Method for controlling the dishing problem associated with chemical-mechanical planarization (cmp) during manufacture of copper multilayer interconnection structures in ultra large-scale integrated circuits (ulsi) .

Method for controlling the dishing problem associated with chemical-mechanical planarization (cmp) during manufacture of copper multilayer interconnection structures in ultra large-scale integrated circuits (ulsi)

Номер патента: US20080032606A1
Опубликовано: 07-02-2008
Автор(ы): BO LIU, Bomei TAN, Xihui ZHANG, Xinhuan NIU, Yahong WU, Yuling Liu
Принадлежит: BO LIU, NIU Xinhuan, Tan Bomei, Wu Yahong, Yuling Liu, Zhang Xihui
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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Номер патента: IL272143B2. Автор: . Владелец: Versum Mat Us Llc. Дата публикации: 2023-08-01.

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Номер патента: US20150155181A1. Автор: Jun Wang,Andrew G. Haerle,Ronald W. Laconto. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2015-06-04.

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Номер патента: US20170372918A9. Автор: Song Y. Chang,Mark Evans,Stephen W. Hymes,Dnyanesh Chandrakant Tamboli. Владелец: Versum Materials US LLC. Дата публикации: 2017-12-28.

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Номер патента: WO2004063301A1. Автор: Song Y. Chang,Mark Evans,Dnyanesh Tamboli,Stephen W. Hymes. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2004-07-29.

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Номер патента: US20040175942A1. Автор: Mark Evans,Dnyanesh Tamboli,Song Chang,Stephen Hymes. Владелец: Air Products and Chemicals Inc. Дата публикации: 2004-09-09.

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Номер патента: KR101366879B1. Автор: 송 와이. 창,마크 에반스,니야네쉬 탬볼리,스티븐 더블류. 하이메스. Владелец: 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드. Дата публикации: 2014-02-24.

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Номер патента: AU2003303677A1. Автор: Song Y. Chang,Mark Evans,Dnyanesh Tamboli,Stephen W. Hymes. Владелец: Air Products and Chemicals Inc. Дата публикации: 2004-08-10.

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Номер патента: TWI348492B. Автор: Mark Evans,Dnyanesh Tamboli,Song Y Chang,Stephen W Hymes. Владелец: Air Prod & Chem. Дата публикации: 2011-09-11.

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Номер патента: US9978609B2. Автор: Xiaobo Shi,James Allen Schlueter,Mark Leonard O'Neill,Joseph Rose,Malcolm Grief. Владелец: Versum Materials US LLC. Дата публикации: 2018-05-22.

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Номер патента: US20080254629A1. Автор: Song Y. Chang,Mark Evans,Dnyanesh Tamboli,Stephen W. Hymes. Владелец: Hymes Stephen W. Дата публикации: 2008-10-16.

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Номер патента: US10373842B2. Автор: Song Y. Chang,Mark Evans,Stephen W. Hymes,Dnyanesh Chandrakant Tamboli. Владелец: Versum Materials US LLC. Дата публикации: 2019-08-06.

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Номер патента: TW200508373A. Автор: Mark Evans,Dnyanesh Tamboli,Song Y Chang,Stephen W Hymes. Владелец: Air Prod & Chem. Дата публикации: 2005-03-01.

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Номер патента: US10253216B2. Автор: Xiaobo Shi,Dnyanesh Chandrakant Tamboli,Matthias Stender,Maitland Gary Graham. Владелец: Versum Materials US LLC. Дата публикации: 2019-04-09.

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Номер патента: US20100233880A1. Автор: Jun Wang,Andrew G. Haerle,Ronald W. Laconto. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2010-09-16.

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Номер патента: EP3708631A1. Автор: Jun Wang,Ronald Laconto,Andrew Haerle. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2020-09-16.

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Номер патента: EP2406341A2. Автор: Jun Wang,Ronald Laconto,Andrew Haerle. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2012-01-18.

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Номер патента: EP2406341A4. Автор: Jun Wang,Ronald Laconto,Andrew Haerle. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2014-05-07.

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Номер патента: US8980113B2. Автор: Jun Wang,Andrew G. Haerle,Ronald W. Laconto. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2015-03-17.

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Номер патента: WO2010105240A2. Автор: Jun Wang,Ronald Laconto,Andrew Haerle. Владелец: SAINT-GOBAIN CERAMICS & PLASTICS, INC.. Дата публикации: 2010-09-16.

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Номер патента: US9343321B2. Автор: Jun Wang,Andrew G. Haerle,Ronald W. Laconto. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2016-05-17.

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Номер патента: US6419554B2. Автор: Dinesh Chopra,Gundu Sabde. Владелец: Micron Technology Inc. Дата публикации: 2002-07-16.

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Номер патента: KR101954380B1. Автор: 개리 메이틀랜드 그라함,마티아스 스텐더,드냐네시 찬드라칸트 탐볼리,지아오보 시. Владелец: 버슘머트리얼즈 유에스, 엘엘씨. Дата публикации: 2019-03-05.

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Номер патента: EP3263667A1. Автор: Shi Xiaobo,Matthias Stender,Maitland Gary Graham,Chandrakant Tamboli Dnyanesh. Владелец: Versum Materials US LLC. Дата публикации: 2018-01-03.

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Номер патента: US6632377B1. Автор: Paul M. Feeney,Vlasta Brusic,Frank B. Kaufman,Daniel C. Edelstein,William Guthrie,Mark Jaso,Naftali Lustig,Peter Roper,Kenneth Rodbell,David B. Thompson. Владелец: International Business Machines Corp. Дата публикации: 2003-10-14.

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Номер патента: KR101346009B1. Автор: 준 왕,로널드 라꽁토,앤드류 할레. Владелец: 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드. Дата публикации: 2013-12-31.

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Номер патента: US9982166B2. Автор: Mark J. Hampden-Smith,Yakov E. Kutsovsky,Brian G. Prevo,Dmitry Fomitchev. Владелец: Cabot Corp. Дата публикации: 2018-05-29.

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Номер патента: US20240006189A1. Автор: Xiaobo Shi,Hongjun Zhou,Rung-Je Yang,Robert Vacassy,Keh-Yeuan LI,Ming Shih Tsai. Владелец: Versum Materials US LLC. Дата публикации: 2024-01-04.

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Номер патента: EP4413088A1. Автор: Xiaobo Shi,Hongjun Zhou,Krishna P. Murella,Joseph D. ROSE. Владелец: Versum Materials US LLC. Дата публикации: 2024-08-14.

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Номер патента: US6630403B2. Автор: Stephen J. Kramer,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2003-10-07.

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Номер патента: US6426295B1. Автор: Stephen J. Kramer,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2002-07-30.

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Номер патента: US20090057834A1. Автор: James Allen Schlueter,Bentley J. Palmer. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2009-03-05.

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Номер патента: US7678605B2. Автор: James Allen Schlueter,Bentley J. Palmer. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2010-03-16.

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Номер патента: TW200910445A. Автор: James Allen Schlueter,Bentley J Palmer. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2009-03-01.

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Номер патента: KR101069472B1. Автор: 제임스 알렌 슐루에터,벤트레이 제이. 팔머. Владелец: 듀퐁 에어 프로덕츠 나노머티어리얼즈 엘엘씨. Дата публикации: 2011-09-30.

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Номер патента: US20200115590A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Tamboli Dnyanesh Chandrakant,Machado Reinaldo Mario,Murella Krishna P.,Zhou Hongjun,Hughes John Edward Quincy,Winchester Steven Charles,Dodd Andrew J.,Schwartz Jo-Ann Theresa,Grief Malcolm. Владелец: Versum Materials US, LLC. Дата публикации: 2020-04-16.

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Номер патента: US20180244955A1. Автор: Tamboli Dnyanesh Chandrakant,Murella Krishna P.,Zhou Hongjun,Rose Joseph,Henry James Matthew. Владелец: Versum Materials US, LLC. Дата публикации: 2018-08-30.

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Номер патента: US20160314989A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Schlueter James Allen,Grief Malcolm,Rose Joseph. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2016-10-27.

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Номер патента: WO2002014014A2. Автор: Craig D. Lack,Wendy B. Goldberg,Glenn C. Mandigo,Ross E. Ii Barker,Ian G. Sullivan. Владелец: Rodel Holdings, Inc.. Дата публикации: 2002-02-21.

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Номер патента: US6602436B2. Автор: Craig D. Lack,Wendy B. Goldberg,Glenn C. Mandigo,Ian G. Sullivan,II Ross E. Barker. Владелец: Rodel Holdings Inc. Дата публикации: 2003-08-05.

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Номер патента: WO2002014014A3. Автор: Craig D Lack,Glenn C Mandigo,Ross E Ii Barker,Ian G Sullivan,Wendy B Goldberg. Владелец: Rodel Inc. Дата публикации: 2002-05-02.

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Номер патента: US10035929B2. Автор: Chi-Ming Yang,Shu-Hao HUANG,Horng-Huei Tseng,Jeng-Jyi Hwang. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2018-07-31.

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Номер патента: US20070151951A1. Автор: Norihiko Ikeda,Eiji Hayashi,Mutsuhiko Yoshioka. Владелец: JSR Corp. Дата публикации: 2007-07-05.

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Номер патента: TW200420687A. Автор: Norihiko Ikeda,Eiji Hayashi,Mutsuhiko Yoshioka. Владелец: JSR Corp. Дата публикации: 2004-10-16.

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Номер патента: US20200365413A1. Автор: William Weilun HONG,Gang Huang,Po-Chin NIEN. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2020-11-19.

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Номер патента: US6869336B1. Автор: Vishwas V. Hardikar. Владелец: Novellus Systems Inc. Дата публикации: 2005-03-22.

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Номер патента: US20050064798A1. Автор: Vishwas Hardikar. Владелец: Novellus Systems Inc. Дата публикации: 2005-03-24.

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Номер патента: TW201043686A. Автор: Yuzhuo Li,Michael Lauter,Bir Darbar Mehta,Vaibhav Dalvi,zhi-hua Zhang,Andreas Fechtenkoetter. Владелец: BASF SE. Дата публикации: 2010-12-16.

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Номер патента: KR101760529B1. Автор: 유주오 리,지후아 장,바이브하브 달비,비르 다르바르 메히타,안드레아스 페치텐쾨터,미카엘 로테르. Владелец: 바스프 에스이. Дата публикации: 2017-07-21.

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Номер патента: US6602439B1. Автор: James Caruso,Mark J. Hampden-Smith,Toivo T. Kodas,Daniel J. Skamser,Quint H. Powell. Владелец: Superior MicroPowders LLC. Дата публикации: 2003-08-05.

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Номер патента: US20040203241A1. Автор: James Caruso,Mark Hampden-Smith,Toivo Kodas,Daniel Skamser,Quint Powell. Владелец: Cabot Corp. Дата публикации: 2004-10-14.

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Номер патента: US6730245B2. Автор: James Caruso,Mark J. Hampden-Smith,Toivo T. Kodas,Daniel J. Skamser,Quint H. Powell. Владелец: Superior MicroPowders LLC. Дата публикации: 2004-05-04.

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Номер патента: US7037451B2. Автор: James Caruso,Mark J. Hampden-Smith,Toivo T. Kodas,Daniel J. Skamser,Quint H. Powell. Владелец: Cabot Corp. Дата публикации: 2006-05-02.

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Номер патента: US20050081998A1. Автор: James Caruso,Mark Hampden-Smith,Toivo Kodas,Daniel Skamser,Quint Powell. Владелец: Cabot Corp. Дата публикации: 2005-04-21.

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Номер патента: US20020003225A1. Автор: James Caruso,Mark Hampden-Smith,Toivo Kodas,Daniel Skamser,Quint Powell. Владелец: Superior MicroPowders LLC. Дата публикации: 2002-01-10.

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Номер патента: US8980122B2. Автор: Robin Ihnfeldt. Владелец: GENERAL ENGINEERING & RESEARCH LLC. Дата публикации: 2015-03-17.

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Номер патента: US9334422B2. Автор: Robin Ihnfeldt. Владелец: GENERAL ENGINEERING & RESEARCH LLC. Дата публикации: 2016-05-10.

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Номер патента: WO2024073211A1. Автор: Xiaobo Shi,Peer Kirsch,Gregor Larbig. Владелец: Versum Materials US, LLC. Дата публикации: 2024-04-04.

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Номер патента: US20200239735A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Murella Krishna P.,Rose Joseph D.,Zhou Hongjun. Владелец: Versum Materials US, LLC. Дата публикации: 2020-07-30.

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Номер патента: US11401441B2. Автор: Ming-Shih Tsai,Xiaobo Shi,Mark Leonard O'Neill,Laura M. Matz,Chris Keh-Yeuan Li,Pao-Chia Pan,Chad Chang-Tse Hsieh,Rung-Je Yang,Blake J. Lew,Agnes Derecskei. Владелец: Versum Materials US LLC. Дата публикации: 2022-08-02.

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Номер патента: EP2256171A1. Автор: S. V. Babu,Sharath Hedge,Sunil Jha,Udaya B. Patri,Youngki Hong. Владелец: Climax Engineered Materials LLC. Дата публикации: 2010-12-01.

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Номер патента: US20090013609A1. Автор: ASHOK KUMAR,Vinay Gupta,Cecil Coutinho,Subrahmanya Mudhivarthi. Владелец: UNIVERSITY OF SOUTH FLORIDA. Дата публикации: 2009-01-15.

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Номер патента: US20050026444A1. Автор: Sunil Jha,Youngki Hong,Sharath Hegde,S. Babu,Udaya Patri. Владелец: Climax Engineered Materials LLC. Дата публикации: 2005-02-03.

Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography

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Номер патента: US20080277378A1. Автор: Udaya B. Patri,Youngki Hong,Sharath Hegde,Sunil Chandra Jha,S.V. Babu. Владелец: Climax Engineered Materials LLC. Дата публикации: 2008-11-13.

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Номер патента: WO2022133396A1. Автор: Xiaobo Shi,Hongjun Zhou,Rung-Je Yang,Robert Vacassy,Keh-Yeuan LI,Ming Shih Tsai. Владелец: Versum Materials US, LLC. Дата публикации: 2022-06-23.

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Tungsten chemical mechanical planarization (cmp) with low dishing and low erosion topography

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Polymeric microgels for chemical mechanical planarization (cmp) processing

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Polymeric microgels for chemical mechanical planarization (cmp) processing

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Chemical mechanical planarization (cmp) composition and methods therefore for copper and through silica via (tsv) applications

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Slurries and methods for chemical-mechanical planarization of copper

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Slurries and methods for chemical-mechanical planarization of copper

Номер патента: SG144929A1. Автор: Sharath Hedge,Sunil Jha,Youngki Hong,S V Babu,Udaya B Patri. Владелец: Climax Engineered Mat Llc. Дата публикации: 2008-08-28.

Slurry and method for chemical-mechanical planarization of copper

Номер патента: TW200507097A. Автор: Sunil Jha,Sharath Hegde,S V Babu,Udaya B Patri,Young-Ki Hong. Владелец: Climax Engineered Mat Llc. Дата публикации: 2005-02-16.

Slurries and methods for chemical-mechanical planarization of copper

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Tungsten chemical mechanical planarization (cmp) with low dishing and low erosion topography

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Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide and Silicon Nitride Removal Rates

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Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide and Silicon Nitride Removal Rates

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Novel pad-1 n-a-bottle (pib) technology for advanced chemical-mechanical planarization (cmp) slurries and processes

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Номер патента: IL261161A. Автор: . Владелец: Versum Mat Us Llc. Дата публикации: 2019-01-31.

Chemical Mechanical Planarization (CMP) Composition and Methods Therefor for Copper and Through Silica VIA (TSV) Applications

Номер патента: IL261161B1. Автор: . Владелец: Versum Mat Us Llc. Дата публикации: 2023-11-01.

Compositions for chemical mechanical planarization of copper

Номер патента: EP1935954A1. Автор: Junaid Ahmed Siddiqui,Rachel Dianne Mcconnell,Saifi Usmani. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2008-06-25.

Compositions for chemical mechanical planarization of copper

Номер патента: US20080148652A1. Автор: Junaid Ahmed Siddiqui,Rachel Dianne Mcconnell,Saifi Usmani. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2008-06-26.

Compositions for chemical mechanical planarization of copper

Номер патента: KR100956216B1. Автор: 주나이드 아흐메드 시디쿠이,레이첼 다이앤 맥코넬,사이피 우스마니. Владелец: 듀퐁 에어 프로덕츠 나노머티어리얼즈 엘엘씨. Дата публикации: 2010-05-04.

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Номер патента: TW200831654A. Автор: Junaid Ahmed Siddiqui,Rachel Dianne Mcconnell,Saifi Usmani. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2008-08-01.

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Номер патента: US20180086944A1. Автор: Ward Douglas E.,Mulder Carlijn L.,SINES Ian T.,Le Roux Vianney,Kwapong Angela. Владелец: . Дата публикации: 2018-03-29.

Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal

Номер патента: US7247179B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2007-07-24.

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Номер патента: US10329455B2. Автор: Ian T. SINES,Angela Kwapong,Carlijn L. Mulder,Douglas E. Ward,Vianney Le Roux. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2019-06-25.

Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole

Номер патента: US20060213868A1. Автор: Junaid Siddiqui,Timothy Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2006-09-28.

Chemical-mechanical planarization composition having PVNO and associated method for use

Номер патента: US20050079803A1. Автор: Bin Hu,Junaid Siddiqui. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-04-14.

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Номер патента: US20050215183A1. Автор: Bin Hu,Junaid Siddiqui. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-09-29.

Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal

Номер патента: US6893476B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-05-17.

Composition and associated method for oxide chemical mechanical planarization

Номер патента: US20040144038A1. Автор: Junaid Ahmed Siddiqui. Владелец: Junaid Ahmed Siddiqui. Дата публикации: 2004-07-29.

Chemical-mechanical planarization composition with nitrogen containing polymer and method for use

Номер патента: US7022255B2. Автор: Junaid Ahmed Siddiqui,Bin Hu. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2006-04-04.

Chemical-mechanical planarization composition with nitrogen containing polymer and method for use

Номер патента: US20050079718A1. Автор: Bin Hu,Junaid Siddiqui. Владелец: Bin Hu. Дата публикации: 2005-04-14.

Chemical mechanical planarization slurry and method for forming same

Номер патента: WO2018057674A1. Автор: Ian T. SINES,Angela Kwapong,Carlijn L. Mulder,Douglas E. Ward,Vianney Le Roux. Владелец: SAINT-GOBAIN CERAMICS & PLASTICS, INC.. Дата публикации: 2018-03-29.

Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal

Номер патента: US20040107650A1. Автор: Junaid Siddiqui,Timothy Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2004-06-10.

Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US7122475B2. Автор: Guy F. Hudson. Владелец: Micron Technology Inc. Дата публикации: 2006-10-17.

Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US20040198194A1. Автор: Guy Hudson. Владелец: Hudson Guy F.. Дата публикации: 2004-10-07.

Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal

Номер патента: US20050044803A1. Автор: Junaid Siddiqui,Timothy Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-03-03.

Chemical-mechanical planarization composition having PVNO and associated method for use

Номер патента: TW200513525A. Автор: Junaid Ahmed Siddiqui,Bin Hu. Владелец: Dupont Air Prod Nanomaterials. Дата публикации: 2005-04-16.

Chemical mechanical planarization slurry and method for forming same

Номер патента: EP3516002A4. Автор: Ian T. SINES,Angela Kwapong,Carlijn L. Mulder,Douglas E. Ward,Vianney Le Roux. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2020-05-27.

Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole

Номер патента: TW200634138A. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2006-10-01.

Chemical mechanical planarization slurry and method for forming same

Номер патента: EP3516002B1. Автор: Ian T. SINES,Angela Kwapong,Carlijn L. Mulder,Douglas E. Ward,Vianney Le Roux. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2022-01-05.

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Номер патента: KR102371795B1. Автор: 더글라스 이. 워드,란 티. 사인즈,엔젤라 크와퐁,칼라인 엘. 멀더,비아네 르 루. Владелец: 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드. Дата публикации: 2022-03-08.

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Номер патента: EP3516002A1. Автор: Ian T. SINES,Angela Kwapong,Carlijn L. Mulder,Douglas E. Ward,Vianney Le Roux. Владелец: Saint Gobain Ceramics and Plastics Inc. Дата публикации: 2019-07-31.

Method for preparing slurry of cerium oxide for chemical mechanical planarization

Номер патента: KR101091532B1. Автор: 김종필,조승범,노준석,김장열. Владелец: 주식회사 엘지화학. Дата публикации: 2011-12-13.

Chemical mechanical planarization slurry processing techniques and systems and methods for polishing substrate using the same

Номер патента: WO2023149925A1. Автор: Fred C. Redeker,Jason Keleher,Ara Philipossian,Yasa Sampurno,Kiana A. CAHUE. Владелец: Araca, Inc.. Дата публикации: 2023-08-10.

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Номер патента: US20130178065A1. Автор: Xiaobo Shi,Bentley J. Palmer,Rebecca A. Sawayda,Fadi Abdallah Coder,Victoria Perez. Владелец: Air Products and Chemicals Inc. Дата публикации: 2013-07-11.

Combination, Method, and Composition for Chemical Mechanical Planarization of a Tungsten-Containing Substrate

Номер патента: US20130288479A1. Автор: Rachel Dianne Mcconnell,Ann Marie Hurst. Владелец: Air Products and Chemicals Inc. Дата публикации: 2013-10-31.

Germanium smoothing and chemical mechanical planarization processes

Номер патента: US20170110334A1. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner. Владелец: International Business Machines Corp. Дата публикации: 2017-04-20.

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Номер патента: US20170218229A1. Автор: Krishnan Mahadevaiyer,Yamanaka Tatsuya,KAWAMOTO Tatsuyoshi,Oishi Yohei,Penigalapati Dinesh Kumar,Steiner Rachel S.,Tornello James A.. Владелец: . Дата публикации: 2017-08-03.

Non-polymeric organic particles for chemical mechanical planarization

Номер патента: WO2005014753A1. Автор: Yuzhuo Li,Atanu Roy Chowdhury,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati. Владелец: Dynea Chemicals Oy. Дата публикации: 2005-02-17.

Engineered non-polymeric organic particles for chemical mechanical planarization

Номер патента: WO2006074248A2. Автор: WU LI,Yuzhuo Li,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati,Vivek Duvvuru,Deenesh Bundi,Henry Bian. Владелец: Dynea Chemicals Oy. Дата публикации: 2006-07-13.

Diamond slurry for chemical-mechanical planarization of semiconductor wafers

Номер патента: US6242351B1. Автор: Yuzhuo Li,David Bruce Cerutti,Donald Joseph Buckley, Jr.,Earl Royce Tyre, Jr.,Jason J. Keleher,Richard J. Uriarte,Ferenc Horkay. Владелец: General Electric Co. Дата публикации: 2001-06-05.

Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers

Номер патента: KR101839633B1. Автор: 유주오 리,케 왕. Владелец: 바스프 에스이. Дата публикации: 2018-03-16.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: US6620215B2. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,Joe Zunzi Zhao,John Westbrook,Yong Lin,Leina Chan. Владелец: Dynea Canada Ltd. Дата публикации: 2003-09-16.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: WO2003055958A1. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,Joe Zunzi Zhao,John Westbrook,Yong Lin,Leina Chan. Владелец: Dynea Canada, Ltd.. Дата публикации: 2003-07-10.

Non-polymeric organic particles for chemical mechanical planarization

Номер патента: AU2003297104A1. Автор: Atanu Roy Chowdhury,Guomin Bian,Krishnayya Cheemalapati,Yazhuo Li. Владелец: Dynea Chemicals Oy. Дата публикации: 2005-02-25.

Non-polymeric organic particles for chemical mechanical planarization

Номер патента: KR101123210B1. Автор: 유주오 리,궉 탕,아타누 로이 챠우두리,궈민 비안,크리슈나야 치마라파티. Владелец: 다이니아 케미컬스 오이. Дата публикации: 2012-03-19.

Non-polymeric organic particles for chemical mechanical planarization

Номер патента: US7037351B2. Автор: Yuzhuo Li,Atanu Roy Chowdhury,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati. Владелец: Dynea Chemicals Oy. Дата публикации: 2006-05-02.

Engineered non-polymeric organic particles for chemical mechanical planarization

Номер патента: WO2006074248A3. Автор: WU LI,Yuzhuo Li,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati,Vivek Duvvuru,Deenesh Bundi,Henry Bian. Владелец: Henry Bian. Дата публикации: 2006-09-21.

Engineered non-polymeric organic particles for chemical mechanical planarization

Номер патента: US7419519B2. Автор: WU LI,Yuzhuo Li,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati,Vivek Duvvuru,Deenesh Bundi,Henry Bian. Владелец: Dynea Chemicals Oy. Дата публикации: 2008-09-02.

Non-polymeric organic particles for chemical mechanical planarization

Номер патента: US20050005525A1. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati,Atanu Chowdhury. Владелец: Dynea Chemicals Oy. Дата публикации: 2005-01-13.

Engineered non-polymeric organic particles for chemical mechanical planarization

Номер патента: EP1838795A2. Автор: WU LI,Yuzhuo Li,Kwok Tang,Guomin Bian,Henry Bian,Krishnayya Clarkson University CHEEMALAPATI,Vivek Clarkson University DUVVURU,Deenesh Clarkson University BUNDI. Владелец: Dynea Chemicals Oy. Дата публикации: 2007-10-03.

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Номер патента: US11066575B2. Автор: Xiaobo Shi,Hongjun Zhou,James Allen Schlueter,Jo-Ann T. Schwartz. Владелец: Versum Materials US LLC. Дата публикации: 2021-07-20.

Engineered non-polymeric organic particles for chemical mechanical planarization

Номер патента: US20060261306A1. Автор: WU LI,Yuzhuo Li,Kwok Tang,Guomin Bian,Krishnayya Cheemalapati,Vivek Duvvuru,Deenesh Bundi,Henry Bian. Владелец: Dynea Chemicals Oy. Дата публикации: 2006-11-23.

Slurry compositions for use in a chemical-mechanical planarization process having non-spherical abrasive particles

Номер патента: WO2004083328A2. Автор: Sharad Mathur,Hamad Moini,Ivan Petrovic. Владелец: Engelhard Corporation. Дата публикации: 2004-09-30.

Slurry compositions for use in a chemical-mechanical planarization process having non-spherical abrasive particles

Номер патента: WO2004083328A3. Автор: Sharad Mathur,Hamad Moini,Ivan Petrovic. Владелец: Engelhard Corp. Дата публикации: 2004-11-11.

Method and composition for chemical mechanical planarization of a metal

Номер патента: US8414789B2. Автор: Xiaobo Shi,Bentley J. Palmer,Rebecca A. Sawayda,Fadi Abdallah Coder,Victoria Perez. Владелец: Air Products and Chemicals Inc. Дата публикации: 2013-04-09.

Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives

Номер патента: US10032644B2. Автор: Xiaobo Shi,James Allen Schlueter,Dnyanesh Chandrakant Tamboli,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2018-07-24.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: US20030136055A1. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,John Westbrook,Yong Lin,Leina Chan,Joe Zhao. Владелец: Dynea Canada Ltd. Дата публикации: 2003-07-24.

Combination, method, and composition for chemical mechanical planarization of a tungsten-containing substrate

Номер патента: US8506831B2. Автор: Dianne Rachel McConnell,Ann Marie Hurst. Владелец: Air Products and Chemicals Inc. Дата публикации: 2013-08-13.

Composition useful to chemical mechanical planarization of metal

Номер патента: US7931714B2. Автор: Songyuan CHANG. Владелец: Uwiz Technology Co Ltd. Дата публикации: 2011-04-26.

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Номер патента: US7300603B2. Автор: Zhendong Liu. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2007-11-27.

Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives

Номер патента: EP3101076B1. Автор: Xiaobo Shi,James Allen Schlueter,Dnyanesh Chandrakant Tamboli,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2020-04-15.

Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition

Номер патента: US20040127045A1. Автор: Suryadevara Babu,Venkata Gorantla. Владелец: Eastman Kodak Co. Дата публикации: 2004-07-01.

Chemically-mechanically planarizing compositions for corrosion reduction in semiconductor wafers

Номер патента: DE602004012357T2. Автор: Zhendong Newark Liu. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2009-04-02.

Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method

Номер патента: US20070075042A1. Автор: Bin Hu,Junaid Siddiqui,Timothy Compton,Daniel Castillo. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2007-04-05.

Chemical mechanical planarization composition and method with low corrosiveness

Номер патента: US8821751B2. Автор: Xiaobo Shi,Ronald Martin Pearlstein. Владелец: Air Products and Chemicals Inc. Дата публикации: 2014-09-02.

Germanium smoothing and chemical mechanical planarization processes

Номер патента: US9646842B1. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner. Владелец: International Business Machines Corp. Дата публикации: 2017-05-09.

Barrier chemical mechanical planarization composition and method thereof

Номер патента: US9574110B2. Автор: Xiaobo Shi,James Allen Schlueter,Maitland Gary Graham. Владелец: Air Products and Chemicals Inc. Дата публикации: 2017-02-21.

Compositions for use in a chemical-mechanical planarization process

Номер патента: US6471735B1. Автор: Ashutosh Misra,Joe G. Hoffman,Anthony J. Schleisman. Владелец: Air Liquide America Corp. Дата публикации: 2002-10-29.

Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing

Номер патента: WO2021118694A1. Автор: Xiaobo Shi,Hongjun Zhou,Mark Leonard O'Neill,Krishna P. Murella,Joseph D. ROSE. Владелец: Versum Materials US, LLC. Дата публикации: 2021-06-17.

Polishing slurry and chemical mechanical planarization method using the same

Номер патента: US9068110B2. Автор: Dae Soon Lim,Dong Hee Shin,Dong Hyeon LEE,Il Ho YANG,Yang Bok Lee. Владелец: SK hynix Inc. Дата публикации: 2015-06-30.

Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers

Номер патента: WO2011101755A1. Автор: Yuzhuo Li,Ke Wang. Владелец: Basf (China) Company Limited. Дата публикации: 2011-08-25.

Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers

Номер патента: EP2539411B1. Автор: Yuzhuo Li,Ke Wang. Владелец: BASF SE. Дата публикации: 2020-08-05.

Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers

Номер патента: TW201202369A. Автор: Yuzhuo Li,Ke Wang. Владелец: BASF SE. Дата публикации: 2012-01-16.

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Номер патента: EP2539411A4. Автор: Yuzhuo Li,Ke Wang. Владелец: BASF SE. Дата публикации: 2017-11-15.

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Номер патента: EP2539411A1. Автор: Yuzhuo Li,Ke Wang. Владелец: BASF SE. Дата публикации: 2013-01-02.

Chemical-mechanical planarization of polymer films

Номер патента: KR102267841B1. Автор: 수디프 팔리까라 쿠띠아토르,레네 지아,제프리 다이사드. Владелец: 씨엠씨 머티리얼즈, 인코포레이티드. Дата публикации: 2021-06-23.

Chemical mechanical planarization compositions for reducing erosion in semiconductor wafers

Номер патента: EP1505134B1. Автор: Zhendong Liu. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2008-03-12.

Chemical mechanical planarization of low dielectric constant materials

Номер патента: US6416685B1. Автор: Feng Liu,Fan Zhang,Dan Towery. Владелец: Honeywell International Inc. Дата публикации: 2002-07-09.

Chemical mechanical planarization compositions for reducing erosion in semiconductor wafers

Номер патента: US20050029491A1. Автор: Zhendong Liu. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2005-02-10.

Method and apparatuses for making and using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6407000B1. Автор: Guy F. Hudson. Владелец: Micron Technology Inc. Дата публикации: 2002-06-18.

Aqueous slurry composition for chemical mechanical planarization

Номер патента: US20060086056A1. Автор: Sang-Ick Lee. Владелец: Samsung Corning Co Ltd. Дата публикации: 2006-04-27.

Germanium smoothing and chemical mechanical planarization processes

Номер патента: US9890300B2. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner. Владелец: International Business Machines Corp. Дата публикации: 2018-02-13.

Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives

Номер патента: KR102422713B1. Автор: 시아오보 쉬,제임스 알렌 슐루터,마크 레오나르드 오'넬,디아네쉬 찬드라칸트 탐보리. Владелец: 버슘머트리얼즈 유에스, 엘엘씨. Дата публикации: 2022-07-18.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: TWI331169B. Автор: Li Yuzhuo,Westbrook John,Bian Guomin,Tang Kwok,Zunzi Zhao Joe,Yung Lin,Chan Leina. Владелец: Dynea Chemicals Oy. Дата публикации: 2010-10-01.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: AU2002361775A1. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,Joe Zunzi Zhao,John Westbrook,Yong Lin,Leina Chan. Владелец: Dynea Canada Ltd. Дата публикации: 2003-07-15.

Abrasive composition containing organic particles for chemical mechanical planarization

Номер патента: TW200304943A. Автор: Yuzhuo Li,Kwok Tang,Guomin Bian,Joe Zunzi Zhao,John Westbrook,Yong Lin,Leina Chan. Владелец: Dynea Canada Ltd. Дата публикации: 2003-10-16.

Method and Composition for Chemical Mechanical Planarization of A Metal

Номер патента: US20100167545A1. Автор: Xiaobo Shi,Bentley J. Palmer,Rebecca A. Sawayda,Fadi Abdallah Coder,Victoria Perez. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2010-07-01.

Combination, method, and composition for chemical mechanical planarization of a tungsten-containing substrate

Номер патента: US8790521B2. Автор: Rachel Dianne Mcconnell,Ann Marie Hurst. Владелец: Air Products and Chemicals Inc. Дата публикации: 2014-07-29.

Planarized membrane and methods for substrate processing systems

Номер патента: US20240227116A9. Автор: Daniel Ray TROJAN. Владелец: AXUS Tech LLC. Дата публикации: 2024-07-11.

Planarized membrane and methods for substrate processing systems

Номер патента: US20240131652A1. Автор: Daniel Ray TROJAN. Владелец: AXUS Tech LLC. Дата публикации: 2024-04-25.

Electro-chemical plating with reduced thickness and integration with chemical mechanical polisher into a single platform

Номер патента: US6613200B2. Автор: Shijian Li,Lizhong Sun,Stan D. Tsai. Владелец: Applied Materials Inc. Дата публикации: 2003-09-02.

Electro-chemical plating with reduced thickness and integration with chemical mechanical polisher into a single platform

Номер патента: US20030121797A1. Автор: Shijian Li,Lizhong Sun,Stan Tsai. Владелец: Applied Materials Inc. Дата публикации: 2003-07-03.

Chemical mechanical planarization slurry processing techniques and systems and methods for polishing substrate using the same

Номер патента: WO2022177767A9. Автор: Jason Keleher,Ara Philipossian,Yasa Sampurno,Katherine WORTMON-OTTO,Abigail LINHART,Kiana A. CAHUE. Владелец: Araca, Inc.. Дата публикации: 2023-05-19.

Systems and methods for chemical mechanical planarization with photo-current detection

Номер патента: US09754845B2. Автор: I-Shuo Liu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2017-09-05.

Chemical mechanical planarization slurry processing techniques and systems and methods for polishing substrate using the same

Номер патента: EP4272241A1. Автор: Jason Keleher,Ara Philipossian,Yasa Sampurno,Abigail LINHART,Kiana A. CAHUE,Katherine WORTMAN-OTTO. Владелец: Araca Inc. Дата публикации: 2023-11-08.

Run-to-run control for chemical mechanical planarization

Номер патента: US20130267148A1. Автор: Patrick David Noll,Madhu Sudan RAMAVAJJALA,Prakash Lakshmikanthan. Владелец: Texas Instruments Inc. Дата публикации: 2013-10-10.

Method and/or system for chemical mechanical planarization (CMP)

Номер патента: US09997420B2. Автор: Cheng Yen-Wei,Jong-I Mou,Yen-Di Tsen. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2018-06-12.

Chemical mechanical planarization apparatus and methods

Номер патента: US09950405B2. Автор: Wufeng Deng. Владелец: Semiconductor Manufacturing International Shanghai Corp. Дата публикации: 2018-04-24.

Method for shaping features of a semiconductor structure using chemical mechanical planarization (CMP)

Номер патента: US5302233A. Автор: Scott Meikle,Sung C. Kim. Владелец: Micron Semiconductor Inc. Дата публикации: 1994-04-12.

Method and apparatus for in-situ monitoring of chemical mechanical planarization (cmp) processes

Номер патента: EP4355528A2. Автор: Daniel Ray TROJAN,Jessica BRINDLEY. Владелец: AXUS Tech LLC. Дата публикации: 2024-04-24.

Chemical mechanical planarization (cmp) pad conditioner and method of making

Номер патента: EP2652773A2. Автор: Srinivasan Ramanath,Jianhui Wu,Arup K. Khaund,Eric M. Schulz. Владелец: Saint Gobain Abrasifs SA. Дата публикации: 2013-10-23.

Chemical mechanical planarization membrane

Номер патента: US11850702B2. Автор: Chien-Wei Chang,Tzi-Yi Shieh,Ren-Dou Lee,Cheng-Ping Chen,Tsung-Lung Lai,Sheng-Tai Peng. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-12-26.

Grooved rollers for a linear chemical mechanical planarization system

Номер патента: WO2003057405A8. Автор: Xu Cangshan. Владелец: Lam Res Corp. Дата публикации: 2003-10-30.

Mega-sonic vibration assisted chemical mechanical planarization

Номер патента: US12036636B2. Автор: Kei-Wei Chen,Chun-Hao Kung,Hui-Chi Huang,Ching-hsiang Tsai,Shang-Yu Wang. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-07-16.

Mega-sonic vibration assisted chemical mechanical planarization

Номер патента: US20230219188A1. Автор: Kei-Wei Chen,Chun-Hao Kung,Hui-Chi Huang,Ching-hsiang Tsai,Shang-Yu Wang. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-07-13.

Grooved rollers for a linear chemical mechanical planarization system

Номер патента: EP1469971A4. Автор: Xu Cangshan. Владелец: Lam Research Corp. Дата публикации: 2005-01-12.

Grooved rollers for a linear chemical mechanical planarization system

Номер патента: US20030139124A1. Автор: Cangshan Xu. Владелец: Lam Research Corp. Дата публикации: 2003-07-24.

System and method for removing debris during chemical mechanical planarization

Номер патента: US20230381923A1. Автор: Chun-Wei Hsu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-11-30.

System and method for removing debris during chemical mechanical planarization

Номер патента: US12017325B2. Автор: Chun-Wei Hsu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-06-25.

Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US20030057185A1. Автор: Gundu Sabde,Jim Hofmann,Scott Moore,Stephen Kramer. Владелец: Individual. Дата публикации: 2003-03-27.

Method and apparatus for wireless transfer of chemical-mechanical planarization measurements

Номер патента: US6827630B2. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2004-12-07.

In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection

Номер патента: CA2036102C. Автор: Gabriel Lorimer Miller,Eric Richard Wagner. Владелец: American Telephone and Telegraph Co Inc. Дата публикации: 1995-04-04.

Method and apparatus for wireless transfer of chemical-mechanical planarization measurements

Номер патента: US6352466B1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2002-03-05.

Wafer support for chemical mechanical planarization

Номер патента: WO2002053320A9. Автор: David G Halley. Владелец: STRASBAUGH. Дата публикации: 2004-03-04.

Spherical drive assembly for chemical mechanical planarization

Номер патента: WO2002060643A9. Автор: David G Halley. Владелец: STRASBAUGH. Дата публикации: 2003-09-12.

Chemical-mechanical planarization pad including patterned structural domains

Номер патента: EP2382651A1. Автор: Guangwei Wu,Paul Lefevre,David Adam Wells,Anoop Mathew,Oscar K. Hsu. Владелец: Innopad Inc. Дата публикации: 2011-11-02.

Systems, methods and apparatus for post-chemical mechanical planarization substrate cleaning

Номер патента: US09844800B2. Автор: Brian J. Brown,Steven M. Zuniga. Владелец: Applied Materials Inc. Дата публикации: 2017-12-19.

Method of grooving a chemical-mechanical planarization pad

Номер патента: US8758659B2. Автор: Guangwei Wu,Paul Lefevre,David Adam Wells,John Erik Aldeborgh,Anoop Mathew,Oscar K. Hsu,Marc C. Jin. Владелец: FNS Technology Co Ltd. Дата публикации: 2014-06-24.

Wafer conveying device, chemical mechanical planarization apparatus and wafer conveying method

Номер патента: US20230201995A1. Автор: Zhipeng ZHOU,Yuansi YANG. Владелец: Hangzhou Sizone Electronic Technology Inc. Дата публикации: 2023-06-29.

Configurable pressure design for multizone chemical mechanical planarization polishing head

Номер патента: WO2015199815A1. Автор: Steven M. Zuniga,Andrew Nagengast,Jeonghoon Oh,Samuel Chu-Chiang Hsu,Gautam Shashank Dandavate. Владелец: Applied Materials, Inc.. Дата публикации: 2015-12-30.

Aerosol methods for making chemical mechanical planarization (cmp) polishing pads

Номер патента: TW201825561A. Автор: 亞當布羅德里克,道格拉斯A 布魯內. Владелец: 美商陶氏全球科技責任有限公司. Дата публикации: 2018-07-16.

Method for Manufacturing a Conditioner for Chemical Mechanical Planarization Pad

Номер патента: KR101072384B1. Автор: 이종재,윤소영. Владелец: 이화다이아몬드공업 주식회사. Дата публикации: 2011-10-11.

Methods and apparatus for post-chemical mechanical planarization substrate cleaning

Номер патента: US09711381B2. Автор: Sen-Hou Ko,Lakshmanan Karuppiah. Владелец: Applied Materials Inc. Дата публикации: 2017-07-18.

Amphiphilic abrasive particles and their use for chemical mechanical planarization

Номер патента: WO2024129435A1. Автор: Gerhard Jonschker. Владелец: Versum Materials US, LLC. Дата публикации: 2024-06-20.

Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads

Номер патента: US20010024935A1. Автор: Scott Meikle,Dinesh Chopra. Владелец: Meikle Scott G.. Дата публикации: 2001-09-27.

Methods and apparatus for the chemical mechanical planarization of electronic devices

Номер патента: GB2329601A. Автор: Clinton O Fruitman. Владелец: Speedfam Corp. Дата публикации: 1999-03-31.

Tungsten Chemical Mechanical Planarization (CMP) With Low Dishing And Low Erosion Topography

Номер патента: US20200040256A1. Автор: Stender Matthias,Derecskei Agnes,Brennan Bradley J.. Владелец: Versum Materials US, LLC. Дата публикации: 2020-02-06.

POLISHING SLURRY AND CHEMICAL MECHANICAL PLANARIZATION METHOD USING THE SAME

Номер патента: US20130178064A1. Автор: LEE Dong Hyeon,LIM Dae Soon,YANG Il Ho,SHIN Dong Hee,LEE Yang Bok. Владелец: . Дата публикации: 2013-07-11.

Chemical Mechanical Planarization Composition For Polishing Oxide Materials And Method Of Use Thereof

Номер патента: US20200048551A1. Автор: Shi Xiaobo,Yang Rung-Je,Rose Joseph D.,Zhou Hongjun,Tsai Ming-Shih,Lee Chia-Chien,Mallikarjunan Anu,Li Chris Keh-Yeuan. Владелец: Versum Materials US, LLC. Дата публикации: 2020-02-13.

Chemical Mechanical Planarization For Tungsten-Containing Substrates

Номер патента: US20200079976A1. Автор: Shi Xiaobo,Zhou Hongjun,Schlueter James Allen,Schwartz Jo-Ann T.. Владелец: Versum Materials US, LLC. Дата публикации: 2020-03-12.

Abrasives and compositions for chemical mechanical planarization of tungsten and titanium

Номер патента: US20050214191A1. Автор: Brian Mueller,Charles Yu. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2005-09-29.

Multi-step polishing solution for chemical mechanical planarization

Номер патента: US6971945B2. Автор: Terence M. Thomas,Zhendong Liu,John Quanci,Robert E. Schmidt. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2005-12-06.

Multi-step polishing solution for chemical mechanical planarization

Номер патента: US20050194357A1. Автор: Zhendong Liu,John Quanci,Terence Thomas,Robert Schmidt. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2005-09-08.

Metal Chemical Mechanical Planarization (CMP) Composition And Methods Therefore

Номер патента: US20200032107A1. Автор: Shi Xiaobo,"ONeill Mark Leonard". Владелец: Versum Materials US, LLC. Дата публикации: 2020-01-30.

Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions

Номер патента: US20200048496A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Murella Krishna P.,Rose Joseph D.,Zhou Hongjun. Владелец: Versum Materials US, LLC. Дата публикации: 2020-02-13.

Chemical Mechanical Planarization (CMP) Composition and Methods Therefore for Copper and Through Silica Via (TSV) Applications

Номер патента: US20190055430A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Yang Rung-Je,Derecskei Agnes,Tsai Ming-Shih,Li Chris Keh-Yeuan,Matz Laura M.,Pan Pao-Chia,Hsieh Chad Chang-Tse,Lew Blake J.. Владелец: Versum Materials US, LLC. Дата публикации: 2019-02-21.

Metal Chemical Mechanical Planarization (CMP) Composition and Methods Therefore

Номер патента: US20190062597A1. Автор: Xiaobo Shi,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2019-02-28.

