Alignment mark and method of formation

25-10-2016 дата публикации

Номер:

US09478480B2

Автор: Chen-Hua Yu, Chen-Yu Tsai, Chia-Ho Chen, Chien-Ming Chiu, Fang Wen Tsai, Jing-Cheng Lin, Shih-Hui Wang, Shin-puu Jeng, Wen-Chih Chiou, Weng-Jin Wu

Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

Контакты:

Номер заявки:

Дата заявки:

CPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/3060 H01L21/30604 H01L21/6 H01L21/68 H01L21/683 H01L21/6835 H01L21/7 H01L21/76 H01L21/768 H01L21/7683 H01L21/76831 H01L21/7687 H01L21/76877 H01L21/7689 H01L21/76898 H01L22 H01L222 H01L2221 H01L2221/H01L2221/6 H01L2221/68 H01L2221/683 H01L2221/6832 H01L2221/68327 H01L2223 H01L2223/H01L2223/5 H01L2223/54 H01L2223/544 H01L2223/5442 H01L2223/54426 H01L2224 H01L2224/H01L2224/1 H01L2224/13 H01L23 H01L23/H01L23/4 H01L23/48 H01L23/481 H01L23/5 H01L23/54 H01L23/544

IPC - классификация

C C0 C09 C09K C09K1 C09K13 C09K13/C09K13/0 C09K13/08 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/6 H01L21/68 H01L21/683 H01L21/6835 H01L23 H01L23/H01L23/5 H01L23/54 H01L23/544

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