoresist composition and pattern forming method using the same

Номер патента: PH12019501406A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2020-06-08.

Chemically amplified positive type photoresist composition and pattern forming method using the same

Номер патента: EP3566098A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2019-11-13.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compounds

Номер патента: IL313684A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2024-08-01.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND

Номер патента: US20150355539A1. Автор: NAMAI Hayato. Владелец: JSR Corporation. Дата публикации: 2015-12-10.

Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, method for producing electronic device, compound, and resin

Номер патента: EP4282886A4. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2024-07-31.

Active light-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: EP4317217A4. Автор: Kotaro Takahashi,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2024-11-06.

A method for producing a sensitive light-sensitive or radiation-sensitive resin composition, a method for producing a resin for a sensitive light-sensitive or radiation-sensitive resin composition, a method for producing a sensitive light-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device.

Номер патента: JPWO2019167419A1. Автор: 孝太郎 高橋,康智 米久田,太朗 三好. Владелец: Fujifilm Corp. Дата публикации: 2021-02-04.

Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: EP4282885A4. Автор: Tsutomu Yoshimura,Akiyoshi Goto,Masafumi KOJIMA,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2024-07-24.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for producing electronic devices

Номер патента: EP4293011A4. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2024-08-07.

Radiation sensitive resin composition, resist pattern forming method, polymer and compound

Номер патента: JPWO2011125684A1. Автор: 浩光 中島,祐亮 庵野,光央 佐藤. Владелец: JSR Corp. Дата публикации: 2013-07-08.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, resist pattern forming method, and photomask

Номер патента: US20160342090A1. Автор: Tomotaka Tsuchimura. Владелец: Fujifilm Corp. Дата публикации: 2016-11-24.

Active-ray-sensitive or radiation-sensitive resin composition, resist film, method for forming positive-working pattern, and method for manufacturing electronic device

Номер патента: EP4293055A4. Автор: Shuhei Yamaguchi,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2024-08-14.

Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: EP4293054A4. Автор: Shuhei Yamaguchi,Eiji Fukuzaki,Tomoaki Yoshioka,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2024-09-25.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

Номер патента: US20200319551A1. Автор: Tomotaka Tsuchimura,Takashi Kawashima,Akihiro Kaneko,Michihiro Shirakawa,Michihiro OGAWA,Hajime Furutani,Kyohei Sakita. Владелец: Fujifilm Corp. Дата публикации: 2020-10-08.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND

Номер патента: US20170038679A1. Автор: KIMOTO Takakazu,Tomioka Hiroshi,Asano Yusuke. Владелец: JSR Corporation. Дата публикации: 2017-02-09.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND

Номер патента: US20200102270A9. Автор: Nishikori Katsuaki,KINOSHITA Natsuko,FURUICHI Kouta. Владелец: JSR Corporation. Дата публикации: 2020-04-02.

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD

Номер патента: US20170131632A1. Автор: NAMAI Hayato,IKEDA Norihiko. Владелец: JSR Corporation. Дата публикации: 2017-05-11.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND

Номер патента: US20180319740A1. Автор: Nishikori Katsuaki,KINOSHITA Natsuko,FURUICHI Kouta. Владелец: JSR Corporation. Дата публикации: 2018-11-08.

Radiation-Sensitive Resin Composition, Resist Pattern Forming Method, and Acid Diffusion Control Agent

Номер патента: JP7140100B2. Автор: 克聡 錦織,聡司 岡嵜. Владелец: JSR Corp. Дата публикации: 2022-09-21.

Radiation sensitive resin composition, resist pattern forming method, acid generator and compound

Номер патента: JP6421449B2. Автор: 裕介 浅野,孝和 木元,寛 冨岡. Владелец: JSR Corp. Дата публикации: 2018-11-14.

Radiation sensitive resin composition, resist pattern forming method, acid diffusion controller and compound

Номер патента: JPWO2017122697A1. Автор: 克聡 錦織,奈津子 木下,康太 古市. Владелец: JSR Corp. Дата публикации: 2018-12-06.

Photosensitive ray- or radiation-sensitive resin composition, sensitized ray-sensitive or radiation-sensitive resin film, pattern forming method, and method for producing electronic component

Номер патента: TW201912664A. Автор: 吉野文博,高桑英希. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2019-04-01.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150277225A1. Автор: Shibuya Akinori,KATAOKA Shohei,GOTO Akiyoshi,KOJIMA Masafumi,KOSHIJIMA KOSUKE. Владелец: . Дата публикации: 2015-10-01.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition, and method for producing electronic device

Номер патента: JP5887300B2. Автор: 啓太 加藤,直紘 丹呉,三千紘 白川,修平 山口,明規 渋谷,祥平 片岡,知樹 松田,研由 後藤,渋谷　明規. Владелец: Fujifilm Corp. Дата публикации: 2016-03-16.

Pattern formation method and method for producing electronic device

Номер патента: EP4282887A1. Автор: Keita Kato,Tetsuya Shimizu,Satomi Takahashi,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2023-11-29.

A method for producing a sensitive light-sensitive or radiation-sensitive resin composition, a sensitive light-sensitive or radiation-sensitive film, a pattern forming method, and an electronic device.

Номер патента: JP6979514B2. Автор: 敦靖 野崎. Владелец: Fujifilm Corp. Дата публикации: 2021-12-15.

Active light sensitive or radiation sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: WO2019044231A1. Автор: 土村　智孝,敬史 川島,金子　明弘,倫弘 小川. Владелец: 富士フイルム株式会社. Дата публикации: 2019-03-07.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: IL310073A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2024-03-01.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

Номер патента: IL265033B. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2022-01-01.

Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Номер патента: WO2023047992A1. Автор: 三千紘 白川,研由 後藤,佑真 楜澤,英幸 石原. Владелец: 富士フイルム株式会社. Дата публикации: 2023-03-30.

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: WO2020129683A1. Автор: 慶 山本,三千紘 白川,敬史 川島,研由 後藤,大輔 浅川. Владелец: 富士フイルム株式会社. Дата публикации: 2020-06-25.

Sensitive ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, electronic device manufacturing method, resin

Номер патента: JP7053789B2. Автор: 敬史 川島,研由 後藤,明弘 金子,倫弘 小川. Владелец: Fujifilm Corp. Дата публикации: 2022-04-12.

Active light ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: KR102513125B1. Автор: 나오야 하타케야마,야스노리 요네쿠타,요이치 니시다,츠토무 요시무라,코헤이 히가시. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2023-03-23.

Active light ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: KR20220084201A. Автор: 나오야 하타케야마,야스노리 요네쿠타,요이치 니시다,츠토무 요시무라,코헤이 히가시. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2022-06-21.

Actinic ray-sensitive or radiation-sensitive resin composition, production method of resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method of manufacturing an electronic device

Номер патента: KR102361263B1. Автор: 야스노리 요네쿠타,타로 미요시,코타로 타카하시. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2022-02-14.

Radiation-sensitive resin composition, polymer, and resist pattern-forming method

Номер патента: US20130203000A1. Автор: Yasuhiko Matsuda,Norihiko Sugie,Tomohiro Kakizawa,Takakazu Kimoto. Владелец: JSR Corp. Дата публикации: 2013-08-08.

Sensitive light or radiation sensitive resin composition, resist film, pattern forming method, mask blanks with resist film, photomask manufacturing method, electronic device manufacturing method

Номер патента: JPWO2019123842A1. Автор: 智孝 土村,三千紘 白川,土村　智孝,敬史 川島,明弘 金子,金子　明弘,享平 崎田,倫弘 小川,創 古谷. Владелец: Fujifilm Corp. Дата публикации: 2020-12-03.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US10545405B2. Автор: Shuji Hirano,Toshiaki Fukuhara,Shuhei Yamaguchi,Koutarou Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2020-01-28.

Radiation-sensitive resin composition, polymer, and resist pattern forming method

Номер патента: JPWO2012036250A1. Автор: 紀彦 杉江,恭彦 松田,友洋 柿澤,孝和 木元. Владелец: JSR Corp. Дата публикации: 2014-02-03.

Pattern formation method and method for producing electronic device

Номер патента: EP4372014A1. Автор: Satomi Takahashi,Kazuhiro Marumo,Michihiro Shirakawa,Yohei Ishiji,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2024-05-22.

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK

Номер патента: US20170121437A1. Автор: Tsuchimura Tomotaka. Владелец: FUJIFILM Corporation. Дата публикации: 2017-05-04.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND

Номер патента: US20150168830A1. Автор: Shibuya Akinori,Yamaguchi Shuhei,KATAOKA Shohei,Kato Keita,Matsuda Tomoki,GOTO Akiyoshi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-06-18.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20190243244A1. Автор: Naruoka Takehiko,KANEKO Tetsurou. Владелец: JSR Corporation. Дата публикации: 2019-08-08.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20180329298A1. Автор: NAMAI Hayato,Nishikori Katsuaki. Владелец: JSR Corporation. Дата публикации: 2018-11-15.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20170363961A9. Автор: NAMAI Hayato. Владелец: JSR Corporation. Дата публикации: 2017-12-21.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20180364571A1. Автор: Shirakawa Michihiro,Kato Keita,Tsuchimura Tomotaka,GOTO Akiyoshi,KOJIMA Masafumi,Nishio Ryo. Владелец: FUJIFILM Corporation. Дата публикации: 2018-12-20.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20200393761A1. Автор: MARUYAMA Ken,Kasahara Kazuki,Nishikori Katsuaki,FURUKAWA Tsuyoshi,KINOSHITA Natsuko. Владелец: JSR Corporation. Дата публикации: 2020-12-17.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask

Номер патента: US9958775B2. Автор: Tomotaka Tsuchimura,Takuya TSURUTA,Tadeteru YATSUO. Владелец: Fujifilm Corp. Дата публикации: 2018-05-01.

Pattern forming method, method for manufacturing electronic device, electronic device, active light sensitive or radiation sensitive resin composition, resist film and mask blank

Номер патента: KR101988896B1. Автор: 토모타카 츠치무라. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-06-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: CN113168100A. Автор: 后藤研由,山本庆,上村稔,金子明弘,小岛雅史. Владелец: Fujifilm Corp. Дата публикации: 2021-07-23.

Active light sensitive or radiation sensitive resin composition, resist film, pattern forming method and method for manufacturing electronic device

Номер патента: WO2017154345A1. Автор: 啓太 加藤,三千紘 白川,土村　智孝,研由 後藤,西尾　亮,雅史 小島. Владелец: 富士フイルム株式会社. Дата публикации: 2017-09-14.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device using the same

Номер патента: WO2014017618A1. Автор: Kei Yamamoto,Shuhei Yamaguchi,Kousuke Koshijima. Владелец: FUJIFILM Corporation. Дата публикации: 2014-01-30.

Radiation sensitive resin composition and resist pattern forming method

Номер патента: JP5472300B2. Автор: 峰規 川上,裕介 浅野. Владелец: JSR Corp. Дата публикации: 2014-04-16.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, method for manufacturing electronic device and electronic device

Номер патента: TWI585523B. Автор: 渋谷明規,片岡祥平,後藤研由,小島雅史,越島康介. Владелец: 富士軟片股份有限公司. Дата публикации: 2017-06-01.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US11687001B2. Автор: Tsutomu Yoshimura,Yoichi Nishida,Yasunori Yonekuta,Kohei Higashi,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2023-06-27.

Radiation sensitive resin composition and resist pattern forming method

Номер патента: WO2018230334A1. Автор: 哲朗 金子. Владелец: Jsr株式会社. Дата публикации: 2018-12-20.

Radiation-sensitive resin composition and resist pattern forming method

Номер патента: JPWO2011108665A1. Автор: 恭彦 松田,峰規 川上,友洋 柿澤. Владелец: JSR Corp. Дата публикации: 2013-06-27.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device using the same

Номер патента: TW201411284A. Автор: Kei Yamamoto,Shuhei Yamaguchi,Kousuke Koshijima. Владелец: Fujifilm Corp. Дата публикации: 2014-03-16.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: IL280627A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2021-03-25.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: IL299954A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2023-03-01.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method

Номер патента: TW201131306A. Автор: Tomotaka Tsuchimura,Takayuki Ito,Tadateru Yatsuo,Takeshi Inasaki,Kotaro Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2011-09-16.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150132687A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-05-14.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150140484A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-05-21.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

Номер патента: US20150185610A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-07-02.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

Номер патента: US20150185612A1. Автор: TSUBAKI Hideaki,Kawabata Takeshi,Takizawa Hiroo. Владелец: FUJIFILM Corporation. Дата публикации: 2015-07-02.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20190196326A1. Автор: Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,ASAKAWA Daisuke,OU Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2019-06-27.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION

Номер патента: US20140342275A1. Автор: Inasaki Takeshi,Tsuchimura Tomotaka,Kawabata Takeshi,TSUCHIHASHI Toru. Владелец: FUJIFILM Corporation. Дата публикации: 2014-11-20.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device

Номер патента: US20140363758A1. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2014-12-11.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20180292751A1. Автор: Yasunori Yonekuta,Michihiro Shirakawa,Akiyoshi Goto,Daisuke Asakawa,Naoya HATAKEYAMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2018-10-11.

PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150331314A1. Автор: Shirakawa Michihiro,Yamaguchi Shuhei,YOSHINO Fumihiro,Fujita Mitsuhiro,FURUTANI Hajime,TOMIGA Takamitsu. Владелец: FUJIFILM Corporation. Дата публикации: 2015-11-19.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method and method for manufacturing electronic device

Номер патента: KR101943347B1. Автор: 슈지 히라노. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-01-29.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, electronic device manufacturing method, resin

Номер патента: KR102450804B1. Автор: 타카시 카와시마,아키요시 고토,미치히로 오가와,아키히로 카네코. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2022-10-06.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method and method for manufacturing electronic device

Номер патента: WO2016035560A1. Автор: 修史 平野. Владелец: 富士フイルム株式会社. Дата публикации: 2016-03-10.

Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern-forming method, and electronic device production method

Номер патента: WO2020066485A1. Автор: 一成 八木,研由 後藤,大輔 浅川,倫弘 小川. Владелец: 富士フイルム株式会社. Дата публикации: 2020-04-02.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device

Номер патента: KR20150003853A. Автор: 케이 야마모토,히데노리 타카하시,슈헤이 야마구치,준이치 이토. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2015-01-09.

Pattern forming method, manufacturing method of electronic device, electronic device, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and blank mask

Номер патента: TW201606445A. Автор: 土村智孝. Владелец: 富士軟片股份有限公司. Дата публикации: 2016-02-16.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and manufacturing method of electronic device

Номер патента: JPWO2020137921A1. Автор: 敬充 冨賀,英明 椿,直也 畠山,康史 大石,東　耕平,康智 米久田. Владелец: Fujifilm Corp. Дата публикации: 2021-10-21.

Sensitive light-sensitive or radiation-sensitive resin composition, sensitive light-sensitive or radiation-sensitive film, pattern forming method, manufacturing method of electronic device

Номер патента: JPWO2019167451A1. Автор: 修平 山口,敦靖 野崎,暁 ▲高▼田. Владелец: Fujifilm Corp. Дата публикации: 2021-02-18.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: JP7240416B2. Автор: 慶 山本,三千紘 白川,敬史 川島,研由 後藤,大輔 浅川. Владелец: Fujifilm Corp. Дата публикации: 2023-03-15.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device

Номер патента: KR101728360B1. Автор: 히데아키 츠바키,타케시 카와바타,히로오 타키자와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-04-19.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, electronic device manufacturing method

Номер патента: JP7220229B2. Автор: 一成 八木,研由 後藤,大輔 浅川,倫弘 小川. Владелец: Fujifilm Corp. Дата публикации: 2023-02-09.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank having actinic ray-sensitive or radiation-sensitive film, method for forming pattern and photomask

Номер патента: TW201403227A. Автор: Tomotaka Tsuchimura,Takuya TSURUTA,Tadateru Yatsuo. Владелец: Fujifilm Corp. Дата публикации: 2014-01-16.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

Номер патента: US9423689B2. Автор: Hidenori Takahashi,Shuhei Yamaguchi,Michihiro Shirakawa,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2016-08-23.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

Номер патента: KR101737379B1. Автор: 미치히로 시라카와,히데노리 타카하시,쇼헤이 카타오카,슈헤이 야마구치,후미히로 요시노,쇼이치 사이토. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-05-18.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device

Номер патента: KR101715670B1. Автор: 와타루 니하시,나츠미 요코카와,슈지 히라노,히로오 타키자와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-03-13.

Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, electronic device production method, polymerizable compound, and resin

Номер патента: WO2022215423A1. Автор: 洋平 石地,享平 崎田,英幸 石原,翔 井本. Владелец: 富士フイルム株式会社. Дата публикации: 2022-10-13.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and manufacturing method of electronic device

Номер патента: JPWO2020049859A1. Автор: 敬充 冨賀,英明 椿,直也 畠山,東　耕平,耕平 東,康智 米久田. Владелец: Fujifilm Corp. Дата публикации: 2021-08-12.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: JPWO2019044231A1. Автор: 智孝 土村,土村　智孝,敬史 川島,明弘 金子,金子　明弘,倫弘 小川. Владелец: Fujifilm Corp. Дата публикации: 2020-04-02.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, electronic device manufacturing method

Номер патента: JP7239611B2. Автор: 秀知 高橋,直紘 丹呉,研由 後藤,惠瑜 王. Владелец: Fujifilm Corp. Дата публикации: 2023-03-14.

COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Номер патента: US20160024005A1. Автор: TSUBAKI Hideaki,HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: . Дата публикации: 2016-01-28.

Mask blanks having an actinic ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, actinic-ray- or radiation-sensitive film, a pattern forming method, and a method of manufacturing an electronic device

Номер патента: KR102021301B1. Автор: 슈헤이 야마구치,토시아키 후쿠하라,코우타로우 타카하시,슈지 히라노. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-09-16.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method of manufacturing electronic device

Номер патента: KR102147743B1. Автор: 나오야 하타케야마,아키요시 고토,야스노리 요네쿠타,미치히로 시라카와,케이유 오우,다이스케 아사카와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2020-08-25.

Actinic-ray-or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: CN113795790A. Автор: 后藤研由,高田晓,小岛雅史,牛山爱菜. Владелец: Fujifilm Corp. Дата публикации: 2021-12-14.

Actinic-ray-or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: CN113260604A. Автор: 富贺敬充,椿英明,米久田康智,大石康史,东耕平,畠山直也. Владелец: Fujifilm Corp. Дата публикации: 2021-08-13.

Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film, pattern-forming method, and electronic device production method

Номер патента: WO2020022089A1. Автор: 直紘 丹呉,研由 後藤,健志 川端,和博 丸茂,惠瑜 王,務 吉村. Владелец: 富士フイルム株式会社. Дата публикации: 2020-01-30.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, and method of manufacturing electronic device

Номер патента: JPWO2018042956A1. Автор: 啓太 加藤,三千紘 白川,研由 後藤,享平 崎田,雅史 小島. Владелец: Fujifilm Corp. Дата публикации: 2019-06-24.

Active-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, and compound

Номер патента: EP4166537A4. Автор: Akira Takada,Takeshi Kawabata,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA. Владелец: Fujifilm Corp. Дата публикации: 2024-03-13.

Curable resin composition for silicon-containing resist, pattern forming method, method for producing imprint mold, and method for producing semiconductor device

Номер патента: US20240004294A1. Автор: Masakazu Kaneko,Yasuhiro Okawa,Hirokazu Oda,Shintaro Nasu. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2024-01-04.

Pattern-forming method, and composition for forming resist underlayer film

Номер патента: US20120285929A1. Автор: Satoru Murakami,Yushi Matsumura,Yusuke Anno,Shinya Minegishi,Kyoyu Yasuda,Shinya NAKAFUJI,Kazuhiko KOMURA. Владелец: JSR Corp. Дата публикации: 2012-11-15.

Pattern-forming method, and composition for forming resist underlayer film

Номер патента: US20140371466A1. Автор: Satoru Murakami,Yushi Matsumura,Yusuke Anno,Shinya Minegishi,Kyoyu Yasuda,Shinya NAKAFUJI,Kazuhiko KOMURA. Владелец: JSR Corp. Дата публикации: 2014-12-18.

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20150284492A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2015-10-08.

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20150010857A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2015-01-08.

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same

Номер патента: US09709892B2. Автор: Kazuyoshi Mizutani,Kaoru Iwato,Yuichiro Enomoto,Sou Kamimura,Shinji Tarutani,Keita Kato,Kana Fujii,Shohei Kataoka,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2017-07-18.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device

Номер патента: US20150185610A1. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2015-07-02.

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: WO2013141395A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-09-26.

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20150293446A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2015-10-15.

Pattern forming method and method for manufacturing electronic device

Номер патента: US20180321589A1. Автор: Tomotaka Tsuchimura,Akihiro Kaneko,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-11-08.

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

Номер патента: WO2011002102A1. Автор: Toru Fujimori,Kana Fujii. Владелец: FUJIFILM Corporation. Дата публикации: 2011-01-06.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JPWO2009145120A1. Автор: 有紀子 村松,宮坂　昌宏,昌宏 宮坂. Владелец: Resonac Corporation. Дата публикации: 2011-10-13.

Coloring composition, method for producing coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device

Номер патента: US11767431B2. Автор: Shoichi Nakamura. Владелец: Fujifilm Corp. Дата публикации: 2023-09-26.

