Method for growth of a merged crystal by bonding at least a first and second crystal to an adhesion layer to form a tiled substrate and growing a crystalline composition over said tiled substrate
27-09-2022 дата публикации
Номер:
US0011453956B2
Принадлежит: SLT TECHNOLOGIES, INC.
Контакты:
Номер заявки: 47-09-1655
Дата заявки: 26-08-2019






















CPC - классификация
CC3C30C30BC30B1C30B19C30B19/C30B19/0C30B19/06C30B19/068C30B19/1C30B19/12C30B2C30B25C30B25/C30B25/0C30B25/02C30B25/1C30B25/18C30B29C30B29/C30B29/4C30B29/40C30B29/403C30B29/406C30B3C30B33C30B33/C30B33/0C30B33/06C30B7C30B7/C30B7/1C30B7/10C30B7/105HH0H01H01LH01L2H01L21H01L21/H01L21/0H01L21/02H01L21/025H01L21/0254H01L21/026H01L21/0260H01L21/02609H01L29H01L29/H01L29/2H01L29/20H01L29/200H01L29/2003IPC - классификация
CC3C30C30BC30B1C30B19C30B19/C30B19/0C30B19/06C30B19/1C30B19/12C30B2C30B25C30B25/C30B25/0C30B25/02C30B25/1C30B25/18C30B29C30B29/C30B29/4C30B29/40C30B29/403C30B3C30B33C30B33/C30B33/0C30B33/06C30B7C30B7/C30B7/1C30B7/10C30B9C30B9/C30B9/1C30B9/10HH0H01H01LH01L2H01L21H01L21/H01L21/0H01L21/02H01L29H01L29/H01L29/2H01L29/20Цитирование НПИ
117/1117/101
117/84
117/915
257/79
427/523
430/22
438/455
438/458
438/458
438/775
Altoukhov et al., High reflectivity airgap distributed Bragg reflectors realized by wet etching of AlInN sacrificial layers Applied Physics Letters 95, 1191102 (2009), 3 pages.
Callahan et al., ‘Synthesis and Growth of Gallium Nitride by The Chemical Vapor Reaction Process (CVRP)', MRS Internet Journal Nitride Semiconductor Research’, vol. 4, No. 10, 1999, pp. 1-6.
Cao et al., “Defect generation in InGaN/GaN light-emitting diodes under forward and reverse electrical stresses,” Microelectronics Reliability, 2003, vol. 43, pp. 1987-1991.
Chakraborty et al., ‘Defect Reduction in Nonpolar a-Plane GaN Films Using in situ SiNx Nanomask’, Applied Physics Letters, vol. 89, 2006, pp. 041903-1-041903-3.
Chen et al. (Applied Physics Letters 75, 2062 (1999)).
Chen et al. (Japanese Journal of Applied Physics 42, L818 (2003)).
Choi et al., 2.5 _ microcavity InGaN light-emitting diodes fabricated by a selective dry-etch thinning process, Applied Physics Letters 91, 061120 (2007), 3 pages.
D'Evelyn et al., ‘Bulk GaN Crystal Growth by the High-Pressure Ammonothermal Method’, Journal of Crystal Growth, vol. 300, 2007, pp. 11-16.
Darakchieva et al., “Lattice parameters of bulk GaN fabricated by halide vapor phase epitaxy,” Journal of Crystal Growth, 2008, vol. 310, pp. 959-965.
Davidsson et al., ‘Effect of AIN Nucleation Layer on the Structural Properties of Bulk GaN Grown on Sapphire by Molecular-Beam Epitaxy’, Journal of Applied Physics, vol. 98, No. 1, 2005, pp. 016109-1-016109-3.
Dorsaz et al., Selective oxidation of AlInN layers for current confinement in III-nitride devices, Applied Physics Letters 87, 072102 (2005), 3 pages.
Dorsaz et al., ‘Selective oxidation of AlInN Layers for current confinement III-nitride devices’, Applied Physics Letters, vol. 87, 2005, pp. 072102.
Dwilinski et al., ‘Ammono Method of BN, AIN and GaN Synthesis and Crystal Growth’, MRS Internet Journal Nitride Semiconductor Research, vol. 3, No. 25, 1998, pp. 1-5.
Dwilinski et al., ‘Excellent Crystallinity of Truly Bulk Ammonothermal GaN’, Journal of Crystal Growth, vol. 310, 2008, pp. 3911-3916.
Ehrentraut et al., ‘The ammonothermal crystal growth of gallium nitride—A technique on the up rise’, Proceedings IEEE, 2010, 98(7), pp. 1316-1323.
Ehrentraut et al.,The Ammonothermal Crystal Growth of Gallium NitrideVA Technique on the Up Rise, Proceedings of the IEEE, vol. 0, No. 0,2009, pp. 1-8, 8 pages.
Fang et al., Deep centers in semi-insulating Fe-doped native GaN substrates grown by hydride vapour phase epitaxy, phys. stat. sol. (c) 5, No. 6, pp. 1508-1511 (2008), 4 pages.
Final Office Action dated Nov. 30, 2021 for U.S. Appl. No. 16/736,274.
Fujito et al., ‘Development of Bulk GaN Crystals and Nonpolar/Semipolar Substrates by HVPE’, MRS Bulletin, May 2009, vol. 34, No. 5, pp. 313-317.
Fukuda et al., ‘Prospects for the Ammonothermal Growth of Large GaN Crystal’, Journal of Crystal Growth, vol. 305, 2007, pp. 304-310.
