Radiation-sensitive composition, method for forming silica-based coating, silica-based coating, apparatus and member provided with silica-based coating, and photosensitive agent for insulating film .

Radiation-sensitive composition, method for forming silica-based coating, silica-based coating, apparatus and member provided with silica-based coating, and photosensitive agent for insulating film

Номер патента: JP5077237B2
Опубликовано: 21-11-2012
Автор(ы): 圭粕谷, 大介龍崎, 恭子小島, 浩一阿部, 鋼志丸山, 陽介青木
Принадлежит: Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions

Номер патента: US5059512A. Автор: Jeffrey D. Gelorme,Jane M. Shaw,Kevin J. Stewart,Michael Hatzakis,Edward D. Babich,David F. Witman. Владелец: International Business Machines Corp. Дата публикации: 1991-10-22.

Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions

Номер патента: EP0422570A3. Автор: Jeffrey Donald Gelorme,Jane Margaret Shaw,Michael Hatzakis,Edward Darko Babich,Kevin Jay Stewart,David Frank Witman. Владелец: International Business Machines Corp. Дата публикации: 1991-10-16.

UV photosensitive photoinitiator compositions, their use and radiation sensitive compositions

Номер патента: DE69024452D1. Автор: Jeffrey Donald Gelorme,Jane Margaret Shaw,Michael Hatzakis,Edward Darko Babich,Kevin Jay Stewart,David Frank Witman. Владелец: International Business Machines Corp. Дата публикации: 1996-02-08.

Radiation sensitive composition and pattern forming method using its composition

Номер патента: JPS61144639A. Автор: 巧上野,Takashi Nishida,Hiroshi Shiraishi,Nobuaki Hayashi,伸明林,洋白石,Takumi Ueno,西田　高. Владелец: HITACHI LTD. Дата публикации: 1986-07-02.

Phosphor dispersed radiation sensitive composition

Номер патента: KR970062812A. Автор: 히로아끼 네모또,히데아끼 마스꼬,다다히꼬 우다가와,노부오 벳쇼. Владелец: 니혼 고오세이 고무 가부시끼가이샤. Дата публикации: 1997-09-12.

Process for preparing a radiation-sensitive composition

Номер патента: WO1999036831A1. Автор: Joseph J. Sizensky,Sanjay Malik,Andrew J. Blakeney. Владелец: Olin Microelectronic Chemicals, Inc.. Дата публикации: 1999-07-22.

Process for preparing a radiation-sensitive composition

Номер патента: EP1044394A1. Автор: Joseph J. Sizensky,Sanjay Malik,Andrew J. Blakeney. Владелец: Olin Microelectronic Chemicals Inc. Дата публикации: 2000-10-18.

Process for preparing a radiation-sensitive composition

Номер патента: WO1999036831A9. Автор: Sanjay Malik,Andrew J Blakeney,Joseph J Sizensky. Владелец: Olin Microelectronic Chem Inc. Дата публикации: 1999-10-07.

Radiation-sensitive composition including an iodine- containing azide compound

Номер патента: CA1176903A. Автор: Saburo Nonogaki,Hiroshi Shiraishi,Takumi Ueno,Takao Iwayanagi,Takahiro Kohashi. Владелец: HITACHI LTD. Дата публикации: 1984-10-30.

Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates

Номер патента: US5340699A. Автор: Neil F. Haley,Steven L. Corbiere. Владелец: Eastman Kodak Co. Дата публикации: 1994-08-23.

Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates

Номер патента: US5466557A. Автор: Neil F. Haley,Steven L. Corbiere. Владелец: Eastman Kodak Co. Дата публикации: 1995-11-14.

Compound for resist and radiation-sensitive composition specification

Номер патента: US8802353B2. Автор: Masatoshi Echigo,Dai Oguro. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2014-08-12.

Radiation-sensitive compositions and imageable materials

Номер патента: WO2007097907A3. Автор: Ting Tao,Paul Richard West,Scott A Beckley,Nicki R Miller. Владелец: Nicki R Miller. Дата публикации: 2008-05-08.

Radiation-sensitive compositions and imageable materials

Номер патента: WO2007097907A2. Автор: Ting Tao,Nicki R. Miller,Scott A. Beckley,Paul Richard West. Владелец: EASTMAN KODAK COMPANY. Дата публикации: 2007-08-30.

Radiation-sensitive compositions and imageable materials

Номер патента: WO2007019031A3. Автор: Shashikant Saraiya,Frederic Eugene Mikell,Kevin David Wieland,Heidi M Munnelly. Владелец: Heidi M Munnelly. Дата публикации: 2007-12-06.

Radiation-sensitive compositions and imageable materials

Номер патента: WO2007019031A2. Автор: Shashikant Saraiya,Heidi M. Munnelly,Frederic Eugene Mikell,Kevin David Wieland. Владелец: EASTMAN KODAK COMPANY. Дата публикации: 2007-02-15.

Negative-working radiation-sensitive compositions and imageable materials

Номер патента: EP2089771A2. Автор: Ting Tao,Jianbing Huang,Scott A. Beckley. Владелец: Eastman Kodak Co. Дата публикации: 2009-08-19.

