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Patterning method

Номер патента: US20220223415A1
Опубликовано: 14-07-2022
Автор(ы): Frederic LAZZARINO, Victor M. Blanco
Принадлежит: Interuniversitair Microelektronica Centrum vzw IMEC
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Metal electrode patterning method using pattern formation control material and substrate, electronic device and display having metal electrode pattern

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Metal electrode patterning method using pattern formation control material, and substrate, electronic device, and display having metal electrode pattern

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Patterning method using electron beam and exposure system configured to perform the same

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Resist patterning method, latent resist image forming device, and resist material

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Photolithography patterning method

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Patterning method

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Patterning method

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Method of removing metal residue using gas phase cleaning, method of forming a conductive layer pattern, method of manufacturing a semiconductor device and related equipment

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Patterning Method Using Secondary Resist Surface Functionalization for Mask Formation

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Hybrid Double Patterning Method for Semiconductor Manufacture

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Method of forming pattern, method of manufacturing semiconductor device, and pattern-forming material

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Hybrid Double Patterning Method for Semiconductor Manufacture

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Hybrid Double Patterning Method for Semiconductor Manufacture

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Photoresist, patterning method of photoresist and etching method of integrated circuit board

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EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY PATTERNING METHODS UTILIZING EUV RESIST HARDENING

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Patterning method employing half tone mask, array substrate and display device

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Thin film patterning method and method of manufacturing semiconductor device using the thin film patterning method

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Euv patterning methods, structures, and materials

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EUV patterning methods, structures, and materials

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Dummy metal pattern method and apparatus

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The patterning method of mesoporous inorganic oxide film and solar cell comprising the mesoporous inorganic oxide film patterned by the method

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The patterning method of mesoporous inorganic oxide film and solar cell comprising the mesoporous inorganic oxide film patterned by the method

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Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device

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GRAPHENE PATTERNING METHOD AND PATTERNING MEMBER

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Method for manufacturing wiring pattern, method for manufacturing conductive film, and method for manufacturing transistor

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Method of forming thin film pattern, method of manufacturing device, electro-optical apparatus and electronic apparatus

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Method for forming pattern, method for manufacturing light emitting device, and light emitting device

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PATTERNING METHODS FOR SEMICONDUCTOR DEVICES AND STRUCTURES RESULTING THEREFROM

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VIA CONTACT PATTERNING METHOD TO INCREASE EDGE PLACEMENT ERROR MARGIN

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VIA CONTACT PATTERNING METHOD TO INCREASE EDGE PLACEMENT ERROR MARGIN

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Patterning Methods for Semiconductor Devices and Structures Resulting Therefrom

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Sidewall spacer patterning method using gas cluster ion beam

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Sidewall spacer patterning method using gas cluster ion beam

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Semiconductor device, method of fabricating the same, and patterning method

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Methods of cutting a fine pattern, methods of forming active patterns using the same, and methods of manufacturing a semiconductor device using the same

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Semiconductor device, method of fabricating the same, and patterning method

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Oxide material, patterning substrate, method of forming a pattern, method of producing an imprint transfer mold, method of producing a recording medium, imprint transfer mold, and recording medium

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Patterned bases, and patterning methods

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SEMICONDUCTOR DEVICE, METHOD OF FABRICATING THE SAME, AND PATTERNING METHOD

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MULTI-PATTERNING METHOD AND DEVICE FORMED BY THE METHOD

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METHOD OF FORMING FINE PATTERN, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM

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PATTERNING METHOD FOR FORMING STAIRCASE STRUCTURE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

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Method of forming resist pattern, method of manufacturing semiconductor device using the same, and semiconductor device

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Method for forming wiring pattern, method for manufacturing device, and device

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Patterning method and method for manufacturing semiconductor device

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Method for forming wiring pattern, method for manufacturing device, device and electronic equipment

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Method of forming a test pattern, method of measuring etching characteristic using the same and circuit for measuring the etching characteristic

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PATTERNING METHOD

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DOUBLE PATTERNING METHODS AND STRUCTURES

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DOUBLE PATTERNING METHOD

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TRIPLE PATTERNING METHOD

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PATTERNING METHOD

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Hybrid Double Patterning Method for Semiconductor Manufacture

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Double patterning method to form sub-lithographic pillars

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DOUBLE PATTERNING METHOD TO FORM SUB-LITHOGRAPHIC PILLARS

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Fin Patterning Methods for Increased Process Margins

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PATTERNING METHOD FOR SEMICONDUCTOR DEVICE FABRICATION

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PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD

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Manufacturing method of mask for double patterning and double patterning method

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METHOD FOR TREATING PHOTORESIST AND SELF-ALIGNED DOUBLE PATTERNING METHOD

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Self-aligned double patterning method, semiconductor device and manufacturing method thereof, and electronic device

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MULTIPLE PATTERNING METHOD FOR SUBSTRATE

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Patterning Method and Method for Manufacturing Array Substrate

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Compound, patterned material, semiconductor device, terminal, and patterning method

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Laser patterning apparatus and laser patterning method

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Compound, patterning material, semiconductor device, terminal, and patterning method

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