Manufacturing method of compound semiconductor substrate having pn junction
Номер патента: TW200605193A
Опубликовано: 01-02-2006
Автор(ы): Kazumasa Ueda, Kenji Kohiro, Masahiko Hata
Принадлежит: Sumitomo Chemical Co
Опубликовано: 01-02-2006
Автор(ы): Kazumasa Ueda, Kenji Kohiro, Masahiko Hata
Принадлежит: Sumitomo Chemical Co
Method for producing compound semiconductor epitaxial substrate having PN junction
Номер патента: US20090031944A1. Автор: Kazumasa Ueda,Masahiko Hata,Kenji Kohiro. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2009-02-05.