Process for preparing a radiation-sensitive composition

Номер патента: EP1044394B1. Автор: Joseph J. Sizensky,Sanjay Malik,Andrew J. Blakeney. Владелец: Arch Specialty Chemicals Inc. Дата публикации: 2005-05-18.

Radiation-sensitive composition, color filter, and method for producing color filter

Номер патента: JP5954892B2. Автор: 俊人空花,泰史田口,高桑　英希,英希高桑. Владелец: Fujifilm Corp. Дата публикации: 2016-07-20.

Radiation-sensitive composition, color filter, and method of manufacturing color filter

Номер патента: KR101755416B1. Автор: 토시히토 쿠게,히로시 타구치,히데키 타카쿠와. Владелец: 후지필름 가부시키가이샤. Дата публикации: 2017-07-10.

Radiation sensitive composition

Номер патента: EP0902327A2. Автор: Hiroaki Nemoto,Satoshi Shimada,Atsushi Kumano,Tomio Nagatsuka. Владелец: JSR Corp. Дата публикации: 1999-03-17.

Radiation sensitive composition for color filter

Номер патента: JP4282783B2. Автор: 孝浩飯島,宏明根本,幸一櫻井,由樹子伊藤. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2009-06-24.

Radiation sensitive composition

Номер патента: US6255034B1. Автор: Hiroaki Nemoto,Satoshi Shimada,Atsushi Kumano,Tomio Nagatsuka. Владелец: JSR Corp. Дата публикации: 2001-07-03.

Radiation Sensitive Composition

Номер патента: KR100423220B1. Автор: 히로아끼 네모또,다까히로 이이지마,고이찌 사꾸라이,유끼꼬 이또. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2005-01-15.

Negative-working radiation-sensitive compositions and imageable materials

Номер патента: US7279255B2. Автор: Ting Tao,Scott A. Beckley. Владелец: Eastman Kodak Co. Дата публикации: 2007-10-09.

Radiation Sensitive Composition

Номер патента: KR100527017B1. Автор: 사또시 시마다,도미오 나가쯔까,히로아끼 네모또,아쯔시 구마노. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2005-11-09.

Radiation-sensitive composition, microlens and method for forming the same, and liquid crystal display device

Номер патента: JP4292985B2. Автор: 政暁花村. Владелец: JSR Corp. Дата публикации: 2009-07-08.

Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records

Номер патента: EP0440086B1. Автор: Andreas Dr. Dipl.-Chem. Elsässer,Hans Werner Dr. Dipl.-Chem. Frass,Dieter Dr. Dipl.-Chem. Mohr. Владелец: Hoechst AG. Дата публикации: 1995-10-25.

Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices

Номер патента: US20030134232A1. Автор: Yoshiyuki Yokoyama,Takashi Hattori. Владелец: HITACHI LTD. Дата публикации: 2003-07-17.

4-Halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives

Номер патента: US4371607A. Автор: Reinhard Donges. Владелец: Hoechst AG. Дата публикации: 1983-02-01.

Radiation-sensitive compositions

Номер патента: EP0565858B1. Автор: Daniel Y. Pai,Philip D. Knudsen,Charles R. Shipley. Владелец: Shipley Co Inc. Дата публикации: 1999-09-01.

Radiation-sensitive composition, pattern forming method, and semiconductor device manufacturing method

Номер патента: JP3822101B2. Автор: 義之横山,孝司服部. Владелец: Renesas Technology Corp. Дата публикации: 2006-09-13.

Method of forming radiation-sensitive composition and pattern and manufacturing method of semiconductor device

Номер патента: KR100907585B1. Автор: 요코야마요시유키,핫토리타카시. Владелец: 가부시키가이샤 히타치세이사쿠쇼. Дата публикации: 2009-07-14.

Radiation-sensitive compositions

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Chemically Amplified Radiation-Sensitive Compositions

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Radiation-sensitive composition in which phosphor is dispersed

Номер патента: KR19980080296A. Автор: 아쯔시 구마노,히데아끼 마스꼬,다다히꼬 우다가와,지로 다까하시. Владелец: 마쯔모또 에이찌. Дата публикации: 1998-11-25.

Radiation-sensitive composition for color filters

Номер патента: KR19980081838A. Автор: 시게루 아베,고지 이따노,야스미 이따노. Владелец: 제이에스알가부시끼가이샤. Дата публикации: 1998-11-25.

A radiation sensitive composition that changes the refractive index

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Radiation sensitive composition

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Radiation-Sensitive Composition Capable of Having Refractive Index Distribution

Номер патента: KR100789582B1. Автор: 겐지 야마다,아쯔시 구마노,이사오 니시무라,노부오 베쑈. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2007-12-28.

Radiation sensitive composition and patternformation method

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Radiation sensitive composition for color filter

Номер патента: JPH10300922A. Автор: Shigeru Abe,慈阿部,考史板野,康美鰐部,Yasuyoshi Wanibe,Takafumi Itano. Владелец: JSR Corp. Дата публикации: 1998-11-13.

