Process kit having tall deposition ring for pvd chamber
Номер патента: SG11202105742YA
Опубликовано: 29-07-2021
Автор(ы): Cheng-Hsiung Tsai, David Gunther, Kirankumar Neelasandra Savandaiah
Принадлежит: Applied Materials Inc
Опубликовано: 29-07-2021
Автор(ы): Cheng-Hsiung Tsai, David Gunther, Kirankumar Neelasandra Savandaiah
Принадлежит: Applied Materials Inc
Process kit having tall deposition ring for pvd chamber
Номер патента: US20240242947A1. Автор: Cheng-Hsiung Tsai,David Gunther,Kirankumar Neelasandra Savandaiah. Владелец: Applied Materials Inc. Дата публикации: 2024-07-18.