STENCIL MASK WITH MEANS OF LOAD ACCUMULATION PREVENTION AND PROCESS FOR MANUFACTURING THE SAME
Номер патента: FR2849529B1
Опубликовано: 22-02-2008
Автор(ы): Kyoichi Suguro, Takeshi Shibata
Принадлежит: Toshiba Corp
Опубликовано: 22-02-2008
Автор(ы): Kyoichi Suguro, Takeshi Shibata
Принадлежит: Toshiba Corp
Top-coating composition for photoresist and process for forming fine pattern using the same
Номер патента: GB2352825B. Автор: Min-Ho Jung,Sung-Eun Hong,Jin Soo Kim,Cha Won Koh,Jae-Chang Jung,Keun-Kyu Kong,Hyeong-Soo Kim,Geun-Su Lee,Baik Ki Ho. Владелец: Hyundai Electronics Industries Co Ltd. Дата публикации: 2003-12-17.