Treatment liquid and pattern forming method

Номер патента: US20190258168A1. Автор: Tetsuya Kamimura,Michihiro Shirakawa,Tadashi OOMATSU. Владелец: Fujifilm Corp. Дата публикации: 2019-08-22.

Kit, composition for forming underlayer film for imprinting, pattern forming method, and method for manufacturing semiconductor device

Номер патента: US20200373167A1. Автор: Yuichiro Goto,Akihiro HAKAMATA,Naoya SHIMOJU. Владелец: Fujifilm Corp. Дата публикации: 2020-11-26.

Composition for pattern formation, and pattern-forming method

Номер патента: US09599892B2. Автор: Tomoki Nagai,Hiroyuki Komatsu,Takehiko Naruoka,Shinya Minegishi. Владелец: JSR Corp. Дата публикации: 2017-03-21.

Pattern-forming method and composition

Номер патента: US20190235386A1. Автор: Masafumi Hori,Hiroyuki Komatsu,Tomohiro Oda,Takehiko Naruoka,Hitoshi Osaki. Владелец: JSR Corp. Дата публикации: 2019-08-01.

Rinsing liquid for lithography and pattern forming method using same

Номер патента: US20160109805A1. Автор: Go Noya,Yuriko Matsuura,Sara TSUYUKI. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2016-04-21.

Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor

Номер патента: US5264319A. Автор: Takashi Inoue,Kazuo Nate,Hisashi Sugiyama,Akiko Mizushima. Владелец: HITACHI LTD. Дата публикации: 1993-11-23.

Composition for forming fine resist pattern and pattern forming method using same

Номер патента: US20180329301A1. Автор: Xiaowei Wang. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2018-11-15.

Active light ray-sensitive or radiation-sensitive resin composition, active light ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: EP4023635A4. Автор: Takamitsu Tomiga,Yasunori Yonekuta,Kohei Higashi,Fumihiro Yoshino,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2022-10-12.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: IL290560A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2022-04-01.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER COMPOSITION

Номер патента: US20200012194A1. Автор: MARUYAMA Ken,SHIRATANI Motohiro,KINOSHITA Natsuko. Владелец: JSR Corporation. Дата публикации: 2020-01-09.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID

Номер патента: US20210263413A9. Автор: Taniguchi Takuhiro,MARUYAMA Ken,KIRIYAMA Kazuya,Nishikori Katsuaki. Владелец: JSR Corporation. Дата публикации: 2021-08-26.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID

Номер патента: US20200341376A1. Автор: Taniguchi Takuhiro,MARUYAMA Ken,KIRIYAMA Kazuya,Nishikori Katsuaki. Владелец: JSR Corporation. Дата публикации: 2020-10-29.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition, and method for producing electronic device

Номер патента: JP6461919B2. Автор: 啓太 加藤,慶 山本,三千紘 白川,文博 吉野,研由 後藤. Владелец: Fujifilm Corp. Дата публикации: 2019-01-30.

Active light ray-sensitive or radiation-sensitive resin composition, active light ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: TW202128970A. Автор: 吉野文博,米久田康智,冨賀敬充,畠山直也,東耕平. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2021-08-01.

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device

Номер патента: US20170038685A1. Автор: Kei Yamamoto,Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2017-02-09.

Sensitive ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, electronic device manufacturing method, compound

Номер патента: JP7076473B2. Автор: 稔 上村,敬史 川島,研由 後藤,雅史 小島. Владелец: Fujifilm Corp. Дата публикации: 2022-05-27.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20220146937A1. Автор: Takamitsu Tomiga,Yasunori Yonekuta,Kohei Higashi,Fumihiro Yoshino,Naoya HATAKEYAMA. Владелец: Fujifilm Corp. Дата публикации: 2022-05-12.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND POLYESTER

Номер патента: US20200393764A1. Автор: NOZAKI Atsuyasu. Владелец: FUJIFILM Corporation. Дата публикации: 2020-12-17.

Photosensitive resin composition, production method therefor, resist film, pattern formation method, and method for producing electronic device

Номер патента: EP3757676A1. Автор: Kei Yamamoto,Hidenori Takahashi,Naohiro Tango,Yasufumi OISHI. Владелец: Fujifilm Corp. Дата публикации: 2020-12-30.

Photopolymerizable radiation-sensitive resin composition and radiation-sensitive sheet material

Номер патента: US4370403A. Автор: Kiyofumi Takaki. Владелец: TAKLE BIRGER. Дата публикации: 1983-01-25.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

Номер патента: WO2012086849A1. Автор: Kei Yamamoto,Tomoki Matsuda,Mitsuhiro Fujita. Владелец: FUJIFILM Corporation. Дата публикации: 2012-06-28.

Photocurable composition for imprints, pattern forming method, and method for manufacturing device

Номер патента: US20170285468A1. Автор: Hirotaka Kitagawa,Yuichiro Goto. Владелец: Fujifilm Corp. Дата публикации: 2017-10-05.

Coloring composition, cured film, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging device, and image display device

Номер патента: US09650493B2. Автор: Kaoru Aoyagi. Владелец: Fujifilm Corp. Дата публикации: 2017-05-16.

Composition for pattern formation, pattern-forming method, and block copolymer

Номер патента: US09738746B2. Автор: Tomoki Nagai,Hiroyuki Komatsu,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2017-08-22.

Curable composition, pattern forming method, pattern, and method for manufacturing device

Номер патента: US20170190820A1. Автор: Hirotaka Kitagawa,Yuichiro Goto. Владелец: Fujifilm Corp. Дата публикации: 2017-07-06.

Curable composition for imprinting, release agent, cured product, pattern forming method, and lithography method

Номер патента: US20210018833A1. Автор: Yuichiro Goto,Akihiro HAKAMATA,Naoya SHIMOJU. Владелец: Fujifilm Corp. Дата публикации: 2021-01-21.

Pattern-forming method, and composition

Номер патента: US20200357633A1. Автор: Masafumi Hori,Tomoki Nagai,Hiroyuki Komatsu,Tomohiro Oda,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2020-11-12.

Pattern-forming method, and composition

Номер патента: US20180342387A1. Автор: Masafumi Hori,Tomoki Nagai,Hiroyuki Komatsu,Tomohiro Oda,Takehiko Naruoka. Владелец: JSR Corp. Дата публикации: 2018-11-29.

Graft pattern forming method and conductive pattern forming method

Номер патента: MY142216A. Автор: Koichi Kawamura,Yasuaki Matsushita. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2010-11-15.

Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material

Номер патента: US20050214693A1. Автор: Koichi Kawamura,Takeyoshi Kano. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2005-09-29.

Fine pattern forming method and stamper

Номер патента: US20090017266A1. Автор: Kyosuke Deguchi. Владелец: Canon Inc. Дата публикации: 2009-01-15.

Pattern-forming method and composition

Номер патента: US20170351174A1. Автор: Hitoshi Osaki. Владелец: JSR Corp. Дата публикации: 2017-12-07.

Graft pattern forming method and conductive pattern forming method

Номер патента: WO2006123834A3. Автор: Koichi Kawamura,Yasuaki Matsushita. Владелец: Yasuaki Matsushita. Дата публикации: 2007-04-19.

Coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device

Номер патента: US20180329295A1. Автор: Yousuke Murakami,Seongmu BAK,Naotsugu Muro,Yoshinori Taguchi,Akiko YOSHII. Владелец: Fujifilm Corp. Дата публикации: 2018-11-15.

Rinsing liquid and pattern forming method

Номер патента: US20230132693A1. Автор: Satomi Takahashi,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2023-05-04.

Pattern forming method, graft polymer-based pattern material, conductive pattern forming method and conductive pattern material

Номер патента: EP1580595A3. Автор: Takeyoshi c/o FUJI PHOTO FILM CO. LTD. KANO,Koichi C/O Fuji Photo Film Co. Ltd. Kawamura. Владелец: Fujifilm Corp. Дата публикации: 2009-05-06.

Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device

Номер патента: EP4129974A4. Автор: Eiji Fukuzaki,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-09-13.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern-forming method, method for producing electronic device, resist film-equipped mask blank, pattern-forming method for resist film-equipped mask blank

Номер патента: WO2019039290A1. Автор: 土村　智孝,一成 八木. Владелец: 富士フイルム株式会社. Дата публикации: 2019-02-28.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for producing electronic device and photoacid generator

Номер патента: WO2018116916A1. Автор: 啓太 加藤,研由 後藤,大輔 浅川,享平 崎田,雅史 小島,惠瑜 王. Владелец: 富士フイルム株式会社. Дата публикации: 2018-06-28.

A radiation-sensitive resin composition, a resist pattern forming method, a polymer, and a compound

Номер патента: TWI525389B. Автор: Tomoki Nagai,Mitsuo Satou,Yuusuke Asano,Hitoshi Oosaki. Владелец: JSR Corp. Дата публикации: 2016-03-11.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

Номер патента: CN105008996A. Автор: 白川三千纮,片冈祥平,渉谷明规,福原敏明,古谷创. Владелец: Fujifilm Corp. Дата публикации: 2015-10-28.

Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film

Номер патента: SG11201901510VA. Автор: Tomoyuki Ando,Ryosuke Nakamura,Tokunori Yamadaya. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2019-03-28.

Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film

Номер патента: US20190235380A1. Автор: Tomoyuki Ando,Ryosuke Nakamura,Tokunori Yamadaya. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2019-08-01.

Composition for pattern formation, and pattern-forming method

Номер патента: US11370872B2. Автор: Masafumi Hori,Hiroyuki Komatsu,Tomohiro Oda,Takehiko Naruoka,Hitoshi Osaki. Владелец: JSR Corp. Дата публикации: 2022-06-28.

Composition for pattern formation, and pattern-forming method

Номер патента: US20190135967A1. Автор: Masafumi Hori,Hiroyuki Komatsu,Tomohiro Oda,Takehiko Naruoka,Hitoshi Osaki. Владелец: JSR Corp. Дата публикации: 2019-05-09.

Active-light-sensitive or radiation-sensitive resin composition, and method for producing resist pattern

Номер патента: EP4411477A1. Автор: Kei Yamamoto,Michihiro Shirakawa,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2024-08-07.

Actinic ray-sensitive or radiation-sensitive resin composition and method for producing resist pattern

Номер патента: US20240248397A1. Автор: Kei Yamamoto,Michihiro Shirakawa,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2024-07-25.

Resist pattern-forming method

Номер патента: US20130323653A1. Автор: Koji Ito,Hirokazu Sakakibara,Hiromu Miyata,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2013-12-05.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device

Номер патента: US09766547B2. Автор: Shuji Hirano,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2017-09-19.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20160363859A1. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2016-12-15.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US09760004B2. Автор: Masafumi Hori,Hayato Namai,Hiromu Miyata. Владелец: JSR Corp. Дата публикации: 2017-09-12.

Method for forming negative pattern, method for producing electronic device, electronic device and actinic ray-sensitive or radiation-sensitive resin composition

Номер патента: WO2013172466A1. Автор: Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi,Fumihiro Yoshino,Junichi Itou. Владелец: FUJIFILM Corporation. Дата публикации: 2013-11-21.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device

Номер патента: US20140349224A1. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takeshi Kawabata,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2014-11-27.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

Номер патента: US09952509B2. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2018-04-24.

Radiation-sensitive resin composition

Номер патента: US20120202150A1. Автор: Koji Ito,Hirokazu Sakakibara,Hiromu Miyata,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2012-08-09.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device

Номер патента: US9632410B2. Автор: Tomotaka Tsuchimura,Shuhei Yamaguchi,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2017-04-25.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US09841679B2. Автор: Kei Yamamoto,Keita Kato,Akinori Shibuya,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2017-12-12.

Negative resist pattern-forming method, and composition for upper layer film formation

Номер патента: US20190004426A1. Автор: Sosuke OSAWA,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2019-01-03.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and electronic device manufacturing method

Номер патента: EP3919981A1. Автор: Kei Yamamoto,Minoru Uemura,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU,Yasuharu SHIRAISHI. Владелец: Fujifilm Corp. Дата публикации: 2021-12-08.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230259029A1. Автор: Keita Kato,Akihiro Kaneko,Akiyoshi Goto,Masafumi KOJIMA,Yuta Okuaki. Владелец: Fujifilm Corp. Дата публикации: 2023-08-17.

Negative resist pattern-forming method, and composition for upper layer film formation

Номер патента: US20160299432A1. Автор: Sosuke OSAWA,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2016-10-13.

Pattern forming method, and, electronic device producing method and electronic device, each using the same

Номер патента: US09885956B2. Автор: Kei Yamamoto,Tsukasa Yamanaka,Naoya Iguchi,Ryosuke Ueba. Владелец: Fujifilm Corp. Дата публикации: 2018-02-06.

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Номер патента: EP2761372A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Takeshi Kawabata. Владелец: Fujifilm Corp. Дата публикации: 2014-08-06.

Radiation-sensitive resin composition and method of forming resist pattern

Номер патента: US20220413385A1. Автор: Kazuya KIRIYAMA,Takuhiro Taniguchi,Natsuko Kinoshita,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2022-12-29.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

Номер патента: WO2012118168A1. Автор: Hidenori Takahashi,Shuhei Yamaguchi,Shohei Kataoka,Michihiro Shirakawa,Shoichi Saitoh,Fumihiro Yoshino. Владелец: FUJIFILM Corporation. Дата публикации: 2012-09-07.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and pattern forming method

Номер патента: US20150355541A1. Автор: Kaoru Iwato. Владелец: Fujifilm Corp. Дата публикации: 2015-12-10.

Resist pattern-forming method, and radiation-sensitive composition and production method thereof

Номер патента: US20200333707A1. Автор: Ken Maruyama,Miki TAMADA,Sousuke OOSAWA. Владелец: JSR Corp. Дата публикации: 2020-10-22.

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device

Номер патента: US20130084438A1. Автор: Kaoru Iwato,Shuji Hirano,Hideaki Tsubaki. Владелец: Fujifilm Corp. Дата публикации: 2013-04-04.

Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device

Номер патента: US20220283499A1. Автор: Kazuyoshi Mizutani,Kei Yamamoto,Takeshi Kawabata. Владелец: Fujifilm Corp. Дата публикации: 2022-09-08.

Resist pattern-forming method

Номер патента: US20170329228A1. Автор: Hiromitsu Nakashima,Tomohiko Sakurai,Sousuke OOSAWA,Kousuke TERAYAMA. Владелец: JSR Corp. Дата публикации: 2017-11-16.

Photosensitive resin composition, pattern forming method, cured film, laminate, and device

Номер патента: US12078929B2. Автор: Toshihide Aoshima,Kenta Yamazaki. Владелец: Fujifilm Corp. Дата публикации: 2024-09-03.

Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Номер патента: US11573491B2. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2023-02-07.

Photosensitive resin composition, pattern forming method, cured film, laminate, and device

Номер патента: US20210302835A1. Автор: Toshihide Aoshima,Kenta Yamazaki. Владелец: Fujifilm Corp. Дата публикации: 2021-09-30.

Photosensitive resin composition, pattern forming method, cured film, multilayer body and device

Номер патента: EP3893053A1. Автор: Toshihide Aoshima,Kenta Yamazaki. Владелец: Fujifilm Corp. Дата публикации: 2021-10-13.

Pattern forming method and method for manufacturing electronic device using same

Номер патента: US20170146908A1. Автор: Keita Kato,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2017-05-25.

Negative-type photosensitive composition for euv light, pattern forming method, and manufacturing method of electronic device

Номер патента: EP3779596A1. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2021-02-17.

Negative tone photosensitive composition for euv light, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210011380A1. Автор: Michihiro Shirakawa,Wataru Nihashi,Michihiro OGAWA. Владелец: Fujifilm Corp. Дата публикации: 2021-01-14.

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Номер патента: US8530148B2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2013-09-10.

Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof

Номер патента: US20130288178A1. Автор: Kuang-Jung Chen,Wu-Song Huang,Wai-Kin Li. Владелец: International Business Machines Corp. Дата публикации: 2013-10-31.

Pattern-forming method

Номер патента: US20170184961A1. Автор: Hisashi Nakagawa,Takehiko Naruoka,Motohiro SHIRATANI. Владелец: JSR Corp. Дата публикации: 2017-06-29.

Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method

Номер патента: US09588423B2. Автор: Norihiko Ikeda,Hayato Namai. Владелец: JSR Corp. Дата публикации: 2017-03-07.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blank, resist pattern forming method, and photomask

Номер патента: JP6209103B2. Автор: 智孝 土村,修平 山口,土村　智孝,夏海 横川. Владелец: Fujifilm Corp. Дата публикации: 2017-10-04.

Radiation-sensitive resin composition, resist pattern forming method, radiation-sensitive acid generator and compound

Номер патента: WO2014141979A1. Автор: 憲彦 池田,永井　智樹,準人 生井,啓之 仁井. Владелец: Jsr株式会社. Дата публикации: 2014-09-18.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

Номер патента: EP2411873A4. Автор: Shuji Hirano,Toru Fujimori,Shinki Yamada,Kana Fuji. Владелец: Fujifilm Corp. Дата публикации: 2013-12-04.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

Номер патента: TW201042375A. Автор: Shuji Hirano,Toru Fujimori,Kana Fujii,Shinki Yamada. Владелец: Fujifilm Corp. Дата публикации: 2010-12-01.

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD

Номер патента: US20150079520A1. Автор: NAMAI Hayato,IKEDA Norihiko. Владелец: JSR Corporation. Дата публикации: 2015-03-19.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, CARBOXYLIC ACID SALT AND CARBOXYLIC ACID

Номер патента: US20190391488A1. Автор: OKAZAKI Satoshi,Nishikori Katsuaki. Владелец: JSR Corporation. Дата публикации: 2019-12-26.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

Номер патента: IL265647A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2019-05-30.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Номер патента: TW201214035A. Автор: Shuji Hirano,Hideaki Tsubaki,Tomotaka Tsuchimura,Hidenori Takahashi,Takeshi Kawabata. Владелец: Fujifilm Corp. Дата публикации: 2012-04-01.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN

Номер патента: US20210072642A1. Автор: Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,KAWASHIMA Takashi,ASAKAWA Daisuke,OISHI Yasufumi. Владелец: FUJIFILM Corporation. Дата публикации: 2021-03-11.

COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20160116840A1. Автор: Tsuchimura Tomotaka. Владелец: FUJIFILM Corporation. Дата публикации: 2016-04-28.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN

Номер патента: US20140212797A1. Автор: TSUBAKI Hideaki,Kawabata Takeshi. Владелец: FUJIFILM Corporation. Дата публикации: 2014-07-31.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN

Номер патента: US20200393762A1. Автор: GOTO Akiyoshi,OGAWA Michihiro,KAWASHIMA Takashi,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2020-12-17.

Radiation-sensitive resin composition, polymer, monomer and method for producing radiation-sensitive resin composition

Номер патента: KR101761434B1. Автор: 겐 마루야마. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2017-07-25.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20180120701A1. Автор: HIRANO Shuji. Владелец: FUJIFILM Corporation. Дата публикации: 2018-05-03.

Acid diffusion control agent, radiation-sensitive resin composition, method for forming resist pattern, compound, and method for producing compound

Номер патента: KR102046850B1. Автор: 노리히코 이케다,하야토 나마이. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2019-11-20.

Photosensitive radiation-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and manufacturing method of electronic device

Номер патента: TWI778122B. Автор: 土村智孝,八木一成,川島敬史,白川三千紘,古谷創. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2022-09-21.

Radiation-sensitive resin composition, spacer for liquid crystal display panel, method for forming spacer for liquid crystal display panel, and liquid crystal display panel

Номер патента: TW200739259A. Автор: Toshihiro Nishio,Hitoshi Hamaguchi,Daigo Ichinohe,Shunpei Kuma. Владелец: JSR Corp. Дата публикации: 2007-10-16.

Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method

Номер патента: US20200407476A1. Автор: Takuo Sone,Ken Maruyama,Motohiro SHIRATANI,Yoshiki Nonoyama. Владелец: JSR Corp. Дата публикации: 2020-12-31.

Thermosetting resin composition for forming cured film, negative radiation-sensitive resin composition, positive radiation-sensitive resin composition, cured film, method for forming the same, semiconductor device and display device

Номер патента: KR102115817B1. Автор: 유키오 니시무라,다카오 야시로,에리 미시마,츠토무 시모카와. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2020-05-27.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200019058A1. Автор: NISHIDA Yoichi,Yoshimura Tsutomu,Yonekuta Yasunori,HIGASHI Kohei,Hatakeyama Naoya. Владелец: FUJIFILM Corporation. Дата публикации: 2020-01-16.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210055653A1. Автор: NISHIDA Yoichi,Yoshimura Tsutomu,Yonekuta Yasunori,HIGASHI Kohei,Hatakeyama Naoya. Владелец: FUJIFILM Corporation. Дата публикации: 2021-02-25.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210165323A1. Автор: GOTO Akiyoshi,YAGI Kazunari,KAWASHIMA Takashi,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2021-06-03.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210191265A1. Автор: GOTO Akiyoshi,OGAWA Michihiro,YAGI Kazunari,ASAKAWA Daisuke. Владелец: FUJIFILM Corporation. Дата публикации: 2021-06-24.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210216012A1. Автор: GOTO Akiyoshi,YAGI Kazunari,KAWASHIMA Takashi,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2021-07-15.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20200192220A1. Автор: Kazunari Yagi,Tomotaka Tsuchimura,Takashi Kawashima,Michihiro Shirakawa,Hajime Furutani. Владелец: Fujifilm Corp. Дата публикации: 2020-06-18.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210356862A1. Автор: Yamamoto Kei,GOTO Akiyoshi,KOJIMA Masafumi,UEMURA Minoru,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2021-11-18.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, electronic device manufacturing method, compound, and resin

Номер патента: KR102210616B1. Автор: 아키요시 고토,아키라 타카다,료 니시오,미치히로 시라카와,나오히로 탄고,카즈히로 마루모,쿄헤이 사키타. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2021-02-02.