SUSPENSION FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) AND METHOD EMPLOYING THE SAME

Номер патента: US20220306902A1. Автор: ALETY Sridevi R.,CYFFKA Mark,MAHADEV Niraj. Владелец: . Дата публикации: 2022-09-29.

Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide And Silicon Nitride Removal Rates

Номер патента: US20200239736A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Murella Krishna P.,Rose Joseph D.,Zhou Hongjun. Владелец: Versum Materials US, LLC. Дата публикации: 2020-07-30.

Metal chemical mechanical planarization (CMP) composition and methods therefore

Номер патента: US10465096B2. Автор: Xiaobo Shi,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2019-11-05.

Method of forming a copper-containing metal interconnect using a chemical mechanical planarization (CMP) slurry

Номер патента: US6436811B1. Автор: Yasuaki Tsuchiya,Tomoko Wake. Владелец: NEC Corp. Дата публикации: 2002-08-20.

Metal chemical mechanical planarization (cmp) composition and methods therefore

Номер патента: KR102287000B1. Автор: 샤이 시아오보,레오날드 오닐 마크. Владелец: 버슘머트리얼즈 유에스, 엘엘씨. Дата публикации: 2021-08-09.

Metal chemical mechanical planarization (cmp) composition and methods therefore

Номер патента: EP3447100A1. Автор: Xiaobo Shi,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2019-02-27.

Metal chemical mechanical planarization (cmp) composition and methods therefore

Номер патента: IL261370B. Автор: . Владелец: Versum Mat Us Llc. Дата публикации: 2021-10-31.

Metal chemical mechanical planarization (CMP) composition and methods therefore

Номер патента: US10920106B2. Автор: Xiaobo Shi,Mark Leonard O'Neill. Владелец: Versum Materials US LLC. Дата публикации: 2021-02-16.

Metal chemical mechanical planarization (cmp) composition and methods therefore

Номер патента: IL261370A. Автор: . Владелец: Versum Mat Us Llc. Дата публикации: 2019-02-28.

Metal chemical mechanical planarization (CMP) composition and method thereof

Номер патента: JP6730385B2. Автор: マーク　レオナルド　オニール,レオナルドオニールマーク,シーシアオポー. Владелец: バーサムマテリアルズユーエス，リミティドライアビリティカンパニー. Дата публикации: 2020-07-29.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: US6630433B2. Автор: Fan Zhang,Joseph A. Levert,Daniel L. Towery,Shyama P. Mukherjee. Владелец: Honeywell International Inc. Дата публикации: 2003-10-07.

Chemical mechanical planarization of copper metallurgy barriers or liners

Номер патента: JP3686307B2. Автор: ウィリアム・ジェイ・コール,ダニエル・シー・エデルステイン,ナフタリ・イー・ラスティグ. Владелец: International Business Machines Corp. Дата публикации: 2005-08-24.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: CA2431591A1. Автор: Fan Zhang,Daniel Towery,Joseph Levert,Shyama Mukherjee. Владелец: Individual. Дата публикации: 2002-08-01.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: WO2002059393A1. Автор: Fan Zhang,Daniel Towery,Joseph Levert,Shyama Mukherjee. Владелец: HONEYWELL INTERNATIONAL INC.. Дата публикации: 2002-08-01.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: US20040046148A1. Автор: Fan Zhang,Dan Towery,Joseph Levert,Shyama Mukherjee,Yanpei Deng. Владелец: Yanpei Deng. Дата публикации: 2004-03-11.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: JP2004524440A. Автор: ジヤン，フアン,タワリー，ダニエル,リバート，ジヨセフ,ムケルジー，シヤマ. Владелец: ハネウエル・インターナシヨナル・インコーポレーテツド. Дата публикации: 2004-08-12.

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Номер патента: EP1352109A1. Автор: Fan Zhang,Daniel Towery,Joseph Levert,Shyama Mukherjee. Владелец: Honeywell International Inc. Дата публикации: 2003-10-15.

Method for chemical mechanical planarization of a copper-containing substrate

Номер патента: US8551887B2. Автор: Xiaobo Shi. Владелец: Air Products and Chemicals Inc. Дата публикации: 2013-10-08.

Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization

Номер патента: US7691287B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton,Robin Edward Richards. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2010-04-06.

Compositions and methods for chemical mechanical planarization of tungsten and titanium

Номер патента: US20050211952A1. Автор: Brian Mueller,Charles Yu,Timothy Mace. Владелец: Rohm and Haas Electronic Materials CMP Holdings Inc. Дата публикации: 2005-09-29.

Chemical-mechanical planarization composition having ketooxime compounds and associated method for use

Номер патента: US7316977B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton. Владелец: Air Products and Chemicals Inc. Дата публикации: 2008-01-08.

Bicine/tricine containing composition and method for chemical-mechanical planarization

Номер патента: US20050194563A1. Автор: Bin Hu,Saifi Usmani,Junaid Siddiqui,Timothy Compton,Robin Richards. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-09-08.

Bicine/tricine containing composition and method for chemical-mechanical planarization

Номер патента: US20050076579A1. Автор: Bin Hu,Saifi Usmani,Junaid Siddiqui,Timothy Compton,Robin Richards. Владелец: Richards Robin Edward. Дата публикации: 2005-04-14.

Method for Chemical Mechanical Planarization of A Metal-containing Substrate

Номер патента: US20090061630A1. Автор: Ann Marie Meyers,Bentley J. Palmer,Ajoy Zutshi,Suresh Shrauti,Guangying Zhang. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2009-03-05.

Method for chemical mechanical planarization of a copper-containing substrate

Номер патента: TW201124517A. Автор: Xiaobo Shi. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2011-07-16.

Composition and method for copper chemical mechanical planarization

Номер патента: US6911393B2. Автор: Martin Nosowitz,Nicholas M. Martyak,Glenn Carroll,Patrick K. Janney. Владелец: Arkema Inc. Дата публикации: 2005-06-28.

Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use

Номер патента: US20060046490A1. Автор: Ajoy Zutshi,Junaid Siddiqui,Timothy Compton,Gautam Banerjee. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2006-03-02.

Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization

Номер патента: US20080182485A1. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton,Robin Edward Richards. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2008-07-31.

Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use

Номер патента: US20090261291A1. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton,Ajoy Zutshi,Gautam Banerjee. Владелец: Gautam Banerjee. Дата публикации: 2009-10-22.

Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use

Номер патента: US9200180B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton,Ajoy Zutshi,Gautam Banerjee. Владелец: Air Products and Chemicals Inc. Дата публикации: 2015-12-01.

Method for chemical mechanical planarization of a copper-containing substrate

Номер патента: KR101203599B1. Автор: 시아오보 시. Владелец: 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드. Дата публикации: 2012-11-23.

Method for chemical mechanical planarization of a copper-containing substrate

Номер патента: US20110312181A1. Автор: Xiaobo Shi. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2011-12-22.

Bicine/tricine containing composition and method for chemical-mechanical planarization

Номер патента: TWI286157B. Автор: Junaid Ahmed Siddiqui,Bin Hu,Saifi Usmani,Timothy Frederick Compton,Robin Edward Richards. Владелец: Dupont Air Prod Nanomaterials. Дата публикации: 2007-09-01.

Chemical-mechanical planarization composition having ketooxime compounds and associated method for use

Номер патента: US20070049025A1. Автор: Junaid Siddiqui,Timothy Compton. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2007-03-01.

Bicine / tricine-containing composition and method for chemical-mechanical planarization

Номер патента: JP4167214B2. Автор: アフメッドシディクイジュネイド,フレデリックコンプトンティモシー,フービン,エドワードリチャーズロビン,ウスマニサイフィ. Владелец: デュポンエアプロダクツナノマテリアルズ，リミティドライアビリティカンパニー. Дата публикации: 2008-10-15.

Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use

Номер патента: US7514363B2. Автор: Junaid Ahmed Siddiqui,Timothy Frederick Compton,Ajoy Zutshi,Gautam Banerjee. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2009-04-07.

Composition and method for copper chemical mechanical planarization

Номер патента: WO2004055864A3. Автор: Martin Nosowitz,Glenn Carroll,Nicholas M Martyak,Patrick K Janney. Владелец: Arkema Inc. Дата публикации: 2005-01-27.

Method for chemical mechanical planarization of a metal-containing substrate

Номер патента: TW200927898A. Автор: Ann Marie Meyers,Ajoy Zutshi,Suresh Shrauti,Bentley J Palmer,guang-ying Zhang. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2009-07-01.

Composition and method for copper chemical mechanical planarization

Номер патента: EP1590505A4. Автор: Martin Nosowitz,Glenn Carroll,Nicholas M Martyak,Patrick K Janney. Владелец: Arkema Inc. Дата публикации: 2005-12-14.

Compositions and methods for chemical-mechanical planarization o f noble-metal-featured substrates. these treated substrates

Номер патента: WO2003064551A1. Автор: Robert J. Small,Zhefei J. Chen. Владелец: EKC Technology, Inc.. Дата публикации: 2003-08-07.

Compositions and methods for chemical mechanical planarization of tungsten and titanium

Номер патента: TW200536665A. Автор: Brian L Mueller,Charles Yu,Timothy Mace. Владелец: Rohm & Haas Elect Mat. Дата публикации: 2005-11-16.

Composition and method for copper chemical mechanical planarization using polysulfide slurries

Номер патента: TW200428524A. Автор: Martin Nosowitz,Glenn Carroll,Nicholas M Martyak,Patrick K Janney. Владелец: Atofina Chem Inc. Дата публикации: 2004-12-16.

Composition and method for copper chemical mechanical planarization

Номер патента: AU2003302769A1. Автор: Martin Nosowitz,Nicholas M. Martyak,Glenn Carroll,Patrick K. Janney. Владелец: Atofina Chemicals Inc. Дата публикации: 2004-07-09.

Slurry Compositions For Chemical Mechanical Planarization

Номер патента: US20230058800A1. Автор: Teng-Chun Tsai,Chun-Hung LIAO,An-Hsuan Lee,Shen-Nan Lee,Chen-Hao WU,Huang-Lin Chao. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-02-23.

Abrasive Free Silicon Chemical Mechanical Planarization

Номер патента: US20120190200A1. Автор: Suryadevara V. Babu,Naresh K. PENTA. Владелец: CLARKSON UNIVERSITY. Дата публикации: 2012-07-26.

CONTACT RELEASE CAPSULE USEFUL FOR CHEMICAL MECHANICAL PLANARIZATION SLURRY

Номер патента: US20130280910A1. Автор: IHNFELDT Robin. Владелец: . Дата публикации: 2013-10-24.

CHEMICAL-MECHANICAL PLANARIZATION OF POLYMER FILMS

Номер патента: US20150083689A1. Автор: Pallikkara Kuttiatoor Sudeep,JIA Renhe,Dysard Jeffrey. Владелец: . Дата публикации: 2015-03-26.

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Номер патента: US20160090513A1. Автор: Moeser Geoffrey D.,Prevo Brian G.,Hampden-smith Mark J.,Zhang Qingling,Greenwood Bennett,Sharma Ravi. Владелец: . Дата публикации: 2016-03-31.

Slurry Compositions For Chemical Mechanical Planarization

Номер патента: US20210098266A1. Автор: TSAI Teng-Chun,Lee Shen-Nan,LIAO Chun-Hung,WU Chen-Hao,Lee An-Hsuan,Chao Huang-Lin. Владелец: . Дата публикации: 2021-04-01.

BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD THEREOF

Номер патента: US20150104940A1. Автор: Shi Xiaobo,Schlueter James Allen,Graham Maitland Gary. Владелец: AIR PRODUCTS AND CHEMICALS INC.. Дата публикации: 2015-04-16.

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Номер патента: US20150104941A1. Автор: Shi Xiaobo,Schlueter James Allen,Graham Maitland Gary. Владелец: . Дата публикации: 2015-04-16.

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Номер патента: US20170110332A1. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner,Henry A. Beveridge. Владелец: International Business Machines Corp. Дата публикации: 2017-04-20.

GROUP III ARSENIDE MATERIAL SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES

Номер патента: US20170110333A1. Автор: Krishnan Mahadevaiyer,Yamanaka Tatsuya,KAWAMOTO Tatsuyoshi,Beveridge Henry A.,Oishi Yohei,Penigalapati Dinesh Kumar,Steiner Rachel S.,Tornello James A.. Владелец: . Дата публикации: 2017-04-20.

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Номер патента: US20150132958A1. Автор: IHNFELDT Robin. Владелец: . Дата публикации: 2015-05-14.

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Номер патента: US20220277964A1. Автор: "OSullivan Eugene J.",Bishop Douglas,Krishnan Mahadevaiyer,Edelstein Daniel Charles,Lofaro Michael Francis,Giannetta Andrew. Владелец: . Дата публикации: 2022-09-01.

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Номер патента: US20180166292A1. Автор: Krishnan Mahadevaiyer,Yamanaka Tatsuya,KAWAMOTO Tatsuyoshi,Beveridge Henry A.,Oishi Yohei,Penigalapati Dinesh Kumar,Steiner Rachel S.,Tornello James A.. Владелец: . Дата публикации: 2018-06-14.

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Номер патента: US20200164482A1. Автор: LEE Ren-Dou,SHEUH Ya-Jen,Chen Shih-Chung,Peng Sheng-Tai,Chen Hung-Lin,Lin Yi-Shao. Владелец: . Дата публикации: 2020-05-28.

Chemical Mechanical Planarization for Tungsten-Containing Substrates

Номер патента: US20140273458A1. Автор: Shi Xiaobo,Zhou Hongjun,Schlueter James Allen,Schwartz Jo-Ann Theresa,Lew Blake J.. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2014-09-18.

METAL OXIDE-POLYMER COMPOSITE PARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20160319160A1. Автор: Fomitchev Dmitry,Prevo Brian G.,Hampden-smith Mark J.,Kutsovsky Yakov E.. Владелец: . Дата публикации: 2016-11-03.

Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coated Silica Abrasives

Номер патента: US20160358790A1. Автор: Shi Xiaobo,"ONeill Mark Leonard",Tamboli Dnyanesh Chandrakant,Schlueter James Allen. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2016-12-08.

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Номер патента: US20180362810A1. Автор: Hseih Dong-Tsai,BOGNER Josh M.. Владелец: . Дата публикации: 2018-12-20.

Process for reducing dishing and erosion during chemical mechanical planarization

Номер патента: TW200413489A. Автор: Stuart D Hellring,Yu-Zhuo Li,Robert L Auger. Владелец: Ppg Ind Ohio Inc. Дата публикации: 2004-08-01.

Process for reducing dishing and erosion during chemical mechanical planarization

Номер патента: EP1543084A2. Автор: Yuzhuo Li,Stuart D. Hellring,Robert L. Auger. Владелец: PPG Industries Ohio Inc. Дата публикации: 2005-06-22.

Compositions for chemical mechanical planarization of tantalum and tantalum nitride

Номер патента: US6638326B2. Автор: Robert J. Small,Tuan Truong,Maria Peterson,Melvin Keith Carter,Lily Yao. Владелец: EKC Technology Inc. Дата публикации: 2003-10-28.

Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates

Номер патента: US7524346B2. Автор: Robert J. Small,Zhefei J. Chen. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2009-04-28.

Chemical-mechanical planarization of barriers or liners for copper metallurgy

Номер патента: US6375693B1. Автор: Daniel C. Edelstein,Naftali E. Lustig,William J. Cote. Владелец: International Business Machines Corp. Дата публикации: 2002-04-23.

Abrasive free silicon chemical mechanical planarization

Номер патента: WO2012103091A2. Автор: Suryadevara V. Babu,Naresh K. PENTA. Владелец: CLARKSON UNIVERSITY. Дата публикации: 2012-08-02.

Chemical-mechanical planarization using ozone

Номер патента: US6756308B2. Автор: Robert J. Small,Xiaowei Shang. Владелец: EKC Technology Inc. Дата публикации: 2004-06-29.

Group III arsenide material smoothing and chemical mechanical planarization processes

Номер патента: US9646841B1. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner,Henry A. Beveridge. Владелец: International Business Machines Corp. Дата публикации: 2017-05-09.

Indium phosphide smoothing and chemical mechanical planarization processes

Номер патента: US9916985B2. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner,Henry A. Beveridge. Владелец: International Business Machines Corp. Дата публикации: 2018-03-13.

Compositions for chemical mechanical planarization of tantalum and tantalum nitride

Номер патента: US7033409B2. Автор: Robert J. Small,Tuan Truong,Maria Peterson,Melvin Keith Carter,Lily Yao. Владелец: DA Nanomaterials LLC. Дата публикации: 2006-04-25.

Low dishing copper chemical mechanical planarization

Номер патента: EP4038155A1. Автор: Xiaobo Shi,Laura M. Matz,Rung-Je Yang,Keh-Yeuan LI,Ming Shih Tsai,Chen Yuan Huang. Владелец: Versum Materials US LLC. Дата публикации: 2022-08-10.

Process for reducing dishing and erosion during chemical mechanical planarization

Номер патента: US20040077295A1. Автор: Yuzhuo Li,Stuart Hellring,Robert Auger. Владелец: PPG Industries Ohio Inc. Дата публикации: 2004-04-22.

Low dishing copper chemical mechanical planarization

Номер патента: WO2021067151A1. Автор: Xiaobo Shi,Laura M. Matz,Rung-Je Yang,Keh-Yeuan LI,Ming Shih Tsai,Chen Yuan Huang. Владелец: Versum Materials US, LLC. Дата публикации: 2021-04-08.

Indium phosphide smoothing and chemical mechanical planarization processes

Номер патента: US10262866B2. Автор: Mahadevaiyer Krishnan,James A. Tornello,Tatsuya Yamanaka,Tatsuyoshi Kawamoto,Yohei Oishi,Dinesh Kumar Penigalapati,Rachel S. Steiner,Henry A. Beveridge. Владелец: International Business Machines Corp. Дата публикации: 2019-04-16.

Chemical-mechanical planarization of barriers or liners for copper metallurgy

Номер патента: US6743268B2. Автор: Daniel C. Edelstein,Naftali E. Lustig,William J. Cote. Владелец: International Business Machines Corp. Дата публикации: 2004-06-01.

Method and composition for chemical mechanical planarization of a metal-containing substrate

Номер патента: TW201120165A. Автор: Xiaobo Shi. Владелец: Dupont Air Products Nano Materials Llc. Дата публикации: 2011-06-16.

Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

Номер патента: US20030194879A1. Автор: Robert Small,Zhefei Chen. Владелец: EKC Technology Inc. Дата публикации: 2003-10-16.

Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

Номер патента: US20090255903A1. Автор: Robert J. Small,Zhefei J. Chen. Владелец: Chen Zhefei J. Дата публикации: 2009-10-15.

Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

Номер патента: US8142675B2. Автор: Robert J. Small,Zhefei J. Chen. Владелец: Air Products and Chemicals Inc. Дата публикации: 2012-03-27.

Chemical mechanical planarization for tungsten-containing substrates

Номер патента: EP2779217A2. Автор: Xiaobo Shi,Hongjun Zhou,James Allen Schlueter,Blake J. Lew,Jo-Ann Theresa Schwartz. Владелец: Air Products and Chemicals Inc. Дата публикации: 2014-09-17.

Pit-less chemical mechanical planarization process and device structures made therefrom

Номер патента: US12131915B2. Автор: Chia-Wei Liu,Jheng-Hong Jiang,Shing-Huang Wu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-10-29.

Pit-less chemical mechanical planarization process and device structures made therefrom

Номер патента: US20240379379A1. Автор: Chia-Wei Liu,Jheng-Hong Jiang,Shing-Huang Wu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-11-14.

Pit-less chemical mechanical planarization process and device structures made therefrom

Номер патента: US11705340B2. Автор: Chia-Wei Liu,Jheng-Hong Jiang,Shing-Huang Wu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-07-18.

Pit-less chemical mechanical planarization process and device structures made therefrom

Номер патента: US20230298903A1. Автор: Chia-Wei Liu,Jheng-Hong Jiang,Shing-Huang Wu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-09-21.

Polishing pad, preparation method thereof and method for preparing semiconductor device using same

Номер патента: US12138738B2. Автор: Kyung Hwan Kim,Jang Won Seo,Jae In Ahn,Sung Hoon Yun,Kang Sik MYUNG. Владелец: SK Enpulse Co Ltd. Дата публикации: 2024-11-12.

Systems and methods for suction pad assemblies

Номер патента: US20240371708A1. Автор: Yu-Hsiang CHAO,Chi-Ping LEI. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-11-07.

Systems and methods for suction pad assemblies

Номер патента: US12087646B2. Автор: Yu-Hsiang CHAO,Chi-Ping LEI. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-09-10.

Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs

Номер патента: US20150093977A1. Автор: Pradip K. Roy,Manish Deopura,Hem M. Vaidya. Владелец: Individual. Дата публикации: 2015-04-02.

Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs

Номер патента: US20080211141A1. Автор: Pradip K. Roy,Manish Deopura,Hem M. Vaidya. Владелец: Individual. Дата публикации: 2008-09-04.

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Номер патента: US20060019587A1. Автор: Manish Deopura,Pradip Roy,Hem Vaidya. Владелец: Individual. Дата публикации: 2006-01-26.

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Номер патента: WO2002103776A2. Автор: Anthony J. Toprac,Christopher A. Bode. Владелец: Advanced Micro Devices, Inc.. Дата публикации: 2002-12-27.

Improved methods and apparatus for chemical mechanical planarization (cmp) of a semiconductor wafer

Номер патента: KR19990077604A. Автор: 마이클엘. 와이즈,제레미케이. 스티븐스,수리지. 헤지. Владелец: 피터 토마스. Дата публикации: 1999-10-25.

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Номер патента: TWI749262B. Автор: 彭升泰,陳政炳,李仁鐸,賴宗龍,謝子逸,張建瑋. Владелец: 台灣積體電路製造股份有限公司. Дата публикации: 2021-12-11.

Method for generating in-situ grooves during chemical mechanical planarization (CMP) PAD and novel CMPPAD design

Номер патента: JP4977604B2. Автор: マニッシュデオプラ，,ヘムエム．バイディア，,プラディプケー．ロイ，. Владелец: ネクスプラナーコーポレイション. Дата публикации: 2012-07-18.

Chemical mechanical planarization (cmp) pad conditioner and method of making

Номер патента: US20120149287A1. Автор: Srinivasan Ramanath,Jianhui Wu,Arup K. Khaund,Eric M. Schulz. Владелец: Saint Gobain Abrasifs SA. Дата публикации: 2012-06-14.

METHOD AND/OR SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)

Номер патента: US20150187662A1. Автор: Mou Jong-I,Tsen Yen-Di,Yen-Wei Cheng. Владелец: Taiwan Semiconductor Manufacturing Company Limited. Дата публикации: 2015-07-02.

