Integrated circuit and system for fabricating the same.

Integrated circuit and system for fabricating the same

Номер патента: US20240234404A1
Опубликовано: 11-07-2024
Автор(ы): Cheng-Yin WANG, Ching-Yu Huang, Chun-Yen Lin, Jiann-Tyng Tzeng, Jui-Chien Huang, Shih-Wei Peng, Szuya Liao, Ting-Yun Wu, Wei-Cheng Lin, Wei-Cheng TZENG
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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