Sensitive light-sensitive or radiation-sensitive resin composition, sensitive light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing an electronic device.

Номер патента: JP6796650B2. Автор: 直紘 丹呉,三千紘 白川,研由 後藤,西尾　亮,亮 西尾,享平 崎田,暁 ▲高▼田,和博 丸茂. Владелец: Fujifilm Corp. Дата публикации: 2020-12-09.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: EP2715451A4. Автор: Keita Kato,Hidenori Takahashi,Michihiro Shirakawa,Shoichi Saitoh,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2015-03-04.

Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: KR101827776B1. Автор: 와타루 니하시,나츠미 요코카와,슈지 히라노,히로오 타키자와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-02-09.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

Номер патента: US20150086912A1. Автор: TSUBAKI Hideaki,Kawabata Takeshi,Takizawa Hiroo,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-03-26.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method

Номер патента: JP7191981B2. Автор: 慶 山本,三千紘 白川,敬史 川島,研由 後藤,大輔 浅川. Владелец: Fujifilm Corp. Дата публикации: 2022-12-19.

Actinic light-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and manufacturing method of electronic device

Номер патента: JPWO2020129476A1. Автор: 慶 山本,三千紘 白川,敬史 川島,研由 後藤,大輔 浅川. Владелец: Fujifilm Corp. Дата публикации: 2021-10-14.

Radiation-sensitive resin composition, resist pattern formation method, and radiation-sensitive acid generator

Номер патента: TW202112845A. Автор: 桐山和也,森秀斗,谷口拓弘,錦織克聡,丸山研. Владелец: 日商Ｊｓｒ股份有限公司. Дата публикации: 2021-04-01.

ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200401045A1. Автор: Shirakawa Michihiro,GOTO Akiyoshi,SAKITA Kyohei,OKA Hironori,ASAKAWA Daisuke. Владелец: FUJIFILM Corporation. Дата публикации: 2020-12-24.

Sensitized ray or radiation-sensitive resin composition, sensitized ray or radioactivity-sensitive film, pattern forming method, the manufacturing method of electronic device, compound and resin

Номер патента: CN109643064A. Автор: 丹吴直纮,白川三千纮,后藤研由,高田晓,西尾亮,丸茂和博,崎田享平. Владелец: Fujifilm Corp. Дата публикации: 2019-04-16.

Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device

Номер патента: US9527809B2. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2016-12-27.

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same

Номер патента: US20130001751A1. Автор: Naoki Inoue. Владелец: Fujifilm Corp. Дата публикации: 2013-01-03.

Resin composition for forming underlayer film, laminate, pattern forming method, kit for forming imprint, and method for manufacturing device

Номер патента: WO2016152600A1. Автор: 大松　禎,北川　浩隆,雄一郎 後藤. Владелец: 富士フイルム株式会社. Дата публикации: 2016-09-29.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US09904168B2. Автор: Shuhei Yamaguchi,Koutarou Takahashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2018-02-27.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, and method for producing electronic device

Номер патента: EP4039669A1. Автор: Toshiya Takahashi,Eiji Fukuzaki,Yasunori Yonekuta,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2022-08-10.

Pattern-forming method for forming a conductive circuit pattern

Номер патента: US09980393B2. Автор: Kwang-Seong Choi,Hyun-Cheol Bae,Yong Sung Eom,Jong Tae Moon,Jung Hyun Noh. Владелец: Electronics and Telecommunications Research Institute ETRI. Дата публикации: 2018-05-22.

Lithography pattern forming method using self-organizing block copolymer

Номер патента: US09816004B2. Автор: Yusuke KASAHARA,Ayako KAWANISHI,Hiroki YONEMITSU. Владелец: Toshiba Memory Corp. Дата публикации: 2017-11-14.

Pattern forming method

Номер патента: EP4332677A1. Автор: Seiichiro Tachibana,Takeru Watanabe,Daisuke Kori,Takashi Sawamura. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-03-06.

Pattern Forming Method

Номер патента: US20240103365A1. Автор: Seiichiro Tachibana,Takeru Watanabe,Daisuke Kori,Takashi Sawamura. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-03-28.

Pattern forming method, under coating agent, and laminate

Номер патента: US20200048491A1. Автор: Kimiko Hattori,Kazuyo MORITA. Владелец: Oji Holdings Corp. Дата публикации: 2020-02-13.

Photosensitive resin composition

Номер патента: US6537719B1. Автор: Shuichi Takahashi. Владелец: Clariant Finance BVI Ltd. Дата публикации: 2003-03-25.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200183280A1. Автор: Tsuchimura Tomotaka,OGAWA Michihiro,KAWASHIMA Takashi,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2020-06-11.

Method for producing resist composition and pattern forming method

Номер патента: US20230045851A1. Автор: Kazunari Yagi,Michihiro Shirakawa,Mitsuhiro Fujita,Naohiro Tango,Akiyoshi Goto,Kyohei Sakita. Владелец: Fujifilm Corp. Дата публикации: 2023-02-16.

Pattern forming method

Номер патента: US20170184972A1. Автор: Hidetami Yaegashi. Владелец: Tokyo Electron Ltd. Дата публикации: 2017-06-29.

Pattern forming method

Номер патента: US10539876B2. Автор: Hidetami Yaegashi. Владелец: Tokyo Electron Ltd. Дата публикации: 2020-01-21.

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for producing electronic device

Номер патента: EP4446811A1. Автор: Akihiro Kaneko,Minoru Uemura,Akiyoshi Goto,Masafumi KOJIMA,Aina Shibuya. Владелец: Fujifilm Corp. Дата публикации: 2024-10-16.

Resist pattern-forming method

Номер патента: US20150050600A9. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2015-02-19.

Resist pattern-forming method

Номер патента: US20170322492A1. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2017-11-09.

Resist pattern-forming method

Номер патента: US20140134544A1. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2014-05-15.

Resist pattern-forming method

Номер патента: US20160320705A1. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2016-11-03.

Resist pattern-forming method

Номер патента: US20160097978A1. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2016-04-07.

Resist pattern-forming method

Номер патента: US20150160556A1. Автор: Hiromitsu Tanaka,Hirokazu Sakakibara,Takashi Mori,Kazunori Takanashi,Yusuke Anno,Taiichi Furukawa,Shin-ya MINEGISHI. Владелец: JSR Corp. Дата публикации: 2015-06-11.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and photo mask

Номер патента: US12061418B2. Автор: Toshiya Takahashi,Hideyuki Ishihara. Владелец: Fujifilm Corp. Дата публикации: 2024-08-13.

Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition

Номер патента: US20140287363A1. Автор: Kaoru Iwato,Akinori Shibuya. Владелец: Fujifilm Corp. Дата публикации: 2014-09-25.

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

Номер патента: EP2577397A1. Автор: Kaoru Iwato,Shuji Hirano,Sou Kamimura,Keita Kato,Hidenori Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2013-04-10.

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

Номер патента: US09760003B2. Автор: Kaoru Iwato,Shuji Hirano,Sou Kamimura,Keita Kato,Hidenori Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2017-09-12.

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

Номер патента: US10488755B2. Автор: Shuji Hirano,Akira Takada,Hidehiro Mochizuki. Владелец: Fujifilm Corp. Дата публикации: 2019-11-26.

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

Номер патента: US20180017865A1. Автор: Shuji Hirano,Akira Takada,Hidehiro Mochizuki. Владелец: Fujifilm Corp. Дата публикации: 2018-01-18.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Номер патента: US20120301831A1. Автор: Toru Fujimori,Kana Fujii,Takamitsu Tomica. Владелец: Fujifilm Corp. Дата публикации: 2012-11-29.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Номер патента: EP2545412A1. Автор: Takamitsu Tomiga,Toru Fujimori,Kana Fujii. Владелец: Fujifilm Corp. Дата публикации: 2013-01-16.

Actinic ray-sensitive or radiation-sensitive resing composition, actinic ray-sensitive or radiation-sensitive film using the composition, and pattern forming method

Номер патента: US20140170564A1. Автор: Akinori Shibuya,Tomoki Matsuda,Yoko TOKUGAWA. Владелец: Fujifilm Corp. Дата публикации: 2014-06-19.

Pattern forming method, actinic ray sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device using same, and electronic device

Номер патента: US20160147147A1. Автор: Shuji Hirano,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2016-05-26.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition

Номер патента: EP2691809A1. Автор: Shuji Hirano,Hideaki Tsubaki,Tomotaka Tsuchimura,Hiroo Takizawa,Toshiya Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2014-02-05.

Radiation-sensitive resin composition, pattern formation method, method for manufacturing substrate, and compound

Номер патента: US20240319597A1. Автор: Masayuki Miyake,Ryuichi Nemoto,Michihiro Mita. Владелец: JSR Corp. Дата публикации: 2024-09-26.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

Номер патента: US20130015562A1. Автор: Kei Yamamoto,Tomoki Matsuda,Mitsuhiro Fujita. Владелец: Fujifilm Corp. Дата публикации: 2013-01-17.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, actinic ray-sensitive or radiation-sensitive resin composition for manufacturing photomask, and method for manufacturing photomask

Номер патента: US20230038825A1. Автор: Toshiya Takahashi,Eiji Fukuzaki,Hideyuki Ishihara,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-02-09.

Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same

Номер патента: EP2478414A1. Автор: Toru Fujimori,Tomotaka Tsuchimura,Hidenori Takahashi,Takayuki Ito,Kana Fujii. Владелец: Fujifilm Corp. Дата публикации: 2012-07-25.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same

Номер патента: US20130078426A1. Автор: Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi,Kosuke KOSHIJIMA. Владелец: Fujifilm Corp. Дата публикации: 2013-03-28.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20200012189A1. Автор: Keita Kato,Akira Takada,Akiyoshi Goto,Masafumi KOJIMA,Kyohei Sakita. Владелец: Fujifilm Corp. Дата публикации: 2020-01-09.

Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same composition

Номер патента: US20120207978A1. Автор: Kunihiko Kodama,Kenji Wada,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda. Владелец: Fujifilm Corp. Дата публикации: 2012-08-16.

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

Номер патента: EP2105440A2. Автор: Shuhei Yamaguchi,Akinori Shibuya,Yuko Yoshida,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2009-09-30.

Pattern forming method

Номер патента: US09696628B2. Автор: Hideki Kanai,Yusuke KASAHARA. Владелец: Toshiba Corp. Дата публикации: 2017-07-04.

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

Номер патента: EP2433178A1. Автор: Hideaki Tsubaki,Tomotaka Tsuchimura,Hidenori Takahashi,Koji Shirakawa,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2012-03-28.

Radiation-sensitive resin composition and method of forming resist pattern

Номер патента: US20240094634A1. Автор: Takahiro Kawai,Katsuaki NISHIKORI. Владелец: JSR Corp. Дата публикации: 2024-03-21.

Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device

Номер патента: WO2013187530A1. Автор: Kei Yamamoto,Ryosuke Ueba. Владелец: FUJIFILM Corporation. Дата публикации: 2013-12-19.

Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays

Номер патента: US8546063B2. Автор: Hideaki Tsubaki,Koji Shirakawa,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2013-10-01.

Pattern forming method, kit, and resist composition

Номер патента: US20230350290A1. Автор: Tetsuya Kamimura,Satomi Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2023-11-02.

Resist pattern-forming method and substrate-treating method

Номер патента: US20200218161A1. Автор: Ryuichi Serizawa,Tomoaki Seko,Nozomi SATOU,Yuusuke OOTSUBO,Tomoya TAJI,Souta NISHIMURA. Владелец: JSR Corp. Дата публикации: 2020-07-09.

Pattern forming method

Номер патента: US20170076940A1. Автор: Hideki Kanai,Yusuke KASAHARA. Владелец: Toshiba Corp. Дата публикации: 2017-03-16.

Resist pattern-forming method, substrate-processing method, and photoresist composition

Номер патента: US20160266489A1. Автор: Motoyuki Shima,Ryu Matsumoto,Yuji Yada,Yuichiro KATSURA,Ken Nakakura. Владелец: JSR Corp. Дата публикации: 2016-09-15.

Resist pattern-forming method, substrate-processing method, and photoresist composition

Номер патента: US09817311B2. Автор: Motoyuki Shima,Ryu Matsumoto,Yuji Yada,Yuichiro KATSURA,Ken Nakakura. Владелец: JSR Corp. Дата публикации: 2017-11-14.

Pattern forming method

Номер патента: US09659816B2. Автор: Koji Asakawa,Atsushi Hieno. Владелец: Toshiba Corp. Дата публикации: 2017-05-23.

NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMING METHOD, AND MASK BLANK PROVIDED WITH RESIST FILM

Номер патента: US20150309408A1. Автор: Tsuchimura Tomotaka,Yatsuo Tadateru. Владелец: FUJIFILM Corporation. Дата публикации: 2015-10-29.

Pattern forming method

Номер патента: US9437477B1. Автор: Makoto Aida. Владелец: Toshiba Corp. Дата публикации: 2016-09-06.

Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method

Номер патента: EP1642171A1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2006-04-05.

Method of designing an exposure mask, exposure method, pattern forming method and device manufacturing method

Номер патента: EP1642171B1. Автор: Takako Yamaguchi,Yasuhisa Inao. Владелец: Canon Inc. Дата публикации: 2011-06-15.

Pattern forming method

Номер патента: US20170184958A1. Автор: Koji Matsuo,Daisuke Kawamura,Masanobu Baba,Taishi ISHIKURA,Tatsuro SHINOZAKI. Владелец: Toshiba Corp. Дата публикации: 2017-06-29.

Gap filling composition and pattern forming method using composition containing polymer

Номер патента: US20200319556A1. Автор: Tatsuro Nagahara,Xiaowei Wang. Владелец: AZ Electronic Materials SARL. Дата публикации: 2020-10-08.

Pattern forming method and manufacturing method of semiconductor device

Номер патента: US09897918B2. Автор: Shinichi Ito,Hirokazu Kato,Tomoyuki Takeishi. Владелец: Toshiba Memory Corp. Дата публикации: 2018-02-20.

Pattern forming method

Номер патента: US09880464B2. Автор: Koji Matsuo,Daisuke Kawamura,Masanobu Baba,Taishi ISHIKURA,Tatsuro SHINOZAKI. Владелец: Toshiba Memory Corp. Дата публикации: 2018-01-30.

Multiple-pattern forming methods

Номер патента: US09753370B2. Автор: Phillip D. Hustad,Shintaro Yamada,Cong Liu,Cheng-Bai Xu,James C. Taylor,Jung Woo Kim,Choong-Bong LEE,Chang-Young Hong,Lori Anne Joesten. Владелец: Rohm and Haas Electronic Materials Korea Ltd. Дата публикации: 2017-09-05.

Pattern forming method

Номер патента: US20170068162A1. Автор: Yusuke KASAHARA. Владелец: Toshiba Corp. Дата публикации: 2017-03-09.

Chemical liquid, chemical liquid storage body, and pattern forming method

Номер патента: US20190346764A1. Автор: Tetsuya Kamimura. Владелец: Fujifilm Corp. Дата публикации: 2019-11-14.

Pattern forming method

Номер патента: US20160071740A1. Автор: Yoshihiro Naka,Katsuyoshi Kodera. Владелец: Toshiba Corp. Дата публикации: 2016-03-10.

Pattern-forming method

Номер патента: US09971247B2. Автор: Tomoki Nagai,Akihiro Oshima,Hisashi Nakagawa,Takehiko Naruoka,Seiji Nagahara,Seiichi Tagawa. Владелец: Osaka University NUC. Дата публикации: 2018-05-15.

Pattern-forming method

Номер патента: US09847232B1. Автор: Kristin Schmidt,Chi-chun Liu,Hitoshi Osaki. Владелец: International Business Machines Corp. Дата публикации: 2017-12-19.

Pattern forming method and method for manufacturing electronic device

Номер патента: US20220179312A1. Автор: Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2022-06-09.

Pattern forming method, actinic ray-sensitive or radiation-sensitive composition, and method for manufacturing electronic device

Номер патента: US20230087940A1. Автор: Kazunari Yagi,Hironori Oka,Michihiro Shirakawa,Mitsuhiro Fujita. Владелец: Fujifilm Corp. Дата публикации: 2023-03-23.

Pattern forming method and developer

Номер патента: US20200401043A1. Автор: Makoto Shimizu,Ryo Kawajiri,Noboru Ootsuka. Владелец: JSR Corp. Дата публикации: 2020-12-24.

Pattern forming method and method of manufacturing liquid crystal display device

Номер патента: US5795686A. Автор: Hideaki Takizawa,Shougo Hayashi. Владелец: Fujitsu Ltd. Дата публикации: 1998-08-18.

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

Номер патента: US20100330507A1. Автор: Hideaki Tsubaki,Kenji Wada,Shinji Tarutani,Wataru HOSHINO,Kazuyoshi Mizuyoshi. Владелец: Fujifilm Corp. Дата публикации: 2010-12-30.

Pattern forming method and template manufacturing method

Номер патента: US11809082B2. Автор: Mitsuru Kondo. Владелец: Kioxia Corp. Дата публикации: 2023-11-07.

Pattern forming method

Номер патента: US10366888B2. Автор: Kazuki Yamada,Takehiro Seshimo,Masatoshi Yamato,Hidetami Yaegashi,Yoshitaka Komuro,Katsumi Ohmori. Владелец: Tokyo Electron Ltd. Дата публикации: 2019-07-30.

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

Номер патента: EP1975718A2. Автор: Hideaki Tsubaki,Wataru HOSHINO,Masahiro Yoshidome. Владелец: Fujifilm Corp. Дата публикации: 2008-10-01.

Pattern forming method

Номер патента: EP2413194A2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2012-02-01.

Pattern forming method by imparting hydrogen atoms and selectively depositing metal film

Номер патента: US5861233A. Автор: Yasuhiro Sekine,Hiroshi Yuzurihara,Genzo Momma. Владелец: Canon Inc. Дата публикации: 1999-01-19.

Pattern forming method utilizing first insulative and then conductive overlayer and underlayer

Номер патента: US5994007A. Автор: Shuji Hayase,Yasunobu Onishi,Atsushi Ando,Yasuhiko Sato,Yoshihiko Nakano,Rikako Kani. Владелец: Toshiba Corp. Дата публикации: 1999-11-30.

Pattern forming method, droplet ejecting device, and electro-optic device

Номер патента: US20080170092A1. Автор: Kohei Ishida. Владелец: Seiko Epson Corp. Дата публикации: 2008-07-17.

Composition for pattern formation, and pattern-forming method

Номер патента: US20150253671A1. Автор: Yuji Namie,Tomoki Nagai,Hiroyuki Komatsu,Shinya Minegishi. Владелец: JSR Corp. Дата публикации: 2015-09-10.

Photosensitive composition, cured film, pattern forming method, color filter, solid-state imaging element, and image display device

Номер патента: US20190212644A1. Автор: Yoshinori Taguchi,Hiroyuki Morishita,Kazuya Oota,Akiko YOSHII. Владелец: Fujifilm Corp. Дата публикации: 2019-07-11.

Chemical liquid, pattern forming method, and kit

Номер патента: US20190258165A1. Автор: Takashi Nakamura,Tetsuya Kamimura,Satomi Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2019-08-22.

Pattern-forming method

Номер патента: US20170184960A1. Автор: Hisashi Nakagawa,Takehiko Naruoka,Tomohisa Fujisawa,Motohiro SHIRATANI. Владелец: JSR Corp. Дата публикации: 2017-06-29.

Pattern-forming method

Номер патента: US20180017864A9. Автор: Hisashi Nakagawa,Takehiko Naruoka,Tomohisa Fujisawa,Motohiro SHIRATANI. Владелец: JSR Corp. Дата публикации: 2018-01-18.

Pattern-forming method and composition for resist pattern-refinement

Номер патента: US20160291462A1. Автор: Ken Maruyama,Yusuke Anno,Kanako MEYA,Shuto MORI. Владелец: JSR Corp. Дата публикации: 2016-10-06.

Pattern forming method

Номер патента: US20170178896A1. Автор: Shinichi Ito,Ryoichi Suzuki,Seiji Morita,Kazuto Matsuki. Владелец: Toshiba Corp. Дата публикации: 2017-06-22.

Chemical liquid, chemical liquid storage body, pattern forming method, and kit

Номер патента: US11747727B2. Автор: Tetsuya Kamimura,Satomi Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2023-09-05.

Pattern forming method

Номер патента: US10018915B2. Автор: Shinichi Ito,Ryoichi Suzuki,Seiji Morita,Kazuto Matsuki. Владелец: Toshiba Memory Corp. Дата публикации: 2018-07-10.

Resist material and pattern forming method

Номер патента: US20230296980A1. Автор: Masahiro Fukushima,Tomohiro Kobayashi,Masayoshi Sagehashi,Kousuke Ohyama,Yutaro OTOMO,Gentaro Hida. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-09-21.

