Textured-grain-powder metallurgy tantalum sputter target
Номер патента: EP1735476A1
Опубликовано: 27-12-2006
Автор(ы): Holger J. Koenigsmann, Paul S. Gilman
Принадлежит: Praxair ST Technology Inc, Praxair Technology Inc
Опубликовано: 27-12-2006
Автор(ы): Holger J. Koenigsmann, Paul S. Gilman
Принадлежит: Praxair ST Technology Inc, Praxair Technology Inc
Реферат: The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The tantalum grains have at least a 40 percent (222) direction orientation ratio and less than a 15 percent (110) direction orientation ratio in an atom transport direction away from the sputter face for increasing sputtering uniformity, the tantalum body being free of (200)-(222) direction banding detectable by Electron Back-Scattering Diffraction and wherein the sputter target has a purity of at least 99.99 (%) percent.
Textured-grain-powder metallurgy tantalum sputter target
Номер патента: US20040250924A1. Автор: Paul Gilman,Holger Koenigsmann. Владелец: Praxair ST Technology Inc. Дата публикации: 2004-12-16.