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Radiation-sensitive resin composition and resist pattern formation method

Номер патента: KR102447850B1
Опубликовано: 28-09-2022
Автор(ы): 다케히코 나루오카, 데츠로우 가네코
Принадлежит: 제이에스알 가부시끼가이샤
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Radiation sensitive resin composition and formation of interlayer insulating film and microlens

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Radiation-sensitive resin composition and silicon oxide film forming method

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Radiation sensitive resin composition and formation of interlayer insulating film and microlens

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Positive-type radiation-sensitive resin composition and method for producing plated molded article

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Pigment dispersion composition, (radiation-sensitive) resin composition for ink-jet type color filter, color filter and liquid crystal display device

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Radiation sensitive resin composition and application thereof

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Radiation sensitive resin composition and spacer for liquid crystal display element

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Radiation sensitive resin composition and pattern forming method using the same

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Radiation sensitive resin composition and method for manufacturing semiconductor device using the same

Номер патента: JP4852575B2. Автор: 健 木村,健一 村上,雅人 西川,義章 木下,雄裕 吉川,卓 佐々. Владелец: AZ Electronic Materials Japan Co Ltd. Дата публикации: 2012-01-11.

Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device

Номер патента: JP4862998B2. Автор: 浩司 志保,勇 米倉,大吾 一戸,徹 梶田,壽浩 西尾. Владелец: JSR Corp. Дата публикации: 2012-01-25.

Radiation-sensitive resin composition and interlayer insulating film formed therefrom

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Radiation sensitive resin composition and color filter

Номер патента: SG141402A1. Автор: Tatsuyoshi Kawamoto,Tomio Nagatsuka,Tsukasa Toyoshima,Masashi Arai,Ryu Matsumoto,Isamu Makihira. Владелец: JSR Corp. Дата публикации: 2008-04-28.

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