Pattern-forming method

Номер патента: WO2013061601A1. Автор: Hiroki Nakagawa,Kentaro Harada,Hayato Namai,Takehiko Naruoka. Владелец: JSR Corporation. Дата публикации: 2013-05-02.

Pattern-forming method

Номер патента: US20170052450A1. Автор: Tomoki Nagai,Akihiro Oshima,Hisashi Nakagawa,Takehiko Naruoka,Seiji Nagahara,Seiichi Tagawa. Владелец: Osaka University NUC. Дата публикации: 2017-02-23.

Actinic light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, and method of manufacturing electronic device

Номер патента: JPWO2018042892A1. Автор: 敬充 冨賀,敏明 福原,直也 畠山,文博 吉野,康智 米久田. Владелец: Fujifilm Corp. Дата публикации: 2019-06-24.

Etching pattern forming method in semiconductor manufacturing process

Номер патента: US12094719B2. Автор: Seung Hyun Lee,Su Jin Lee,Seung Hun Lee,Gi Hong Kim. Владелец: Youngchang Chemical Co Ltd. Дата публикации: 2024-09-17.

Composition for film formation, resist composition, radiation-sensitive composition, method for producing amorphous film, resist pattern formation method, composition for underlayer film formation for lithography, method for producing underlayer film for lithography, circuit pattern formation method, composition for optical member formation, resin for underlayer film formation, resist resin, radiation-sensitive resin, and resin for underlayer film formation for lithography

Номер патента: US20240117101A1. Автор: Hiroaki Yamamoto,Masatoshi Echigo,Takashi Makinoshima,Junya Horiuchi,Atsuko Iwasaki,Kodai MATSUURA. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2024-04-11.

Radiation-sensitive resin composition and resist pattern forming method

Номер патента: JP5673670B2. Автор: 恭彦 松田,峰規 川上. Владелец: JSR Corp. Дата публикации: 2015-02-18.

Method for producing radiation-sensitive resin composition and pattern forming method

Номер патента: US12061415B2. Автор: Takamitsu Tomiga,Takumi Tanaka,Takashi Bannai,Kohei Higashi,Fumihiro Yoshino,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2024-08-13.

Pattern-forming methods

Номер патента: WO1999001796A3. Автор: Anthony Paul Kitson,Kevin Barry Ray,Stuart Bayes,Alan Stanley Victor Monk,Christopher David Mccullough. Владелец: Kodak Polychrome Graphics Llc. Дата публикации: 1999-03-25.

High heat resistance resist composition and pattern forming method using the same

Номер патента: WO2017084742A1. Автор: Masato Suzuki,Hiroshi Hitokawa,Tomohide Katayama. Владелец: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.. Дата публикации: 2017-05-26.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Номер патента: US20240353753A1. Автор: Takamitsu Tomiga,Hideaki Tsubaki,Asahi Takaki. Владелец: Fujifilm Corp. Дата публикации: 2024-10-24.

Radiation sensitive resin composition for roller coating and roller coating method

Номер патента: MY133351A. Автор: Yamamoto Kenji. Владелец: Az Electronic Mat Japan K K. Дата публикации: 2007-11-30.

Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device

Номер патента: US9448482B2. Автор: Kaoru Iwato,Hiroo Takizawa,Takanobu Takeda. Владелец: Fujifilm Corp. Дата публикации: 2016-09-20.

Positive type radiation-sensitive resin composition

Номер патента: US20060223010A1. Автор: Takayuki Tsuji,Daisuke Shimizu,Tomoki Nagai,Kentarou Harada. Владелец: Individual. Дата публикации: 2006-10-05.

Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Номер патента: US20230213861A1. Автор: Takamitsu Tomiga,Takumi Tanaka,Fumihiro Yoshino,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2023-07-06.

Radiation-sensitive resin composition

Номер патента: US20120219903A1. Автор: Mitsuo Sato,Hiromitsu Nakashima,Kazuo Nakahara. Владелец: JSR Corp. Дата публикации: 2012-08-30.

Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film

Номер патента: US9316910B2. Автор: Hidenori Takahashi,Shuhei Yamaguchi,Shohei Kataoka,Michihiro Shirakawa,Shoichi Saitoh,Fumihiro Yoshino. Владелец: Fujifilm Corp. Дата публикации: 2016-04-19.

Radiation-sensitive resin composition and electronic device

Номер патента: US09798233B2. Автор: Satoshi Abe. Владелец: Zeon Corp. Дата публикации: 2017-10-24.

Radiation-sensitive resin composition

Номер патента: US20060234153A1. Автор: Hiroyuki Ishii,Isao Nishimura,Yukio Nishimura,Eiichi Kobayashi. Владелец: Individual. Дата публикации: 2006-10-19.

Radiation-sensitive resin composition

Номер патента: US20090148790A1. Автор: Hiroyuki Ishii,Isao Nishimura,Yukio Nishimura,Eiichi Kobayashi. Владелец: JSR Corp. Дата публикации: 2009-06-11.

Positive type radiation-sensitive resin composition

Номер патента: IL174569A. Автор: . Владелец: JSR Corp. Дата публикации: 2010-11-30.

Radiation-sensitive resin composition

Номер патента: US6342542B1. Автор: Satoshi Kobayashi,Haruhiko Itoh,Hidekazu Shioda. Владелец: Clariant Finance BVI Ltd. Дата публикации: 2002-01-29.

Positive type radiation-sensitive resin composition

Номер патента: IL174569A0. Автор: . Владелец: JSR Corp. Дата публикации: 2006-08-20.

Radiation sensitive resin composition

Номер патента: US7078148B2. Автор: Hiroyuki Ishii,Atsushi Nakamura,Masafumi Yamamoto,Motoyuki Shima. Владелец: JSR Corp. Дата публикации: 2006-07-18.

Radiation sensitive resin composition

Номер патента: US5494777A. Автор: Toshiyuki Ota,Shinji Shiraki,Masaaki Inoue,Hidetoshi Miyamoto,Takao Miura,Yoshiji Yumoto. Владелец: Japan Synthetic Rubber Co Ltd. Дата публикации: 1996-02-27.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Номер патента: US8865389B2. Автор: Shuji Hirano,Hideaki Tsubaki,Hidenori Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2014-10-21.

Radiation-sensitive resin composition

Номер патента: US6048659A. Автор: Hiromichi Hara,Katsumi Inomata,Masaaki Inoue,Yoshiji Yumoto. Владелец: JSR Corp. Дата публикации: 2000-04-11.

Methods of forming resist pattern, forming electrode pattern, and manufacturing surface acoustic wave device

Номер патента: US6821712B2. Автор: Kenji Sakaguchi,Yoshihiro Koshido,Toshiyuki Fuyutsume. Владелец: Murata Manufacturing Co Ltd. Дата публикации: 2004-11-23.

Pattern forming method

Номер патента: US20100021850A1. Автор: Hiroko Nakamura. Владелец: Individual. Дата публикации: 2010-01-28.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP6782417B2. Автор: 名越　俊昌,俊昌 名越,壮和 粂. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2020-11-11.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP4985768B2. Автор: 秀行 片木,利純 吉野,邦明 佐藤,敬浩 日高,昌也 大川. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2012-07-25.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JPWO2013115189A1. Автор: 芳樹 味岡,純一 磯,賢治 神尾,味岡　芳樹,愛美 薄葉. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2015-05-11.

Pattern forming method for forming a pattern

Номер патента: US10317797B2. Автор: Takehiro Seshimo,Kenichi Oyama,Hidetami Yaegashi,Yoshitaka Komuro,Katsumi Ohmori. Владелец: Tokyo Electron Ltd. Дата публикации: 2019-06-11.

Pattern forming method, combined processing apparatus, and recording medium

Номер патента: US20230089980A1. Автор: Noriko Sakurai,Kosuke TAKAI. Владелец: Kioxia Corp. Дата публикации: 2023-03-23.

Pattern forming method, template manufacturing method, and semiconductor device manufacturing method

Номер патента: US20230420291A1. Автор: Masatoshi Terayama. Владелец: Kioxia Corp. Дата публикации: 2023-12-28.

Pattern forming method and template manufacturing method

Номер патента: US20210088906A1. Автор: Hideaki Sakurai,Noriko Sakurai,Takeharu Motokawa,Ryu Komatsu. Владелец: Kioxia Corp. Дата публикации: 2021-03-25.

Positive resist composition and pattern forming method using the same

Номер патента: US7338744B2. Автор: Hideaki Tsubaki,Shinji Tarutani. Владелец: Fujifilm Corp. Дата публикации: 2008-03-04.

Pattern forming method using contrast enhanced material

Номер патента: US4849323A. Автор: Kazufumi Ogawa,Masayuki Endo,Masaru Sasago. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 1989-07-18.

Exposure pattern forming method and exposure pattern

Номер патента: US20050174557A1. Автор: Kazuhisa Ogawa,Hidetoshi Ohnuma. Владелец: Sony Corp. Дата публикации: 2005-08-11.

Pattern forming method, template manufacturing method, and photomask manufacturing method

Номер патента: US20220091499A1. Автор: Yoshinori Kagawa. Владелец: Kioxia Corp. Дата публикации: 2022-03-24.

Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition

Номер патента: US8841059B2. Автор: Kenichi Okuyama,Yasunori Nagatsuka. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2014-09-23.

Exposure pattern forming method and exposure pattern

Номер патента: US20050204330A1. Автор: Kazuhisa Ogawa,Hidetoshi Ohnuma. Владелец: Sony Corp. Дата публикации: 2005-09-15.

Imprint pattern forming method

Номер патента: US8444889B2. Автор: Ikuo Yoneda,Ryoichi Inanami,Hiroshi Tokue. Владелец: Toshiba Corp. Дата публикации: 2013-05-21.

Pattern forming method

Номер патента: US20140231380A1. Автор: Yuriko Seino,Hiroki YONEMITSU. Владелец: Toshiba Corp. Дата публикации: 2014-08-21.

Patterns forming method

Номер патента: US09929019B2. Автор: Kuo-Yao Chou. Владелец: Micron Technology Inc. Дата публикации: 2018-03-27.

Pattern-forming method and resist underlayer film-forming composition

Номер патента: US09607849B2. Автор: Toru Kimura,Takashi Mori,Yoshio Takimoto,Shinya Minegishi,Kyoyu Yasuda,Shinya NAKAFUJI,Kazuhiko KOUMURA. Владелец: JSR Corp. Дата публикации: 2017-03-28.

Photosensitive composition, transfer film, pattern forming method, method for manufacturing circuit wiring, and method for manufacturing touch panel

Номер патента: US20240210828A1. Автор: Kunihiko Kodama,Keigo YAMAGUCHI. Владелец: Fujifilm Corp. Дата публикации: 2024-06-27.

Mold, pattern forming method, and pattern forming apparatus

Номер патента: EP2090929A3. Автор: Masao C/O Canon Kabushiki Kaisha Majima,Nobuhito c/o CANON KABUSHIKI KAISHA Suehira,Hideki c/o CANON KABUSHIKI KAISHA Ina,Atsunori c/o CANON KABUSHIKI KAISHA Terasaki,Junichi c/o CANON KABUSHIKI KAISHA Seki. Владелец: Canon Inc. Дата публикации: 2009-09-16.

Pattern forming method

Номер патента: US9412618B2. Автор: Eiichi Nishimura,Fumiko Yamashita,Shinya Morikita. Владелец: Tokyo Electron Ltd. Дата публикации: 2016-08-09.

Pattern forming method and method for manufacturing semiconductor device

Номер патента: US11798806B2. Автор: Yusuke KASAHARA. Владелец: Kioxia Corp. Дата публикации: 2023-10-24.

Pattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist

Номер патента: US20190391484A1. Автор: Keiko Chiba,Weijun Liu,Toshiki Ito,Toshiaki Ando,Shingo Ishida,Timothy Brian Stachowiak. Владелец: Canon Inc. Дата публикации: 2019-12-26.

Pattern forming method

Номер патента: US20160042970A1. Автор: Eiichi Nishimura,Fumiko Yamashita,Shinya Morikita. Владелец: Tokyo Electron Ltd. Дата публикации: 2016-02-11.

Resin composition for acoustic matching layer, cured product, acoustic matching sheet, acoustic probe, acoustic measuring apparatus, method for producing acoustic probe, and acoustic matching layer material set

Номер патента: US11891505B2. Автор: Yoshihiro Nakai,Kazuhiro Hamada,Kazushi Furukawa. Владелец: Fujifilm Corp. Дата публикации: 2024-02-06.

Pattern forming method

Номер патента: US4824766A. Автор: Kazufumi Ogawa. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 1989-04-25.

Pattern forming method, photomask substrate creation method, photomask creation method, and photomask

Номер патента: US20210341830A1. Автор: Shoji Mimotogi,Yukio Oppata. Владелец: Kioxia Corp. Дата публикации: 2021-11-04.

Pattern forming method and pattern forming apparatus

Номер патента: US20160243753A1. Автор: Yoshihisa Kawamura,Masayuki Hatano. Владелец: Toshiba Corp. Дата публикации: 2016-08-25.

Chemical liquid supply method and pattern forming method

Номер патента: US20230229078A1. Автор: Masahiro Yoshidome. Владелец: Fujifilm Corp. Дата публикации: 2023-07-20.

Pre-wet liquid, resist film forming method, pattern forming method, and kit

Номер патента: US20220197137A1. Автор: Satomi Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2022-06-23.

Pattern forming method, manufacturing method of semiconductor device, and semiconductor device

Номер патента: US20240096644A1. Автор: Katsuyoshi Kodera,Koki Ueha. Владелец: Kioxia Corp. Дата публикации: 2024-03-21.

Image forming methods, pattern forming methods, pattern forming material and planographic printing plate

Номер патента: EP1475230A3. Автор: Koichi Kawamura,Takeyoshi Kano. Владелец: Fujifilm Corp. Дата публикации: 2009-03-25.

Pattern forming method and pattern structural body

Номер патента: US20170168388A1. Автор: Masahiko Akiyama. Владелец: Toshiba Corp. Дата публикации: 2017-06-15.

Pattern forming method and semiconductor device manufacturing method

Номер патента: US20160079076A1. Автор: Hiroshi Yamamoto,Mitsuhiro Omura,Tsubasa IMAMURA. Владелец: Toshiba Corp. Дата публикации: 2016-03-17.

Positive resist compostion and pattern forming method using the same

Номер патента: EP1975717A2. Автор: Kazuyoshi Mizutani,Shuji Hirano. Владелец: Fujifilm Corp. Дата публикации: 2008-10-01.

Organic anti-reflective coating composition and pattern forming method using the same

Номер патента: US20050014094A1. Автор: Sam Kim,Geun Lee. Владелец: Hynix Semiconductor Inc. Дата публикации: 2005-01-20.

Fine pattern forming method

Номер патента: US20060204899A1. Автор: Akitaka Shimizu,Masato Kushibiki. Владелец: Tokyo Electron Ltd. Дата публикации: 2006-09-14.

Pattern forming method

Номер патента: US20100237045A1. Автор: Ikuo Yoneda,Takeshi Koshiba,Tetsuro Nakasugi. Владелец: Individual. Дата публикации: 2010-09-23.

Pattern-forming method

Номер патента: US20190259606A1. Автор: Shinichi Ito,Ryuichi Saito,Ryoichi Suzuki,Seiji Morita,Soichi Inoue,Ryosuke Yamamoto,Takeharu Motokawa. Владелец: Kioxia Corp. Дата публикации: 2019-08-22.

Pattern forming method, imprint apparatus, and article manufacturing method

Номер патента: US11840010B2. Автор: Ryohei Suzuki. Владелец: Canon Inc. Дата публикации: 2023-12-12.

Pattern forming methods and semiconductor device manufacturing method

Номер патента: US20140038318A1. Автор: Hironobu Sato. Владелец: Toshiba Corp. Дата публикации: 2014-02-06.

Pattern forming method and pattern forming device

Номер патента: US20120049396A1. Автор: Osamu Ikenaga,Tomohiro Tsutsui,Ryoichi Inanami. Владелец: Individual. Дата публикации: 2012-03-01.

Pattern-forming method

Номер патента: US10811252B2. Автор: Shinichi Ito,Ryuichi Saito,Ryoichi Suzuki,Seiji Morita,Soichi Inoue,Ryosuke Yamamoto,Takeharu Motokawa. Владелец: Toshiba Memory Corp. Дата публикации: 2020-10-20.

Pattern forming method and system, and method of manufacturing a semiconductor device

Номер патента: US20080276216A1. Автор: Toshiya Kotani,Ayako Nakano. Владелец: Toshiba Corp. Дата публикации: 2008-11-06.

Pattern-forming method

Номер патента: US20170003592A1. Автор: Junya Suzuki,Hiromitsu Tanaka,Masayoshi Ishikawa,Yoshio Takimoto,Tomoaki Seko,Tomoharu KAWAZU. Владелец: JSR Corp. Дата публикации: 2017-01-05.

Pattern forming method

Номер патента: US9046763B2. Автор: Ikuo Yoneda,Takeshi Koshiba,Tetsuro Nakasugi. Владелец: Toshiba Corp. Дата публикации: 2015-06-02.

Pattern forming method, semiconductor device manufacturing method, and pattern forming apparatus

Номер патента: US20230298888A1. Автор: Satoshi MITSUGI. Владелец: Kioxia Corp. Дата публикации: 2023-09-21.

Patterns forming method

Номер патента: US20170294317A1. Автор: Kuo-Yao Chou. Владелец: Micron Technology Inc. Дата публикации: 2017-10-12.

Pattern forming method, semiconductor device manufacturing method, and template

Номер патента: US20230408935A1. Автор: Anupam Mitra. Владелец: Kioxia Corp. Дата публикации: 2023-12-21.

Positive resist composition and pattern forming method using the same

Номер патента: US20060194148A1. Автор: Hideaki Tsubaki,Shinji Tarutani. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-08-31.

Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition

Номер патента: US20120115084A1. Автор: Kenichi Okuyama,Yasunori Nagatsuka. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2012-05-10.

Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition

Номер патента: US8673537B2. Автор: Michihiro Sugo,Kazunori Kondo,Hideto Kato,Tomoyuki Goto,Masahiro Furuya,Shohei Tagami. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-03-18.

Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition

Номер патента: US20110086311A1. Автор: Katsuya Sakayori,Shunji Fukuda,Mami Katayama. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2011-04-14.

Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, pattern forming method, and light emitting element

Номер патента: EP4071200A1. Автор: Hitoshi Maruyama,Tamotsu Oowada. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2022-10-12.

Patterning material, patterning composition, and pattern forming method

Номер патента: US20240034930A1. Автор: Yu Zhang,Lei Zhang,Di Wang,Xiaofeng YI. Владелец: Huawei Technologies Co Ltd. Дата публикации: 2024-02-01.

Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin

Номер патента: EP4024132A4. Автор: Keita Kato,Akira Takada,Hironori Oka,Michihiro Shirakawa,Mitsuhiro Fujita,Akiyoshi Goto,Masafumi KOJIMA,Aina USHIYAMA,Yasuharu SHIRAISHI. Владелец: Fujifilm Corp. Дата публикации: 2022-11-02.

Pattern forming method, active light-sensitive or radiation-sensitive resin composition for organic solvent development used in same, method for producing active light-sensitive or radiation-sensitive resin composition for organic solvent development, method for manufacturing electronic device, and electronic device

Номер патента: KR101702928B1. Автор: 아키요시 고토,소우 카미무라,신이치 스기야마. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-02-06.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE

Номер патента: US20160018732A1. Автор: Yamaguchi Shuhei,Tsuchimura Tomotaka,TSUCHIHASHI Toru. Владелец: . Дата публикации: 2016-01-21.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film and method for producing electronic device

Номер патента: JPWO2015190174A1. Автор: 三千紘 白川,研由 後藤,創 古谷,正洋 吉留,雅史 小島. Владелец: Fujifilm Corp. Дата публикации: 2017-04-20.

Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and electronic device

Номер патента: WO2014123105A1. Автор: 文博 吉野. Владелец: 富士フイルム株式会社. Дата публикации: 2014-08-14.

Pattern-forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, method for producing electronic device, and electronic device

Номер патента: WO2014192768A1. Автор: 三千紘 白川,研由 後藤,創 古谷,正洋 吉留. Владелец: 富士フイルム株式会社. Дата публикации: 2014-12-04.

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20170168395A1. Автор: Yamaguchi Shuhei. Владелец: FUJIFILM Corporation. Дата публикации: 2017-06-15.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20160282720A1. Автор: Yamaguchi Shuhei,MOCHIZUKI Hidehiro,Tsuchimura Tomotaka,Takahashi Koutarou,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-09-29.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: WO2015118774A1. Автор: 修平 山口,土村　智孝,夏海 横川,孝太郎 高橋,英宏 望月. Владелец: 富士フイルム株式会社. Дата публикации: 2015-08-13.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20160202608A1. Автор: NAMAI Hayato. Владелец: JSR Corporation. Дата публикации: 2016-07-14.

Pattern forming method, active light-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device using pattern forming method, and electronic device

Номер патента: KR101856553B1. Автор: 나츠미 요코카와,슈지 히라노,히로오 타키자와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-05-10.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20220043347A1. Автор: GOTO Akiyoshi,KOJIMA Masafumi,TAKADA Akira,USHIYAMA Aina. Владелец: FUJIFILM Corporation. Дата публикации: 2022-02-10.

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20160041465A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-02-11.

RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20170059992A1. Автор: Nagai Tomoki,Naruoka Takehiko,NAKAGAWA Hisashi. Владелец: JSR Corporation. Дата публикации: 2017-03-02.

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN

Номер патента: US20220179307A1. Автор: Shirakawa Michihiro,Kato Keita,Fujita Mitsuhiro,GOTO Akiyoshi,KOJIMA Masafumi,TAKADA Akira,USHIYAMA Aina,OKA Hironori,SHIRAISHI Yasuharu. Владелец: FUJIFILM Corporation. Дата публикации: 2022-06-09.

Resist pattern-forming method, and radiation-sensitive resin composition

Номер патента: US20140295350A1. Автор: Hirokazu Sakakibara,Masafumi Hori,Reiko Kimura,Taiichi Furukawa. Владелец: JSR Corp. Дата публикации: 2014-10-02.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20210318616A1. Автор: Shirakawa Michihiro,Yamamoto Kei,GOTO Akiyoshi,KAWASHIMA Takashi,ASAKAWA Daisuke. Владелец: FUJIFILM Corporation. Дата публикации: 2021-10-14.

Radiation-sensitive resin composition and resist pattern-forming method

Номер патента: US20160363859A1. Автор: Hayato Namai. Владелец: JSR Corp. Дата публикации: 2016-12-15.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Номер патента: WO2013122264A1. Автор: Junichi Ito,Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi. Владелец: FUJIFILM Corporation. Дата публикации: 2013-08-22.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: IL284859A. Автор: . Владелец: Fujifilm Corp. Дата публикации: 2021-08-31.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

Номер патента: US20160011517A1. Автор: HIRANO Shuji,Takizawa Hiroo,YOKOKAWA Natsumi. Владелец: . Дата публикации: 2016-01-14.

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20170059995A1. Автор: Shirakawa Michihiro,Yoshidome Masahiro,GOTO Akiyoshi,KOJIMA Masafumi,FURUTANI Hajime. Владелец: FUJIFILM Corporation. Дата публикации: 2017-03-02.

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20160070174A1. Автор: Yamaguchi Shuhei,KATAOKA Shohei,Yamamoto Kei. Владелец: FUJIFILM Corporation. Дата публикации: 2016-03-10.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20220137512A1. Автор: YOSHINO Fumihiro,Yonekuta Yasunori,HIGASHI Kohei,Hatakeyama Naoya,TOMIGA Takamitsu. Владелец: FUJIFILM Corporation. Дата публикации: 2022-05-05.

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Номер патента: US20140199617A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Takeshi Kawabata. Владелец: Fujifilm Corp. Дата публикации: 2014-07-17.

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20170242338A1. Автор: HIRANO Shuji. Владелец: FUJIFILM Corporation. Дата публикации: 2017-08-24.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20180299777A1. Автор: YOSHINO Fumihiro,HIRANO Shuji,Harada Kenichi,SUGIYAMA Shinichi,TOMIGA Takamitsu. Владелец: FUJIFILM Corporation. Дата публикации: 2018-10-18.

Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic device

Номер патента: KR102044227B1. Автор: 아키요시 고토,미치히로 시라카와,마사후미 코지마,하지메 후루타니,마사히로 요시도메. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-11-13.

Active ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, method of manufacturing electronic device, and electronic device

Номер патента: KR101943343B1. Автор: 케이 야마모토,히데노리 타카하시,슈헤이 야마구치,코스케 코시지마. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-01-29.

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Номер патента: US20160147154A1. Автор: Fujimori Toru,HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2016-05-26.

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Номер патента: US20160147155A1. Автор: Tsuchimura Tomotaka,Takizawa Hiroo,TSURUTA Takuya. Владелец: FUJIFILM Corporation. Дата публикации: 2016-05-26.

PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20160147156A1. Автор: YOSHINO Fumihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2016-05-26.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device

Номер патента: KR101754842B1. Автор: 케이 야마모토,히데노리 타카하시,슈헤이 야마구치,후미히로 요시노. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-07-06.

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Номер патента: KR101811254B1. Автор: 와타루 니하시,나츠미 요코카와,토루 후지모리,슈지 히라노,히로오 타키자와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-12-21.

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Номер патента: WO2015015974A1. Автор: 亘 二橋,修史 平野,夏海 横川,滝沢　裕雄,藤森　亨. Владелец: 富士フイルム株式会社. Дата публикации: 2015-02-05.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US20160320700A1. Автор: Shuhei Yamaguchi,Koutarou Takahashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2016-11-03.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: KR101821620B1. Автор: 슈헤이 야마구치,나츠미 요코카와,코우타로우 타카하시. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-01-24.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: KR101981508B1. Автор: 토시야 타카하시,히로키 모리,타케시 카와바타,타다테루 야츠오. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-05-23.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20220206386A1. Автор: Toshiya Takahashi,Eiji Fukuzaki,Yasunori Yonekuta,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2022-06-30.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern formation method, and electronic device manufacturing method

Номер патента: JP6286227B2. Автор: 修平 山口,夏海 横川,孝太郎 高橋. Владелец: Fujifilm Corp. Дата публикации: 2018-02-28.

Pattern forming method and plasma processing method

Номер патента: US20240318014A1. Автор: Tatsuya Yamaguchi,Yoshiaki Shoji,Shin Oowada,Takanori Fukushima,Ryuichi Asako,Takashi Kajitani,Hibiki OGIWARA. Владелец: Tokyo Institute of Technology NUC. Дата публикации: 2024-09-26.

Pattern forming method, method for manufacturing color filter, and color filter manufactured thereby

Номер патента: WO2013047906A1. Автор: Yasuo Sugishima,Mitsuji Yoshibayashi. Владелец: FUJIFILM Corporation. Дата публикации: 2013-04-04.

Pattern forming method

Номер патента: US20040265745A1. Автор: Hirokazu Kato,Yasunobu Onishi,Tsuyoshi Shibata,Daisuke Kawamura,Koutaro Sho. Владелец: Individual. Дата публикации: 2004-12-30.

Radiation-sensitive composition, optical filter, laminate, pattern forming method, solid image pickup element, image display device, and infrared sensor

Номер патента: US20180356575A1. Автор: Kazutaka Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2018-12-13.

Pattern forming method, manufacturing method of circuit board, and laminate

Номер патента: US20230305403A1. Автор: Morimasa Sato,Soji Ishizaka,Akio Katayama. Владелец: Fujifilm Corp. Дата публикации: 2023-09-28.

Semiconductor device manufacturing method and resist pattern forming method

Номер патента: US9437637B2. Автор: MASAHIKO KONDO,Nobutaka Ukigaya,Koji Hara,Satoshi Yoshizaki,Atsushi Kanome. Владелец: Canon Inc. Дата публикации: 2016-09-06.

Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method

Номер патента: US20130153535A1. Автор: Masayuki Motonari,Satoru Murakami,Yuushi Matsumura,Shin-Ya Nakafuji,Kazuhiko KOUMURA,Katsuhisa MIZOGUCHI. Владелец: JSR Corp. Дата публикации: 2013-06-20.

Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method

Номер патента: US20140014620A9. Автор: Masayuki Motonari,Satoru Murakami,Yuushi Matsumura,Shin-Ya Nakafuji,Kazuhiko KOUMURA,Katsuhisa MIZOGUCHI. Владелец: JSR Corp. Дата публикации: 2014-01-16.

Plate pattern forming method and its inspecting method

Номер патента: US20020006562A1. Автор: Satoshi Akutagawa,Koujiro Suzuki. Владелец: Fujitsu Ltd. Дата публикации: 2002-01-17.

Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns

Номер патента: US20100255423A1. Автор: Masashi Fujimoto. Владелец: NEC Electronics Corp. Дата публикации: 2010-10-07.

Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns

Номер патента: US20060210889A1. Автор: Masashi Fujimoto. Владелец: NEC Electronics Corp. Дата публикации: 2006-09-21.

Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer

Номер патента: US5599653A. Автор: Hiroyuki Yamazaki,Masato Saito,Taku Nakao,Toshimasa Nakayama,Nobuo Tokutake,Hidekatsu Kohara. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 1997-02-04.

Photomask, laminate comprising photomask, photomask preparation method, and pattern forming method using photomask

Номер патента: US20180164677A1. Автор: Seung Heon Lee,Yong Goo Son,Kiseok LEE. Владелец: LG Chem Ltd. Дата публикации: 2018-06-14.

Optically oriented photoresist pattern forming method using organic crystal in photoresist layer with specified refracting indices formula

Номер патента: US4996123A. Автор: Noboru Nomura,Kazuhiko Hashimoto,Atsushi Ueno,Satoshi Kinoshita. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 1991-02-26.

Negative active-light-sensitive or radiation-sensitive resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photomask

Номер патента: KR101585912B1. Автор: 타케시 이나사키,토모타카 츠치무라. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2016-01-15.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20170351176A1. Автор: Yamaguchi Shuhei,HIRANO Shuji,FUKUHARA Toshiaki,Takahashi Koutarou. Владелец: FUJIFILM Corporation. Дата публикации: 2017-12-07.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150147699A1. Автор: TAKAHASHI Hidenori,Kato Keita,Kamimura Sou. Владелец: FUJIFILM Corporation. Дата публикации: 2015-05-28.

Fluorocarbon resin composite, cookware, cooker, roller for office automation equipment, belt for office automation equipment, and method for producing them

Номер патента: US09776289B2. Автор: Kazuaki Ikeda,Yoshimasa Suzuki,Nobutaka Matsushita. Владелец: SUMITOMO ELECTRIC FINE POLYMER INC. Дата публикации: 2017-10-03.

Fluorocarbon resin composite, cookware, cooker, roller for office automation equipment, belt for office automation equipment , and method for producing them

Номер патента: US20140106084A1. Автор: Kazuaki Ikeda,Yoshimasa Suzuki,Nobutaka Matsushita. Владелец: SUMITOMO ELECTRIC FINE POLYMER INC. Дата публикации: 2014-04-17.

Plastic-clad silica (PCS) fibers and methods and apparatuses for producing the same

Номер патента: US5212762A. Автор: Katsuhiko Shimada,Michisuke Edamatsu,Tsuneo Takano,Yasuo Hiromoto,Osamu Itamoto. Владелец: Mitsubishi Rayon Co Ltd. Дата публикации: 1993-05-18.

Pattern forming method, self-organization material, and method of manufacturing semiconductor apparatus

Номер патента: US20180076019A1. Автор: Seiji Morita,Masahiro Kanno,Yusuke KASAHARA. Владелец: Toshiba Memory Corp. Дата публикации: 2018-03-15.

Method for producing active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: KR101858967B1. Автор: 토모타카 츠치무라,코우타로우 타카하시,히데히로 모치즈키. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-05-17.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition

Номер патента: TW201241560A. Автор: Shuji Hirano,Hideaki Tsubaki,Tomotaka Tsuchimura,Hiroo Takizawa,Toshiya Takahashi. Владелец: Fujifilm Corp. Дата публикации: 2012-10-16.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND

Номер патента: US20140342288A1. Автор: KIMOTO Takakazu,Tomioka Hiroshi,Asano Yusuke. Владелец: JSR Corporation. Дата публикации: 2014-11-20.

MANUFACTURING METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK COMPRISING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTO MASK, FORMING METHOD FOR PATTERN, MANUFACTURING METHOD FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20170003591A1. Автор: MOCHIZUKI Hidehiro,Tsuchimura Tomotaka,Takahashi Koutarou. Владелец: FUJIFILM Corporation. Дата публикации: 2017-01-05.

Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same

Номер патента: US20150004547A1. Автор: Makoto Sugiura,Gouji Wakamatsu,Masafumi Hori,Kouichi Fujiwara. Владелец: JSR Corp. Дата публикации: 2015-01-01.

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM

Номер патента: US20140023968A1. Автор: Kimura Toru,HORI Masafumi,MIYATA Hiromu,NAKASHIMA Hiromitsu,KIMURA Reiko,YOSHIDA Masafumi,Asano Yusuke,Kasahara Kazuki. Владелец: JSR Corporation. Дата публикации: 2014-01-23.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: WO2020049865A1. Автор: 敬充 冨賀,英明 椿,直也 畠山,東　耕平,康智 米久田. Владелец: 富士フイルム株式会社. Дата публикации: 2020-03-12.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

Номер патента: WO2018043122A1. Автор: 啓太 加藤,研由 後藤,享平 崎田,惠瑜 王. Владелец: 富士フイルム株式会社. Дата публикации: 2018-03-08.

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern formation method, method for manufacturing electronic device, active-light-sensitive or radiation-sensitive resin composition for manufacturing photomask, and method for manufacturing photomask

Номер патента: EP4130878A4. Автор: Toshiya Takahashi,Eiji Fukuzaki,Hideyuki Ishihara,Taro MIYOSHI. Владелец: Fujifilm Corp. Дата публикации: 2023-09-27.

Sensitizing radiation-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and manufacturing method of electronic component

Номер патента: TWI751295B. Автор: 藤田光宏,崎田享平,田中匠,後藤研由,加藤啓太,山本恵士. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2022-01-01.

Method for producing active light sensitive or radiation sensitive resin composition, pattern forming method, and method for producing electronic device

Номер патента: WO2020203246A1. Автор: 聡 上村. Владелец: 富士フイルム株式会社. Дата публикации: 2020-10-08.

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20140363766A9. Автор: Ito Koji,SAKAKIBARA Hirokazu,HORI Masafumi,FURUKAWA Taiichi,MIYATA Hiromu. Владелец: . Дата публикации: 2014-12-11.

A method for producing a sensitive light-sensitive or radiation-sensitive resin composition, a pattern forming method, a resist film, and an electronic device.

Номер патента: JP7096892B2. Автор: 敬充 冨賀,英明 椿,直也 畠山,耕平 東,康智 米久田. Владелец: Fujifilm Corp. Дата публикации: 2022-07-06.

Sensitized ray or the manufacture method of radiation-sensitive resin composition, sensitized ray or radiation-sensitive resin composition, sensitized ray or radioactivity-sensitive film, possess sensitized ray or the blank mask of radioactivity-sensitive film, photomask, pattern formation method, the manufacture method of electronic device and electronic device

Номер патента: CN106133601A. Автор: 土村智孝,望月英宏,高桥孝太郎. Владелец: Fujifilm Corp. Дата публикации: 2016-11-16.

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20130230803A1. Автор: Ito Koji,SAKAKIBARA Hirokazu,HORI Masafumi,FURUKAWA Taiichi. Владелец: JSR Corporation. Дата публикации: 2013-09-05.

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20130295506A1. Автор: Ito Koji,SAKAKIBARA Hirokazu,HORI Masafumi,FURUKAWA Taiichi,MIYATA Hiromu. Владелец: . Дата публикации: 2013-11-07.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140087310A1. Автор: Shirakawa Michihiro,TAKAHASHI Hidenori,YOSHINO Fumihiro,SAITOH Shoichi,Kato Keita. Владелец: FUJIFILM Corporation. Дата публикации: 2014-03-27.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK

Номер патента: US20150086911A1. Автор: Tsuchimura Tomotaka,TSURUTA Takuya,YATSUO Tadeteru. Владелец: FUJIFILM Corporation. Дата публикации: 2015-03-26.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200124963A1. Автор: Tsuchimura Tomotaka,ITO Junichi,OGAWA Michihiro,KAWASHIMA Takashi,KANEKO Akihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2020-04-23.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200159117A1. Автор: GOTO Akiyoshi,TAKADA Akira,Nishio Ryo,Tango Naohiro,Marumo Kazuhiro,O Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2020-05-21.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200201177A1. Автор: Tsuchimura Tomotaka,YAGI Kazunari,KAWASHIMA Takashi. Владелец: FUJIFILM Corporation. Дата публикации: 2020-06-25.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20190204736A1. Автор: Tango Naohiro,Marumo Kazuhiro. Владелец: FUJIFILM Corporation. Дата публикации: 2019-07-04.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140349225A1. Автор: Yamaguchi Shuhei,TAKAHASHI Hidenori,Yamamoto Kei,ITO Junichi. Владелец: FUJIFILM Corporation. Дата публикации: 2014-11-27.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150301451A1. Автор: IWATO Kaoru. Владелец: FUJIFILM Corporation. Дата публикации: 2015-10-22.

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT

Номер патента: US20170322490A1. Автор: Shirakawa Michihiro,Kato Keita,GOTO Akiyoshi,Hatakeyama Naoya,OU Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2017-11-09.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: CN113168099A. Автор: 丹吴直纮,白川三千纮,后藤研由,山本庆,上村稔,小岛雅史. Владелец: Fujifilm Corp. Дата публикации: 2021-07-23.

Pattern forming method, ion implantation method, method for producing solid-state imaging element, multilayer resist film, and active light sensitive or radiation sensitive resin composition

Номер патента: WO2019064970A1. Автор: 直也 畠山,東　耕平,陽一 西田. Владелец: 富士フイルム株式会社. Дата публикации: 2019-04-04.

Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20210286263A1. Автор: Kei Yamamoto,Minoru Uemura,Michihiro Shirakawa,Naohiro Tango,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2021-09-16.

Photosensitive radiation-sensitive or radiation-sensitive resin composition, photosensitive radiation-sensitive or radiation-sensitive film, pattern forming method, and manufacturing method of electronic component

Номер патента: TWI779159B. Автор: 山口修平,丸茂和. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2022-10-01.

Resist pattern forming method and radiation-sensitive resin composition

Номер патента: JP5263453B2. Автор: 雅史 堀,泰一 古川,亘史 伊藤,宏和 榊原. Владелец: JSR Corp. Дата публикации: 2013-08-14.

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20170097565A1. Автор: Shibuya Akinori,KATAOKA Shohei,OU Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2017-04-06.

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE

Номер патента: US20140193749A1. Автор: TSUBAKI Hideaki,HIRANO Shuji,Takizawa Hiroo. Владелец: FUJIFILM Corporation. Дата публикации: 2014-07-10.

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE

Номер патента: US20140212811A1. Автор: INOUE Naoki,TSUBAKI Hideaki,HIRANO Shuji,Takizawa Hiroo. Владелец: FUJIFILM Corporation. Дата публикации: 2014-07-31.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND

Номер патента: US20210165325A1. Автор: FUKUZAKI Eiji,Yonekuta Yasunori,MIYOSHI Taro. Владелец: FUJIFILM Corporation. Дата публикации: 2021-06-03.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE

Номер патента: US20140349224A1. Автор: Tsuchimura Tomotaka,Kawabata Takeshi,Takizawa Hiroo,TSURUTA Takuya. Владелец: FUJIFILM Corporation. Дата публикации: 2014-11-27.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE

Номер патента: US20140356771A1. Автор: Yamaguchi Shuhei,TAKAHASHI Hidenori,Yamamoto Kei,ITO Junichi. Владелец: . Дата публикации: 2014-12-04.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20190294042A1. Автор: Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,SAKITA Kyohei,ASAKAWA Daisuke. Владелец: FUJIFILM Corporation. Дата публикации: 2019-09-26.

Pattern forming method, active ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device, and electronic device

Номер патента: KR101950720B1. Автор: 미치히로 시라카와,히데노리 타카하시,쇼헤이 카타오카,슈헤이 야마구치,후미히로 요시노,쇼이치 사이토. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2019-02-21.

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: KR101820759B1. Автор: 쇼헤이 카타오카,아키노리 시부야,케이유 오우. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-01-22.

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition

Номер патента: US8846293B2. Автор: Yusuke IIZUKA,Akinori Shibuya,Shohei Kataoka,Naohiro Tango. Владелец: Fujifilm Corp. Дата публикации: 2014-09-30.

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition

Номер патента: KR101744608B1. Автор: 쇼헤이 카타오카,아키노리 시부야,유스케 이이즈카,나오히로 탕고. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-06-08.

Pattern forming method, electronic device manufacturing method, actinic ray-sensitive or radiation-sensitive resin composition, resist film

Номер патента: KR20220137947A. Автор: 미치히로 시라카와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2022-10-12.

Actinic ray-sensitive or radiation-sensitive resin composition, film using the compotion and method of forming pattern

Номер патента: TW201222148A. Автор: Akinori Shibuya,Tomoki Matsuda,Yoko TOKUGAWA. Владелец: Fujifilm Corp. Дата публикации: 2012-06-01.

ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR

Номер патента: US20190294043A1. Автор: Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,SAKITA Kyohei,ASAKAWA Daisuke,OU Keiyu. Владелец: FUJIFILM Corporation. Дата публикации: 2019-09-26.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

Номер патента: KR101892556B1. Автор: 타케시 이나사키,히데노리 타카하시,쇼헤이 카타오카,타카유키 이토,토모타카 츠치무라. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2018-08-28.

Negative-acting active ray-sensitive or radiation-sensitive resin composition, negative-acting active ray-sensitive or radiation-sensitive film, pattern forming method, and manufacturing method of electronic device

Номер патента: KR20170125358A. Автор: 슈헤이 야마구치,아키히로 카네코. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-11-14.

Active light sensitive or radiation sensitive resin composition, resist film, method for forming pattern, method for manufacturing electronic device

Номер патента: TW202024789A. Автор: 川端健志,後藤研由. Владелец: 日商富士軟片股份有限公司. Дата публикации: 2020-07-01.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

Номер патента: TW201107879A. Автор: Tomotaka Tsuchimura,Hidenori Takahashi,Takayuki Ito,Shohei Kataoka,Takeshi Inasaki. Владелец: Fujifilm Corp. Дата публикации: 2011-03-01.