Method and apparatus for in-situ monitoring of chemical mechanical planarization (cmp) processes

Номер патента: WO2022265967A2. Автор: Daniel Ray TROJAN,Jessica BRINDLEY. Владелец: AXUS TECHNOLOGY, LLC. Дата публикации: 2022-12-22.

Planarizing solutions, planarizing machines, and methods for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US6376381B1. Автор: Gundu M. Sabde. Владелец: Micron Technology Inc. Дата публикации: 2002-04-23.

Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6402884B1. Автор: Karl M. Robinson,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2002-06-11.

Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6599836B1. Автор: Karl M. Robinson,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2003-07-29.

Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6805615B1. Автор: Karl M. Robinson,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2004-10-19.

Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US7276446B2. Автор: Karl M. Robinson,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2007-10-02.

Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US20050107010A1. Автор: Scott Meikle,Karl Robinson. Владелец: Individual. Дата публикации: 2005-05-19.

Method for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US7223154B2. Автор: Stephen J. Kramer,Michael J. Joslyn. Владелец: Micron Technology Inc. Дата публикации: 2007-05-29.

SYSTEMS AND METHODS FOR CHEMICAL MECHANICAL PLANARIZATION WITH PHOTOLUMINESCENCE QUENCHING

Номер патента: US20160005667A1. Автор: Liu I-Shuo. Владелец: . Дата публикации: 2016-01-07.

Systems and methods for chemical mechanical planarization with photoluminescence quenching

Номер патента: US20150162209A1. Автор: I-Shuo Liu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2015-06-11.

SYSTEMS AND METHODS FOR CHEMICAL MECHANICAL PLANARIZATION WITH PHOTO-CURRENT DETECTION

Номер патента: US20150162210A1. Автор: Liu I-Shuo. Владелец: Taiwan Semiconductor Manufacturing Company Limited. Дата публикации: 2015-06-11.

SYSTEMS AND METHODS FOR PERFORMING CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20150194318A1. Автор: TSAI Teng-Chun,Lee Shen-Nan,Lu Yung-Cheng. Владелец: Taiwan Semiconductor Manufacturing Company Limited. Дата публикации: 2015-07-09.

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Номер патента: US20210260716A1. Автор: LEE EdwardLiCang,GU Jingran. Владелец: HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.. Дата публикации: 2021-08-26.

PADS FOR CHEMICAL MECHANICAL PLANARIZATION TOOLS, CHEMICAL MECHANICAL PLANARIZATION TOOLS, AND RELATED METHODS

Номер патента: US20200246937A1. Автор: Bresson James. Владелец: . Дата публикации: 2020-08-06.

Materials and methods for chemical-mechanical planarization

Номер патента: US6910951B2. Автор: Sudhakar Balijepalli,Dale J. Aldrich,Laura A. Grier. Владелец: Dow Global Technologies LLC. Дата публикации: 2005-06-28.

Materials and methods for chemical-mechanical planarization

Номер патента: TWI316887B. Автор: Sudhakar Balijepalli,Dale J Aldrich,Laura A Grier. Владелец: DOW GLOBAL TECHNOLOGIES INC. Дата публикации: 2009-11-11.

Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad

Номер патента: US5972792A. Автор: Guy F. Hudson. Владелец: Micron Technology Inc. Дата публикации: 1999-10-26.

Systems and methods for chemical mechanical planarization with fluorescence detection

Номер патента: US9305851B2. Автор: Hui-Chi Huang,I-Shuo Liu,Jung-Tsan TSAI,Chien-Ping Lee. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2016-04-05.

Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers

Номер патента: US5893754A. Автор: Karl M. Robinson,Michael A. Walker. Владелец: Micron Technology Inc. Дата публикации: 1999-04-13.

Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads

Номер патента: US6250994B1. Автор: Dinesh Chopra,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2001-06-26.

Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers

Номер патента: US5981396A. Автор: Karl M. Robinson,Michael A. Walker. Владелец: Micron Technology Inc. Дата публикации: 1999-11-09.

Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad

Номер патента: WO1998018159A1. Автор: Guy F. Hudson. Владелец: MICRON TECHNOLOGY, INC.. Дата публикации: 1998-04-30.

Method and apparatus for improving planarity of chemical-mechanical planarization operations

Номер патента: US5232875A. Автор: Trung T. Doan,Gurtej S. Sandhu,Mark E. Tuttle,Angus C. Fox,Hugh E. Stroupe. Владелец: Micron Technology Inc. Дата публикации: 1993-08-03.

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US6592443B1. Автор: Stephen J. Kramer,Michael J. Joslyn. Владелец: Micron Technology Inc. Дата публикации: 2003-07-15.

Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US6652764B1. Автор: Guy T. Blalock. Владелец: Micron Technology Inc. Дата публикации: 2003-11-25.

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US7192336B2. Автор: Stephen J. Kramer,Michael J. Joslyn. Владелец: Micron Technology Inc. Дата публикации: 2007-03-20.

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US20060194523A1. Автор: Michael Joslyn,Stephen Kramer. Владелец: Micron Technology Inc. Дата публикации: 2006-08-31.

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US20060194522A1. Автор: Michael Joslyn,Stephen Kramer. Владелец: Micron Technology Inc. Дата публикации: 2006-08-31.

Methods and apparatuses for making and using planarizing pads for mechanical and chemical mechanical planarization of microelectronic substrates

Номер патента: US6746317B2. Автор: Guy T. Blalock. Владелец: Micron Technology Inc. Дата публикации: 2004-06-08.

Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US7037179B2. Автор: Guy T. Blalock. Владелец: Micron Technology Inc. Дата публикации: 2006-05-02.

Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US6758735B2. Автор: Guy T. Blalock. Владелец: Micron Technology Inc. Дата публикации: 2004-07-06.

Modular method for chemical mechanical planarization

Номер патента: AU2003296430A1. Автор: David G. Halley. Владелец: Strasbaugh Inc. Дата публикации: 2004-07-29.

Systems and methods for performing chemical mechanical planarization

Номер патента: US9962801B2. Автор: Teng-Chun Tsai,Shen-Nan Lee,Yung-Cheng Lu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2018-05-08.

Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad

Номер патента: EP0946979A1. Автор: Guy F. Hudson. Владелец: Micron Technology Inc. Дата публикации: 1999-10-06.

Systems And Methods For Chemical Mechanical Planarization With Fluorescence Detection

Номер патента: CN104647194B. Автор: 黄惠琪,李健平,刘翼硕,蔡荣赞. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2017-05-24.

Systems and methods for chemical mechanical planarization with fluorescence detection

Номер патента: KR101583154B1. Автор: 이수어 리우,후에이치 황,롱짠 차이,치엔핑 리. Владелец: 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드. Дата публикации: 2016-01-07.

Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers

Номер патента: EP0907460B1. Автор: Karl M. Robinson,Michael A. Walker. Владелец: Micron Technology Inc. Дата публикации: 2003-03-26.

Systems and methods for chemical mechanical planarization with photo-current detection

Номер патента: US9153452B2. Автор: I-Shuo Liu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2015-10-06.

Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad

Номер патента: KR100489458B1. Автор: 허드슨구이에프.. Владелец: 마이크론 테크놀로지 인코포레이티드. Дата публикации: 2005-05-16.

Systems and methods for chemical mechanical planarization with photoluminescence quenching

Номер патента: US9666496B2. Автор: I-Shuo Liu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2017-05-30.

Methods for monitoring and controlling chemical mechanical planarization

Номер патента: US6931330B1. Автор: Jingang Yi,Cangshan Xu. Владелец: Lam Research Corp. Дата публикации: 2005-08-16.

Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads

Номер патента: US6652364B2. Автор: Dinesh Chopra,Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 2003-11-25.

System and method for chemical mechanical planarization

Номер патента: CN114695104A. Автор: 许峻维. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2022-07-01.

Method for chemical mechanical planarization

Номер патента: US20040238493A1. Автор: Yehiel Gotkis,Rod Kistler,Aleksandar Owczarz. Владелец: Lam Research Corp. Дата публикации: 2004-12-02.

Modular method for chemical mechanical planarization

Номер патента: WO2004060609A1. Автор: David G. Halley. Владелец: Strasbaugh, Inc.. Дата публикации: 2004-07-22.

Systems and methods for performing chemical mechanical planarization

Номер патента: DE102014119322A1. Автор: Teng-Chun Tsai,Shen-Nan Lee,Yung-Cheng Lu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2015-07-09.

Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US20020127958A1. Автор: Guy Blalock. Владелец: Blalock Guy T.. Дата публикации: 2002-09-12.

Multi-step, in-situ pad conditioning system and method for chemical mechanical planarization

Номер патента: US7040967B2. Автор: Stephen J. Benner. Владелец: TBW Industries Inc. Дата публикации: 2006-05-09.

Multi-step, in-situ pad conditioning system and method for chemical mechanical planarization

Номер патента: EP1715979A4. Автор: Stephen J Benner. Владелец: TBW Industries Inc. Дата публикации: 2010-03-31.

Materials and methods for chemical-mechanical planarization

Номер патента: KR20050107454A. Автор: 서드하카르 발리제팔리,대일 제이. 알드리치,로라 에이. 그리어. Владелец: 다우 글로벌 테크놀로지스 인크.. Дата публикации: 2005-11-11.

Chemical mechanical planarization pad, and method of forming and using same

Номер патента: TW201034792A. Автор: Guangwei Wu,Paul Lefevre,David Adam Wells,Oscar K Hsu,Anoop Mathew,Scott Xin Qiao. Владелец: Innopad Inc. Дата публикации: 2010-10-01.

Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization

Номер патента: EP1128932A1. Автор: Andrew J. Nagengast,Anthony Meyer,Michael Labunsky,Glenn W. Travis,Tac Huynh. Владелец: Lam Research Corp. Дата публикации: 2001-09-05.

Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization

Номер патента: WO2000027585A1. Автор: Andrew J. Nagengast,Anthony Meyer,Michael Labunsky,Glenn W. Travis,Tac Huynh. Владелец: LAM RESEARCH CORPORATION. Дата публикации: 2000-05-18.

Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization

Номер патента: EP1128932A4. Автор: Anthony Meyer,Michael Labunsky,Andrew J Nagengast,Tac Huynh,Glenn W Travis. Владелец: Lam Research Corp. Дата публикации: 2007-01-10.

Chemical mechanical planarization system and method therefor

Номер патента: TW383260B. Автор: James F Vanell,Todd W Buley. Владелец: Motorola Inc. Дата публикации: 2000-03-01.

Chemical mechanical planarization conditioner

Номер патента: US20170008146A1. Автор: Mark Kevin Diaz,Mark Bubnick,Thomas S. Namola. Владелец: Abrasive Technology Inc. Дата публикации: 2017-01-12.

MEGA-SONIC VIBRATION ASSISTED CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20210016415A1. Автор: Chen Kei-Wei,Tsai Ching-Hsiang,HUANG Hui-Chi,Kung Chun-Hao,Wang Shang-Yu. Владелец: . Дата публикации: 2021-01-21.

CHEMICAL MECHANICAL PLANARIZATION MEMBRANE

Номер патента: US20190091829A1. Автор: CHANG Chien-Wei,LEE Ren-Dou,Chen Cheng-Ping,Peng Sheng-Tai,Lai Tsung-Lung,Shieh Tzi-Yi. Владелец: . Дата публикации: 2019-03-28.

CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER WITH ELONGATED CUTTING EDGES

Номер патента: US20170095903A1. Автор: Galpin Andrew,WELLS Daniel. Владелец: . Дата публикации: 2017-04-06.

Systems, methods and apparatus for post-chemical mechanical planarization substrate buff pre-cleaning

Номер патента: US20150114430A1. Автор: Hui Chen,Yufei Chen,Jianshe Tang,Jim K. Atkinson,Clinton P. Sakata,Yunshuang DING,Brian J. Brian. Владелец: Applied Materials Inc. Дата публикации: 2015-04-30.

CHEMICAL MECHANICAL PLANARIZATION APPARATUS AND METHODS

Номер патента: US20150183081A1. Автор: DENG Wufeng. Владелец: . Дата публикации: 2015-07-02.

CHEMICAL-MECHANICAL PLANARIZATION SYSTEM

Номер патента: US20160332277A1. Автор: ZHANG Wei,Chen Yen-Yu,CHENG Chung-Liang,LEE Chang-Sheng. Владелец: . Дата публикации: 2016-11-17.

METHODS AND APPARATUS FOR FORMING A RESIST ARRAY USING CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20160343578A1. Автор: Bencher Christopher D.. Владелец: . Дата публикации: 2016-11-24.

METHODS AND SYSTEMS FOR CHEMICAL MECHANICAL PLANARIZATION ENDPOINT DETECTION USING AN ALTERNATING CURRENT REFERENCE SIGNAL

Номер патента: US20150371912A1. Автор: BELLO Abner,Wedlake Michael. Владелец: . Дата публикации: 2015-12-24.

Methods and apparatus for the chemical mechanical planarization of electronic devices

Номер патента: US5769691A. Автор: Clinton O. Fruitman. Владелец: Speedfam Corp. Дата публикации: 1998-06-23.

Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US6492273B1. Автор: Stephen J. Kramer,Scott E. Moore,Gundu M. Sabde,Jim Hofmann. Владелец: Micron Technology Inc. Дата публикации: 2002-12-10.

Methods, apparatus and slurries for chemical mechanical planarization

Номер патента: US6623355B2. Автор: Joseph M. Desimone,James B. McClain. Владелец: MiCell Technologies Inc. Дата публикации: 2003-09-23.

Methods, apparatus and slurries for chemical mechanical planarization

Номер патента: US6743078B2. Автор: Joseph M. Desimone,James B. McClain. Владелец: MiCell Technologies Inc. Дата публикации: 2004-06-01.

Post-chemical mechanical planarization clean-up process using post-polish scrubbing

Номер патента: US5996594A. Автор: Sudipto Ranendra Roy,Iqbal Ali,Gregory B. Shinn,Rajani C. Shah,Shelley H. Peterman,Srini Raghavan. Владелец: Texas Instruments Inc. Дата публикации: 1999-12-07.

Methods, apparatus and slurries for chemical mechanical planarization

Номер патента: US20030194953A1. Автор: James McClain,Joseph DeSimone. Владелец: Desimone Joseph M.. Дата публикации: 2003-10-16.

SYSTEM AND METHOD FOR CONTROLLING CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20220270939A1. Автор: Hsu Chun-Wei. Владелец: . Дата публикации: 2022-08-25.

Method for monitoring polishing pad used in chemical-mechanical planarization process

Номер патента: US6194231B1. Автор: Hong Ho-Cheng,Kuo-Hsing Liu. Владелец: National Tsing Hua University NTHU. Дата публикации: 2001-02-27.

CHEMICAL MECHANICAL PLANARIZATION SYSTEM AND A METHOD OF USING THE SAME

Номер патента: US20200070307A1. Автор: SU Jassie. Владелец: . Дата публикации: 2020-03-05.

CHEMICAL MECHANICAL PLANARIZATION PLATEN

Номер патента: US20140227945A1. Автор: Lin Chang-Sheng,Lu Hsin-Hsien. Владелец: Taiwan Semiconductor Manufacturing Co., Ltd.. Дата публикации: 2014-08-14.

Carbon and boron implantation for backside chemical mechanical planarization control

Номер патента: US20240266175A1. Автор: Yan Zhang,Jae Young Lee,Naushad Variam,Johannes M. van Meer. Владелец: Applied Materials Inc. Дата публикации: 2024-08-08.

Optical coupler hub for chemical-mechanical-planarization polishing pads with an integrated optical waveguide.

Номер патента: US20030190866A1. Автор: Stephan Wolf. Владелец: Individual. Дата публикации: 2003-10-09.

Method for improving Uniformity of Chemical-Mechanical Planarization Process

Номер патента: US20130273669A1. Автор: Tao Yang,Chao Zhao,Junfeng Li. Владелец: Institute of Microelectronics of CAS. Дата публикации: 2013-10-17.

Chemical mechanical planarization tool

Номер патента: US12030159B2. Автор: Kei-Wei Chen,Tung-Kai Chen,Hui-Chi Huang,Wan-Chun Pan,Shang-Yu Wang,Zink Wei. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2024-07-09.

Methods for reducing scratch defects in chemical mechanical planarization

Номер патента: US20230377898A1. Автор: William Weilun HONG,Ying-Tsung Chen,Wan-Chun Pan. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-11-23.

Chemical Mechanical Planarization Tool

Номер патента: US20230321789A1. Автор: Kei-Wei Chen,Tung-Kai Chen,Hui-Chi Huang,Wan-Chun Pan,Shang-Yu Wang,Zink Wei. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-10-12.

Bottom Leads Chemical Mechanical Planarization for TMR Magnetic Sensors

Номер патента: US20210057638A1. Автор: Ming Jiang,Ronghui ZHOU,Yuankai Zheng,Ming Mao,Chih-Ching Hu,Yung-Hung Wang,Chen-Jung Chien. Владелец: Western Digital Technologies Inc. Дата публикации: 2021-02-25.

Chemical Mechanical Planarization Tool

Номер патента: US20230271298A1. Автор: Liang-Guang Chen,Kei-Wei Chen,Kao-Feng Liao,Ting-Hsun CHANG,Chun-Chieh Lin,Hsin-ying Ho,Chih Hung Chen,Fu-Ming HUANG,Michael Yen,Chun-Wen Hsiao,Sheng-Chao Chuang,Peng-Chung Jangjian,Ji James Cui. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-08-31.

Chip customized polish pads for chemical mechanical planarization (cmp)

Номер патента: EP1610929A1. Автор: Pradip K. Roy. Владелец: Neopad Technologies Corp. Дата публикации: 2006-01-04.

An apparatus for and method of polishing a semiconductor wafer using chemical mechanical planarization

Номер патента: WO2008023288A2. Автор: Eoin O'dea. Владелец: Eoin O'dea. Дата публикации: 2008-02-28.

Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US20030060140A1. Автор: David Carlson. Владелец: Carlson David W.. Дата публикации: 2003-03-27.

Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US7479206B2. Автор: Jason B. Elledge. Владелец: Micron Technology Inc. Дата публикации: 2009-01-20.

System and Method for Online End Point Detection for use in Chemical Mechanical Planarization

Номер патента: US20060100821A1. Автор: ASHOK KUMAR,Arun SIKDER,Tapas Das,Rajesh Ganesan. Владелец: UNIVERSITY OF SOUTH FLORIDA. Дата публикации: 2006-05-11.

Multi-layered chemical-mechanical planarization pad

Номер патента: US09796063B2. Автор: Guangwei Wu,Paul Lefevre,David Adam Wells,John Erik Aldeborgh,Anoop Mathew,Scott Xin Qiao,Oscar K. Hsu,Marc C. Jin. Владелец: FNS Technology Co Ltd. Дата публикации: 2017-10-24.

Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process

Номер патента: US6361414B1. Автор: Mike Ravkin,Katrina Mikhaylich,Don E. Anderson. Владелец: Lam Research Corp. Дата публикации: 2002-03-26.

Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6739955B2. Автор: John Skrovan. Владелец: Micron Technology Inc. Дата публикации: 2004-05-25.

Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic device substrate assemblies

Номер патента: US6361413B1. Автор: John Skrovan. Владелец: Micron Technology Inc. Дата публикации: 2002-03-26.

Multi-action chemical mechanical planarization device and method

Номер патента: US6514129B1. Автор: David G. Halley. Владелец: Strasbaugh Inc. Дата публикации: 2003-02-04.

Seal for use with a chemical mechanical planarization apparatus

Номер патента: US20020086626A1. Автор: Andrew Yednak,Phillip Rayer. Владелец: Speedfam IPEC Corp. Дата публикации: 2002-07-04.

Customized polish pads for chemical mechanical planarization

Номер патента: US20100273398A1. Автор: Pradip K. Roy,Sudhanshu Misra. Владелец: Individual. Дата публикации: 2010-10-28.

Apparatus and method for adjusting and controlling the stacking-up layer manufacturing

Номер патента: US09884455B2. Автор: Wei-Chin Huang,Chuan-Sheng Zhuang. Владелец: Industrial Technology Research Institute ITRI. Дата публикации: 2018-02-06.

Compositions for chemical mechanical planarization of copper

Номер патента: US20030164471A1. Автор: Robert Small,Tuan Truong,Melvin Carter,Maria Peterson,Lily Yao. Владелец: EKC Technology Inc. Дата публикации: 2003-09-04.

Compositions for chemical mechanical planarization of copper

Номер патента: TW200302857A. Автор: Tuan Truong,Robert J Small,Melvin Keith Carter,Lily Yao,Maria L Peterson. Владелец: EKC Technology Inc. Дата публикации: 2003-08-16.

Compositions for chemical mechanical planarization of copper

Номер патента: US6866792B2. Автор: Robert J. Small,Tuan Truong,Maria Peterson,Melvin Keith Carter,Lily Yao. Владелец: EKC Technology Inc. Дата публикации: 2005-03-15.

Compositions for chemical mechanical planarization of copper

Номер патента: WO2003103894A2. Автор: Robert J. Small,Tuan Truong,Maria Peterson,Melvin Keith Carter,Lily Yau. Владелец: EKC Technology, Inc.. Дата публикации: 2003-12-18.

Controlling passivating film properties using colloidal particles polyelectrolytes, and ionic additives for copper chemical mechanical planarization

Номер патента: WO2008157293A1. Автор: Yuzhuo Li. Владелец: BASF SE. Дата публикации: 2008-12-24.

Controlling passivating film properties using colloidal particles, polyelectrolytes, and ionic additives for copper chemical mechanical planarization

Номер патента: US20100178768A1. Автор: Yuzhuo Li. Владелец: BASF SE. Дата публикации: 2010-07-15.

Fluoride-modified silica sols for chemical mechanical planarization

Номер патента: US8163049B2. Автор: Junaid Ahmed Siddiqui. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2012-04-24.

Fluoride-modified silica sols for chemical mechanical planarization

Номер патента: US20070251156A1. Автор: Junaid Siddiqui. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2007-11-01.

Advanced process control (apc) of copper thickness for chemical mechanical planarization(cmp) optimization

Номер патента: AU2002367053A1. Автор: Craig William Christian,James Clayton Stice. Владелец: Advanced Micro Devices Inc. Дата публикации: 2003-07-30.

Advanced process control (APC) of copper thickness for chemical mechanical planarization (CMP) optimization

Номер патента: US20030129774A1. Автор: Craig Christian,James Stice. Владелец: Advanced Micro Devices Inc. Дата публикации: 2003-07-10.

Post Chemical Mechanical Planarization (CMP) clean

Номер патента: CN110643434A. Автор: D·C·塔姆博利. Владелец: Versum Materials US LLC. Дата публикации: 2020-01-03.

Post chemical mechanical planarization (cmp) cleaning

Номер патента: EP4204529A4. Автор: Dnyanesh Tamboli,Jeong Yun Yu,Hee Min Hwang. Владелец: Versum Materials US LLC. Дата публикации: 2024-10-02.

