Substrate cleaning chamber, a substrate processing system including the same, and a method of processing a substrate using the substrate processing system.

Substrate cleaning chamber, a substrate processing system including the same, and a method of processing a substrate using the substrate processing system

Номер патента: US20240173751A1
Опубликовано: 30-05-2024
Автор(ы): Ji Hwan Park, Kuntack Lee, Sangjine Park
Принадлежит: SAMSUNG ELECTRONICS CO LTD
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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