Active ray-sensitive or radiation-sensitive resin composition, resist film, method for forming pattern, and method for manufacturing electronic device

Номер патента: WO2020158467A1. Автор: 慶 山本,稔 上村,直紘 丹呉,三千紘 白川,研由 後藤,雅史 小島. Владелец: 富士フイルム株式会社. Дата публикации: 2020-08-06.

Actinic-ray-or radiation-sensitive resin composition and method of forming pattern using the composition

Номер патента: TW201106100A. Автор: Hideaki Tsubaki,Tomotaka Tsuchimura,Hidenori Takahashi,Koji Shirakawa,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2011-02-16.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME

Номер патента: US20150004533A1. Автор: TSUBAKI Hideaki,HIRANO Shuji,Takizawa Hiroo. Владелец: FUJIFILM Corporation. Дата публикации: 2015-01-01.

Pattern forming method and plasma processing method

Номер патента: EP4369381A1. Автор: Tatsuya Yamaguchi,Yoshiaki Shoji,Shin Oowada,Takanori Fukushima,Ryuichi Asako,Takashi Kajitani,Hibiki OGIWARA. Владелец: Tokyo Institute of Technology NUC. Дата публикации: 2024-05-15.

Film forming material, film forming composition for lithography, optical component forming material, resist composition, resist pattern forming method, permanent film for resist, radiation sensitive composition, method for producing amorphous film, lower layer film forming material for lithography , Composition for forming lower layer film for lithography, method for producing lower layer film for lithography, and method for forming circuit pattern

Номер патента: JPWO2019004142A1. Автор: 三樹　泰,泰 三樹,越後　雅敏,雅敏 越後. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2020-07-02.

Film-forming material, film-forming composition for lithography, optical component-forming material, resist composition, resist pattern forming method, permanent film for resist, radiation-sensitive composition, method for producing amorphous film, underlayer film-forming material for lithography , a composition for forming an underlayer film for lithography, a method for producing an underlayer film for lithography, and a method for forming a circuit pattern

Номер патента: JP7252516B2. Автор: 泰 三樹,雅敏 越後. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2023-04-05.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN

Номер патента: US20150132688A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-05-14.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20150093703A1. Автор: NAMAI Hayato,HORI Masafumi,MIYATA Hiromu. Владелец: JSR Corporation. Дата публикации: 2015-04-02.

PATTERN FORMING METHOD, ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Номер патента: US20160147147A1. Автор: HIRANO Shuji,Takizawa Hiroo. Владелец: FUJIFILM Corporation. Дата публикации: 2016-05-26.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150079508A1. Автор: Yamaguchi Shuhei,TAKAHASHI Hidenori,Yamamoto Kei,ITO Junichi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-03-19.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

Номер патента: US20150147688A1. Автор: HIRANO Shuji,Takizawa Hiroo,NIHASHI Wataru,YOKOKAWA Natsumi. Владелец: FUJIFILM Corporation. Дата публикации: 2015-05-28.

Method and system for recycling furfural-containing waste water and method and system for producing furfural

Номер патента: RU2389691C2. Автор: Йилин ТАНГ,Ченгжен ДЖИАНГ,Шаофенг ГАО,Донгшенг ЛВ,Жуджианг ШЕН,Ксуануей СУО. Владелец: Джинан Шенгквуан Гроуп Шаре-Холдинг Ко., Лтд.. Дата публикации: 2010-05-20.

Supported fluorocarbonsulfonic acid polymers and an improved method for their preparation

Номер патента: US4791081A. Автор: John D. Weaver,Emmett L. Tasset,David L. Childress. Владелец: Dow Chemical Co. Дата публикации: 1988-12-13.

Cellulose and lignocellulose structural materials and methods and systems for producing such materials

Номер патента: RU2664249C1. Автор: Маршалл Медофф. Владелец: Ксилеко, Инк. Дата публикации: 2018-08-15.

Curable organopolysiloxane composition having excellent cold resistance, and a pattern forming method

Номер патента: US12122915B2. Автор: Manabu Sutoh,Nohno TODA. Владелец: Dow Toray Co Ltd. Дата публикации: 2024-10-22.

Thermoplastic resin composition for semiconductor, adhesion film, lead frame, and semiconductor device using the same, and method of producing semiconductor device

Номер патента: MY140876A. Автор: Tomohiro Nagoya,Yoshiyuki Tanabe,Toshiyasu Kawai,Naoko Tomoda,Kiyohide Tateoka. Владелец: Hitachi Chemical Co Ltd. Дата публикации: 2010-01-29.

Moulding material for extrusion with foaming, method of its production, moulded wood-filled foam plastic made from said moulding material and method and device for producing of said foam plastic

Номер патента: RU2530047C9. Автор: Такеясу КИКУЧИ,Кадзумаса МОРИТА,Коджи ХИГАСИ,Юитиро НАКАМУРА. Владелец: ВПС Корпорейшн. Дата публикации: 2015-04-10.

Recombinant rotaviruses and methods and systems for producing the same

Номер патента: WO2024077299A3. Автор: John T. Patton,Asha A. PHILIP,Chantal A. AGBEMABIESE. Владелец: The Trustees of Indiana University. Дата публикации: 2024-05-23.

Recombinant rotaviruses and methods and systems for producing the same

Номер патента: WO2024077299A2. Автор: John T. Patton,Asha A. PHILIP,Chantal A. AGBEMABIESE. Владелец: The Trustees of Indiana University. Дата публикации: 2024-04-11.

Pattern forming method, mold and data processing method

Номер патента: US8722535B2. Автор: Masafumi Asano. Владелец: Toshiba Corp. Дата публикации: 2014-05-13.

Defect removal device, defect removal method, pattern forming method, and method of manufacturing electronic device

Номер патента: US20230395366A1. Автор: Ryo Saito,Masahiro Yoshidome,Akihiko Ohtsu,Yukihisa KAWADA. Владелец: Fujifilm Corp. Дата публикации: 2023-12-07.

Pattern forming method

Номер патента: US20150079794A1. Автор: Hiroki Tanaka,Naoko Kihara,Ryosuke Yamamoto. Владелец: Toshiba Corp. Дата публикации: 2015-03-19.

Servo pattern forming method of hard disk drive

Номер патента: US20100297364A1. Автор: Cheol-soon Kim,Ha Yong Kim,Yoon Chul CHO. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2010-11-25.

Metal pattern forming method

Номер патента: US20090087570A1. Автор: Seiichi Inoue,Yasuhiko Maeda,Ken Kawata. Владелец: Fujifilm Corp. Дата публикации: 2009-04-02.

Pattern forming method for quartz surface and pattern forming device for quartz surface

Номер патента: CA3001392A1. Автор: Paul Lee,Jin Seok Kwak,Ju Yeon Won,Suk Whan Ko,Joong Heon Lee,Jung Sang Lee,Yang Won Yun,Chung Man Kim. Владелец: LG HAUSYS LTD. Дата публикации: 2019-05-15.

Surface pattern forming method for aluminium product

Номер патента: US11913122B2. Автор: Jinju Kim,Kyunghwan Lee,Jiyoung Song,Kwangjoo KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-02-27.

Surface pattern forming method for aluminium product

Номер патента: US20210164111A1. Автор: Jinju Kim,Kyunghwan Lee,Jiyoung Song,Kwangjoo KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2021-06-03.

Pattern forming method, mold and data processing method

Номер патента: US20130323925A1. Автор: Masafumi Asano. Владелец: Toshiba Corp. Дата публикации: 2013-12-05.

Disc streak pattern forming method and apparatus

Номер патента: US5800253A. Автор: Kiyoshi Ikemoto. Владелец: SpeedFam Co Ltd. Дата публикации: 1998-09-01.

Pattern forming method and manufacturing method of magnetic recording medium

Номер патента: US9412405B2. Автор: Akira Watanabe,Akira Fujimoto,Kaori Kimura. Владелец: Toshiba Corp. Дата публикации: 2016-08-09.

Pattern forming method

Номер патента: US20120249664A1. Автор: Yuya Haneda,Ryoichi Nozawa. Владелец: Seiko Epson Corp. Дата публикации: 2012-10-04.

Pattern forming method

Номер патента: US11800648B2. Автор: Hideki Hoshino,Masayoshi Yamauchi,Hidenobu Ohya,Masayuki Ushiku,Ryo AOYAMA,Takenori Omata,Naoto NIIZUMA,Kazuho URAYAMA. Владелец: KONICA MINOLTA INC. Дата публикации: 2023-10-24.

Pattern forming method

Номер патента: EP3758456A1. Автор: Hideki Hoshino,Masayoshi Yamauchi,Hidenobu Ohya,Masayuki Ushiku,Ryo AOYAMA,Takenori Omata,Naoto NIIZUMA,Kazuho URAYAMA. Владелец: KONICA MINOLTA INC. Дата публикации: 2020-12-30.

Pattern forming device and pattern forming method

Номер патента: US20240141278A1. Автор: Takahiro Oba,Yusuke Kasai. Владелец: Fujifilm Corp. Дата публикации: 2024-05-02.

Concave/convex pattern forming method and information recording medium manufacturing method

Номер патента: US20070199920A1. Автор: Minoru Fujita,Mitsuru Takai,Akimasa Kaizu. Владелец: TDK Corp. Дата публикации: 2007-08-30.

Pattern forming device and pattern forming method

Номер патента: EP4365276A1. Автор: Takahiro Oba,Yusuke Kasai. Владелец: Fujifilm Corp. Дата публикации: 2024-05-08.

NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK

Номер патента: US20140178806A1. Автор: Inasaki Takeshi,Tsuchimura Tomotaka. Владелец: FUJIFILM Corporation. Дата публикации: 2014-06-26.

Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition

Номер патента: EP1126319A1. Автор: Shuichi Takahashi. Владелец: CLARIANT INTERNATIONAL LTD. Дата публикации: 2001-08-22.

Radiation-sensitive resin composition, active matrix substrate and method for producing the same

Номер патента: TW200905391A. Автор: Makoto Fujimura,Takeyoshi Kato,Azusa Wada,Yumi Osaku. Владелец: Zeon Corp. Дата публикации: 2009-02-01.

Method for forming pattern, and optical element

Номер патента: US20050014100A1. Автор: Masaaki Hanamura,Atsushi Kumano,Shinji Shiraki. Владелец: JSR Corp. Дата публикации: 2005-01-20.

Method for forming pattern, and optical element

Номер патента: EP1498776A3. Автор: Masaaki Hanamura,Atsushi Kumano,Shinji Shiraki. Владелец: JSR Corp. Дата публикации: 2005-02-09.

Radiation-sensitive resin composition and resist pattern forming method

Номер патента: JP5581726B2. Автор: 晃雅 征矢野,芳史 大泉. Владелец: JSR Corp. Дата публикации: 2014-09-03.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, resist-coated mask blank, photomask, electronic device manufacturing method, and electronic device

Номер патента: JPWO2016031437A1. Автор: 智孝 土村,土村　智孝,孝太郎 高橋,健志 川端. Владелец: Fujifilm Corp. Дата публикации: 2017-04-27.

Radiation-sensitive resin composition, spacer and insulating film for organic EL display element and method for forming the same

Номер патента: TW201100956A. Автор: Masaaki Hanamura,Hiroyuki Maruyama. Владелец: JSR Corp. Дата публикации: 2011-01-01.

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20130224666A1. Автор: SAKAKIBARA Hirokazu,HORI Masafumi,FURUKAWA Taiichi,KIMURA Reiko. Владелец: JSR Corporation. Дата публикации: 2013-08-29.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20200012189A1. Автор: Kato Keita,GOTO Akiyoshi,KOJIMA Masafumi,TAKADA Akira,SAKITA Kyohei. Владелец: FUJIFILM Corporation. Дата публикации: 2020-01-09.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Номер патента: US20200117087A1. Автор: KANEKO Tetsurou. Владелец: JSR Corporation. Дата публикации: 2020-04-16.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140248556A1. Автор: Shirakawa Michihiro,TAKAHASHI Hidenori,Kato Keita,Kamimura Sou. Владелец: FUJIFILM Corporation. Дата публикации: 2014-09-04.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20190377261A1. Автор: Kato Keita,Fujita Mitsuhiro,Tanaka Takumi,GOTO Akiyoshi,SAKITA Kyohei,YAMAMOTO Keishi. Владелец: FUJIFILM Corporation. Дата публикации: 2019-12-12.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE

Номер патента: US20140045117A1. Автор: Shirakawa Michihiro,Yamaguchi Shuhei,TAKAHASHI Hidenori,KATAOKA Shohei,YOSHINO Fumihiro,SAITOH Shoichi. Владелец: FUJIFILM Corporation. Дата публикации: 2014-02-13.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE

Номер патента: US20140141360A1. Автор: Shirakawa Michihiro,Yamaguchi Shuhei,TAKAHASHI Hidenori,YOSHINO Fumihiro. Владелец: FUJIFILM Corporation. Дата публикации: 2014-05-22.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер патента: US20190137875A1. Автор: YOSHINO Fumihiro,FUKUHARA Toshiaki,Yonekuta Yasunori,Hatakeyama Naoya,TOMIGA Takamitsu. Владелец: FUJIFILM Corporation. Дата публикации: 2019-05-09.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140308605A1. Автор: Yamaguchi Shuhei,TAKAHASHI Hidenori,Yamamoto Kei,ITO Junichi. Владелец: FUJIFILM Corporation. Дата публикации: 2014-10-16.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20150248054A1. Автор: Matsuda Tomoki. Владелец: . Дата публикации: 2015-09-03.

Radiation-sensitive resin composition for forming cured film, method of manufacturing the radiation-sensitive resin composition for forming cured film, cured film, method for forming the cured film and liquid crystal display device

Номер патента: KR101813138B1. Автор: 에이지 요네다,노부히로 니시,세이이치로우 고다마,카츠미 이노마타. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2017-12-28.

Radiation sensitive resin composition, method for producing substrate having patterned resin film, and use of the resin composition

Номер патента: JP3843995B2. Автор: 順司 小出村,広和 東. Владелец: Zeon Corp. Дата публикации: 2006-11-08.

Radiation-sensitive resin composition, method for producing a substrate having a patterned resin film, and use of the resin composition

Номер патента: JPWO2003100524A1. Автор: 小出村　順司,順司 小出村,広和 東. Владелец: Zeon Corp. Дата публикации: 2005-09-29.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME

Номер патента: US20140127627A1. Автор: TAKAHASHI Hidenori,KATAOKA Shohei,Ito Takayuki,Inasaki Takeshi,Tsuchimura Tomotaka. Владелец: . Дата публикации: 2014-05-08.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140234762A1. Автор: Shirakawa Michihiro,Yamaguchi Shuhei,TAKAHASHI Hidenori,KATAOKA Shohei,YOSHINO Fumihiro,SAITOH Shoichi. Владелец: FUJIFILM Corporation. Дата публикации: 2014-08-21.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20140242505A1. Автор: Yamaguchi Shuhei,TAKAHASHI Hidenori,YOSHINO Fumihiro,Yamamoto Kei. Владелец: FUJIFILM Corporation. Дата публикации: 2014-08-28.

Actinic-ray-or radiation-sensitive resin composition and method of forming pattern using the composition

Номер патента: TW201127796A. Автор: Tomotaka Tsuchimura,Takayuki Ito,Takeshi Kawabata. Владелец: Fujifilm Corp. Дата публикации: 2011-08-16.

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION

Номер патента: US20140030643A1. Автор: TSUBAKI Hideaki,HIRANO Shuji,Tsuchimura Tomotaka,Takizawa Hiroo,TAKAHASHI Toshiya. Владелец: FUJIFILM Corporation. Дата публикации: 2014-01-30.

Composite structure made of titanium and/or a titanium alloy and/or niti and a polymer, and electrochemical etching method for producing same

Номер патента: US20240208180A1. Автор: Rainer Adelung,Melike Baytekin-Gerngroß,Mark-Daniel Gerngroß,Juergen Carstensen. Владелец: Christian Albrechts Universitatet Zu Kiel. Дата публикации: 2024-06-27.

Aldolase, aldolase mutant, and method and composition for producing tagatose by using same

Номер патента: US09914919B2. Автор: Deok-kun Oh,Seung-Hye HONG,Seon-Hwa Lee. Владелец: Samyang Corp. Дата публикации: 2018-03-13.

Method for screening and producing compound libraries

Номер патента: CA2343914A1. Автор: Patrick J. Sinko,George M. Grass,Glen D. Leesman,Daniel A. Norris,John E. Wehrli. Владелец: Individual. Дата публикации: 2000-03-23.

Transporter arrays and methods and kits for producing and using the arrays

Номер патента: WO2002095064A1. Автор: Lars Siim Madsen,Bo Skaaning Jensen,Ulrik Gether,Jens Bitsch Jensen. Владелец: Azign Bioscience A/S. Дата публикации: 2002-11-28.

A cementitious material binder and methods and systems for producing the same which do not rely on a surface-alone reaction

Номер патента: CA3241106A1. Автор: Kevin A. MacDonald,Brittany L. Zimmerman,Christopher F. Cogswell. Владелец: Yummet LLC. Дата публикации: 2023-06-08.

Composite filter and method and apparatus for producing high purity water using the composite filter

Номер патента: EP1457464A4. Автор: Masatoshi Iida,Ryosuke Murayama,Seisuke Takashima,Masayoshi Furuhashi. Владелец: Iida Kensetu Co Ltd. Дата публикации: 2008-08-27.

Stirring device for a semi-solid metal slurry and method and system for producing a semi-solid metal slurry using such a stirring device

Номер патента: WO2020130907A1. Автор: Per Jansson. Владелец: PA INVEST AB. Дата публикации: 2020-06-25.

A cementitious material binder and methods and systems for producing the same which do not rely on a surface-alone reaction

Номер патента: AU2022400776A1. Автор: Kevin A. MacDonald,Brittany L. Zimmerman,Christopher F. Cogswell. Владелец: Yummet LLC. Дата публикации: 2024-07-04.

Piezoelectric sensors and methods and apparatuses for producing piezoelectric sensors

Номер патента: US20230405931A1. Автор: Jinsheng Fan,Brittany Newell,Jose Manuel Garcia-Bravo,Robert A. Nawrocki. Владелец: PURDUE RESEARCH FOUNDATION. Дата публикации: 2023-12-21.

A cementitious material binder and methods and systems for producing the same which do not rely on a surface-alone reaction

Номер патента: EP4441009A1. Автор: Kevin A. MacDonald,Brittany L. Zimmerman,Christopher F. Cogswell. Владелец: Yummet LLC. Дата публикации: 2024-10-09.

Catalyst and method of decomposing dinitrogen monoxide and method and device for producing nitric acid

Номер патента: RU2397810C2. Автор: Йюрген НОЙМАНН. Владелец: Умикоре Аг Унд Ко. Кг. Дата публикации: 2010-08-27.

Solid fuel, and method and apparatus for producing same

Номер патента: MY161924A. Автор: Hiroshi Amano,Shigeya Hayashi. Владелец: Ube Industries. Дата публикации: 2017-05-15.

Molybdenum disulfide powders and methods and apparatus for producing the same

Номер патента: CA2824399C. Автор: James A. Cole,Gregory Rue LOGUE,Larry GIANNOTTI,Gary G. DE GALA,David L. COTTRELL. Владелец: Climax Molybdenum Co. Дата публикации: 2018-09-18.

Security element, corresponding engraved intaglio printing plate, and methods and devices for producing, decoding and authenticating security marking of said security element

Номер патента: CA3241313A1. Автор: Olivier LEFÈBVRE,Eric Decoux,Nicola Duca. Владелец: SICPA HOLDING SA. Дата публикации: 2023-06-29.

Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride film

Номер патента: EP2579300A4. Автор: Seiji Nishikawa. Владелец: Mitsubishi Heavy Industries Ltd. Дата публикации: 2013-12-18.

Security element, corresponding engraved intaglio printing plate, and methods and devices for producing, decoding and authenticating security marking of said security element

Номер патента: AU2022421462A1. Автор: Olivier LEFÈBVRE,Eric Decoux,Nicola Duca. Владелец: SICPA HOLDING SA. Дата публикации: 2024-08-01.

Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride film

Номер патента: US20130075875A1. Автор: Seiji Nishikawa. Владелец: Mitsubishi Heavy Industries Ltd. Дата публикации: 2013-03-28.

Hemp seed products and methods and systems for producing same

Номер патента: US12016349B2. Автор: Benjamin Raymond,Chad Wakeland-Rosen. Владелец: Victory Foods Pbc. Дата публикации: 2024-06-25.

Hemp seed products and methods and systems for producing same

Номер патента: US20240315275A1. Автор: Benjamin Raymond,Chad Wakeland-Rosen. Владелец: Victory Foods Pbc. Дата публикации: 2024-09-26.

Pyrolysis oil and method and plant for producing same

Номер патента: CA2975003C. Автор: Andreas Hornung,Andreas Apfelbacher,Johannes Neumann,Miloud OUADI. Владелец: Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV. Дата публикации: 2023-01-24.

Hollow cell array structure and method and apparatus for producing hollow cell array structure

Номер патента: EP2451633A1. Автор: Shinya Seno,Shinji Aoki,Yukie Inoue,Masahiro Masuzawa,Toshihiro Kanematsu,Masaru Ohgaki,Hisayoshi Ohshima. Владелец: Ricoh Co Ltd. Дата публикации: 2012-05-16.