Post Chemical Mechanical Planarization (CMP) Cleaning

Номер патента: US20190390139A1. Автор: Tamboli Dnyanesh C.. Владелец: Versum Materials US, LLC. Дата публикации: 2019-12-26.

Post chemical-mechanical planarization (CMP) cleaning composition

Номер патента: US6194366B1. Автор: Shahriar Naghshineh,Jeff Barnes,Yassaman Hashemi,Ewa B. Oldak. Владелец: ESC Inc. Дата публикации: 2001-02-27.

Cleaning composition after chemical mechanical planarization (CMP)

Номер патента: JP4942275B2. Автор: シャーリアーナグシニー，,ジェフバーネス，,ディンインシュ，. Владелец: アドバンスドテクノロジーマテリアルズ，インコーポレイテッド. Дата публикации: 2012-05-30.

Post chemical-mechanical planarization (CMP) cleaning composition

Номер патента: US6723691B2. Автор: Shahriar Naghshineh,Jeff Barnes,Ewa B. Oldak. Владелец: Advanced Technology Materials Inc. Дата публикации: 2004-04-20.

Post chemical-mechanical planarization (CMP) cleaning composition

Номер патента: US6492308B1. Автор: Shahriar Naghshineh,Jeff Barnes,Dingying Xu. Владелец: ESC Inc. Дата публикации: 2002-12-10.

Post chemical mechanical planarization (cmp) cleaning

Номер патента: EP3588535A1. Автор: Dnyanesh Chandrakant Tamboli. Владелец: Versum Materials US LLC. Дата публикации: 2020-01-01.

Post chemical-mechanical planarization (cmp) cleaning composition

Номер патента: WO2001095381A2. Автор: Shahriar Naghshineh,Jeff Barnes,Dingying Xu. Владелец: Esc, Inc.. Дата публикации: 2001-12-13.

Post chemical-mechanical planarization (cmp) cleaning composition

Номер патента: WO2001040425A2. Автор: Shahriar Naghshineh,Jeff Barnes,Yassaman Hashemi,Ewa B. Oldak. Владелец: Esc, Inc.. Дата публикации: 2001-06-07.

Post chemical-mechanical planarization (cmp) cleaning composition

Номер патента: WO2001095381A3. Автор: Shahriar Naghshineh,Jeff Barnes,Dingying Xu. Владелец: ESC Inc. Дата публикации: 2002-05-23.

Post chemical-mechanical planarization (cmp) cleaning composition

Номер патента: WO2001040425A3. Автор: Shahriar Naghshineh,Jeff Barnes,Yassaman Hashemi,Ewa B Oldak. Владелец: ESC Inc. Дата публикации: 2002-01-03.

Post chemical-mechanical planarization (cmp) cleaning composition

Номер патента: EP1287550B1. Автор: Shahriar Naghshineh,Jeff Barnes,Dingying Xu. Владелец: Advanced Technology Materials Inc. Дата публикации: 2010-03-24.

Post chemical-mechanical planarization cmp cleaning composition

Номер патента: KR100831180B1. Автор: 나그시네샤리아르,바네스제프,쉬딩잉. Владелец: 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드. Дата публикации: 2008-05-21.

Post chemical mechanical planarization(cmp) cleaning

Номер патента: KR102414343B1. Автор: 드니아네쉬 씨 탐볼리. Владелец: 버슘머트리얼즈 유에스, 엘엘씨. Дата публикации: 2022-06-29.

Post chemical mechanical planarization (cmp) cleaning

Номер патента: EP3588535B1. Автор: Dnyanesh Chandrakant Tamboli. Владелец: Versum Materials US LLC. Дата публикации: 2023-09-20.

Method for manufacturing multi-layered thin film, method for manufacturing solar cell, and method for manufacturing solar cell module

Номер патента: EP3933940A1. Автор: Yoshiko Hiraoka,Mutsuki Yamazaki,Kazushige Yamamoto,Soichiro Shibasaki,Naoyuki Nakagawa,Sara Yoshio,Yuya Honishi. Владелец: Toshiba Energy Systems and Solutions Corp. Дата публикации: 2022-01-05.

COMPOSITION AND METHOD FOR REMOVING RESIDUE FROM CHEMICAL-MECHANICAL PLANARIZATION SUBSTRATE

Номер патента: US20180166273A1. Автор: Cui Ji,HUANG Helin. Владелец: . Дата публикации: 2018-06-14.

Composition and method for removing residue from chemical-mechanical planarization substrate

Номер патента: WO2018111545A1. Автор: Helin Huang,Ji Cui. Владелец: Cabot Microelectronics Corporation. Дата публикации: 2018-06-21.

Composition and method for removing residue from chemical-mechanical planarization substrate

Номер патента: US10522341B2. Автор: Helin Huang,Ji Cui. Владелец: Cabot Microelectronics Corp. Дата публикации: 2019-12-31.

Chemical mechanical planarization pads with constant groove volume

Номер патента: US20240238937A1. Автор: Jaeseok Lee,Eric S. Moyer,Paul Andre Lefevre,Devin SCHMITT,Holland Hodges. Владелец: CMC Materials LLC. Дата публикации: 2024-07-18.

Cleaning composition for post chemical mechanical planarization and method of using the same

Номер патента: WO2021186241A1. Автор: Yihan Yang,Cheyu KUO,Chengchun HUANG,Hoying WU,Mingche Ho,Minghui Lu. Владелец: Ferro Taiwan Limited. Дата публикации: 2021-09-23.

Process solutions containing surfactants used as post-chemical mechanical planarization treatment

Номер патента: US7208049B2. Автор: Peng Zhang,Brenda Faye Ross. Владелец: Air Products and Chemicals Inc. Дата публикации: 2007-04-24.

Method of chemical mechanical planarization using copper coordinating ligands

Номер патента: US6096652A. Автор: Janos Farkas,Chelsea Dang,Jason Gomez,David K. Watts. Владелец: Motorola Inc. Дата публикации: 2000-08-01.

Alkaline cleaning composition for post chemical mechanical planarization

Номер патента: JP4638262B2. Автор: チャンドラカントタンボリデニアネッシュ,バネルジーガウタム. Владелец: Air Products and Chemicals Inc. Дата публикации: 2011-02-23.

Aqueous cleaning composition for post copper chemical mechanical planarization

Номер патента: WO2014151361A1. Автор: Cheng-Yuan Ko. Владелец: Cabot Microelectronics Corporation. Дата публикации: 2014-09-25.

Alkaline post-chemical mechanical planarization cleaning compositions

Номер патента: US20050205835A1. Автор: Dnyanesh Tamboli,Gautam Banerjee. Владелец: Air Products and Chemicals Inc. Дата публикации: 2005-09-22.

Solution for ruthenium chemical mechanical planarization

Номер патента: US20030124867A1. Автор: Woo Lee. Владелец: Hynix Semiconductor Inc. Дата публикации: 2003-07-03.

Solution for ruthenium chemical mechanical planarization

Номер патента: US6797624B2. Автор: Woo Jin Lee. Владелец: Hynix Semiconductor Inc. Дата публикации: 2004-09-28.

Composition for cleaning chemical mechanical planarization apparatus

Номер патента: US6498131B1. Автор: Robert J. Small,Joo-Yun Lee. Владелец: EKC Technology Inc. Дата публикации: 2002-12-24.

Method for scheduling or controlling the movements of a plurality of vehicles over a network of routes

Номер патента: US20200410416A1. Автор: Karl Schöpf,Daniel Kindler,Kai Gotthardt,Moritz VON BONIN,Michael Kuperberg,Sergiu-Matei Burciu. Владелец: DEUTSCHE BAHN AG. Дата публикации: 2020-12-31.

Method for scheduling or controlling the movements of a plurality of vehicles over a network of routes

Номер патента: CA3092270A1. Автор: Karl Schöpf,Daniel Kindler,Kai Gotthardt,Moritz VON BONIN,Michael Kuperberg,Sergiu-Matei Burciu. Владелец: DEUTSCHE BAHN AG. Дата публикации: 2019-09-26.

Method for analyzing effective polishing frequency and effective polishing times for chemical mechanical planarization polishing wafers with different polishing pad profiles

Номер патента: US20060240745A1. Автор: Zone-Ching Lin,Chein-Chung Chen. Владелец: National Taiwan University of Science and Technology NTUST. Дата публикации: 2006-10-26.

Method for analyzing effective polishing frequency and effective polishing times for chemical mechanical planarization polishing wafers with different polishing pad profiles

Номер патента: US7299107B2. Автор: Zone-Ching Lin,Chein-Chung Chen. Владелец: National Taiwan University of Science and Technology NTUST. Дата публикации: 2007-11-20.

Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization

Номер патента: EP1222056A1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2002-07-17.

Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines

Номер патента: US6361832B1. Автор: Scott G. Meikle,Vishnu K. Agarwal. Владелец: Micron Technology Inc. Дата публикации: 2002-03-26.

Chemical mechanical planarization process control utilizing in-situ conditioning process

Номер патента: IL177027A. Автор: . Владелец: Tbw Ind Inc. Дата публикации: 2010-06-16.

Apertured conditioning brush for chemical mechanical planarization systems

Номер патента: WO2007047996A3. Автор: Stephen J Benner. Владелец: Tbw Ind Inc. Дата публикации: 2007-10-04.

Apparatus and method for measuring and controlling the internal temperature of a semicondcutor device

Номер патента: US20170030961A1. Автор: Jason Christopher McCullough. Владелец: Texas Instruments Inc. Дата публикации: 2017-02-02.

Shared Data Induced Quality Control For A Chemical Mechanical Planarization Process

Номер патента: US20230325751A1. Автор: Hongjun Zhou,Joseph Rose,Rung-Je Yang,LU Gan,Krishna Murella,Ryan Clarke,Cesar Clavero,Anupama Mallikarjunan,Hieu Pham,Vid Gopal,Esmeralda Yitamben,Shirley Lin. Владелец: Versum Materials US LLC. Дата публикации: 2023-10-12.

Slurry recycling for chemical mechanical planarization system

Номер патента: US20230256563A1. Автор: Wen-Kuei Liu. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2023-08-17.

An apparatus and method for use in controlling the positioning of an antenna

Номер патента: WO2019115859A1. Автор: Jani Moilanen,Teemu VEIJALAINEN. Владелец: NOKIA TECHNOLOGIES OY. Дата публикации: 2019-06-20.

Methods for the prediction, prognosis, and/or diagnosis of an inflammatory response associated with schizophrenia

Номер патента: US20220252623A1. Автор: Ute-Christiane Meier. Владелец: Individual. Дата публикации: 2022-08-11.

Bottom leads chemical mechanical planarization for tmr magnetic sensors

Номер патента: WO2021040806A1. Автор: Ming Jiang,Ronghui ZHOU,Yuankai Zheng,Ming Mao,Chih-Ching Hu,Yung-Hung Wang,Chen-Jung Chien. Владелец: WESTERN DIGITAL TECHNOLOGIES, INC.. Дата публикации: 2021-03-04.

Chemical mechanical planarization (CMP) of a semiconductor wafer using acoustical waves for in-situ end point detection

Номер патента: US5240552A. Автор: Chris C. Yu,Gurtej S. Sandhu. Владелец: Micron Technology Inc. Дата публикации: 1993-08-31.

Systems and methods for fabrication of superconducting integrated circuits

Номер патента: US09768371B2. Автор: Jeremy P. Hilton,Paul I. Bunyk,Eric Ladizinsky,Byong Hyop Oh. Владелец: D Wave Systems Inc. Дата публикации: 2017-09-19.

SYSTEMS AND METHODS FOR CHEMICAL MECHANICAL PLANARIZATION WITH FLUORESCENCE DETECTION

Номер патента: US20150140691A1. Автор: HUANG Hui-Chi,Liu I-Shuo,TSAI Jung-Tsan,Lee Chien-Ping. Владелец: Taiwan Semiconductor Manufacturing Company Limited. Дата публикации: 2015-05-21.

Method for post chemical-mechanical planarization cleaning of semiconductor wafers

Номер патента: US5679169A. Автор: David Gonzales,Guy F. Hudson. Владелец: Micron Technology Inc. Дата публикации: 1997-10-21.

Systems and methods for fabrication of superconducting integrated circuits

Номер патента: US11930721B2. Автор: Jeremy P. Hilton,Paul I. Bunyk,Eric Ladizinsky,Byong Hyop Oh. Владелец: 1372934 BC Ltd. Дата публикации: 2024-03-12.

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Номер патента: US20140264151A1. Автор: Ko Cheng-Yuan. Владелец: . Дата публикации: 2014-09-18.

Method for monitoring and controlling the temperature regime of the growth surface of the substrate

Номер патента: RU2763103C1. Автор: Сергей Александрович Филин,Евгений Евсеевич Ашкинази,Виктор Григорьевич Ральченко,Виталий Иванович Конов,Андрей Петрович Большаков,Станислав Геннадиевич Рыжков. Владелец: Федеральное государственное бюджетное учреждение науки Федеральный исследовательский центр "Институт общей физики им. А.М. Прохорова Российской академии наук" (ИОФ РАН). Дата публикации: 2021-12-27.

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Номер патента: US09801865B2. Автор: Valentina Echeverria Moran. Владелец: US Department of Veterans Affairs VA. Дата публикации: 2017-10-31.

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Номер патента: US20190167653A1. Автор: Valentina Echeverria Moran. Владелец: US Department of Veterans Affairs VA. Дата публикации: 2019-06-06.

Method for predicting the risk of deep vein thrombosis and pulmonary embolism associated with hormonal preparations and hormone levels

Номер патента: EP3551771A1. Автор: Goranka TANACKOVIC ABBAS-TERKI,Joelle Michaud Schutz,Thierry Daniel PACHE. Владелец: GENE PREDICTIS SA. Дата публикации: 2019-10-16.

Method for predicting the risk of deep vein thrombosis and pulmonary embolism associated with hormonal preparations and hormone levels

Номер патента: WO2018104549A4. Автор: Goranka TANACKOVIC ABBAS-TERKI,Joelle Michaud Schutz,Thierry Daniel PACHE. Владелец: GENE PREDICTIS SA. Дата публикации: 2018-08-02.

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Номер патента: US20200071762A1. Автор: Goranka TANACKOVIC ABBAS-TERKI,Joelle Michaud Schutz,Thierry Daniel PACHE. Владелец: GENE PREDICTIS SA. Дата публикации: 2020-03-05.

Materials and methods for diagnosis, prevention and/or treatment of stress disorders and conditions associated with A-beta peptide aggregation

Номер патента: US10238641B2. Автор: Valentina Echeverria Moran. Владелец: US Department of Veterans Affairs VA. Дата публикации: 2019-03-26.

Method for checking and controlling the mammalian lactic acid fermentation process/aerobic glucose fermentation metabolic pathway in mammalian organism

Номер патента: US11236381B2. Автор: Johannes Coy. Владелец: Individual. Дата публикации: 2022-02-01.

Method for checking and controlling the mammalian lactic acid fermentation process/aerobic glucose fermentation metabolic pathway in mammalian organism

Номер патента: EP1856537A1. Автор: Johannes Dr. Coy. Владелец: Individual. Дата публикации: 2007-11-21.

Method for checking and controlling the mammalian lactic acid fermentation process / aerobic glucose fermentation metabolic pathway in mammalian organism

Номер патента: US20200248227A1. Автор: Johannes Coy. Владелец: Individual. Дата публикации: 2020-08-06.

Method for checking and controlling the mammalian lactic acid fermentation process/aerobic glucose fermentation metabolic pathway in mammalian organism

Номер патента: AU2006222277A1. Автор: Johannes Coy. Владелец: Individual. Дата публикации: 2006-09-14.

Method for checking and controlling the mammalian lactic acid fermentation process/aerobic glucose fermentation metabolic pathway in mammalian organism

Номер патента: US20100240687A1. Автор: Johannes Coy. Владелец: Individual. Дата публикации: 2010-09-23.

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Номер патента: US20180208489A1. Автор: Saugata Gon,Anoop Chengara. Владелец: ECOLAB USA INC. Дата публикации: 2018-07-26.

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Номер патента: US20110061774A1. Автор: Wen Lin Lo,Xiao Rong Fang. Владелец: Modern Islands Co Ltd. Дата публикации: 2011-03-17.

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Номер патента: EP3452395A1. Автор: Tiziano Barea. Владелец: BTSR International SpA. Дата публикации: 2019-03-13.

Method for preventing and controlling biofouling on marine objects

Номер патента: EP2432323A1. Автор: Elena Roda,Alejandro Hochkoeppler,Alessandra Stefan,Lucio Panizza. Владелец: Archimede R&D Srl. Дата публикации: 2012-03-28.

Method for measuring geometric deviations between the dished surfaces of a plurality of materials to be assessed and a dished surface of a reference material

Номер патента: US11933601B2. Автор: Adrien CARLU,Alexandre Marlier. Владелец: Saint Gobain Glass France SAS. Дата публикации: 2024-03-19.

Plant for manufacturing articles made of stone, stone-like or ceramic agglomerate material and method for adjusting and controlling the process for manufacturing such articles

Номер патента: WO2024161243A1. Автор: Dario Toncelli. Владелец: Dario Toncelli. Дата публикации: 2024-08-08.

Measuring and controlling the addition of suspension material to a process stream

Номер патента: CA1092852A. Автор: Alonzo D. Lafleur,John T. Creehan,Robert E. Baugh. Владелец: Ormet Corp. Дата публикации: 1981-01-06.

High-efficiency and short-process method for preparing a high-strength and high-conductivity copper alloy

Номер патента: US11913105B2. Автор: LIANG Meng,Hongtao Wang,Jindong Zhang,Youtong Fang,Jiabin Liu,Litian Wang,Xiaoyang Fang. Владелец: Zhejiang University ZJU. Дата публикации: 2024-02-27.

System and method for scheduling and controlling the display of media content

Номер патента: US20170171581A1. Автор: David Grice Mulligan,Van Quoc Dang. Владелец: Individual. Дата публикации: 2017-06-15.

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Номер патента: WO2001032372A1. Автор: Robert Cardoso Sartorio. Владелец: ARACRUZ CELULOSE S.A.. Дата публикации: 2001-05-10.

System and method for presenting assigned content to a user based on user's association with a recognized article and rights to access

Номер патента: US12058272B2. Автор: Stephen J. Brown,Stephen C. Harris. Владелец: Sneakertopia Inc. Дата публикации: 2024-08-06.

Systems and methods for using a reaction-based approach to managing shared state storage associated with a distributed database

Номер патента: US09852173B1. Автор: Peter Schuller,Stuart Hood,Sumeet Lahorani. Владелец: Twitter Inc. Дата публикации: 2017-12-26.

Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole

Номер патента: US7153335B2. Автор: Junaid Ahmed Siddiqui,Bin Hu,Timothy Frederick Compton,Robin Edward Richards. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2006-12-26.

Tunable composition and method for chemical mechanical planarization using aspartic acid / tolyltriazole

Номер патента: JP4081064B2. Автор: アフメッドシディクイジュネイド,フレデリックコンプトンティモシー,フービン,エドワードリチャーズロビン. Владелец: デュポンエアプロダクツナノマテリアルズ，リミティドライアビリティカンパニー. Дата публикации: 2008-04-23.

Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole

Номер патента: TWI279434B. Автор: Junaid Ahmed Siddiqui,Bin Hu,Timothy Frederick Compton,Robin Edward Richards. Владелец: Dupont Air Prod Nanomaterials. Дата публикации: 2007-04-21.

Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole

Номер патента: US20050076578A1. Автор: Bin Hu,Junaid Siddiqui,Timothy Compton,Robin Richards. Владелец: DuPont Air Products NanoMaterials LLC. Дата публикации: 2005-04-14.

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Номер патента: US9434859B2. Автор: Jeffrey Dysard,Sudeep Pallikkara Kuttiatoor,Renhe Jia. Владелец: Cabot Microelectronics Corp. Дата публикации: 2016-09-06.

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Номер патента: RU2753004C2. Автор: Кевин С. КЭЛЛАХАН,Тайлер К. СТАУДИНГЕР,Айзак ЧЭНГ,Стефан ДЭЙМ,Ник С. ЭВАНС,Закари Д. ЙОРГЕНСЕН,Джошуа КАЛИН,Эрик Р. МУИР. Владелец: Зе Боинг Компани. Дата публикации: 2021-08-11.

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Номер патента: CA1224979A. Автор: Leroy G. Hagenbuch. Владелец: HAGENBUCH ROY GEORGE LE. Дата публикации: 1987-08-04.

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Номер патента: US11530064B2. Автор: Carlos Alberto DIAZ GUERRERO. Владелец: VanRx Pharmasystems Inc. Дата публикации: 2022-12-20.

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Номер патента: US11931834B2. Автор: Andreas WALDHÖR,Manuel Binder. Владелец: FRONIUS INTERNATIONAL GMBH. Дата публикации: 2024-03-19.

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Номер патента: US20230405702A1. Автор: Andreas WALDHÖR,Manuel Binder. Владелец: FRONIUS INTERNATIONAL GMBH. Дата публикации: 2023-12-21.

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Номер патента: US20190025202A1. Автор: David Grice Mulligan,Van Quoc Dang. Владелец: Individual. Дата публикации: 2019-01-24.

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Номер патента: CA2806496C. Автор: Jaime Urzua. Владелец: OUTOTEC OYJ. Дата публикации: 2015-03-31.

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Номер патента: AU2018382215B2. Автор: Kenneth SVINTH. Владелец: Enabl AS. Дата публикации: 2024-02-22.

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Номер патента: US20180083909A1. Автор: Matthew Watts,Eric Barker,Howard Crutsinger,Tataihono Rauru Nikora,Aaron Thomson. Владелец: Individual. Дата публикации: 2018-03-22.

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Номер патента: US20180282008A1. Автор: Carlos Alberto DIAZ GUERRERO. Владелец: VanRx Pharmasystems Inc. Дата публикации: 2018-10-04.

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Номер патента: US20230362011A1. Автор: Stephen J. Brown,Stephen C. Harris. Владелец: Sneakertopia Inc. Дата публикации: 2023-11-09.

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Номер патента: EP1227919A1. Автор: Robert Cardoso Sartorio. Владелец: ARACRUZ CELULOSE SA. Дата публикации: 2002-08-07.

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Номер патента: WO1999056106A9. Автор: Todd A Cerni,Scott Waisanen,Dennis Knowlton. Владелец: Particle Measuring Syst. Дата публикации: 2000-01-27.

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Номер патента: EP1076814A1. Автор: Todd A. Cerni,Scott Waisanen,Dennis Knowlton. Владелец: Particle Measuring Systems Inc. Дата публикации: 2001-02-21.

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Номер патента: US09955319B2. Автор: Jonathan Matus,Pankaj Risbood,Aditya Karnik,Manish Sachdev. Владелец: Zendrive inc. Дата публикации: 2018-04-24.

