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Radiation-sensitive resin composition and polymer

Номер патента: KR101708071B1
Опубликовано: 17-02-2017
Автор(ы): 겐 마루야마, 고타 니시노, 다이스케 시미즈, 도시유키 가이
Принадлежит: 제이에스알 가부시끼가이샤
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Method for producing active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

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Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin

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Sensitized ray or the manufacture method of radiation-sensitive resin composition, sensitized ray or radiation-sensitive resin composition, sensitized ray or radioactivity-sensitive film, possess sensitized ray or the blank mask of radioactivity-sensitive film, photomask, pattern formation method, the manufacture method of electronic device and electronic device

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Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

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Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

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