Radiation-sensitive compositions and recording media using them

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Acid labile solution inhibitors and positively and negatively working radiation sensitive composition based on them

Номер патента: KR100190809B1. Автор: 율리히쉐델리. Владелец: 오린 마이크로엘렉트로닉 케미칼스 인코포레이티드. Дата публикации: 1999-06-01.

Positive radiation-sensitive composition

Номер патента: US6733951B2. Автор: Kunihiko Kodama. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2004-05-11.

Compound for resist and radiation-sensitive composition

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Radiation-sensitive compositions containing polymeric sulfonate acid generators and their use in imaging

Номер патента: EP1508071A1. Автор: Tingting Tao. Владелец: Kodak Graphics Holding Inc. Дата публикации: 2005-02-23.

Radiation sensitive composition for color filters

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A resole resin and a novolak resin containing radiation sensitive composition and their use in printing plates

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Radiation-sensitive composition with variable refraction coefficient

Номер патента: RU2281310C2. Автор: Исао НИСИМУРА,Нобуо БЕССО,Ацуси КУМАНО,Кендзи ЯМАДА. Владелец: Джей Эс Эр КОРПОРЕЙШН. Дата публикации: 2006-08-10.

Radiation-sensitive composition capable of having refractive index distribution

Номер патента: EP1369459A4. Автор: Kenji Yamada,Nobuo Bessho,Isao Nishimura,Atsushi Kumano. Владелец: JSR Corp. Дата публикации: 2008-05-21.

Radiation-sensitive composition containing polymer having labile group

Номер патента: JP3037518B2. Автор: ジェイムズ・ダブリュ・サッカリー,ロジヤー・シンタ,リチヤード・シー・ヘモンド,デイビツド・アール・メデイーラス,マーサ・エム・ラジヤラツトナム,ダイアン・カニストロ. Владелец: Rohm and Haas Electronic Materials LLC. Дата публикации: 2000-04-24.

Compound for resist and radiation-sensitive composition

Номер патента: KR101412954B1. Автор: 마사토시 에치고,다이 오구로. Владелец: 미츠비시 가스 가가쿠 가부시키가이샤. Дата публикации: 2014-06-26.

Positive Radiation-Sensitive Composition

Номер патента: KR100613308B1. Автор: 가즈따까 다무라. Владелец: 도레이 가부시끼가이샤. Дата публикации: 2006-08-17.

Visible radiation sensitive composition

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Compound for resist and radiation-sensitive composition

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Radiation-sensitive composition

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Radiation-sensitive composition

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Radiation-sensitive composition

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Radiation-Sensitive Composition

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Radiation sensitive composition

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Radiation-sensitive compositions containing polymeric sulfonate acid generators and their use in imaging

Номер патента: WO2003102692A8. Автор: Ting Tao. Владелец: Kodak Polychrome Graphics Llc. Дата публикации: 2005-01-20.

Visible radiation sensitive composition

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A printing plate precursor comprising a substrate, a radiation sensitive composition and a barrier layer

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Radiation-sensitive composition and method for forming pattern using this

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Radiation sensitive composition for forming an insulating film, insulating film and display device

Номер патента: TWI273352B. Автор: Masayoshi Suzuki,Kazuaki Niwa,Shinji Shiraki,Hirofumi Sasaki,Michinori Nishikawa. Владелец: JSR Corp. Дата публикации: 2007-02-11.

Radiation sensitive composition for forming an insulating film, insulating film and display device

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Radiation-sensitive composition, insulating film and organic EL display element

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Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof

Номер патента: CN102870047B. Автор: 一户大吾. Владелец: JSR Corp. Дата публикации: 2016-03-02.

Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition

Номер патента: US20060063103A1. Автор: Ratnam Sooriyakumaran,Marie Angelopoulos,Wu-Song Huang,Dirk Pfeiffer,Timothy Brunner. Владелец: International Business Machines Corp. Дата публикации: 2006-03-23.

Positive radiation-sensitive composition, interlayer insulating film and method for forming the same

Номер патента: JP5397152B2. Автор: 政暁花村,大吾一戸. Владелец: JSR Corp. Дата публикации: 2014-01-22.

Positive radiation-sensitive composition, interlayer insulating film and method for forming the same

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Novel process for producing anhydride-containing polymers for radiation sensitive compositions

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Radiation-sensitive composition, cured film and forming methods thereof

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Radiation sensitive composition for forming colored layer, color filter and liquid crystal display element

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Positive radiation-sensitive composition, interlayer insulation film, and method for producing the same

Номер патента: TW201129863A. Автор: Masaaki Hanamura,Daigo Ichinohe. Владелец: JSR Corp. Дата публикации: 2011-09-01.

Radiation-Sensitive Composition, Insulating Film and Organic EL Display Element

Номер патента: KR100745331B1. Автор: 히로후미 사사끼,마사요시 스즈끼,이사오 니시무라,후미꼬 요네자와,마사유끼 엔도,가즈아끼 니와. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2007-08-02.

Negative-working radiation-sensitive compositions and imageable materials

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