Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
Номер патента: EP1026213A4
Опубликовано: 20-10-2004
Автор(ы): Akira Nakashima, Michio Komatsu
Принадлежит: Catalysts and Chemicals Industries Co Ltd
Опубликовано: 20-10-2004
Автор(ы): Akira Nakashima, Michio Komatsu
Принадлежит: Catalysts and Chemicals Industries Co Ltd
Реферат: A coating fluid capable of forming a silica-based coating film having a relative permittivity as low as 3 or below and a low density and excellent in resistance to oxygen plasma and suitability for other processings; and a substrate having a coating film having such properties. The coating fluid is characterized by comprising a polymer composition comprising (i) a polysiloxane which is a product of the reaction of fine silica particles with a hydrolyzate of at least one alkoxysilane represented by following general formula (I) and (ii) a readily decomposable resin; XnSi(OR)4-n (wherein X represents hydrogen, flourine, C1-8 alkyl, flouroalkyl, aryl, or vinyl; R represents hydrogen, C1-8 alkyl, aryl, or vinyl; and n is an integer of 0 to 3).
Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
Номер патента: EP1035183A4. Автор: Akira Nakashima,Michio Komatsu,Miki Egami. Владелец: Catalysts and Chemicals Industries Co Ltd. Дата публикации: 2004-10-20.