Gladkov et al., Effect of Fe doping on optical properties of freestanding semi-insulating HVPE GaN:Fe, Journal of Crystal Growth 312 (2010) pp. 1205-1209, 5 pages.
Grzegory, ‘High pressure growth of bulk GaN from Solutions in gallium’, Journal of Physics Condensed Matter, vol. 13, 2001, pp. 6875-6892.
Hashimoto et al., ‘A GaN bulk crystal with improved structural quality grown by the ammonothermal method’, Nature Materials, vol. 6, 2007, pp. 568-671.
Hashimoto et al., ‘Ammonothermal Growth of Bulk GaN’, Journal of Crystal Growth, vol. 310, 2008, pp. 3907-3910.
International Search Report dated May 6, 2021 for Application No. PCT/US2021/017514.
International Search Report dated Nov. 2, 2020 for Application No. PCT/US2020/034405).
Katona et al., ‘Observation of Crystallographic Wing Tilt in Cantilever Epitaxy of GaN on Silicon Carbide and Silicon (111) Substrates’, Applied Physics Letters, vol. 79, No. 18, 2001, pp. 2907-2909.
Kaun et al., “Effects of Threading Dislocation Density on the Gate Leakage of AlGaN/GaN Heterostructures for High Electron Mobility Transistors,” Applied Physics Express, 2011, vol. 4, p. 024101.
Kolis et al., ‘Crystal Growth of Gallium Nitride in Supercritical Ammonia’, Journal of Crystal Growth, vol. 222, 2001, pp. 431-434.
Kolis et al., ‘Materials Chemistry and Bulk Crystal Growth of Group III Nitrides in Supercritical Ammonia’, Material Resources Society Symposium Proceedings, vol. 495, 1998, pp. 367-372.
Linthicum et al. (Applied Physics Letters, 75, 196, (1999)).
Motoki et al., ‘Growth and Characterization of Freestanding GaN Substrates’, Journal of Crystal Growth, vol. 237-239, 2002, pp. 912-921.
Moutanabbir, ‘Bulk GaN Ion Cleaving’, Journal of Electronic Materials, vol. 39, 2010, pp. 482-488.
Nakamura et al., ‘GaN Growth Using GaN Buffer Layer’, Japanese Journal of Applied Physics, vol. 30, No. 10A, 1991, pp. L1705-L1707.
Non-Final Office Action for U.S. Appl. No. 16/736,274 dated Apr. 5, 2022.
Office Action dated Aug. 30, 2021 for U.S. Appl. No. 16/736,274.
Orita et al., “Analysis of Diffusion Involved in Degradation of InGaN-based Laser Diodes,” IEEE International Reliability Physics Symposium Proceedings, 2009, pp. 736-740.
Oshima et al., ‘Thermal and Optical Properties of Bulk GaN Crystals Fabricated Through Hydride Vapor Phase Epitaxy With Void-Assisted Separation’, Journal of Applied Physics, vol. 98, No. 10, Nov. 18, 2005, pp. 103509-1-103509-4.
Pattison et al., Gallium nitride based microcavity light emitting diodes with 2_ effective cavity thickness, Applied Physics Letters 90, 031111 (2007), 3 pages.
Porowski et al., High resistivity GaN single crystalline substrates, APPA Vo. 92 (1997), 5 pages.
Porowski, ‘Near Defect Free GaN Substrates’, Journal of Nitride Semiconductor, 1999, pp. 1-11.
S. K. Mathis et al., “Modeling of threading dislocation reduction in growing GaN layers,” Journal of Crystal Growth, 2001, vol. 231, pp. 371-390.
Schubert etal., Applied Physics Letters, 2007, 91(23), 231114.
Sharma et al., ‘Vertically oriented GaN-based air-gap distributed Bragg reflector structure fabricated using band-gap-selective photoelectrochemical etching’, Applied Physics Letters, vol. 87, 2005, pp. 051107.
Sumiya et al., ‘Growth Mode and Surface Morphology of a GaN Film Deposited Along The N-Face Polar Direction on c-Plane Sapphire Substrate’, Journal of Applied Physics, vol. 88, No. 2, 2000, pp. 1158-1165.
Sumiya et al., ‘High-pressure synthesis of high-purity diamond crystal’, Diamond and Related Materials, 1996, vol. 5, pp. 1359-1365.
Tapajna et al. “Influence of threading dislocation density on early degradation in AlGaN/GaN high electron mobility transistors,” Applied Physics Letters, 2011, vol. 99, pp. 223501.
Tomiya et al., “Dislocation Related Issues in the Degradation of GaN-Based Laser Diodes,” IEEE Journal of Selected Topics in Quantum Electronics, 2004, vol. 10, No. 6, pp. 1277-1286.
Tyagi et al., Partial strain relaxation via misfit dislocation generation at heterointerfaces in (Al,In)GaN epitaxial layers grown on semipolar (1122) GaN free standing substrates, Applied Physics Letters 95, 1191102 (2009), 3 pages.
Wang et al., Ammonothermal growth of GaN crystals in alkaline solutions, Journal of Crystal Growth 287 (2006) pp. 376-380, 5 pages.
Weisbuch et al., Recent results and latest views on microcavity LEDs, Proc. of SPIE, vol. 5366, 2009, pp. 1-19, 19 pages.
“Semiconductor Wafer Bonding” by Q.-Y. Tong and U. Gosele, Annu. Rev. Mater. Sci., vol. 28, pp. 215-241 (1998).