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Номер патента: WO2001064395A3. Автор: Randy Smith,Jack Nimtz,Gary Rickords,Mark Freseman. Владелец: Speedfam IPEC Corp. Дата публикации: 2002-08-29.

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Номер патента: US20240234159A9. Автор: Jeremy Alfred Theil. Владелец: Adeia Semiconductor Bonding Technologies Inc. Дата публикации: 2024-07-11.

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Номер патента: US20020016138A1. Автор: Michael Walker,Scott Moore. Владелец: Individual. Дата публикации: 2002-02-07.

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Номер патента: US6059643A. Автор: Burford J. Furman,Albert Hu,Mohamed Abushaban. Владелец: Aplex Inc. Дата публикации: 2000-05-09.

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Номер патента: US20230219189A1. Автор: Daniel REDFIELD,Ashwin CHOCKALINGAM,Joshua Chen,Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE. Владелец: Applied Materials Inc. Дата публикации: 2023-07-13.

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Номер патента: US11804377B2. Автор: Jeremy Alfred Theil. Владелец: Adeia Semiconductor Bonding Technologies Inc. Дата публикации: 2023-10-31.

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Номер патента: WO2023133110A1. Автор: Daniel REDFIELD,Ashwin CHOCKALINGAM,Joshua Chen,Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE. Владелец: Applied Materials, Inc.. Дата публикации: 2023-07-13.

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Номер патента: US20240136196A1. Автор: Jeremy Alfred Theil. Владелец: Adeia Semiconductor Bonding Technologies Inc. Дата публикации: 2024-04-25.

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Номер патента: US6729945B2. Автор: Cangshan Xu,Jeff Gasparitsch,Robert Taff,Kenneth J. Bahng,Paul Stasiewicz,Erik H. Engdahl. Владелец: Lam Research Corp. Дата публикации: 2004-05-04.

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Номер патента: US20030143930A1. Автор: Uldis Ziemins,Raymond Khoury,Jose Ocasio. Владелец: International Business Machines Corp. Дата публикации: 2003-07-31.

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Номер патента: WO2024177780A1. Автор: Jianxin Lei,Wenting Hou,David Maxwell Gage,Zhaoxuan WANG,Zihao He. Владелец: Applied Materials, Inc.. Дата публикации: 2024-08-29.

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Номер патента: US20240282709A1. Автор: Jianxin Lei,Wenting Hou,David Maxwell Gage,Zhaoxuan WANG,Zihao He. Владелец: Applied Materials Inc. Дата публикации: 2024-08-22.

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Номер патента: US20180147688A1. Автор: Brune Douglas A.,Broderick Adam. Владелец: . Дата публикации: 2018-05-31.

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Номер патента: US20180147689A1. Автор: Brune Douglas A.,Broderick Adam. Владелец: . Дата публикации: 2018-05-31.

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Номер патента: US20180169827A1. Автор: Hendron Jeffrey James,Miller Jeffrey B.,Stack Jeffrey Robert,Smith Adam P.. Владелец: . Дата публикации: 2018-06-21.

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Номер патента: US20190193245A1. Автор: Tregub Alexander,Molloy Oisin J.. Владелец: Intel Corporation. Дата публикации: 2019-06-27.

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Номер патента: US20040229550A1. Автор: Yakov Epshteyn,Marie Mitchel,John Shartel. Владелец: Novellus Systems Inc. Дата публикации: 2004-11-18.

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Номер патента: US11646233B2. Автор: Tiancai YAN,Bingxun Su. Владелец: Shanghai Huali Integrated Circuit Corp. Дата публикации: 2023-05-09.

Method for manufacturing fin field-effect transistor

Номер патента: US20210391221A1. Автор: Tiancai YAN,Bingxun Su. Владелец: Shanghai Huali Integrated Circuit Corp. Дата публикации: 2021-12-16.

MOSFET integrated circuit having doped conductive interconnects and methods for its manufacture

Номер патента: US8580665B2. Автор: Christian Witt. Владелец: Globalfoundries Inc. Дата публикации: 2013-11-12.

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Номер патента: US20130089980A1. Автор: Christian Witt. Владелец: Globalfoundries Inc. Дата публикации: 2013-04-11.

Method for making a device for detecting electromagnetic radiation comprising a layer of getter material

Номер патента: US09911785B2. Автор: Jean-Jacques Yon. Владелец: Commissariat a lEnergie Atomique et aux Energies Alternatives CEA. Дата публикации: 2018-03-06.

Method for forming semiconductor device structure

Номер патента: US09786754B1. Автор: Chih-Ping Lin,Chung-Yeh Lee. Владелец: Vanguard International Semiconductor Corp. Дата публикации: 2017-10-10.

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Номер патента: US20160354896A1. Автор: Lewis Jennifer A.,Compton Brett G.. Владелец: President and Fellows of Harvard College. Дата публикации: 2016-12-08.

Semiconductor gettering process using backside chemical mechanical planarization (CMP) and dopant diffusion

Номер патента: US5223734A. Автор: Trung T. Doan,Gurtej S. Sandhu,Tyler A. Lowrey. Владелец: Micron Technology Inc. Дата публикации: 1993-06-29.

Chemical mechanical planarization (CMP) apparatus

Номер патента: US6769961B1. Автор: Rodney C. Kistler,Aleksander Owczarz. Владелец: Lam Research Corp. Дата публикации: 2004-08-03.

Backing film for chemical mechanical planarization (CMP) of a semiconductor wafer

Номер патента: US6371833B1. Автор: Kai Huckels,Klaus Herlitz. Владелец: INFINEON TECHNOLOGIES AG. Дата публикации: 2002-04-16.

Method for operating chemical mechanical polishing ("CMP") tool for the manufacture of semiconductor devices

Номер патента: US20040171266A1. Автор: Chien Hua Chen,Yuan Hsin Peng,Xiao Hua Li. Владелец: Semiconductor Manufacturing International Shanghai Corp. Дата публикации: 2004-09-02.

Method for planarizing workpieces in a chemical-mechanical planarization process, method for chemical-mechanical planarization of a substrate, and apparatus for planarizing a surface on a workpiece

Номер патента: TW422754B. Автор: Jeremy K Stephens. Владелец: Ibm. Дата публикации: 2001-02-21.

Method for analyzing effective polishing frequency and times for chemical mechanical planarization polishing wafer with different polishing pad profile

Номер патента: TW200638477A. Автор: Zone-Ching Lin,Chein-Chung Chen. Владелец: Univ Nat Taiwan Science Tech. Дата публикации: 2006-11-01.

Systems and methods for process monitoring and control

Номер патента: US20240274449A1. Автор: Byung-Jun Lee,Chan Park,Pil Sung JO,Sunghee Yun,Simon Zabrocki,Minju Jung,Dongkyun Yim. Владелец: Gauss Labs Inc. Дата публикации: 2024-08-15.

Systems and methods for process monitoring and control

Номер патента: EP4418055A1. Автор: Byung-Jun Lee,Chan Park,Pil Sung JO,Sunghee Yun,Simon Zabrocki,Minju Jung,Dongkyun Yim. Владелец: Gauss Labs Inc. Дата публикации: 2024-08-21.

Planarizing pads, planarizing machines and methods for making and using planarizing pads in mechanical and chemical-mechanical planarization of microelectronic device substrate assemblies

Номер патента: US6498101B1. Автор: Dapeng Wang. Владелец: Micron Technology Inc. Дата публикации: 2002-12-24.

Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization

Номер патента: US6350180B2. Автор: Scott A. Southwick. Владелец: Micron Technology Inc. Дата публикации: 2002-02-26.

Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization

Номер патента: US20010044257A1. Автор: Scott Southwick. Владелец: Southwick Scott A.. Дата публикации: 2001-11-22.

Planarizing pads, planarizing machines, and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6428386B1. Автор: Aaron T. Bartlett. Владелец: Micron Technology Inc. Дата публикации: 2002-08-06.

Structure and method for improving access resistance in u-channel etsoi

Номер патента: US20190288091A1. Автор: Rajiv V. Joshi,Richard Q. Williams,Robert H. Dennard. Владелец: International Business Machines Corp. Дата публикации: 2019-09-19.

Chemical-mechanical planarization machine and method for uniformly planarizing semiconductor wafers

Номер патента: US5868896A. Автор: Chris Chang Yu,Karl M. Robinson. Владелец: Micron Technology Inc. Дата публикации: 1999-02-09.

Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US6206754B1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2001-03-27.

Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same

Номер патента: US6213845B1. Автор: Jason B. Elledge. Владелец: Micron Technology Inc. Дата публикации: 2001-04-10.

Chemical-mechanical planarization machine and method for uniformly planarizing semiconductor wafers

Номер патента: US6143123A. Автор: Chris Chang Yu,Karl M. Robinson. Владелец: Micron Technology Inc. Дата публикации: 2000-11-07.

Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic-substrate assemblies

Номер патента: US6364746B2. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2002-04-02.

Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US6234878B1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2001-05-22.

Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6833046B2. Автор: David Q. Wright. Владелец: Micron Technology Inc. Дата публикации: 2004-12-21.

Method for forming co-planar conductor and insulator features using chemical mechanical planarization

Номер патента: WO1997048132A1. Автор: Kashmir S. Sahota,Subramanian Venkatkrishnan. Владелец: Advanced Micro Devices, Inc.. Дата публикации: 1997-12-18.

Apparatuses and methods for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US7229338B2. Автор: Vishnu K. Agarwal. Владелец: Micron Technology Inc. Дата публикации: 2007-06-12.

Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US20020069967A1. Автор: David Wright. Владелец: Wright David Q.. Дата публикации: 2002-06-13.

Method for Manufacturing Conditioner for Chemical Mechanical Planarization Pad and Conditioner for Chemical Mechanical Planarization Pad

Номер патента: KR100889288B1. Автор: 이주한,윤소영,방준석. Владелец: 이화다이아몬드공업 주식회사. Дата публикации: 2009-03-17.

Carrier heads, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US20050266778A1. Автор: Daniel Custer,Aaron Ward. Владелец: Micron Technology Inc. Дата публикации: 2005-12-01.

Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same

Номер патента: US20010044261A1. Автор: Jason Elledge. Владелец: Elledge Jason B.. Дата публикации: 2001-11-22.

Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers

Номер патента: US5609718A. Автор: Scott G. Meikle. Владелец: Micron Technology Inc. Дата публикации: 1997-03-11.

Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates

Номер патента: US20010006879A1. Автор: Michael Walker,Karl Robinson. Владелец: Individual. Дата публикации: 2001-07-05.

Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates

Номер патента: US20010019937A1. Автор: Jason Elledge. Владелец: Individual. Дата публикации: 2001-09-06.

Polishing pads for chemical mechanical planarization

Номер патента: US20030027500A1. Автор: David James,Peter Burke,Arun Vishwanathan,David Shidner,Lee Cook. Владелец: David Shidner. Дата публикации: 2003-02-06.

Method and apparatus for improved chemical mechanical planarization

Номер патента: EP1799402A1. Автор: Rajeev Bajaj. Владелец: Individual. Дата публикации: 2007-06-27.

Method for cleaning wafer after chemical mechanical planarization

Номер патента: US20130061884A1. Автор: Tao Yang,Chao Zhao,Junfeng Li. Владелец: Institute of Microelectronics of CAS. Дата публикации: 2013-03-14.

Method for improving Uniformity of Chemical-Mechanical Planarization Process

Номер патента: US20130273669A1. Автор: Zhao Chao,Yang Tao,Li Junfeng. Владелец: . Дата публикации: 2013-10-17.

METHODS FOR CHEMICAL MECHANICAL PLANARIZATION OF PATTERNED WAFERS

Номер патента: US20130295752A1. Автор: SANCHEZ ERROL ANTONIO C.,HUANG YI-CHIAU,Wood Bingxi,MENK GREGORY. Владелец: . Дата публикации: 2013-11-07.

SYSTEMS AND METHODS FOR CHEMICAL MECHANICAL PLANARIZATION WITH PHOTO-CURRENT DETECTION

Номер патента: US20160005619A1. Автор: Liu I-Shuo. Владелец: . Дата публикации: 2016-01-07.

METHODS FOR FABRICATING INTEGRATED CIRCUITS USING CHEMICAL MECHANICAL PLANARIZATION TO RECESS METAL

Номер патента: US20150064903A1. Автор: Zhang Xunyuan,Tanwar Kunaljeet,PATLOLLA Raghuveer,Canaperi Donald. Владелец: . Дата публикации: 2015-03-05.

Methods for Reducing Scratch Defects in Chemical Mechanical Planarization

Номер патента: US20200126803A1. Автор: William Weilun HONG,Ying-Tsung Chen,Wan-Chun Pan. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2020-04-23.

SYSTEM AND METHOD FOR REMOVING DEBRIS DURING CHEMICAL MECHANICAL PLANARIZATION

Номер патента: US20220281069A1. Автор: Hsu Chun-Wei. Владелец: . Дата публикации: 2022-09-08.

Methods for Reducing Scratch Defects in Chemical Mechanical Planarization

Номер патента: US20170213743A1. Автор: Chen Ying-Tsung,Hong William Weilun,Pan Wan-Chun. Владелец: . Дата публикации: 2017-07-27.

SYSTEM AND METHOD FOR CHEMICAL MECHANICAL PLANARIZATION PROCESS PREDICTION AND OPTIMIZATION

Номер патента: US20160365253A1. Автор: Luoh Tuung,Chen Chun-Fu,CHEN Kuang-Wei. Владелец: . Дата публикации: 2016-12-15.

Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US6210257B1. Автор: David W. Carlson. Владелец: Micron Technology Inc. Дата публикации: 2001-04-03.

Method for forming a floating gate using chemical mechanical planarization

Номер патента: US20070264777A1. Автор: Naga Chandrasekaran. Владелец: Micron Technology Inc. Дата публикации: 2007-11-15.

Method for forming a floating gate using chemical mechanical planarization

Номер патента: US7998809B2. Автор: Naga Chandrasekaran. Владелец: Micron Technology Inc. Дата публикации: 2011-08-16.

Devices and methods for in-situ control of mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6290572B1. Автор: Jim Hofmann. Владелец: Micron Technology Inc. Дата публикации: 2001-09-18.

Planarizing machines and alignment systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates

Номер патента: US6447369B1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2002-09-10.

Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of micro electronic substrates

Номер патента: US6609947B1. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2003-08-26.

Removal rate behavior of spin-on dielectrics with chemical mechanical polish

Номер патента: WO1997001864A1. Автор: Lynn Forester,Dong K. Choi,Reza Hosseini. Владелец: Alliedsignal Inc.. Дата публикации: 1997-01-16.

Removal rate behavior of spin-on dielectrics with chemical mechanical polish

Номер патента: US5952243A. Автор: Lynn Forester,Dong K. Choi,Reza Hosseini. Владелец: AlliedSignal Inc. Дата публикации: 1999-09-14.

IC interconnect formation with chemical-mechanical polishing and silica etching with solution of nitric and hydrofluoric acids

Номер патента: US6048789A. Автор: Landon B. Vines,Craig A. Bellows,Walter D. Parmantie. Владелец: VLSI Technology Inc. Дата публикации: 2000-04-11.

Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids

Номер патента: US6533893B2. Автор: Whonchee Lee,Gundu M. Sabde,Michael J. Joslyn,James J. Hofmann. Владелец: Micron Technology Inc. Дата публикации: 2003-03-18.

Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates

Номер патента: US6922253B2. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2005-07-26.

Apparatuses for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6986700B2. Автор: Vishnu K. Agarwal. Владелец: Micron Technology Inc. Дата публикации: 2006-01-17.

Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization

Номер патента: US7094695B2. Автор: Theodore M. Taylor. Владелец: Micron Technology Inc. Дата публикации: 2006-08-22.

Apparatus and method for mechanical and/or chemical-mechanical planarization of micro-device workpieces

Номер патента: US7115016B2. Автор: Nagasubramaniyan Chandrasekaran. Владелец: Micron Technology Inc. Дата публикации: 2006-10-03.

Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US7182668B2. Автор: Brian Marshall. Владелец: Micron Technology Inc. Дата публикации: 2007-02-27.

Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers

Номер патента: US5782675A. Автор: Scott A. Southwick. Владелец: Micron Technology Inc. Дата публикации: 1998-07-21.

Materials and methods for low pressure chemical-mechanical planarization

Номер патента: US6918821B2. Автор: Sudhakar Balijepalli,Dale J. Aldrich,Laura A. Grier,Michael E. Mills. Владелец: Dow Global Technologies LLC. Дата публикации: 2005-07-19.

Methods for fabricating integrated circuits using chemical mechanical planarization to recess metal

Номер патента: US9275874B2. Автор: Raghuveer Patlolla,Donald Canaperi,Xunyuan Zhang,Kunaljeet Tanwar. Владелец: International Business Machines Corp. Дата публикации: 2016-03-01.

Method for forming damascene type metal wire in semiconductor device using chemical mechanical planarization and spin etch process

Номер патента: KR100528449B1. Автор: 김형준. Владелец: 주식회사 하이닉스반도체. Дата публикации: 2005-11-15.

Polishing head pressure control device and method for chemical mechanical planarization device

Номер патента: CN110883680B. Автор: 朱铭,蔡宁远. Владелец: Hangzhou Zhonggui Electronic Technology Co ltd. Дата публикации: 2021-08-10.

Optimization method for contact hole chemical mechanical planarization

Номер патента: CN112259501B. Автор: 陈岚,刘建云. Владелец: Institute of Microelectronics of CAS. Дата публикации: 2022-08-30.

Method and apparatus for inspecting defects on polishing pads to be used with chemical mechanical polishing apparatus

Номер патента: US7027640B2. Автор: Sung-Jin Park,Chan-Ho Ryu. Владелец: Nanometrics Inc. Дата публикации: 2006-04-11.

Method for chemical mechanical planarization of a semiconductor display device

Номер патента: KR100567315B1. Автор: 김형석. Владелец: 동부아남반도체 주식회사. Дата публикации: 2006-04-03.

Method for operating chemical mechanical planarization tool

Номер патента: CN112476228A. Автор: 陈东楷,黄惠琪,陈科维,王上瑜,潘婉君,魏民忠. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2021-03-12.

Method for supplying flush fluid

Номер патента: US6146246A. Автор: Scott E. Moore,Daniel G. Custer. Владелец: Micron Technology Inc. Дата публикации: 2000-11-14.

Optimization method for contact hole chemical mechanical planarization

Номер патента: CN112259501A. Автор: 陈岚,刘建云. Владелец: Institute of Microelectronics of CAS. Дата публикации: 2021-01-22.

Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies

Номер патента: US20010029157A1. Автор: Dinesh Chopra. Владелец: Dinesh Chopra. Дата публикации: 2001-10-11.

Method and apparatus for releasably attaching polishing pads to planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Номер патента: US6439970B1. Автор: Michael A. Walker. Владелец: Micron Technology Inc. Дата публикации: 2002-08-27.

Memory elements and methods for making same

Номер патента: US20080017953A9. Автор: Steven Harshfield. Владелец: Harshfield Steven T. Дата публикации: 2008-01-24.

Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization

Номер патента: US6755718B2. Автор: Scott E. Moore. Владелец: Micron Technology Inc. Дата публикации: 2004-06-29.

Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates

Номер патента: US20040012795A1. Автор: Scott Moore. Владелец: Moore Scott E.. Дата публикации: 2004-01-22.

Dressing method for pad conditioner and pad conditioner dressed thereby

Номер патента: KR101162759B1. Автор: 이주한,이종재,윤소영. Владелец: 이화다이아몬드공업 주식회사. Дата публикации: 2012-07-05.

Methods and systems for controlling belt surface temperature and slurry temperature in linear chemical mechanical planarization

Номер патента: US6953750B1. Автор: Ren Zhou,Tuan A. Nguyen,Xuyen Pham,Patrick P. H. Wu. Владелец: Lam Research Corp. Дата публикации: 2005-10-11.

System and method for the identification of chemical mechanical planarization defects

Номер патента: WO2005100976A2. Автор: ASHOK KUMAR,Rajesh Ganesan,Tapas K. Das,Arun K. Sikder. Владелец: UNIVERSITY OF SOUTH FLORIDA. Дата публикации: 2005-10-27.

Polishing head pressure control device and method for chemical mechanical planarization device

Номер патента: WO2021120635A1. Автор: 朱铭,蔡宁远. Владелец: 杭州众硅电子科技有限公司. Дата публикации: 2021-06-24.

Conditioners and related methods for chemical mechanical planarization pads

Номер патента: KR102447622B1. Автор: 콘래드 수리아가,패트릭 두어링,라제시 티와리,브루스 알링턴,앤드류 앨런 갤핀. Владелец: 엔테그리스, 아이엔씨.. Дата публикации: 2022-09-28.

Removal rate behavior of spin-on dielectrics with chemical mechanical polish

Номер патента: EP0836746A1. Автор: Lynn Forester,Dong K. Choi,Reza Hosseini. Владелец: AlliedSignal Inc. Дата публикации: 1998-04-22.

Method for cleaning wafer after chemical-mechanical planarization

Номер патента: WO2012163154A1. Автор: 杨涛,赵超,李俊峰. Владелец: 中国科学院微电子研究所. Дата публикации: 2012-12-06.

Method for analyzing effective polishing frequency and times for chemical mechanical planarization polishing wafer with different polishing pad profile

Номер патента: TWI261878B. Автор: Zone-Ching Lin,Chein-Chung Chen. Владелец: Univ Nat Taiwan Science Tech. Дата публикации: 2006-09-11.

Method for protecting porous low-k dielectric post chemical mechanical planarization

Номер патента: US20090142885A1. Автор: Shom Ponoth,Terry A. Spooner,Hosadurga Shobha,Ya Ou. Владелец: International Business Machines Corp. Дата публикации: 2009-06-04.

Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization

Номер патента: US20030060128A1. Автор: Scott Moore. Владелец: Individual. Дата публикации: 2003-03-27.

Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads

Номер патента: TWI286502B. Автор: Philip Slutsky,Dan Doron,Boaz Eldad,Barak Yardeni. Владелец: Intel Corp. Дата публикации: 2007-09-11.

Pad conditioner coupling and end effector for a chemical mechanical planarization system and method therefor

Номер патента: SG102560A1. Автор: F Vanell James. Владелец: Motorola Inc. Дата публикации: 2004-03-26.

Chemical mechanical planarization methods and apparatus

Номер патента: US20080318494A1. Автор: Tien-Chen Hu,Chun-Chin Huang,Jung-Sheng Hou. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2008-12-25.

Reinforced chemical mechanical planarization belt

Номер патента: TW586158B. Автор: Jibing Lin,Diane J Hymes. Владелец: Lam Res Corp. Дата публикации: 2004-05-01.