Pyrolysis oil and method and plant for producing same

Номер патента: AU2015383974B2. Автор: Andreas Hornung,Andreas Apfelbacher,Johannes Neumann,Miloud OUADI. Владелец: Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV. Дата публикации: 2021-05-06.

Pyrolysis oil and method and plant for producing same

Номер патента: CA3181440A1. Автор: Andreas Hornung,Andreas Apfelbacher,Johannes Neumann,Miloud OUADI. Владелец: Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV. Дата публикации: 2016-09-01.

Secure identification card and method and apparatus for producing and authenticating same

Номер патента: US5864622A. Автор: James R. Marcus. Владелец: Pitney Bowes Inc. Дата публикации: 1999-01-26.

Secure document and method and apparatus for producing and authenticating same

Номер патента: US5388158A. Автор: William Berson. Владелец: Pitney Bowes Inc. Дата публикации: 1995-02-07.

Engineered low-density heterogeneous microparticles and methods and formulations for producing the microparticles

Номер патента: US8609244B2. Автор: Hamid Hojaji,Shannon Marie Labernik,Thinh Pham,Huagang Zhang,David L. Melmeth,James A. McFarlane. Владелец: James Hardie Technology Ltd. Дата публикации: 2013-12-17.

Secure identification card and method and apparatus for producing and authenticating same by comparison of a portion of an image to the whole

Номер патента: US5420924A. Автор: Shailendra Kumar,William Berson. Владелец: Pitney Bowes Inc. Дата публикации: 1995-05-30.

Engineered low-density heterogeneous microparticles and methods and formulations for producing the microparticles

Номер патента: CA2632760C. Автор: Hamid Hojaji,Shannon Marie Labernik,David Leslie Melmeth,Thinh Pham,Huagang Zhang. Владелец: James Hardie Technology Ltd. Дата публикации: 2017-11-28.

Nitride products and method and apparatus for producing nitride products

Номер патента: CA2034214C. Автор: Michael C. Carter,Bruce W. Gerhold. Владелец: Phillips Petroleum Co. Дата публикации: 1998-09-29.

Rotatable record carrier and method and apparatus for producing same

Номер патента: CA1104251A. Автор: Chiaki Kojima,Takashi Otobe,Hiroshi Ohki. Владелец: Sony Corp. Дата публикации: 1981-06-30.

Coating film and method and apparatus for producing the same

Номер патента: CA1232228A. Автор: Masao Hayashi,Akio Hiraki,Tatsuro Miyasato. Владелец: Meidensha Corp. Дата публикации: 1988-02-02.

Backfill paste production facility and method and apparatus for producing high density slurry and paste backfills

Номер патента: US5888026A. Автор: Long Jin Chen,Daniel G. Millette,Alfred Annor. Владелец: Canada Minister of Natural Resources. Дата публикации: 1999-03-30.

Gypsum-containing product having increased resistance to permanent deformation and method and composition for producing it

Номер патента: CA2268105C. Автор: Qiang Yu,Frederick T. Jones,Steven W. Sucech,Brent E. Groza,Raymond J. Mlinac,Paul J. Henkels. Владелец: United States Gypsum Co. Дата публикации: 2009-05-26.

Stirring device for a semi-solid metal slurry and method and system for producing a semi-solid metal slurry using such a stirring device

Номер патента: CA3123582A1. Автор: Per Jansson. Владелец: PA INVEST AB. Дата публикации: 2020-06-25.

Stirring device for a semi-solid metal slurry and method and system for producing a semi-solid metal slurry using such a stirring device

Номер патента: EP3898027A1. Автор: Per Jansson. Владелец: PA INVEST AB. Дата публикации: 2021-10-27.

Anion-adsorbing carbon material, and method and apparatus for producing same

Номер патента: CA2546477A1. Автор: Satoshi Hayashi,Riei Yokoyama. Владелец: Individual. Дата публикации: 2005-06-16.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: EP4010131A1. Автор: Daniel Bitton. Владелец: House of Metals Co Ltd. Дата публикации: 2022-06-15.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: US20230323510A1. Автор: Daniel Bitton. Владелец: House of Metals Co Ltd. Дата публикации: 2023-10-12.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: CA3107439C. Автор: Bitton Daniel. Владелец: House of Metals Co Ltd. Дата публикации: 2021-11-02.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: US20210040582A1. Автор: Daniel Bitton. Владелец: House of Metals Co Ltd. Дата публикации: 2021-02-11.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: US20220275478A1. Автор: Daniel Bitton. Владелец: House of Metals Co Ltd. Дата публикации: 2022-09-01.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: CA3107439A1. Автор: Bitton Daniel. Владелец: House of Metals Co Ltd. Дата публикации: 2021-02-07.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: US11946117B2. Автор: Daniel Bitton. Владелец: House of Metals Co Ltd. Дата публикации: 2024-04-02.

Product comprising recycled aluminum alloy wheel fragments and an alloying supplement, and methods and system for producing same

Номер патента: WO2021022364A1. Автор: Daniel Bitton. Владелец: House Of Metals Company Limited. Дата публикации: 2021-02-11.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT

Номер патента: US20200142306A1. Автор: Takakuwa Hideki,HIGASHI Kohei. Владелец: FUJIFILM Corporation. Дата публикации: 2020-05-07.

Pattern forming method and method for manufacturing semiconductor device

Номер патента: US20220084833A1. Автор: Hironobu Sato,Yoshihiro Naka. Владелец: Kioxia Corp. Дата публикации: 2022-03-17.

Pattern forming method and method of manufacturing semiconductor device

Номер патента: US11024510B2. Автор: Tsubasa IMAMURA. Владелец: Kioxia Corp. Дата публикации: 2021-06-01.

Metal pattern forming method

Номер патента: US20230028779A1. Автор: Kenji Ichikawa,Eijiro Iwase. Владелец: Fujifilm Corp. Дата публикации: 2023-01-26.

Pattern forming method, semiconductor device manufacturing apparatus and storage medium

Номер патента: US20090176374A1. Автор: Teruyuki Hayashi,Akitake Tamura,Kaoru Fujihara. Владелец: Tokyo Electron Ltd. Дата публикации: 2009-07-09.

Pattern forming method

Номер патента: US20200294796A1. Автор: Tsukasa Azuma. Владелец: Toshiba Memory Corp. Дата публикации: 2020-09-17.

Pattern forming method

Номер патента: US10950439B2. Автор: Tsukasa Azuma. Владелец: Toshiba Memory Corp. Дата публикации: 2021-03-16.

Pattern forming method

Номер патента: US11776817B2. Автор: Shota ISHIBASHI. Владелец: Tokyo Electron Ltd. Дата публикации: 2023-10-03.

Pattern forming method and method for manufacturing semiconductor device

Номер патента: US11996295B2. Автор: Hironobu Sato,Yoshihiro Naka. Владелец: Kioxia Corp. Дата публикации: 2024-05-28.

Test pattern forming method, transport adjusting method, and image forming apparatus

Номер патента: US20120081450A1. Автор: Takeshi Yoshida,Masahiko Yoshida,Tatsuya Nakano,Michiaki Tokunaga. Владелец: Seiko Epson Corp. Дата публикации: 2012-04-05.

Pattern forming method and manufacturing method of solar battery

Номер патента: US20130309807A1. Автор: Shiro Sekino,Yoshinobu Hirokado. Владелец: Mitsubishi Electric Corp. Дата публикации: 2013-11-21.

Pattern-bearing sheet for use in simultaneous injection-molding and pattern-forming method

Номер патента: US5843555A. Автор: Kazuhisa Kobayashi,Hiroyuki Atake. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 1998-12-01.

Pattern forming method

Номер патента: EP1143506A3. Автор: Hiromu Ishii,Katsuyuki Machida,Kunio Saito,Tadao Nagatsuma,Shouji Yagi,Hakaru Kyuragi. Владелец: Nippon Telegraph and Telephone Corp. Дата публикации: 2004-02-25.

Pattern forming method

Номер патента: US20120148959A1. Автор: Sang-Hee Lee,Jin Choi,Byung-gook Kim,Hee-Bom Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2012-06-14.

Hole pattern forming method and semiconductor device manufacturing method

Номер патента: US20090093120A1. Автор: Toshiyuki Hirota. Владелец: Elpida Memory Inc. Дата публикации: 2009-04-09.

Pattern forming method

Номер патента: US20140199852A1. Автор: Masahiro Kimura,Tomonori Umezaki,Akiou Kikuchi. Владелец: Individual. Дата публикации: 2014-07-17.

Pattern forming method, film structure, electro-optical apparatus, and electronic device

Номер патента: US20050106775A1. Автор: Hironori Hasei. Владелец: Seiko Epson Corp. Дата публикации: 2005-05-19.

Pattern forming method

Номер патента: US20140094034A1. Автор: Kenichi Oyama,Hidetami Yaegashi. Владелец: Tokyo Electron Ltd. Дата публикации: 2014-04-03.

Pattern forming method and method of manufacturing semiconductor device

Номер патента: US20210090893A1. Автор: Tsubasa IMAMURA. Владелец: Kioxia Corp. Дата публикации: 2021-03-25.

Pattern forming method, semiconductor device manufacturing apparatus and storage medium

Номер патента: US8008211B2. Автор: Teruyuki Hayashi,Akitake Tamura,Kaoru Fujihara. Владелец: Tokyo Electron Ltd. Дата публикации: 2011-08-30.

Foam part, in particular for a vehicle seat, and method and tool for producing a foam part

Номер патента: US09914380B2. Автор: Karsten Hilger,Laurent Hugues,Horst Steinmeier,Bernhard Riezler,Mohsin Benamar. Владелец: Johnson Controls GmbH. Дата публикации: 2018-03-13.

Packet for cigarette industry products and method and device for producing the same

Номер патента: US12103744B2. Автор: Dirk Förstmann. Владелец: Focke and Co GmbH and Co KG. Дата публикации: 2024-10-01.

Multi-layer ceramic substrate, and method and device for producing the same

Номер патента: EP1471573A1. Автор: Hideaki c/o TDK Corporation NINOMIYA,Haruo c/o TDK Corporation NISHINO,Kiyoshi c/o TDK Corporation HATANAKA. Владелец: TDK Corp. Дата публикации: 2004-10-27.

Method and apparatus for impregnating a fibre bundle and method and facility for producing a three-dimensional structure

Номер патента: US20220212369A1. Автор: Maik Titze. Владелец: Deutsches Zentrum fuer Luft und Raumfahrt eV. Дата публикации: 2022-07-07.

Tissue product and method and apparatus for producing same

Номер патента: US20240229362A1. Автор: Sebastien Jeannot,Hans-Jürgen Lamb,Jurgen Sauter,Emmanuelle Kientz,Agne BUOB,Carlo Russo. Владелец: Essity Hygiene and Health AB. Дата публикации: 2024-07-11.

Implant, and method and system for producing such an implant

Номер патента: US09737392B2. Автор: Jan Hall. Владелец: Nobel Biocare Services AG. Дата публикации: 2017-08-22.

One-piece blank, display case, and method and device for producing such a case from said blank

Номер патента: US09662851B2. Автор: Gerard Mathieu,Sébastien Jacomelli,Thierry Colas. Владелец: Otor Sa. Дата публикации: 2017-05-30.

Electric roller-type capacitor and method and device for producing the capacitor

Номер патента: US4495542A. Автор: Harald Vetter,Rudolf Kros. Владелец: SIEMENS AG. Дата публикации: 1985-01-22.

Improved flexible solar panels and photovoltaic devices, and methods and systems for producing them

Номер патента: EP4388590A1. Автор: Eran MAIMON,Yaron Tidhar,Hod YARKONI,Ygal EISENBERG,Asaf Katz. Владелец: Solarpaint Ltd. Дата публикации: 2024-06-26.

Battery, power consumption device, and method and device for producing battery

Номер патента: US12036877B2. Автор: Wenli Wang,Xiaoteng Huang,Zhanyu SUN,Yuqun Zeng,Jiarong HONG,Haiqi Yang,Langchao Hu. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2024-07-16.

Brake caliper for disc brake assembly and method and apparatus for producing same

Номер патента: WO2016090086A1. Автор: Anthony Schmandt,Harry D. Miller,Sky Lintner,Antonio Eduardo MORAIS. Владелец: KELSEY-HAYES COMPANY. Дата публикации: 2016-06-09.

Flexible Solar Panels and Photovoltaic Devices, and Methods and Systems for Producing Them

Номер патента: US20240274734A1. Автор: Eran MAIMON,Yaron Tidhar,Hod YARKONI,Ygal EISENBERG,Asaf Katz. Владелец: Solarpaint Ltd. Дата публикации: 2024-08-15.

Pressurized steam-jetting nozzle, and method and apparatus for producing nonwoven fabric using the nozzle

Номер патента: US20080178442A1. Автор: Tomio Suzuki,Masahiro Taniguchi,Shinichi Shimizu. Владелец: Mitsubishi Rayon Engineering Co Ltd. Дата публикации: 2008-07-31.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US09941285B2. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2018-04-10.

Brake caliper for disc brake assembly and method and apparatus for producing same

Номер патента: US09737929B2. Автор: Anthony Schmandt,Harry D. Miller,Sky Lintner,Antonio Eduardo MORAIS. Владелец: Kelsey Hayes Co. Дата публикации: 2017-08-22.

Removable core for a shrinkable tubular sheath and method and apparatus for producing same

Номер патента: CA2059007C. Автор: William H. Tuggle, Jr.. Владелец: Atcoflex, Inc.. Дата публикации: 1996-05-14.

Curved wall and ceiling frame member and method and apparatus for producing the same

Номер патента: US20030140677A1. Автор: Charles Mears. Владелец: Mears Charles W.. Дата публикации: 2003-07-31.

Composite brake disc and method and device for producing same

Номер патента: RU2681069C2. Автор: Даниель ДЕРЬЯ. Владелец: Эрнст Гроб Аг. Дата публикации: 2019-03-01.

Method and device for bending edges of thick steel sheet and method and installation for producing steel pipe

Номер патента: RU2745056C1. Автор: Масаюки ХОРИЭ,Тосихиро МИВА,Тецуя ТОКУХАРА,Хиденори ХИРАКИ. Владелец: ДжФЕ СТИЛ КОРПОРЕЙШН. Дата публикации: 2021-03-18.

Mandibular advancement device, and method and kit for producing said device

Номер патента: RU2703505C2. Автор: АЛЬДЕКОА Эдуардо АНИТУА. Владелец: Байотекнолоджи Инститьют, И Мас Д, С.Л.. Дата публикации: 2019-10-17.

Insulating element and method and plant for producing and packaging

Номер патента: CA2182185C. Автор: Ian Cridland,LUIS JõRGEN NORGAARD,Kim Brandt. Владелец: Rockwool International AS. Дата публикации: 2006-03-21.

Packet for cigarette industry products and method and device for producing the same

Номер патента: US20220315274A1. Автор: Dirk Förstmann. Владелец: Focke and Co GmbH and Co KG. Дата публикации: 2022-10-06.

Cable, Strand, and Method and Device for Producing a Cable and a Strand

Номер патента: US20230407561A1. Автор: Thierry Verreet,Markus ZOGG,Marco Elig,Yeonhwan Bae. Владелец: Kv R&d Center GmbH. Дата публикации: 2023-12-21.

Packet for products in the cigarette industry, and method and device for producing the same

Номер патента: US11975913B2. Автор: Jan Schnakenberg,Gerd Städing. Владелец: Focke and Co GmbH and Co KG. Дата публикации: 2024-05-07.

Device for mixing cement slurry, and method and appratus for producing cement slurry

Номер патента: EP3646942A1. Автор: Mario Flavio Carlotto,Odysseas Spanos. Владелец: MCM Montaggi E Costruzioni Meccaniche Srl. Дата публикации: 2020-05-06.

Backside emitter solar cell structure having a heterojunction and method and device for producing the same

Номер патента: US11967662B2. Автор: Marcel Koenig,Jun Zhao. Владелец: Meyer Burger Germany GmbH. Дата публикации: 2024-04-23.

Enhanced Flexible Solar Panels and Photovoltaic Devices, and Methods and Systems for Producing Them

Номер патента: US20240243694A1. Автор: Eran MAIMON,Ramon Joseph ALBALAK,Yaron Tidhar,Hod YARKONI,Haggai Manor,Omri Gover. Владелец: Solarpaint Ltd. Дата публикации: 2024-07-18.

Enhanced flexible solar panels and photovoltaic devices, and methods and systems for producing them

Номер патента: EP4396877A1. Автор: Eran MAIMON,Ramon Joseph ALBALAK,Yaron Tidhar,Hod YARKONI,Haggai Manor,Omri Gover. Владелец: Solarpaint Ltd. Дата публикации: 2024-07-10.

Box of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US20230420774A1. Автор: Yao Li,Xiaobo Chen,Xianda Li,Lu HU,Jinru YUE,Piaopiao YANG,Mingguang GU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-12-28.

Case of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US20220118860A1. Автор: Wenli Wang,Xiaoteng Huang,Zhanyu SUN,Fenggang Zhao,Jiarong HONG,Haiqi Yang,Langchao Hu. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2022-04-21.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20230352788A1. Автор: Qiu Jin,OU Qian,Xiaobo Chen,Piaopiao YANG. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-11-02.

Energy storage container, and method and apparatus for producing energy storage container

Номер патента: US20240234932A1. Автор: Yue Liu,Chenling Zheng,Zengzhong Wang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-07-11.

Roll of bags and method and device for producing the same

Номер патента: WO1997033744A1. Автор: Kenneth Vinberg. Владелец: Vinberg Engineering. Дата публикации: 1997-09-18.

Battery cell, battery, power consumption device, and method and device for producing battery cell

Номер патента: US20240283099A1. Автор: Xing Li,HU XU,Shaojun Niu. Владелец: Contemporary Amperex Technology Hong Kong Ltd. Дата публикации: 2024-08-22.

Enhanced flexible solar panels and photovoltaic devices, and methods and systems for producing them

Номер патента: WO2023031916A1. Автор: Eran MAIMON,Ramon Joseph ALBALAK,Yaron Tidhar,Hod YARKONI,Haggai Manor,Omri Gover. Владелец: Solarpaint Ltd.. Дата публикации: 2023-03-09.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20230268588A1. Автор: PENG Wang,Yuepan HOU,Xiaoteng Huang,Zhanyu SUN,Haiqi Yang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-08-24.

Injection molded, blow molded, and rotational molded articles that integrally incorporate a photovoltaic device, and method and system for producing such articles

Номер патента: EP4238212A1. Автор: Eran MAIMON,Ramon Joseph ALBALAK. Владелец: Solarpaint Ltd. Дата публикации: 2023-09-06.

Box of battery, battery, power consumption apparatus, and method and apparatus for producing battery

Номер патента: US20240372207A1. Автор: Yao Li,Qiu Jin,Xiaobo Chen,Mingguang GU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-11-07.

Packs, in particular for cigarettes, and method and apparatus for producing said packs

Номер патента: US09788575B2. Автор: Henry Buse,Reinhard Lohmann. Владелец: Focke and Co GmbH and Co KG. Дата публикации: 2017-10-17.

Battery, power consumption device, and method and device for producing battery

Номер патента: US11862776B2. Автор: PENG Wang,Yuepan HOU,Xiaoteng Huang,Zhanyu SUN,Haiqi Yang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-01-02.

Tubular member and method and apparatus for producing a tubular member

Номер патента: EP2951003A1. Автор: Thilo Simonsohn,Christian Heindl,Bernd Graeve. Владелец: Tyco Electronics Raychem GmbH. Дата публикации: 2015-12-09.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20240021910A1. Автор: PENG Wang,Yuepan HOU,Xiaoteng Huang,Zhanyu SUN,Haiqi Yang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-01-18.

Nonwoven structure and method and apparatus for producing it

Номер патента: US3756893A. Автор: R Smith. Владелец: Owens Corning Fiberglas Corp. Дата публикации: 1973-09-04.

Security thread or stripe comprising oriented magnetic particles in ink, and method and means for producing same

Номер патента: CA2791929C. Автор: Claude-Alain Despland,Pierre Degott,Mathieu Schmid,Gebhard Ritter,Edgar Mueller. Владелец: SICPA HOLDING SA. Дата публикации: 2017-12-12.

Sack and method and device for producing sacks

Номер патента: US9205957B2. Автор: Uwe Koehn. Владелец: Windmoeller and Hoelscher KG. Дата публикации: 2015-12-08.

Cold rollformed structures and method and apparatus for producing same

Номер патента: CA1316766C. Автор: Gale E. Sauer,Dennis A. Alvarez,George F. Bosl,Joseph A. Hocevar,Patrick M. Kelly. Владелец: Donn Inc. Дата публикации: 1993-04-27.

Extruded plastic film with adhering strips and method and apparatus for producing same

Номер патента: CA1324475C. Автор: Kevin J. Wagers,Douglas P. Gundlach. Владелец: Dow Chemical Co. Дата публикации: 1993-11-23.

Air-laid blank for sound absorbing or damping, and methods and appartuses for producing such

Номер патента: US20230416958A1. Автор: Maria TÖRNBLOM. Владелец: STORA ENSO OYJ. Дата публикации: 2023-12-28.

Battery, power consumption apparatus, and method and apparatus for producing battery

Номер патента: CA3224216A1. Автор: Yao Li,Qiu Jin,Xiaobo Chen,Jianhuang KE,Yujie Pu. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-03-09.

