Dielectric barrier discharge plasma reactor for non-oxidative coupling of methane having a controlled gap distance between dielectric particles and regeneration method of deactivated bed in the same
Номер патента: US20200129952A1
Опубликовано: 30-04-2020
Автор(ы): Jaekwon Jeoung, Jinwon Lee, Juchan Kim, Kyoung-Su Ha
Принадлежит: Industry University Cooperation Foundation of Sogang University
Получить PDF файл: Открыть в новом окне
Опубликовано: 30-04-2020
Автор(ы): Jaekwon Jeoung, Jinwon Lee, Juchan Kim, Kyoung-Su Ha
Принадлежит: Industry University Cooperation Foundation of Sogang University
Получить PDF файл: Открыть в новом окне
Dielectric barrier discharge plasma reactor for non-oxidative coupling of methane having a controlled gap distance between dielectric particles and regeneration method of deactivated bed in the same
Номер патента: US11633708B2. Автор: Jinwon Lee,Kyoung-Su Ha,Juchan Kim,Jaekwon Jeoung. Владелец: Industry University Cooperation Foundation of Sogang University. Дата публикации: 2023-04-25.