Conditioner for chemical-mechanical-planarization pad and related methods

Номер патента: EP3793772A1. Автор: Rajesh Tiwari,Patrick Doering,Bruce Arrington,Conrad SURIAGA,Andrew Allan GALPIN. Владелец: Entegris Inc. Дата публикации: 2021-03-24.

Conditioner for chemical-mechanical-planarization pad and related methods

Номер патента: WO2019222302A1. Автор: Rajesh Tiwari,Patrick Doering,Bruce Arrington,Conrad SURIAGA,Andrew Allan GALPIN. Владелец: ENTEGRIS, INC.. Дата публикации: 2019-11-21.

Conditioner for chemical-mechanical-planarization pad and related methods

Номер патента: EP3793772A4. Автор: Rajesh Tiwari,Patrick Doering,Bruce Arrington,Conrad SURIAGA,Andrew Allan GALPIN. Владелец: Entegris Inc. Дата публикации: 2022-03-16.

Reinforced chemical mechanical planarization belt

Номер патента: AU2003213823A8. Автор: Jibing Lin,Diane J Hymes. Владелец: Lam Research Corp. Дата публикации: 2003-09-29.

Reinforced chemical mechanical planarization belt

Номер патента: TW200304180A. Автор: Jibing Lin,Diane J Hymes. Владелец: Lam Res Corp. Дата публикации: 2003-09-16.

Slurry feed system and method of providing slurry to chemical mechanical planarization station

Номер патента: US09744642B2. Автор: Wei-Cheng LI,Tsung-Huang Chen,Yung-Ti HUNG,Chi-Tung LAI. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2017-08-29.

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Номер патента: US20130078895A1. Автор: Wu Jianhui,Schulz Eric M.,Ramanath Srinivasan,Dinh-Ngoc Charles,Puthanangady Thomas,Vedantham Ramanujam,Hwang Taewook. Владелец: . Дата публикации: 2013-03-28.

METHOD AND COMPOSITION FOR CHEMICAL MECHANICAL PLANARIZATION OF A METAL OR A METAL ALLOY

Номер патента: US20130102153A1. Автор: Shi Xiaobo,Palmer Bentley J.,Sawayda Rebecca A.. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2013-04-25.

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Номер патента: US20130244548A1. Автор: Mathew Anoop,LEFEVRE Paul,WU Guangwei,QIAO Scott Xin,HSU Oscar K.,WELLS David Adam. Владелец: . Дата публикации: 2013-09-19.

Methods and apparatus for pre-chemical mechanical planarization buffing module

Номер патента: US20130288578A1. Автор: Hui Chen,Hung Chen,Allen L. D'Ambra,Jim K. Atkinson. Владелец: Applied Materials Inc. Дата публикации: 2013-10-31.

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Номер патента: US20130316623A1. Автор: Cobb Michael A.,Krishnan Mahadevaiyer,Lofaro Michael F.,Manzer Dennis G.. Владелец: INTERNATIONAL BUSINESS MACHINES CORPORATION. Дата публикации: 2013-11-28.

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Номер патента: US20130316630A1. Автор: Ramanath Srinivasan,Vedantham Ramanujam,Hwang Taewook,PYTEL Rachel Z.,Cyr Paul,Rothenberg Michael. Владелец: . Дата публикации: 2013-11-28.

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Номер патента: US20140113532A1. Автор: Smith Joseph,Wargo Christopher,Galpin Andrew. Владелец: ENTEGRIS, INC.. Дата публикации: 2014-04-24.

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Номер патента: US20210057292A1. Автор: LIANTO Prayudi,HUNG Shih-Chao,TOH GEOK SAN. Владелец: . Дата публикации: 2021-02-25.

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Номер патента: US20210057638A1. Автор: Jiang Ming,Zheng Yuankai,Zhou Ronghui,Wang Yung-Hung,HU Chih-Ching,MAO Ming,CHIEN Chen-jung. Владелец: . Дата публикации: 2021-02-25.

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Номер патента: US20160059377A1. Автор: Hsu Samuel Chu-Chiang,Dandavate Gautam Shashank,OH JEONGHOON,Zuniga Steven M.,NAGENGAST Andrew. Владелец: . Дата публикации: 2016-03-03.

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Номер патента: US20190054590A1. Автор: Huang Chun-Hsi,Ko Huang-Chu. Владелец: . Дата публикации: 2019-02-21.

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Номер патента: US20170069507A1. Автор: HUA Qiang,ZHOU Yaohui. Владелец: CSMC TECHNOLOGIES FAB2 CO., LTD.. Дата публикации: 2017-03-09.

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Номер патента: US20160074993A1. Автор: Smith Joseph,Wargo Christopher,Galpin Andrew. Владелец: . Дата публикации: 2016-03-17.

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Номер патента: US20140167208A1. Автор: Hung Yung Tai,Su Chin Ta,CHEN Chun Fu,CHENG Yi Sheng. Владелец: MACRONIX INTERNATIONAL CO., LTD.. Дата публикации: 2014-06-19.

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Номер патента: US20150117135A1. Автор: HUNG YUNG-TI,CHEN Tsung-Huang,LI Wei-Cheng,LAI Chi-Tung. Владелец: Taiwan Semiconductor Manufacturing Co., Ltd.. Дата публикации: 2015-04-30.

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Номер патента: US20140209239A1. Автор: Karuppiah Lakshmanan,Ko Sen-Hou. Владелец: . Дата публикации: 2014-07-31.

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Номер патента: US20140227951A1. Автор: Lin Chang-Sheng,Lu Hsin-Hsien. Владелец: Taiwan Semiconductor Manufacturing Co., Ltd.. Дата публикации: 2014-08-14.

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Номер патента: US20160172208A1. Автор: Carswell Andrew,Lindenberg Tony M.,Liu Lequn,Morley Mark,Ritter Kyle. Владелец: . Дата публикации: 2016-06-16.

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Номер патента: US20140256133A1. Автор: Lin Qinghuang,Khojasteh Mahmoud,Tseng Wei-Tsu,STEFFES James J.,Devarapalli Vamsi,Goyette Colin J.,Kennett Michael R.,Ticknor Adam D.. Владелец: INTERNATIONAL BUSINESS MACHINES CORPORATION. Дата публикации: 2014-09-11.

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Номер патента: US20150228511A1. Автор: Wedlake Michael. Владелец: GLOBALFOUNDRIES, Inc.. Дата публикации: 2015-08-13.

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Номер патента: US20140311043A1. Автор: Mathew Anoop,LEFEVRE Paul,WU Guangwei,QIAO Scott Xin,HSU Oscar K.,WELLS David Adam,ALDEBORGH John Erik,JIN Marc C.. Владелец: . Дата публикации: 2014-10-23.

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Номер патента: US20140323017A1. Автор: Osterheld Thomas H.,Menk Gregory E.,Tang Jianshe,Redeker Fred C.. Владелец: . Дата публикации: 2014-10-30.

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Номер патента: US20190224810A1. Автор: Kei-Wei Chen,Ying-Lang Wang,Chih Hung Chen. Владелец: Taiwan Semiconductor Manufacturing Co TSMC Ltd. Дата публикации: 2019-07-25.

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Номер патента: US20180281076A1. Автор: Cantrell Brian T.,Delaney Patrick S.,Stack Jeffrey Robert. Владелец: . Дата публикации: 2018-10-04.

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Номер патента: US20190291237A1. Автор: Trojan Daniel R.,Ciszek Richard,Daniel Clifford. Владелец: . Дата публикации: 2019-09-26.

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Номер патента: US20170320193A1. Автор: HUNG YUNG-TI,CHEN Tsung-Huang,LI Wei-Cheng,LAI Chi-Tung. Владелец: . Дата публикации: 2017-11-09.

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Номер патента: US20170355062A1. Автор: Clifford Daniel,Daniel R. Trojan,Richard Ciszek. Владелец: AXUS Tech LLC. Дата публикации: 2017-12-14.

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Номер патента: US20190351527A1. Автор: Tiwari Rajesh,Doering Patrick,SURIAGA Conrad,Arrington Bruce,GALPIN Andrew Allan. Владелец: . Дата публикации: 2019-11-21.

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Номер патента: US20200353586A1. Автор: Huang Ping,STEWART Justin,Fu Lin,Moyer Eric S.,Tsai Chen-Chih,SPITZIG William Michael,BARROS Carlos. Владелец: . Дата публикации: 2020-11-12.

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Номер патента: US20200353588A1. Автор: LEE Jaeseok,Lefevre Paul Andre,Moyer Eric S.,SCHMITT Devin,HODGES Holland. Владелец: . Дата публикации: 2020-11-12.

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Номер патента: US20190381575A1. Автор: Cantrell Brian T.,Delaney Patrick S.,Stack Jeffrey Robert. Владелец: . Дата публикации: 2019-12-19.

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Номер патента: US6258721B1. Автор: Yuzhuo Li,David Bruce Cerutti,Donald Joseph Buckley, Jr.,Earl Royce Tyre, Jr.,Jason J. Keleher,Richard J. Uriarte,Ferenc Horkay. Владелец: General Electric Co. Дата публикации: 2001-07-10.

Method and apparatus for endpointing mechanical and chemical-mechanical planarization of microelectronic substrates

Номер патента: US6046111A. Автор: Karl M. Robinson. Владелец: Micron Technology Inc. Дата публикации: 2000-04-04.

Method of chemical mechanical planarization using a water rinse to prevent particle contamination

Номер патента: US6071816A. Автор: Rajeev Bajaj,David K. Watts,Sanjit K. Das. Владелец: Motorola Inc. Дата публикации: 2000-06-06.

Shallow trench isolation chemical mechanical planarization

Номер патента: US8497210B2. Автор: Tomohisa Konno,Mahadevaiyer Krishnan,Michael F. Lofaro,Leslie Charns,Jason E. Cummings,Lukasz J. Hupka,Dinesh R. Koli,Jakub W. Nalaskowski,Masahiro Noda,Dinesh K. Penigalapati,Tatsuya Yamanaka. Владелец: International Business Machines Corp. Дата публикации: 2013-07-30.

Method of polishing semiconductor structures using a two-step chemical mechanical planarization with slurry particles having different particle bulk densities

Номер патента: US6368955B1. Автор: William Graham Easter,John Albert Maze, III,Frank Miceli. Владелец: Agere Systems LLC. Дата публикации: 2002-04-09.

Chemical-mechanical planarization pad

Номер патента: KR101570732B1. Автор: 오스카 케이. 수,폴 르페브르,마크 씨. 진,존 에릭 알데보흐,데이비드 아담 웰스. Владелец: 에프엔에스테크 주식회사. Дата публикации: 2015-11-20.

Polishing pad for use in chemical - mechanical planarization of semiconductor wafers and method of making same

Номер патента: US20040142638A1. Автор: Angela Petroski,Richard Cooper,Paul Fathauer,Marc Yesnik. Владелец: Individual. Дата публикации: 2004-07-22.

Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same

Номер патента: US20040142637A1. Автор: Angela Petroski,Richard Cooper,Paul Fathauer,Marc Yesnik. Владелец: Individual. Дата публикации: 2004-07-22.

Polishing pad for use in chemical—mechanical planarization of semiconductor wafers and method of making same

Номер патента: US6852020B2. Автор: Angela Petroski,Paul Fathauer,Richard D. Cooper,Marc Andrew Yesnik. Владелец: Raytech Innovative Solutions Inc. Дата публикации: 2005-02-08.

Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same

Номер патента: US7037184B2. Автор: Angela Petroski,Paul Fathauer,Richard D. Cooper,Marc Andrew Yesnik. Владелец: Raytech Innovation Solutions LLC. Дата публикации: 2006-05-02.

Diamond as a polish-stop layer for chemical-mechanical planarization in a damascene process flow

Номер патента: US20020048959A1. Автор: Louis Hsu,Jeremy Stephens,Lawrence Clevenger,Michael Wise. Владелец: International Business Machines Corp. Дата публикации: 2002-04-25.

Systems for performing chemical mechanical planarization and process for conducting same

Номер патента: US5637185A. Автор: Shyam P. Murarka,Ronald J. Gutmann,David J. Duquette,Joseph M. Steigerwald. Владелец: RENSSELAER POLYTECHNIC INSTITUTE. Дата публикации: 1997-06-10.

Diamond as a polish-stop layer for chemical-mechanical planarization in a damascene process flow

Номер патента: US6348395B1. Автор: Michael Wise,Lawrence A. Clevenger,Louis L. C. Hsu,Jeremy K. Stephens. Владелец: International Business Machines Corp. Дата публикации: 2002-02-19.

Synthesis of a functionally graded pad for chemical mechanical planarization

Номер патента: WO2005000529A1. Автор: Pradip K. Roy,Manish Deopura,Sudhanshu Misra. Владелец: Neopad Technologies Corporation. Дата публикации: 2005-01-06.

Chemical mechanical planarization processes for fabrication of FinFET devices

Номер патента: US8513127B2. Автор: Tomohisa Konno,Mahadevaiyer Krishnan,Michael F. Lofaro,Leslie Charns,Jason E. Cummings,Lukasz J. Hupka,Dinesh R. Koli,Jakub W. Nalaskowski,Masahiro Noda,Dinesh K. Penigalapati,Tatsuya Yamanaka,Josephine B. Chang,Michael A. Guillorn. Владелец: International Business Machines Corp. Дата публикации: 2013-08-20.

Chemical mechanical planarization with overburden mask

Номер патента: US8524606B2. Автор: Tomohisa Konno,Mahadevaiyer Krishnan,Michael F. Lofaro,Leslie Charns,Jason E. Cummings,Lukasz J. Hupka,Dinesh R. Koli,Jakub W. Nalaskowski,Masahiro Noda,Dinesh K. Penigalapati,Tatsuya Yamanaka,John M. Cotte. Владелец: International Business Machines Corp. Дата публикации: 2013-09-03.

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Номер патента: US20230298856A1. Автор: James Rogers,Katsumasa Kawasaki. Владелец: Applied Materials Inc. Дата публикации: 2023-09-21.

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Номер патента: EP3671944A1. Автор: Yong-Seok Choi,Yo-Han KO,Jin-Moo NAM. Владелец: LG Chem Ltd. Дата публикации: 2020-06-24.

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Номер патента: US20130205679A1. Автор: ALDEBORGH John Erik,Renteln Peter,DOLAN Robert P.. Владелец: INNOPAD, INC.. Дата публикации: 2013-08-15.

Method for assessing the implantation viability of endometrium in repeated implantation failures associated with chronic endometritis

Номер патента: RU2746644C1. Автор: Мекан Рахимбердыевич Оразов,Людмила Михайловна Михалева,Марина Борисовна Хамошина,Елена Сергеевна Силантьева,Роман Евгеньевич Орехов,Елена Владимировна Лагутина,Павел Александрович Семёнов. Владелец: Мекан Рахимбердыевич Оразов. Дата публикации: 2021-04-19.

System and method for data visualization using machine learning and automatic insight of outliers associated with a set of data

Номер патента: US20210073682A1. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Steve Simon Joseph Fernandez,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2021-03-11.

System and method for data visualization using machine learning and automatic insight of facts associated with a set of data

Номер патента: US20190102702A1. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2019-04-04.

Method for detecting and controlling the presence of sand in a hyrdocarbon production well equipped with a gas lift

Номер патента: WO2024170921A1. Автор: Benoît GUILLERMOU,Louis-Claude LOEMBA,Diego SANCHEZ PUENTES,Jozef MONSMA. Владелец: TOTALENERGIES ONETECH. Дата публикации: 2024-08-22.

System and method for measuring and controlling the quality of dispersion of filler particles in rubber compounds

Номер патента: WO1999000767A1. Автор: James M. Reszler. Владелец: M.A. Hannarubber Compounding. Дата публикации: 1999-01-07.

Compositions and methods for treating and preventing hyperlipidemia, fatty liver, atherosclerosis and other disorders associated with metabolic syndrome

Номер патента: US9370549B2. Автор: Yan Liu,Jack J. Hawiger,Ruth Ann Veach,Robert D. Collins,Jozef ZIENKIEWICZ,Amy S. Major. Владелец: VANDERBILT UNIVERSITY. Дата публикации: 2016-06-21.

Method for regulating or controlling the temperature of a sheathed-element glow plug

Номер патента: US09816478B2. Автор: Sascha Joos,Bernd Rapp. Владелец: ROBERT BOSCH GMBH. Дата публикации: 2017-11-14.

Compositions and methods for treating and preventing hyperlipidemia, fatty liver, atherosclerosis and other disorders associated with metabolic syndrome

Номер патента: US09808501B2. Автор: Yan Liu,Jack J. Hawiger,Ruth Ann Veach,Robert D. Collins,Jozef ZIENKIEWICZ,Amy S. Major. Владелец: VANDERBILT UNIVERSITY. Дата публикации: 2017-11-07.

Memory device and method for operating and controlling the same

Номер патента: US20110208883A1. Автор: Sang-Sic Yoon,Jinyeong MOON. Владелец: Hynix Semiconductor Inc. Дата публикации: 2011-08-25.

System and method for complete on line testing of a mechanical overspeed trip channel associated with an electrohydraulic emergency trip system for a turbine power plant

Номер патента: CA1071430A. Автор: John R. Doyle,Millard F. Smith,Frederick J. Behringer,Daniel P. Mcfadden. Владелец: Westinghouse Electric Corp. Дата публикации: 1980-02-12.

Screening method for identification of compounds suitable for treatment of oral cavity malodor associated with consumption of garlic

Номер патента: CA2635860C. Автор: Michael J. Greenberg,Charles J. Harrison,Russell Albert Bazemore. Владелец: Wm Wrigley Jr Co. Дата публикации: 2013-01-08.

Method for predicting and controlling the strength development of concrete and apparatus therefor

Номер патента: US5041987A. Автор: Nobuyuki Yamazaki,Takashi Kuwahara. Владелец: Shimizu Construction Co Ltd. Дата публикации: 1991-08-20.

Apparatus and method for monitoring and controlling the transmissibility of mechanical vibration energy during dynamic motion therapy

Номер патента: CA2602040C. Автор: Titi Trandafir. Владелец: American Medical Innovations LLC. Дата публикации: 2013-03-19.

System, device, and method for providing and controlling the supply of a distending media for ct colonography

Номер патента: CA2818844C. Автор: Jeffrey B. Cushner,Christopher R. Stebbins,Allyson Barish. Владелец: Bracco Diagnostics Inc. Дата публикации: 2016-02-16.

Method for Estimating and Controlling the Intake Efficiency of an Internal Combustion Engine

Номер патента: US20200362781A1. Автор: Marco Panciroli. Владелец: Marelli Europe Spa. Дата публикации: 2020-11-19.

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Номер патента: US20210340925A1. Автор: Marco Panciroli. Владелец: Marelli Europe Spa. Дата публикации: 2021-11-04.

Method for estimating and controlling the intake efficiency of an internal combustion engine

Номер патента: US11384701B2. Автор: Marco Panciroli. Владелец: Marelli Europe Spa. Дата публикации: 2022-07-12.

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Номер патента: US20230194631A1. Автор: Johannes Menzel,Jean-Marc Lupin,Ravindra Kulkarni. Владелец: Schneider Electric USA Inc. Дата публикации: 2023-06-22.

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Номер патента: US20170042964A1. Автор: Yan Liu,Jack J. Hawiger,Ruth Ann Veach,Robert D. Collins,Jozef ZIENKIEWICZ,Amy S. Major. Владелец: VANDERBILT UNIVERSITY. Дата публикации: 2017-02-16.

Compositions and methods for treating and preventing hyperlipidemia, fatty liver, atherosclerosis and other disorders associated with metabolic syndrome

Номер патента: US20140336113A1. Автор: Yan Liu,Jack J. Hawiger,Ruth Ann Veach,Robert D. Collins,Jozef ZIENKIEWICZ,Amy Major. Владелец: VANDERBILT UNIVERSITY. Дата публикации: 2014-11-13.

System and method for data visualization using machine learning and automatic insight of facts associated with a set of data

Номер патента: US20210287139A1. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2021-09-16.

System and method for data visualization using machine learning and automatic insight of segments associated with a set of data

Номер патента: US20190102703A1. Автор: John Fuller,Victor Belyaev,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2019-04-04.

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Номер патента: US11694118B2. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Steve Simon Joseph Fernandez,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2023-07-04.

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Номер патента: US11715038B2. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2023-08-01.

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Номер патента: US11023826B2. Автор: John Fuller,Saugata Chowdhury,Victor Belyaev,Ashish Mittal,Alextair Mascarenhas,Samar Lotia,Gabby Rubin,Alvin Raj. Владелец: Oracle International Corp. Дата публикации: 2021-06-01.

Systems and methods for identifying and managing stress conditions, risk state or aging state associated with capacitors

Номер патента: WO2023121979A2. Автор: Johannes Menzel,Jean-Marc Lupin,Ravindra Kulkarni. Владелец: Schneider Electric USA, Inc.. Дата публикации: 2023-06-29.

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Номер патента: WO2023121979A3. Автор: Johannes Menzel,Jean-Marc Lupin,Ravindra Kulkarni. Владелец: Schneider Electric USA, Inc.. Дата публикации: 2023-08-24.

Systems and methods for identifying and managing stress conditions, risk state or aging state associated with capacitors

Номер патента: WO2023121979A9. Автор: Johannes Menzel,Jean-Marc Lupin,Ravindra Kulkarni. Владелец: Schneider Electric USA, Inc.. Дата публикации: 2023-07-27.

Systems and methods for generating a visibility counts per pixel of a texture atlas associated with a viewer telemetry data

Номер патента: US20200279385A1. Автор: Amit Mital,Adam G. Kirk,Oliver A. Whyte. Владелец: Onmivor Inc. Дата публикации: 2020-09-03.

System and method for monitoring and controlling the width of a product

Номер патента: US5345399A. Автор: Steven L. Collins. Владелец: Union Camp Corp. Дата публикации: 1994-09-06.

Method for triggering and controlling the lateral buckling in underwater pipelines

Номер патента: CA2555241C. Автор: Floriano Casola,Paolo Monti,Luca Branduardi. Владелец: Saipem Energy International SpA. Дата публикации: 2012-07-24.

System and method for measuring and controlling the quality of dispersion of filler particles in rubber compounds

Номер патента: US5974167A. Автор: James M. Reszler. Владелец: MA Hanna Rubber Compounding. Дата публикации: 1999-10-26.

System and method for retrieval and generation of graphical user interface depicting of graphics associated with rules-based data management

Номер патента: US11907692B2. Автор: QIAN WEN,Vijaybabu Eswari Rajan Babu,Pratikshaben Patel. Владелец: Bank of America Corp. Дата публикации: 2024-02-20.

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Номер патента: EP4322839A1. Автор: Roxana TIRON,Niall Andrew FOX. Владелец: Resmed Sensor Technologies Ltd. Дата публикации: 2024-02-21.