Capacitive sensors and methods and apparatuses for producing capacitive sensors

Номер патента: US20230405920A1. Автор: Jinsheng Fan,Brittany Newell,Jose Manuel Garcia-Bravo,Robert A. Nawrocki. Владелец: PURDUE RESEARCH FOUNDATION. Дата публикации: 2023-12-21.

Air-laid blank for sound absorbing or damping, and methods and apparatuses for producing such

Номер патента: EP4259870A1. Автор: Maria TÖRNBLOM. Владелец: STORA ENSO OYJ. Дата публикации: 2023-10-18.

Pressurized steam-jetting nozzle, and method and apparatus for producing nonwoven fabric using the nozzle

Номер патента: US20060042057A1. Автор: Tomio Suzuki,Masahiro Taniguchi,Shinichi Shimizu. Владелец: Mitsubishi Rayon Engineering Co Ltd. Дата публикации: 2006-03-02.

Method and device for bending edges of thick steel sheet and method and installation for producing steel pipe

Номер патента: RU2741916C1. Автор: Масаюки ХОРИЭ,Тосихиро МИВА,Тецуя ТОКУХАРА,Хиденори ХИРАКИ. Владелец: ДжФЕ СТИЛ КОРПОРЕЙШН. Дата публикации: 2021-01-29.

Brush head and method and tool for producing same

Номер патента: US8845034B2. Автор: Klaus Amsel,Andreas Birk,Ulrich Pfeifer,Lars Foerster,Guenther Alschweig. Владелец: Braun GmbH. Дата публикации: 2014-09-30.

Closure system for pliable container and method and apparatus for producing the same

Номер патента: CA2293258A1. Автор: Robert W. Hausslein. Владелец: Individual. Дата публикации: 1999-01-07.

Removable redeemable coupon for newspaper advertisements and method and apparatus for producing same

Номер патента: US3995555A. Автор: Frank E. Stewart. Владелец: Individual. Дата публикации: 1976-12-07.

Rigid paperboard container and method and apparatus for producing the same

Номер патента: CA1225342A. Автор: Patrick H. Wnek,Gerald J. Van Handel,John L. Petit. Владелец: James River Norwalk Inc. Дата публикации: 1987-08-11.

Surface treated security paper and method and device for producing surface treated security paper

Номер патента: CA2236860C. Автор: Lars-Ake Peterson. Владелец: M Real Sverige AB. Дата публикации: 2006-10-24.

Customized prescription product packaging and method and system for producing customized prescription product packaging

Номер патента: CA2333343A1. Автор: Wallace Anthony Martin,Daniel Tsu-Fang Wang,Stephen R. Beaton,Donnie Jerome Duis,George E. Himes. Владелец: Johnson and Johnson Vision Care Inc. Дата публикации: 2001-08-01.

Walled domed building structures and methods and apparatus for producing them

Номер патента: GB985099A. Автор: . Владелец: Dow Chemical Co. Дата публикации: 1965-03-03.

Stable fiber laminate and method and apparatus for producing same

Номер патента: CA2621674C. Автор: Ullrich Muenstermann. Владелец: Fleissner GmbH. Дата публикации: 2014-04-22.

Tapered pole and method and apparatus for producing same

Номер патента: US3771978A. Автор: F Cauffiel. Владелец: Individual. Дата публикации: 1973-11-13.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20220123430A1. Автор: Chengdu Liang,Wenli Wang,Xiaoteng Huang,Jiarong HONG,Haiqi Yang,Langchao Hu,Cheng Xue. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2022-04-21.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20240088477A1. Автор: PENG Wang,Yuepan HOU,Xiaoteng Huang,Zhanyu SUN,Haiqi Yang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-03-14.

Box of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US20240088498A1. Автор: Yao Li,Xiaobo Chen,Xianda Li,Lu HU,Jinru YUE,Piaopiao YANG,Mingguang GU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-03-14.

Case of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US11926225B2. Автор: Wenli Wang,Xiaoteng Huang,Zhanyu SUN,Fenggang Zhao,Jiarong HONG,Haiqi Yang,Langchao Hu. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2024-03-12.

Rubber Molded Articles that Integrally Incorporate a Photovoltaic Device, and Method and System for Producing Such Articles

Номер патента: US20230344381A1. Автор: Eran MAIMON,Ramon Joseph ALBALAK. Владелец: Solarpaint Ltd. Дата публикации: 2023-10-26.

Rubber molded articles that integrally incorporate a photovoltaic device, and method and system for producing such articles

Номер патента: EP4275234A2. Автор: Eran MAIMON,Ramon Joseph ALBALAK. Владелец: Solarpaint Ltd. Дата публикации: 2023-11-15.

Battery, power consumption device, and method and device for producing battery

Номер патента: US11888177B2. Автор: Chengdu Liang,Wenli Wang,Xiaoteng Huang,Jiarong HONG,Haiqi Yang,Langchao Hu. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2024-01-30.

Battery, power consumption device, and method and device for producing battery

Номер патента: US11888136B2. Автор: PENG Wang,Yuepan HOU,Xiaoteng Huang,Zhanyu SUN,Haiqi Yang. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-01-30.

Mandrel, bent tube, and method and apparatus for producing bent tube

Номер патента: US11969779B2. Автор: Shohei Tamura,Hidehiro Arita. Владелец: Nippon Steel Corp. Дата публикации: 2024-04-30.

Box of battery, battery, power consumption apparatus, and method and apparatus for producing battery

Номер патента: CA3227076A1. Автор: Yao Li,Qiu Jin,Xiaobo Chen,Mingguang GU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-07-20.

Case of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US11936027B2. Автор: Wenli Wang,Xiaoteng Huang,Fenggang Zhao,Jiarong HONG,Haiqi Yang,Langchao Hu,Cheng Xue. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2024-03-19.

Battery cell, battery, power consumption device, and method and device for producing battery cell

Номер патента: US20240106084A1. Автор: PENG Wang,Zhijun Guo,Haizu Jin,Yulian ZHENG,Xinxiang CHEN,Denghua LIN. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2024-03-28.

Box of battery, battery, power consumption device, and method and device for producing battery

Номер патента: US11784371B2. Автор: Yao Li,Xiaobo Chen,Xianda Li,Lu HU,Jinru YUE,Piaopiao YANG,Mingguang GU. Владелец: Contemporary Amperex Technology Co Ltd. Дата публикации: 2023-10-10.

Battery, power consumption device, and method and device for producing battery

Номер патента: US20220123424A1. Автор: Kai Wu,Wenli Wang,Xiaoteng Huang,Zhanyu SUN,Jiarong HONG,Haiqi Yang,Langchao Hu. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2022-04-21.

Battery, power consumption device, and method and device for producing battery

Номер патента: US11996580B2. Автор: Chengdu Liang,Wenli Wang,Xiaoteng Huang,Jiarong HONG,Haiqi Yang,Langchao Hu,Cheng Xue. Владелец: Jiangsu Contemporary Amperex Technology Ltd. Дата публикации: 2024-05-28.

Rubber molded articles that integrally incorporate a photovoltaic device, and method and system for producing such articles

Номер патента: WO2022149140A3. Автор: Eran MAIMON,Ramon Joseph ALBALAK. Владелец: Solarpaint Ltd.. Дата публикации: 2022-08-18.

Backside emitter solar cell structure having a heterojunction and method and device for producing the same

Номер патента: AU2020343894A1. Автор: Jun Zhao,Marcel Konig. Владелец: Meyer Burger Germany GmbH. Дата публикации: 2022-02-24.

Mandrel, Bent Tube, and Method and Apparatus for Producing Bent Tube

Номер патента: US20200009630A1. Автор: Shohei Tamura,Hidehiro Arita. Владелец: Nippon Steel Corp. Дата публикации: 2020-01-09.

Sunscreen compositions and methods and materials for producing the same

Номер патента: EP1490018A2. Автор: Urvil B. Shah,Craig A. Bonda,Robert J. Mcmillin,Magda M. Roth. Владелец: CP Hall Co. Дата публикации: 2004-12-29.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US9780095B2. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-10-03.

Wireless communication method, information access method, and virtual antenna radiation pattern forming method

Номер патента: US8472622B2. Автор: Wan-Hsin Hsieh,Ming-Seng Kao,Chieh-Fu Chang. Владелец: NATIONAL APPLIED RESEARCH LABORATORIES. Дата публикации: 2013-06-25.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US20170352667A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-12-07.

Pattern forming method and semiconductor device manufacturing method using the same

Номер патента: US20170243871A1. Автор: Jae-Houb CHUN,Jeong-Sub LIM. Владелец: SK hynix Inc. Дата публикации: 2017-08-24.

Wireless communication method, information access method, and virtual antenna radiation pattern forming method

Номер патента: US20100235708A1. Автор: Wan-Hsin Hsieh,Ming-Seng Kao,Chieh-Fu Chang. Владелец: Individual. Дата публикации: 2010-09-16.

Conductive pattern forming method and conductive pattern forming system

Номер патента: US20130129916A1. Автор: Manabu Katsumura. Владелец: Fujifilm Corp. Дата публикации: 2013-05-23.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD

Номер патента: US20120003586A1. Автор: . Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

Номер патента: US20120003583A1. Автор: TSUBAKI Hideaki,Tsuchimura Tomotaka,TAKAHASHI Toshiya. Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION

Номер патента: US20120003585A1. Автор: TSUBAKI Hideaki,Tsuchimura Tomotaka,Yatsuo Tadateru,TSUCHIHASHI Toru,SHIRAKAWA Koji. Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

Номер патента: US20120003590A1. Автор: . Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

Radiation sensitive resin composition and color filter

Номер патента: SG141403A1. Автор: Tatsuyoshi Kawamoto,Kazuhiro Kobayashi,Masashi Arai,Ryu Matsumoto,Isamu Makihira. Владелец: JSR Corp. Дата публикации: 2008-04-28.

PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME

Номер патента: US20120003436A1. Автор: . Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, ANTIREFLECTION FILM, INSULATING FILM, OPTICAL DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20120003437A1. Автор: Kodama Kunihiko,WADA Kenji,OHTA Masaki. Владелец: FUJIFILM Corporation. Дата публикации: 2012-01-05.

Radiation-sensitive resin composition for liquid immersion exposure and pattern forming method

Номер патента: JP2011095623A. Автор: 裕介 浅野,Yusuke Asano. Владелец: JSR Corp. Дата публикации: 2011-05-12.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP4561625B2. Автор: 昌樹 遠藤,卓哉 梶原,庸司 田中. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2010-10-13.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP4529752B2. Автор: 昌樹 遠藤,芳樹 味岡,満明 渡辺. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2010-08-25.

Photosensitive resin composition, photosensitive element, resist pattern forming method, and printed wiring board manufacturing method

Номер патента: JP5273455B2. Автор: 力 石川,卓治 阿部,浩二 小柳. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2013-08-28.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP5799799B2. Автор: 誠 鍛治,宮坂　昌宏,昌宏 宮坂,傑 印,学松 姜,鍛治　誠,宝 李. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2015-10-28.

Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method

Номер патента: JP5899798B2. Автор: 有紀子 村松,宮坂　昌宏,昌宏 宮坂. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2016-04-06.

Photosensitive thermosetting resin composition and solder resist pattern forming method

Номер патента: JP2802801B2. Автор: 峰雄 野内,功 師岡,洋一 大場,山大 岩佐,光二 宮部,晴弘 小久保,太郎 長坂. Владелец: 株式会社アサヒ化学研究所. Дата публикации: 1998-09-24.

Photosensitive thermosetting resin composition and solder resist pattern forming method

Номер патента: JP2802800B2. Автор: 峰雄 野内,功 師岡,洋一 大場,山大 岩佐,光二 宮部,晴弘 小久保,太郎 長坂. Владелец: 株式会社アサヒ化学研究所. Дата публикации: 1998-09-24.

Photosensitive resin composition, photosensitive film, resist pattern forming method and printed wiring board

Номер патента: JP5082566B2. Автор: 正樹 森田,修一 畠山. Владелец: Showa Denko Materials Co Ltd. Дата публикации: 2012-11-28.

Impression pattern forming method in functional layer of article by multi-pass planing in nc machine tools and planing cutter for performing the same

Номер патента: RU2296036C1. Автор: Аркадий Владимирович Трачук,Андрей Валерьевич Чеглаков,Александр Георгиевич Писарев,Александр Игоревич Мочалов,Валерий Анатольевич Чеглаков,Дмитрий Николаевич Грачев,Алексей Владимирович Греков,Владимир Васильевич Павлов,залов Сергей Юрьевич В,Сергей Юрьевич Вязалов,Александр Васильевич Курочкин,Евгений Михайлович Метельский,Виктор Сергеевич Солдатченков,Яков Михайлович Ашкиназий,Виктор Афанасьевич Чекмарев,Алексей Иванович Климов,Сергей Геннадьевич Зарубин. Владелец: Федеральное Государственное Унитарное Предприятие "Гознак" (Фгуп "Гознак"). Дата публикации: 2007-03-27.

INFORMATION STORAGE/READOUT DEVICE FOR USE IN CONTINUOUSLY MANUFACTURING SYSTEM FOR LIQUID-CRYSTAL DISPLAY ELEMENTS, AND METHOD AND SYSTEM FOR PRODUCING THE SAME

Номер патента: US20120002154A1. Автор: Kitada Kazuo,Yura Tomokazu,Koshio Satoru,Nakazono Takuya,KIMURA Kouji,SHIMANOE Fumihito. Владелец: NITTO DENKO CORPORATION. Дата публикации: 2012-01-05.

Package and method and apparatus for producing same

Номер патента: CA1057700A. Автор: Larry C. Gess. Владелец: Individual. Дата публикации: 1979-07-03.

Gypsum-containing product having increased resistance to permanent deformation and method and composition for producing it

Номер патента: NZ509805A. Автор: Qiang Yu,Steven W Sucech,Brent E Groza,Frederick T Jones,Frederick M Boehnert,Raymond J Mlinac. Владелец: United States Gypsum Co. Дата публикации: 2003-08-29.

Radiation sensitive resin composition, resist pattern forming method, polymer, compound and method for producing the same

Номер патента: JP6273689B2. Автор: 恭彦 松田,憲嗣 望田,裕介 浅野. Владелец: JSR Corp. Дата публикации: 2018-02-07.

Radiation-sensitive resin composition, resist pattern forming method, polymer and compound

Номер патента: JP6825249B2. Автор: 準人 生井,泰一 古川,奈津子 木下. Владелец: JSR Corp. Дата публикации: 2021-02-03.

Radiation-sensitive resin composition, resist pattern forming method, and radiation-sensitive acid generator

Номер патента: JP7192589B2. Автор: 龍一 根本. Владелец: JSR Corp. Дата публикации: 2022-12-20.

RESIN COMPOSITION FOR SOLAR CELL ENCAPSULANT, SOLAR CELL ENCAPSULANT AND SOLAR CELL MODULE USING THE SAME

Номер патента: US20120000514A1. Автор: Amamiya Takahiro,Onaka Tamami. Владелец: JAPAN POLYETHYLENE CORPORATION. Дата публикации: 2012-01-05.

Radiation-sensitive resin composition, resist pattern forming method and compound

Номер патента: JP6926406B2. Автор: 準人 生井,晃太 西野. Владелец: JSR Corp. Дата публикации: 2021-08-25.

FLAME-RETARDANT POLY LACTIC ACID-CONTAINING FILM OR SHEET, AND METHOD FOR MANUFACTURING THEREOF

Номер патента: US20120003459A1. Автор: . Владелец: NITTO DENKO CORPORATION. Дата публикации: 2012-01-05.

Radiation-sensitive resin composition for forming cured film, method for producing radiation-sensitive resin composition for forming cured film, cured film, method for forming cured film, and display element

Номер патента: JP5765049B2. Автор: 克巳 猪俣,英司 米田,信弘 西,誠一郎 児玉,猪俣　克巳,米田　英司. Владелец: JSR Corp. Дата публикации: 2015-08-19.

COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING COMPOUND

Номер патента: US20120100480A1. Автор: MATSUMURA Nobuji,Naruoka Takehiko,ASANO Yuusuke,SAKAKIBARA Hirokazu,NISHIMURA Yukio. Владелец: JSR Corporation. Дата публикации: 2012-04-26.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20130004740A1. Автор: . Владелец: FUJIFILM Corporation. Дата публикации: 2013-01-03.

Radiation sensitive resin composition, radiation sensitive dry film, interlayer dielectric film and a forming method thereof, and microlens and a forming method thereof

Номер патента: TW200630749A. Автор: Eiji Takamoto,Masaaki Hanamura,Kenichi Hamada,Takaki Minowa. Владелец: JSR Corp. Дата публикации: 2006-09-01.

THIN FILM TRANSISTOR AND METHOD OF FABRICATING SAME

Номер патента: US20120001190A1. Автор: Yaneda Takeshi,Aita Tetsuya,Harumoto Yoshiyuki,Inoue Tsuyoshi,OKABE Tohru. Владелец: SHARP KABUSHIKI KAISHA. Дата публикации: 2012-01-05.

Radiation-sensitive resin composition and resist pattern forming method

Номер патента: JP6451427B2. Автор: 仁視 大▲崎▼. Владелец: JSR Corp. Дата публикации: 2019-01-16.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD

Номер патента: US20120301817A1. Автор: Ito Takayuki,Inasaki Takeshi,Tsuchimura Tomotaka,Yatsuo Tadateru,Takahashi Koutarou. Владелец: FUJIFILM Corporation. Дата публикации: 2012-11-29.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20130078432A1. Автор: Shirakawa Michihiro,Yamaguchi Shuhei,TAKAHASHI Hidenori,KATAOKA Shohei,YOSHINO Fumihiro,SAITOH Shoichi. Владелец: FUJIFILM Corporation. Дата публикации: 2013-03-28.

Polymer, radiation-sensitive resin composition, and resist pattern forming method

Номер патента: JP6264144B2. Автор: 準人 生井,仁視 大▲崎▼. Владелец: JSR Corp. Дата публикации: 2018-01-24.

Sensitive light-sensitive or radiation-sensitive resin composition, sensitive light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing an electronic device.

Номер патента: JP6846151B2. Автор: 啓太 加藤,研由 後藤,大輔 浅川,享平 崎田,雅史 小島,惠瑜 王. Владелец: Fujifilm Corp. Дата публикации: 2021-03-24.

Polymer, radiation-sensitive resin composition, and resist pattern forming method

Номер патента: JP4848843B2. Автор: 幸生 西村,峰規 川上,賢二 星子. Владелец: JSR Corp. Дата публикации: 2011-12-28.

Compound having sulfonyl structure, radiation-sensitive acid generator, positive-type radiation-sensitive resin composition, and negative-type radiation-sensitive resin composition using the same

Номер патента: JP4120437B2. Автор: 健一 横山,勇 王,敏 江幡,智樹 永井,潤一郎 稲葉. Владелец: JSR Corp. Дата публикации: 2008-07-16.

Compound having sulfonyl structure, radiation-sensitive acid generator, positive-type radiation-sensitive resin composition, and negative-type radiation-sensitive resin composition using the same

Номер патента: JP4951827B2. Автор: 健一 横山,努 下川,勇 王,敏 江幡,真司 白木. Владелец: JSR Corp. Дата публикации: 2012-06-13.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION

Номер патента: US20120251948A1. Автор: Shibuya Akinori,KATAOKA Shohei,Iizuka Yusuke,Tango Naohiro. Владелец: FUJIFILM Corporation. Дата публикации: 2012-10-04.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

Номер патента: US20130004888A1. Автор: Inasaki Takeshi,Tsuchimura Tomotaka. Владелец: FUJIFILM Corporation. Дата публикации: 2013-01-03.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

Номер патента: US20130029255A1. Автор: Inasaki Takeshi,Tsuchimura Tomotaka. Владелец: FUJIFILM Corporation. Дата публикации: 2013-01-31.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Номер патента: US20130034706A1. Автор: Yamaguchi Shuhei. Владелец: FUJIFILM Corporation. Дата публикации: 2013-02-07.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, electronic device manufacturing method

Номер патента: JP6659481B2. Автор: 啓太 加藤,研由 後藤,大輔 浅川,雅史 小島,惠瑜 王. Владелец: Fujifilm Corp. Дата публикации: 2020-03-04.

RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20120237876A1. Автор: MARUYAMA Ken. Владелец: JSR Corporation. Дата публикации: 2012-09-20.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD

Номер патента: US20120135348A1. Автор: Shibuya Akinori,Matsuda Tomoki,TOKUGAWA Yoko. Владелец: FUJIFILM Corporation. Дата публикации: 2012-05-31.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME

Номер патента: US20120164574A1. Автор: Fujita Mitsuhiro,Matsuda Tomoki,TOKUGAWA Yoko. Владелец: FUJIFILM Corporation. Дата публикации: 2012-06-28.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME

Номер патента: US20130020684A1. Автор: IWATO Kaoru. Владелец: FUJIFILM Corporation. Дата публикации: 2013-01-24.

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION

Номер патента: US20130045445A1. Автор: TSUBAKI Hideaki,HIRANO Shuji,Takizawa Hiroo,TAKAHASHI Toshiya,TAMAOKI Hiroshi. Владелец: FUJIFILM Corporation. Дата публикации: 2013-02-21.

Бесплатный поиск патентной информации. Построение патентных ландшафтов и отчетов.

Главная
Проекты и услуги
Контакты

© 2021-2022 - All Rights Reserved - разработано Ecoruspace.me.