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Номер патента: US20240028314A1. Автор: QIAN WEN,Vijaybabu Eswari Rajan Babu,Pratikshaben Patel. Владелец: Bank of America Corp. Дата публикации: 2024-01-25.

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Номер патента: US20240181185A1. Автор: Roxana TIRON,Niall Andrew FOX. Владелец: Resmed Sensor Technologies Ltd. Дата публикации: 2024-06-06.

In vitro-method for the diagnosis, prognosis, monitoring and therapy follow-up of disorders associated with the metabolic syndrome, a cardiovascular disease and/or insulin resistance

Номер патента: WO2010049178A1. Автор: Andreas Bergmann. Владелец: B.R.A.H.M.S. Ag. Дата публикации: 2010-05-06.

Method for obtaining structured porous coating on titanium

Номер патента: RU2669257C1. Автор: Евгений Петрович Субботин,Павел Сергеевич Гордиенко,Софья Борисовна Ярусова,Иван Геннадьевич Жевтун. Владелец: Федеральное государственное бюджетное учреждение науки Институт химии Дальневосточного отделения Российской академии наук (ИХ ДВО РАН). Дата публикации: 2018-10-09.

Method and system for microbiome-derived diagnostics and therapeutics for conditions associated with microbiome functional features

Номер патента: US09758839B2. Автор: Zachary APTE,Jessica RICHMAN,Daniel Almonacid,Siavosh Rezvan BEHBAHANI. Владелец: uBiome Inc. Дата публикации: 2017-09-12.

Post Chemical Mechanical Planarization (CMP) Cleaning

Номер патента: US20240026246A1. Автор: Dnyanesh Tamboli,Hee Ming Hwang,Jeong Yun Yu. Владелец: Versum Materials US LLC. Дата публикации: 2024-01-25.

Methods for determining drug candidates

Номер патента: EP4428869A1. Автор: Harald Mischak,Marika Mokou. Владелец: Mosaiques Diagnostics & Therapeutics Ag. Дата публикации: 2024-09-11.

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Номер патента: WO2024184437A1. Автор: Harald Mischak,Marika Mokou. Владелец: MOSAIQUES DIAGNOSTICS AND THERAPEUTICS AG. Дата публикации: 2024-09-12.

Methods and compositions for inhibiting polypeptide accumulation associated with neurological disorders

Номер патента: EP1204674A2. Автор: James S. Huston,Anne Messer,Jean-Michel Lecerf. Владелец: Abgenix Inc. Дата публикации: 2002-05-15.

Compositions and methods for treating, ameliorating, and/or preventing diseases and/or disorders

Номер патента: WO2024191937A2. Автор: Paul STABACH,Demetrius BRADDOCK,Ethan LESTER. Владелец: YALE UNIVERSITY. Дата публикации: 2024-09-19.

Compositions and methods for treating, ameliorating, and/or preventing diseases and/or disorders

Номер патента: WO2024191937A3. Автор: Demetrios Braddock,Paul STABACH,Ethan LESTER. Владелец: YALE UNIVERSITY. Дата публикации: 2024-11-07.

Compounds and methods for targeted degradation of estrogen receptors

Номер патента: WO2023212599A9. Автор: Guangdi Wang,Hyunjung Choi,Bongsu PARK,Xianyou PENG,Borui KANG,Hongjoong KIM,Hunsoon JUNG. Владелец: Endotarget Inc.. Дата публикации: 2024-03-21.

Compounds and methods for targeted degradation of estrogen receptors

Номер патента: WO2023212599A3. Автор: Guangdi Wang,Hyunjung Choi,Bongsu PARK,Xianyou PENG,Borui KANG,Hongjoong KIM,Hunsoon JUNG. Владелец: Endotarget Inc.. Дата публикации: 2023-12-07.

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Номер патента: WO2024178379A3. Автор: Lu Chen. Владелец: The Regents of the University of California. Дата публикации: 2024-10-17.

A method for identifying subjects having a high or low drug metabolising phenotype associated with cytochrome CYP3A5 expression

Номер патента: NZ512932A. Автор: Martin Armstrong,Aimee Dymphne Cather Paulussen. Владелец: Janssen Pharmaceutica NV. Дата публикации: 2004-01-30.

Compositions and methods for modulating expression of apolipoprotein (a)

Номер патента: RU2699985C2. Автор: Марк Дж. ГРЭХАМ,Пунит П. Сет,Тхажа П. Пракаш,Эрик Е. Свейз. Владелец: Ионис Фармасьютикалз, Инк.. Дата публикации: 2019-09-11.

Method and compositions for breeding for preferred traits associated with goss` wilt resistance in plants

Номер патента: CA2697860C. Автор: Scott Walker,Thomas Carlson,Donald Bockelman,Samuel Eathington,Laron Peters,David Butruille,Gilberto Pozar,Travis J. Frey,Kevin Cook,Gregory Holland,Michael R. Kerns,Roger Weyhrich,Karen Grote,Hongwu Jia. Владелец: MONSANTO TECHNOLOGY LLC. Дата публикации: 2019-01-15.

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Номер патента: CA2411857A1. Автор: James A. Romesser,Carla H. Kuhner. Владелец: Individual. Дата публикации: 2001-12-27.

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Номер патента: CA2846786C. Автор: Aaron Deykin. Владелец: Biogen MA Inc. Дата публикации: 2022-05-17.

Method for improving the sensitivity of detection in determining copy number variations

Номер патента: AU2020200728B2. Автор: Diana Abdueva,Richard P. Rava,Darya I. Chudova. Владелец: Verinata Health Inc. Дата публикации: 2021-05-27.

Method for improving the sensitivity of detection in determining copy number variations

Номер патента: CA2928185C. Автор: Diana Abdueva,Richard P. Rava,Darya I. Chudova. Владелец: Verinata Health Inc. Дата публикации: 2024-01-30.

Materials and methods for treatment of spinocerebellar ataxia type 1 (sca1) and other spinocerebellar ataxia type 1 protein (atxn1) gene related conditions or disorders

Номер патента: US20220047722A1. Автор: Lawrence Klein,Ante Sven LUNDBERG,Samarth Kulkarni,Hari Kumar PADMANABHAN. Владелец: CRISPR Therapeutics AG. Дата публикации: 2022-02-17.

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Номер патента: EP3548438A1. Автор: Massimiliano Cesari. Владелец: Lw Srl. Дата публикации: 2019-10-09.

Genetic test for detecting a predisposition to a disease associated with abnormal vegf gene expression

Номер патента: EP1200621A2. Автор: Paul Ernest Charles Brenchley,Carolyn Watson. Владелец: Victoria University of Manchester. Дата публикации: 2002-05-02.

Genetic test for detecting a predisposition to a disease associated with abnormal vegf gene expression

Номер патента: WO2001004351A3. Автор: Paul Ernest Charles Brenchley,Carolyn Watson. Владелец: Carolyn Watson. Дата публикации: 2001-08-09.

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Номер патента: US20130153820A1. Автор: Shi Xiaobo. Владелец: AIR PRODUCTS AND CHEMICALS, INC.. Дата публикации: 2013-06-20.

Sensing device and method for controlling a sensing device

Номер патента: US20240176003A1. Автор: Junjie Zhao. Владелец: BOE Technology Group Co Ltd. Дата публикации: 2024-05-30.

System And Method For Controlling Devices At A Location

Номер патента: US20120105633A1. Автор: Samuel N. Zellner,Mark J. Enzmann,Robert T. Moton, Jr.. Владелец: AT&T INTELLECTUAL PROPERTY I LP. Дата публикации: 2012-05-03.

Method and system for controlling encoded image production using image signatures

Номер патента: WO2005062910A3. Автор: Alfred V Alasia,Alfred J Alasia,Thomas C Alasia,Slobodan Cvetkovic. Владелец: ALASIA ALFRED VICTOR. Дата публикации: 2006-06-15.

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Номер патента: US09954420B2. Автор: J. Rhett Mayor,S. Andrew Semidey. Владелец: Georgia Tech Research Corp. Дата публикации: 2018-04-24.

System and method for audio volume control

Номер патента: US09692384B2. Автор: Grzegorz Wowro. Владелец: Advanced Digital Broadcast SA. Дата публикации: 2017-06-27.

System and method for audio control of concurrently displayed video programs

Номер патента: US20220109904A1. Автор: Albert Fitzgerald Elcock,Richard Moore, Jr.,Anthony Zuyderhoff. Владелец: ARRIS Enterprises LLC. Дата публикации: 2022-04-07.

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Номер патента: RU2706412C2. Автор: Гари Брет МИЛЛАР. Владелец: Ерт Стар Солюшнз, Ллк. Дата публикации: 2019-11-18.

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Номер патента: EP4400415A1. Автор: Kurt SERMEUS. Владелец: Bombardier Inc. Дата публикации: 2024-07-17.

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Номер патента: EP4121692A1. Автор: Aaron Dickey,Pierre Garon,Russell Jones,Kenneth STRANG,Korbin THOMAS,Alan Parkin,Hadylee Wan,Nathaniel Rohrick. Владелец: Dometic Sweden AB. Дата публикации: 2023-01-25.

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Номер патента: AU2021238656A1. Автор: Aaron Dickey,Pierre Garon,Russell Jones,Kenneth STRANG,Korbin THOMAS,Alan Parkin,Hadylee Wan,Nathaniel Rohrick. Владелец: Dometic Sweden AB. Дата публикации: 2022-10-06.

Systems and methods for recreating configuration data

Номер патента: EP1584015A2. Автор: Mark G. Hatle,Joseph W. Green. Владелец: Montavista Software Inc. Дата публикации: 2005-10-12.

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Номер патента: WO2023110065A1. Автор: Haigang Zhang,Francisco FONS LLUIS. Владелец: Huawei Technologies Co., Ltd.. Дата публикации: 2023-06-22.

Systems and methods for recreating configuration data

Номер патента: WO2004063894A2. Автор: Mark G. Hatle,Joseph W. Green. Владелец: Montavista Software, Inc.. Дата публикации: 2004-07-29.

System and method for inferring device type based on port usage

Номер патента: WO2023084371A1. Автор: Ron Shoham,Yuval Friedlander,Tom Hanetz,Gil Ben Zvi. Владелец: Armis Security Ltd.. Дата публикации: 2023-05-19.

System and method for inferring device type based on port usage

Номер патента: EP4430807A1. Автор: Ron Shoham,Yuval Friedlander,Tom Hanetz,Gil Ben Zvi. Владелец: Armis Security Ltd. Дата публикации: 2024-09-18.

A device and a method for a gateway controller of user equipment

Номер патента: EP4427405A1. Автор: Haigang Zhang,Francisco FONS LLUIS. Владелец: Huawei Technologies Co Ltd. Дата публикации: 2024-09-11.

System and methods for simultaneously capturing audio and image data for digital playback

Номер патента: US09955134B2. Автор: Pankaj Sharma,Rakhi Sharma. Владелец: Individual. Дата публикации: 2018-04-24.

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Номер патента: EP3628560A1. Автор: Hoi Won Kim,Hyun Jae Yoo,Beom Jun KIM,Chan Il Park. Владелец: Kia Motors Corp. Дата публикации: 2020-04-01.

System and method for bridge port administration

Номер патента: EP1639430A2. Автор: FANG Yang,Joseph M. McAndrews,Ping H. Kui. Владелец: Computer Associates Think Inc. Дата публикации: 2006-03-29.

System and method for bridge port administration

Номер патента: WO2005003914A2. Автор: FANG Yang,Joseph M. McAndrews,Ping H. Kui. Владелец: Computer Associates Think, Inc.. Дата публикации: 2005-01-13.

Constant-current control circuit and method for constant-current control

Номер патента: US20240251492A1. Автор: Lizhong Dai,Yaping Xie,Jiangang LING,Zhenfan CUI. Владелец: Hunan Biometa Intelligent Manufacturing Technology Co Ltd. Дата публикации: 2024-07-25.

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Номер патента: US12037150B2. Автор: John Senger,Yakov Gofman,Marcin Cichy,Juvenal Naing,Carlos Alberto DIAZ GUERRERO,Craig Rathe. Владелец: VanRx Pharmasystems Inc. Дата публикации: 2024-07-16.

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Номер патента: US20210217077A1. Автор: Skye Drynan. Владелец: House Of Skye Ltd. Дата публикации: 2021-07-15.

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Номер патента: US20190135574A1. Автор: Tiziano Barea. Владелец: BTSR International SpA. Дата публикации: 2019-05-09.

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Номер патента: US20210006575A1. Автор: Jon Ramsey,Nash Borges,Lewis McLean. Владелец: SecureWorks Corp. Дата публикации: 2021-01-07.

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Номер патента: US09762539B2. Автор: David Diehl,Paul Meyer,Spencer Minear. Владелец: McAfee LLC. Дата публикации: 2017-09-12.

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Номер патента: WO2020135470A1. Автор: Muguo DU. Владелец: BEIJING QISHENG SCIENCE AND TECHNOLOGY CO., LTD.. Дата публикации: 2020-07-02.

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Номер патента: US20130094454A1. Автор: Rashid Ahmed Akbar Attar,Christopher Gerard Lott,Joseph B. Soriaga,Rohan Salvi. Владелец: Qualcomm Inc. Дата публикации: 2013-04-18.

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Номер патента: WO2013056134A1. Автор: Rashid Ahmed Akbar Attar,Christopher Gerard Lott,Joseph B. Soriaga,Rohan Salvi. Владелец: QUALCOMM INCORPORATED. Дата публикации: 2013-04-18.

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Номер патента: WO2002065239A3. Автор: Allen M Razdow,Deepak Karamcheti,Daniel R Slater,Michael S Stout. Владелец: Michael S Stout. Дата публикации: 2003-04-10.

Method for mobile device-based cooperative data capture

Номер патента: US20230254673A1. Автор: Jonathan Matus,Pankaj Risbood,Aditya Karnik,Manish Sachdev. Владелец: Zendrive inc. Дата публикации: 2023-08-10.

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Номер патента: US20240315563A1. Автор: Saar Wilf,Ori Weitz. Владелец: Immersix Ltd. Дата публикации: 2024-09-26.

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Номер патента: US12102972B2. Автор: Timothy J Pike,Devin W Ulam,Christopher P Neff. Владелец: Covestro LLC. Дата публикации: 2024-10-01.

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Номер патента: US09763241B2. Автор: Daesung HWANG,Joonkui Ahn,Yunjung Yi. Владелец: LG ELECTRONICS INC. Дата публикации: 2017-09-12.

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Номер патента: EP1300625B1. Автор: Ener Varetto,Lio Piccolo. Владелец: VEP Automation Srl. Дата публикации: 2005-04-06.

Mobile advertising using data networks based on intelligence data associated with internet-connectable devices derived using graph models

Номер патента: WO2013036557A1. Автор: Rishi Kumar,Hemang N. GADHIA,Hellmut ADOLPHS,Matthew M. SAUNDERS. Владелец: Millenial Media. Дата публикации: 2013-03-14.

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Номер патента: US20200366637A1. Автор: Praveen Raja Dhanabalan. Владелец: Citrix Systems Inc. Дата публикации: 2020-11-19.

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Номер патента: EP3603033A1. Автор: Praveen Raja Dhanabalan. Владелец: Citrix Systems Inc. Дата публикации: 2020-02-05.

Computer-implemented system and method for determining a status of a call connection

Номер патента: US09781256B2. Автор: David Milstein. Владелец: Intellisist Inc. Дата публикации: 2017-10-03.

System and method for locating nodes within a wireless network

Номер патента: US09716979B2. Автор: Harold Roberts,Jason Dove,Jeffrey Buffum. Владелец: Calix Inc. Дата публикации: 2017-07-25.

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Номер патента: RU2633094C2. Автор: Вольфганг ДИТЦ,Гюнтер ВОЛЬФСБЕРГЕР. Владелец: Магна Штайр Фарцойгтехник Аг Унд Ко Кг. Дата публикации: 2017-10-11.

Method for switching communication links to a mobile terminal device which is associated with a local radio area of a network

Номер патента: US9002351B2. Автор: Bruno Bozionek,Thomas Hanna,Klaus-Josef Kunte. Владелец: Unify GmbH and Co KG. Дата публикации: 2015-04-07.

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Номер патента: WO2019143227A1. Автор: Hoyoung Lee,Gyuchual Kim,Changdae JUNG,Kwangseong CHOI,Hosup Choi. Владелец: SAMSUNG ELECTRONICS CO., LTD.. Дата публикации: 2019-07-25.

Method for operating a vehicle

Номер патента: US20240034271A1. Автор: Erik LINDBERG NILSSON,Johnny TRAN NGUYEN. Владелец: Ningbo Geely Automobile Research and Development Co Ltd. Дата публикации: 2024-02-01.

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Номер патента: FR2838576B1. Автор: Dominique Sebille. Владелец: Valeo Equipements Electriques Moteur SAS. Дата публикации: 2004-08-27.

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Номер патента: FR2635597B1. Автор: Leorat Francois. Владелец: Regie Nationale des Usines Renault. Дата публикации: 1994-05-13.

Method for controlling the radio resources and radio communication system associated with a mobile station

Номер патента: DE10331319A1. Автор: Hyung-Nam Choi,Maik Bienas,Michael Eckert. Владелец: SIEMENS AG. Дата публикации: 2005-02-03.

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Номер патента: US20230280831A1. Автор: James D. Hamilton,Nathan E. Brummel. Владелец: Emerge Now Inc. Дата публикации: 2023-09-07.

System and method for producing mid-air tactile stimulation

Номер патента: US20210286434A1. Автор: James D. Hamilton,Nathan E. Brummel. Владелец: Emerge Now Inc. Дата публикации: 2021-09-16.

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Номер патента: US20240163106A1. Автор: Bjorn Markus Jakobsson. Владелец: Artema Labs Inc. Дата публикации: 2024-05-16.

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Номер патента: DE3561192D1. Автор: Fred R Kohlbach. Владелец: Ingko Industrieanlagenbau GmbH. Дата публикации: 1988-01-28.

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Номер патента: US7650425B2. Автор: Thomas D. Petite,James Davis. Владелец: Sipco LLC. Дата публикации: 2010-01-19.

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Номер патента: CA2564649C. Автор: Andrew J. Borleske,Sean M. Scoggins,David Uy. Владелец: Elster Electricity LLC. Дата публикации: 2010-03-23.

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Номер патента: EP1861303B1. Автор: Marco Paolacci. Владелец: MP Srl. Дата публикации: 2009-07-08.

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Номер патента: US11936942B2. Автор: Ian Bastable,Gareth Bowen. Владелец: Synamedia Ltd. Дата публикации: 2024-03-19.

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Номер патента: US20210374282A1. Автор: Milos Dunjic,John Jong-Suk Lee,Arun Victor JAGGA,Arthur Carroll Chow,David Samuel TAX,Martin Albert Lozon,Peter Glen Nairn,Edward James Hood. Владелец: Toronto Dominion Bank. Дата публикации: 2021-12-02.

Systems and methods for managing a data request interface

Номер патента: US20190332808A1. Автор: Milos Dunjic,John Jong-Suk Lee,Arun Victor JAGGA,Arthur Carroll Chow,David Samuel TAX,Martin Albert Lozon,Peter Glen Nairn,Edward James Hood. Владелец: Toronto Dominion Bank. Дата публикации: 2019-10-31.

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Номер патента: WO2023133648A1. Автор: Jonathan Eckart,Stanislaus Mathy. Владелец: World Economic Forum. Дата публикации: 2023-07-20.

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Номер патента: US20170048220A1. Автор: Allyn D. Smith,Steven R. Hallquist,William O. Pollnow. Владелец: Unisys Corp. Дата публикации: 2017-02-16.

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Номер патента: US20170048219A1. Автор: Allyn D. Smith,Steven R. Hallquist,William O. Pollnow. Владелец: Unisys Corp. Дата публикации: 2017-02-16.

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Номер патента: WO2021185903A1. Автор: Aaron Dickey,Pierre Garon,Russell Jones,Kenneth STRANG,Korbin THOMAS,Alan Parkin,Hadylee Wan,Nathaniel Rohrick. Владелец: Dometic Sweden AB. Дата публикации: 2021-09-23.

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Номер патента: CA3174582A1. Автор: Peter Fehr,Peter Wolfe,Brett Martin Erickson,Alexander James Meikle. Владелец: Tolko Industries Ltd. Дата публикации: 2023-03-14.

System and method for processing a battery passport

Номер патента: US20230224158A1. Автор: Jonathan Eckart,Stanislaus Mathy. Владелец: World Economic Forum. Дата публикации: 2023-07-13.

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Номер патента: CA3002988C. Автор: Milos Dunjic,John Jong-Suk Lee,Arun Victor JAGGA,Arthur Carroll Chow,David Samuel TAX,Martin Albert Lozon,Peter Glen Nairn,Edward James Hood. Владелец: Toronto Dominion Bank. Дата публикации: 2024-03-05.

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Номер патента: US20210065224A1. Автор: Kiyotaka Kawashima. Владелец: Honda Motor Co Ltd. Дата публикации: 2021-03-04.

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Номер патента: US20140133383A1. Автор: Dae-Geun Park. Владелец: Electronics and Telecommunications Research Institute ETRI. Дата публикации: 2014-05-15.

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Номер патента: US20150306637A1. Автор: Brown Brian J.,Zuniga Steven M.. Владелец: . Дата публикации: 2015-10-29.

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Номер патента: WO2001050307A3. Автор: Brian Parsonnet,Tariq Samad,Lane D Desborough. Владелец: Honeywell Inc. Дата публикации: 2002-07-11.

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Номер патента: EP1259915A2. Автор: Brian Parsonnet,Tariq Samad,Lane D. Desborough. Владелец: Honeywell Inc. Дата публикации: 2002-11-27.

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Номер патента: US09767042B2. Автор: Daniel Greenspan,Yoav Lossin. Владелец: Intel Corp. Дата публикации: 2017-09-19.

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Номер патента: US6044438A. Автор: Howard Thomas Olnowich. Владелец: International Business Machines Corp. Дата публикации: 2000-03-28.

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Номер патента: SE516345C2. Автор: Lennart Carlsson. Владелец: MediTeam Dental AB. Дата публикации: 2001-12-17.

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Номер патента: AU8283198A. Автор: James M. Reszler. Владелец: MA Hanna Rubber Compounding. Дата публикации: 1999-01-19.

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Номер патента: US20170107917A1. Автор: Brennan Daniel G.,Rayl Allen B.. Владелец: GM GLOBAL TECHNOLOGY OPERATIONS LLC. Дата публикации: 2017-04-20.

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Номер патента: US20100273206A1. Автор: Manfred Rauh,Hans-Georg Topf. Владелец: Individual. Дата публикации: 2010-10-28.

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Номер патента: WO2020185332A1. Автор: John Ferraz, JR.,William N. O'Neill,Michael T. Jackson. Владелец: CATERPILLAR INC.. Дата публикации: 2020-09-17.

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